Abstract: A gas barrier film according to one aspect of the present disclosure comprises: a substrate film that contains polypropylene; and a vapor deposition layer that contains an inorganic oxide and that is disposed on a first surface, which is one surface of the substrate film, wherein the substrate film is provided with a second skin layer that has a second surface, which is the surface on the opposite side from the first surface of the substrate film, and a core layer. The second skin layer contains 1500-4000 mass ppm of silicon-containing particles.
| # | Name | Date |
|---|---|---|
| 1 | 202547123428-STATEMENT OF UNDERTAKING (FORM 3) [08-12-2025(online)].pdf | 2025-12-08 |
| 2 | 202547123428-REQUEST FOR EXAMINATION (FORM-18) [08-12-2025(online)].pdf | 2025-12-08 |
| 3 | 202547123428-PROOF OF RIGHT [08-12-2025(online)].pdf | 2025-12-08 |
| 4 | 202547123428-PRIORITY DOCUMENTS [08-12-2025(online)].pdf | 2025-12-08 |
| 5 | 202547123428-FORM 18 [08-12-2025(online)].pdf | 2025-12-08 |
| 6 | 202547123428-FORM 1 [08-12-2025(online)].pdf | 2025-12-08 |
| 7 | 202547123428-DRAWINGS [08-12-2025(online)].pdf | 2025-12-08 |
| 8 | 202547123428-DECLARATION OF INVENTORSHIP (FORM 5) [08-12-2025(online)].pdf | 2025-12-08 |
| 9 | 202547123428-COMPLETE SPECIFICATION [08-12-2025(online)].pdf | 2025-12-08 |
| 10 | 202547123428-FORM-26 [09-12-2025(online)].pdf | 2025-12-09 |
| 11 | 202547123428-Proof of Right [10-12-2025(online)].pdf | 2025-12-10 |