Abstract: This insulating film processing liquid for grain-oriented electrical steel sheets contains colloidal silica and a phosphoric acid metal salt of at least one metal selected from K, Al, Fe, Mg, Mn, Ni, Zn, Co, Mo, V, W, and Zr. In the insulating film processing liquid, the K2O/SiO2 ratio of the K amount expressed as K2O and the Si amount expressed as SiO2 is 0.5-10% in mass%.
| # | Name | Date |
|---|---|---|
| 1 | 202517097087-TRANSLATIOIN OF PRIOIRTY DOCUMENTS ETC. [08-10-2025(online)].pdf | 2025-10-08 |
| 2 | 202517097087-STATEMENT OF UNDERTAKING (FORM 3) [08-10-2025(online)].pdf | 2025-10-08 |
| 3 | 202517097087-REQUEST FOR EXAMINATION (FORM-18) [08-10-2025(online)].pdf | 2025-10-08 |
| 4 | 202517097087-PROOF OF RIGHT [08-10-2025(online)].pdf | 2025-10-08 |
| 5 | 202517097087-PRIORITY DOCUMENTS [08-10-2025(online)].pdf | 2025-10-08 |
| 6 | 202517097087-POWER OF AUTHORITY [08-10-2025(online)].pdf | 2025-10-08 |
| 7 | 202517097087-FORM 18 [08-10-2025(online)].pdf | 2025-10-08 |
| 8 | 202517097087-FORM 1 [08-10-2025(online)].pdf | 2025-10-08 |
| 9 | 202517097087-DRAWINGS [08-10-2025(online)].pdf | 2025-10-08 |
| 10 | 202517097087-DECLARATION OF INVENTORSHIP (FORM 5) [08-10-2025(online)].pdf | 2025-10-08 |
| 11 | 202517097087-COMPLETE SPECIFICATION [08-10-2025(online)].pdf | 2025-10-08 |