The invention relates to fabrics and a method of manufacturing fabrics. More particularly, the invention relates to a pintucked fabric including embedded applique or printed motifs and a method of manufacturing the same. BACKGROUND
Fashionable clothing and accessories have always been in huge demand, with the end product often depending on the quality and type of the base fabric used. Accordingly, fabrics are aesthetically enhanced either by printed patterns, appliqued motifs or fabric modification such as pintucks.
Applique is a technique with which one piece of fabric can be patched on another piece of fabric in the shape of a motif or pattern. It is done by tracing a motif outline on the first fabric, and placing the second fabric or motif on top of it and stitching down both the fabrics together in a secure manner, along the traced motif. The second fabric is then cut along the stitching and removed from all areas except the motif itself. This results in the second fabric being patched or "appliqued" on to the first fabric in the form of a motif. Various or multiple motifs may be appliqued on to a fabric to form a pattern.
Pintucking is a process of manipulating a fabric to create a stripy texture on it. It is done by folding and stitching down small pleats or tucks one after another in order to create a stripy rib like texture on the fabric. Pintucking results in shrinking of fabric perpendicular to the direction of the tucks. The shrinkage depends upon the width of the tucks and the gap between them.
Pintucking is commonly done on plain fabrics and seldom on printed fabrics or fabrics with appliqued motifs as pintucking distorts the prints or patterns on the fabric. Another limitation of pintucking a fabric with a motif appliqued on it is that the process of applique involves applying a stitch on the outlines of the motifs or patterns. The stitch is preferably thick and secure so that it firmly holds the motif in place and the motif does not get dislodged from
the base fabric due to wear and tear. These thick stitches interfere with the pintucking process and result in uneven pintucks.
It is therefore desirable to address one or more of the aforementioned disadvantages or at least provide a useful alternative thereto. BRIEF DESCRIPTION OF DRAWINGS
The following is a brief description of the preferred embodiments with reference to the accompanying drawings. It is to be understood that the features illustrated in and described with reference to the drawings are not to be construed as limiting of the scope of the invention. In the accompanying drawings:
Figure 1 illustrates a sample piece of fabric on which a motif is to be applied and pintucked in accordance with an embodiment.
Figure 2 illustrates a motif to be appliqued on the fabric of figure 1.
Figure 3 illustrates a modified motif of figure 2 in accordance with an embodiment of the invention.
Figure 4 illustrates the appliqued modified motif of figure 3 on the fabric of figure 1 in accordance with an embodiment.
Figure 5 illustrates the final pintucked fabric in accordance with an embodiment of the invention including an embedded motif.
SUMMARY
A fabric comprising a base fabric, a motif embedded on the base fabric and at least a
portion of the base fabric including the motif formed into pintucks, the pintucks resulting in a
shrinking of the fabric and the motif by a shrinkage ratio wherein the motif embedded on the
base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at
the portion of the motif to be pintucked along with the base fabric by an amount to
compensate for the shrinkage ratio caused by the pintucks.
In accordance with an aspect, a method of manufacturing a fabric comprising embedding a motif on a base fabric and forming pintucks on at least a portion of the fabric including the embedded motif. The pintucks resulting in a shrinking of the fabric and the motif by a shrinkage ratio wherein the motif embedded on the base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at the portion of the motif to be pintucked along with the base fabric by an amount to compensate for the shrinkage ratio caused by the pintucks.
DETAILED DESCRIPTION
For the purpose of promoting an understanding of the principles of the invention, reference will now be made to the embodiment illustrated in the drawings and specific language will be used to describe the same. It will nevertheless be understood that no limitation of the scope of the invention is thereby intended, such alterations and further modifications in the illustrated device, and such further applications of the principles of the invention as illustrated therein being contemplated as would normally occur to one skilled in the art to which the invention relates.
It will be understood by those skilled in the art that the foregoing general description and the following detailed description are exemplary and explanatory of the invention and are not intended to be restrictive thereof.
The invention provides for a pintucked fabric with an embedded motif or pattern in the desired proportion. The fabric in accordance with an embodiment of the invention includes at least one motif appliqued to it and with pintucks at least partly overlapping with the motif. A plurality of motifs may be appliqued to the fabric forming a pattern and the entire fabric may be pintucked. Alternatively, the fabric in accordance with an alternate embodiment includes a printed pattern with pintucks at least partly overlapping the printed pattern.
Figure 5 illustrates a fabric (20) in accordance with an embodiment of the invention. The fabric (20) includes a first fabric (10) on which a motif (16) has been appliqued. The fabric also has multiple pintucks (18) along its length such that the motif is also pintucked along with the base fabric. The motif appliqued on the fabric is not distorted by the pintucking of the base fabric. The pintucking may be done uniformly on the appliqued fabric or alternatively the pintucking may be in accordance with a pattern.
The invention also provides a method of pintucking a fabric with an appliqued motif without distorting the motif. The method involves first determining the shrinkage of the fabric by the desired pintucks, the shrinkage depending on the width of the tuck and the spacing between each tuck. By way of example, a sample piece of fabric may be taken onto which the desired pintucks maybe formed to calculate the amount of shrinkage for the fabric. The motif to be appliqued is modified based on the shrinkage determined, such that the motif is stretched in the reverse ratio of shrinkage in the direction perpendicular to the direction of the pintucks. The modified motif is then appliqued to the fabric with great care to ensure that the outline stitching of the applique motif does not become thick. In accordance with an embodiment the use of very fine nylon threads is preferred. The nylon threads are preferably of the same color as the fabric. Alternatively, the thread may be of the same color as the motif, which would make the stitching look much neater and presentable. Excess motif fabric is cut off to give clean motif edges along the stitches. Due care is to be exercised while cutting out the excess applique fabric to ensure that the stitching does not get cut. The result is an applique motif with very delicate and almost invisible outlines. The fabric is then pintucked as per the desired ratio with the resultant pintucked fabric including an embedded motif.
The pintucking of the appliqued fabric ensures that the appliqued motif is not dislodged as the pintucks firmly embed the motif on to the fabric.
The following example serves to explain and illustrate certain preferred embodiments of
the invention and the method of forming the fabric. The dimensions provided are specific to the
example, not limiting the scope of the invention. With reference to Figure 1 a sample piece of base fabric (10) is illustrated. The base fabric in the embodiment illustrated is shown to be a square piece of fabric (10) measuring 18" in length and 18" in width. An area (A) of the fabric is marked for a motif to be appliqued. The area "A" measures 6" in length and 6" in width. The fabric (10) on pintucking along its width will shrink.
Figure 2 illustrates a desired motif design (14) to be appliqued on to the fabric 10 at the area "A". The motif (14) is square and has dimensions matching the dimensions of the area "A".
In accordance with an embodiment, the motif (14) is required to be modified before it can be appliqued to the fabric (10). Figure 3 illustrates a modified motif (16). The modified motif (16) is obtained by stretching the original motif (14) horizontally to compensate for the shrinking that will happen after pintucking is performed on the motif (16). The modified motif (16) is stretched in a reverse ratio of the anticipated shrinkage for the fabric (10) post the pintucks, and in the present example the motif (14) is stretched to a width of 12". The modified motif (16) may provide some distortion to its shape or proportion due to the stretching.
Figure 4 illustrates the modified motif (16) positioned in the area "A" of the fabric (10). The modified motif (16) is appliqued to the fabric (10) and occupies area (12) in addition to the area "A" of the base fabric. The modified motif (16) is stitched along its edges by a light thread. The extra fabric along the edges of the modified motif (16) is cut off.
After the modified motif is appliqued, the fabric may be pintucked as per the desired tuck patterns. Figure 5 illustrates the final fabric (20) with pintucks (18) in accordance with an embodiment of the invention. The modified motif (16) has been reverted to the original motif (14).
In accordance with an alternate embodiment, the fabric may also be formed of a printed base fabric, where the print on the base fabric has been modified in the reverse ratio of the anticipated shrinkage on account of subsequent pintucks.
SPECIFIC EMBODIMENTS ARE DESCRIBED BELOW
A fabric comprising a base fabric, a motif embedded on the base fabric and at least a portion of the base fabric including the motif formed into pintucks; the pintucks resulting in a shrinking of the fabric and the motif by a shrinkage ratio wherein the motif embedded on the base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at the portion of the motif to be pintucked along with the base fabric by an amount to compensate for the shrinkage ratio caused by the pintucks.
Such fabric(s), wherein the entire motif is pintucked, and wherein the motif is expanded prior to embedment on the base fabric, the expansion of the motif by an amount to compensate for the shrinkage ratio caused by the pintucks.
FURTHER SPECIFIC EMBODIMENTS ARE DESCRIBED BELOW
A method of manufacturing a fabric comprising embedding a motif on a base fabric and forming pintucks on at least a portion of the fabric including the embedded motif, the pintucks resulting in a shrinking of the fabric and the motif by a shrinkage ratio wherein the motif embedded on the base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at the portion of the motif to be pintucked along with the base fabric by an amount to compensate for the shrinkage ratio caused by the pintucks.
INDUSTRIAL APPLICABILITY
The present invention provides a new fabric that includes pintucks with embedded
motifs or patterns and a method of manufacturing the same. The invention has multiple
applications in various products in the garments industry, home furnishings and accessories
market. In particular, the invention has particular relevance for the fashion industry and
designer clothes. It may be used in shirts, tops, kurtas, shervanis, jackets and other garments
known in the art. It may also be used in handbags, scarves, caps ties and other related
accessories known in the art. It may also be used in cushions covers, quilt, curtains, table mats or other related home furnishing known in the art.
The invention being thus described, it will be obvious that the same may be varied in many ways. Such variations are not to be regarded as a departure from the spirit and scope of the invention, and all such modifications as would be obvious to one skilled in the art are intended to be included in the detailed description.

I claim:
1. A fabric comprising:
a base fabric;
a motif embedded on the base fabric;
at least a portion of the base fabric including the motif formed into pinrucks; the pinrucks resulting in a shrinking of the fabric and the motif by a shrinkage ratio;
wherein the motif embedded on the base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at the portion of the motif to be pintucked along with the base fabric by an amount to compensate for the shrinkage ratio caused by the pinrucks.
2. A fabric as claimed in claim 1 wherein the entire motif is pintucked, and wherein the motif is expanded prior to embedment on the base fabric, the expansion of the motif by an amount to compensate for the shrinkage ratio caused by the pinrucks.
3. A method of manufacturing a fabric comprising:
embedding a motif on a base fabric;
forming pinrucks on at least a portion of the fabric including the embedded motif; the pinrucks resulting in a shrinking of the fabric and the motif by a shrinkage ratio;
wherein the motif embedded on the base fabric is expanded prior to embedment on the base fabric, the expansion of the motif at the portion of the motif to be pintucked along with the base fabric by an amount to compensate for the shrinkage
ratio caused by the pintucks.