Actinic Ray Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Pattern Formation Method, Electronic Device Manufacturing Method, And Onium Salt

Abstract: The purpose of the present invention is to provide: an actinic ray-sensitive or radiation-sensitive resin composition which has excellent LWR performance and enables the reduction of residues after development; a resist film, a pattern formation method and an electronic device manufacturing method, in each of which the actinic ray-sensitive or radiation-sensitive resin composition is used; and an onium salt which can be used for the actinic ray-sensitive or radiation-sensitive resin composition. Provided are: an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin capable of increasing in the polarity thereof by the action of an acid and an onium salt having a specific structure; a resist film, a pattern formation method, and an electronic device manufacturing method, in each of which the actinic ray-sensitive or radiation-sensitive resin composition is used; and an onium salt having a specific structure.

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