Abstract: The present invention addresses the problem of providing a semiconductor processing liquid which exhibits excellent metal corrosion resistance and excellent cleaning properties against an organic residue, upon contacting an object to be processed containing a metal which has been subjected to a chemical-mechanical polishing process. A semiconductor processing liquid according to the present invention contains a compound represented by formula (1), and has a pH over 7.0.
| # | Name | Date |
|---|---|---|
| 1 | 202547073492-STATEMENT OF UNDERTAKING (FORM 3) [01-08-2025(online)].pdf | 2025-08-01 |
| 2 | 202547073492-REQUEST FOR EXAMINATION (FORM-18) [01-08-2025(online)].pdf | 2025-08-01 |
| 3 | 202547073492-PROOF OF RIGHT [01-08-2025(online)].pdf | 2025-08-01 |
| 4 | 202547073492-Proof of Right [01-08-2025(online)]-1.pdf | 2025-08-01 |
| 5 | 202547073492-PRIORITY DOCUMENTS [01-08-2025(online)].pdf | 2025-08-01 |
| 6 | 202547073492-NOTIFICATION OF INT. APPLN. NO. & FILING DATE (PCT-RO-105-PCT Pamphlet) [01-08-2025(online)].pdf | 2025-08-01 |
| 7 | 202547073492-FORM 18 [01-08-2025(online)].pdf | 2025-08-01 |
| 8 | 202547073492-FORM 1 [01-08-2025(online)].pdf | 2025-08-01 |
| 9 | 202547073492-DECLARATION OF INVENTORSHIP (FORM 5) [01-08-2025(online)].pdf | 2025-08-01 |
| 10 | 202547073492-COMPLETE SPECIFICATION [01-08-2025(online)].pdf | 2025-08-01 |
| 11 | 202547073492-FORM-26 [04-08-2025(online)].pdf | 2025-08-04 |