Claims:1. A writing and cleansing composition comprising:
a) at least one metal salt; and
b) at least one surfactant,
wherein the composition has active detergency (AD) value in the range of 0.5-40% and active detergency of the composition to metal salt ratio is in the range of 1:1-1:190.
2. The writing and cleansing composition as claimed in claim 1, wherein the metal salt is selected from the group comprising calcium sulfate, calcium carbonate, and sodium carbonate.
3. The writing and cleansing composition as claimed in claim 2, wherein the metal salt is calcium sulfate.
4. The writing and cleansing composition as claimed in claim 1, wherein the surfactant is selected from the group comprising non-ionic surfactants, anionic surfactants, cationic surfactants, and amphoteric surfactants.
5. The writing and cleansing composition as claimed in claim 4, wherein the anionic surfactant is chosen from the group comprising sodium lauryl ether sulfate (SLES), alpha olefin sulfonate (AOS), methyl taurates, sodium cocoyl isethionates, ammonium lauryl sulfate, sodium lauryl sulfate, sodium lauroyl sarcosinate.
6. The writing and cleansing composition as claimed in claim 4, wherein the cationic surfactant is selected from the group comprising benzalkonium chloride (BKC), cetrimonium bromide, cetrimonium chloride, stearalkonium chloride, polyquarternium-10.
7. The writing and cleansing composition as claimed in claim 4, wherein the amphoteric surfactant is selected from the group comprising cocamidopropyl betaine (CAPB) and cocamidopropyl hydroxysultaine.
8. The writing and cleansing composition as claimed in claim 4, wherein the non-ionic surfactant is selected from the group comprising polysorbate 80, decyl glucoside, polysorbate 20, sorbitan monostearate, and cocamide DEA.
9. The writing and cleansing composition as claimed in claim 1, wherein the composition further comprises at least one polymer.
10. The writing and cleansing composition as claimed in claim 9, wherein the polymer is selected from the group consisting of polyoxyethylene glycol 90M, polyoxyethylene glycol 2M, polyoxyethylene glycol 5M, polyoxyethylene glycol 7M, polyoxyethylene glycol 14M, polyoxyethylene glycol 32M, and polyoxyethylene glycol 45M.
11. The writing and cleansing composition as claimed in claim 1, wherein the composition further comprises optionally at least one excipient selected from the group consisting of colorants, fragrances, silica, and anti-microbial agents.
12. A writing and cleansing composition comprising:
a) at least one metal salt having weight percentage in the range of 40-95% with respect to the composition; and
b) at least one surfactant having weight percentage sufficient to maintain active detergency value of the composition in the range of 0.5-40%.
13. A writing and cleansing composition as claimed in claim 1 comprising:
a) at least one metal salt having weight percentage in the range of 40-95% with respect to the composition; and
b) at least one surfactant having weight percentage sufficient to maintain active detergency value of the composition in the range of 0.5-40%.
14. A chalk comprising the writing and cleansing composition as claimed in any of the preceding claims 1-13.
15. A process for the preparation of the chalk as claimed in claim 14, comprising the steps of:
a) contacting at least one metal salt and at least one polymer to obtain mixture 1;
b) contacting at least one surfactant and water to obtain mixture 2; and
c) contacting mixture 1 and mixture 2 to obtain the chalk,
wherein the chalk has active detergency (AD) value in the range of 0.5-40% and active detergency of the chalk to metal salt ratio is in the range of 1:1-1:190.
16. The process as claimed in claim 15, wherein i) step (b) further comprises contacting optionally silica, optionally at least one colorant, and optionally at least one fragrance; ii) step (c) further comprises obtaining a pourable slurry by contacting mixture 1 and mixture 2 and processing it further to obtain the chalk.
17. The process as claimed in claims 15 and 16, wherein i) step (a) is carried out at a temperature in the range of 20-30 °C; ii) step (b) is carried out at a temperature in the range of 20-30 °C; and iii) processing in step (c) comprises pouring the slurry in moulds and drying it at a temperature in the range of 20-90 °C.
18. A process for the preparation of the chalk as claimed in claim 14, comprising the steps of:
a) contacting at least one metal salt and at least one polymer to obtain mixture 1;
b) contacting mixture 1 with water to obtain a chalk precursor;
c) contacting the chalk precursor with at least one surfactant; and
d) drying the chalk precursor to obtain the chalk,
wherein the chalk has active detergency (AD) value in the range of 0.5-40% and active detergency of the chalk to metal salt ratio is in the range of 1:1-1:190.
19. The process as claimed in claim 18, wherein i) step (b) further comprises contacting optionally silica, optionally at least one colorant, and optionally at least one fragrance with water before contacting with mixture 1; ii) step (b) further comprises obtaining a pourable slurry by contacting mixture 1 with water and processing it further to obtain the chalk precursor.
20. The process as claimed in claims 18 and 19, wherein i) step (a) is carried out at a temperature in the range of 20-30 °C; ii) contacting in step (b) is carried out at a temperature in the range of 20-30 °C; iii) processing in step (b) comprises pouring the slurry in moulds and drying it at a temperature in the range of 20-90 °C; iv) contacting in step (c) is carried out for a period in the range of 2-4 hours; and v) drying in step (d) is carried out at a temperature in the range of 20-90 °C.
, Description:As Attached