A Method Of Fabricating A Nanopore In A Dielectric Membrane

Abstract: ABSTRACT A METHOD OF FABRICATING A NANOPORE IN A DIELECTRIC MEMBRANE Present disclosure provides method for fabricating nanopores in a dielectric membrane. The method includes depositing a dielectric film over a substrate and applying a mechanical force through nanoindentation to one or more predetermined regions of the film to induce localized thinning. The substrate may then be selectively etched to create a suspended dielectric membrane that may include these locally thinned regions. A controlled electrical voltage may subsequently be applied across the suspended membrane in an electrolytic medium, facilitating dielectric breakdown specifically at the thinned regions to form one or more nanopores at predetermined locations. The technique may thereby enable deterministic nanopore positioning and size control by combining mechanical pre-conditioning with controlled electrical breakdown. The disclosed method may thus offer a scalable, low-cost, and equipment-light alternative to conventional nanopore fabrication methods, making it suitable for applications in dynamic fields. Figure 2

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