Actinic Ray Sensitive Or Radiation Sensitive Resin Composition, Resist

Actinic Ray Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Pattern Forming Method, And Production Method For Electronic Device

Abstract: This actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin having a polarity that increases due to action of an acid; an onium salt (B) represented by formula (1) described in the description; and a resin (C) satisfying specific conditions. This resist film is formed using the actinic ray-sensitive or radiation-sensitive resin composition. This pattern-forming method and this production method for an electronic device use the actinic ray-sensitive or radiation-sensitive resin composition.

Patent Information

Application #

Filing Date

04 September 2025

Publication Number

43/2025

Publication Type

INA

Invention Field

PHYSICS

Status

Email

Parent Application

Applicants

FUJIFILM CORPORATION

26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620

Inventors

1. KANEKO Akihiro

c/o FUJIFILM Corporation, 4000, Kawashiri, Yoshida-cho, Haibara-gun, Shizuoka 4210396

2. GOTO Akiyoshi

c/o FUJIFILM Corporation, 4000, Kawashiri, Yoshida-cho, Haibara-gun, Shizuoka 4210396

Specification

Documents

Application Documents

#	Name	Date
1	202547084131-STATEMENT OF UNDERTAKING (FORM 3) [04-09-2025(online)].pdf	2025-09-04
2	202547084131-REQUEST FOR EXAMINATION (FORM-18) [04-09-2025(online)].pdf	2025-09-04
3	202547084131-PROOF OF RIGHT [04-09-2025(online)].pdf	2025-09-04
4	202547084131-PRIORITY DOCUMENTS [04-09-2025(online)].pdf	2025-09-04
5	202547084131-FORM 18 [04-09-2025(online)].pdf	2025-09-04
6	202547084131-FORM 1 [04-09-2025(online)].pdf	2025-09-04
7	202547084131-DECLARATION OF INVENTORSHIP (FORM 5) [04-09-2025(online)].pdf	2025-09-04
8	202547084131-COMPLETE SPECIFICATION [04-09-2025(online)].pdf	2025-09-04
9	202547084131-Proof of Right [06-09-2025(online)].pdf	2025-09-06
10	202547084131-FORM-26 [08-09-2025(online)].pdf	2025-09-08