Actinic Ray Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Pattern Forming Method, And Production Method For Electronic Device

Abstract: This actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin having a polarity that increases due to action of an acid; an onium salt (A) including a sulfonic acid anion but not including a fluorine atom; and an onium salt (B) including a specific structure but not including a fluorine atom. This resist film is formed using the actinic ray-sensitive or radiation-sensitive resin composition. This pattern-forming method and this production method for an electronic device use the actinic ray-sensitive or radiation-sensitive resin composition.

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