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Method For Manufacturing Glass Substrate Having Conductive Via, Metal Paste For Forming Through Glass Via, And Glass Substrate Having Conductive Via

Abstract: This method for manufacturing a glass substrate having a conductive via comprises: a step a for preparing a glass substrate provided with a hole and providing a metal paste part, which contains metal particles and a volatile solvent, in a manner so as to cover at least the surface of the periphery of the hole in the glass substrate while filling the inside of the hole; a step b for heating the metal paste part to remove a portion of the volatile solvent; a step c for removing a portion of the heated metal paste part such that the surface is exposed, and forming, inside the hole, a conductive via precursor which has a flattened exposed surface and which contains the remainder of the metal particles and the volatile solvent; and a step d for burning the conductive via precursor. The metal particles include first metal particles having a volume average particle diameter of 0.8 µm or more and second metal particles having a volume average particle diameter of 0.5 µm or less. The metal particle concentration of the metal paste part provided in said step a is 95.0 mass% or more, and the content of the second metal particles in the metal paste part provided in said step a is 50 mass% or less with respect to the total amount of the metal particles. The method for manufacturing a glass substrate having a conductive via is also useful as a technique for reducing an environmental load due to plating.

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Notices, Deadlines & Correspondence

Patent Information

Application #
Filing Date
17 August 2026
Publication Number
34/2026
Publication Type
INA
Invention Field
ELECTRONICS
Status
Email
Parent Application

Applicants

1. RESONAC CORPORATION
9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325

Inventors

1. EJIRI Yoshinori
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
2. SAKAMOTO Masumi
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
3. SHIMIZU Chiaki
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
4. OIKAWA Futoshi
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
5. URAGAMI Hiroshi
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
6. KAI Seiji
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
7. MORIJIRI Tomoki
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
8. KIKUCHI Naoyuki
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
9. URASHIMA Kosuke
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325
10. KURAHASHI Shunsuke
c/o Resonac Corporation, 9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057325

Specification

Documents

Application Documents

# Name Date
1 202647099017-WIPO_PCT_DOC.pdf 2026-08-17
2 202647099017-STATEMENT OF UNDERTAKING (FORM 3) [17-08-2026(online)].pdf 2026-08-17
3 202647099017-Proof of Right [17-08-2026(online)].pdf 2026-08-17
4 202647099017-PROOF OF RIGHT [17-08-2026(online)]-1.pdf 2026-08-17
5 202647099017-PRIORITY DOCUMENTS [17-08-2026(online)].pdf 2026-08-17
6 202647099017-FORM 18 [17-08-2026(online)].pdf 2026-08-17
7 202647099017-FORM 1 [17-08-2026(online)].pdf 2026-08-17
8 202647099017-DRAWINGS [17-08-2026(online)].pdf 2026-08-17
9 202647099017-DECLARATION OF INVENTORSHIP (FORM 5) [17-08-2026(online)].pdf 2026-08-17
10 202647099017-COMPLETE SPECIFICATION [17-08-2026(online)].pdf 2026-08-17
11 202647099017-FORM-26 [18-08-2026(online)].pdf 2026-08-18
12 202647099017-PATENT_APPLICATION_PUBLICATION.pdf 2026-08-22