Name of invention: Original plate for grain-oriented electrical steel sheet, method for manufacturing grain-oriented silicon steel sheet used as material for grain-oriented electrical steel sheet, method for manufacturing grain-oriented electrical steel sheet, and method for manufacturing grain-oriented electrical steel sheet
Technical field
[0001]
　The present invention relates to a base plate for grain-oriented electrical steel sheets, a method for manufacturing a grain-oriented silicon steel plate as a material for a grain-oriented electrical steel sheet, a method for manufacturing a grain-oriented electrical steel sheet, and a method for manufacturing grain-oriented electrical steel sheets.
Background technology
[0002]
　It is known that the surface of a steel sheet is smoothed (mirrored) as a measure for reducing the iron loss value, which is a main characteristic required for grain-oriented electrical steel sheets used for iron core materials of transformers. However, it is an issue in commercialization to ensure the adhesion between the mirrored steel sheet surface and the insulating property that is indispensable as an iron core material and the tension coating (insulating coating) for applying tension. Various techniques have been proposed to solve the problem.
[0003]
　For example, as a technique for ensuring the adhesion of the tension film, Patent Document 1 states that an external oxide type oxide film is formed at the interface between the tension film and the steel plate at 40 nm or more and 500 nm or less, and the cavity occupies 30% or less in terms of cross-sectional area ratio. The technology to be used is disclosed. In this technique, thermal oxidation annealing is set to 1000 ° C. or higher.
[0004]
　In Patent Document 2, an oxide composed of one or more elements of iron, aluminum, titanium, manganese, and chromium having a cross-sectional area ratio of 2 nm or more and 500 nm or less is formed at the interface between the tension coating and the steel plate. A technique for forming an externally oxidized oxide film that occupies 50% or less is disclosed.
[0005]
　However, when a product is industrially manufactured by the technique of Patent Document 1 or 2, it is practically necessary to form an external oxide layer by annealing at 1000 ° C. or higher. During such annealing at 1000 ° C. or higher, if the tension-passing plate is not properly performed, strain is introduced into the steel plate during the plate-passing, and there is a problem that the iron loss characteristic is deteriorated.
[0006]
　According to Patent Document 3, when an externally oxidized SiO 2 film of 100 mg / m 2 or less per side is formed on the surface of a steel sheet in thermal oxidation annealing at 850 ° C., an interface between the steel sheet and the externally oxidized SiO 2 film occurs. It is disclosed that roughening can be prevented and good iron loss characteristics can be obtained. However, in this technique, the film adhesion after the tension film is baked is not always good.
[0007]
　In Patent Document 4, prior to forming the externally oxidized SiO 2 film, the surface of the steel sheet is wiped with a brush containing abrasive grains to introduce minute strain, or fine irregularities are formed by pickling. It is disclosed that the film adhesion can be improved by promoting the growth of the externally oxidized SiO 2 and forming a granular oxide at the same time, starting from the minute strain or the minute unevenness . However, in this technique, the adhesion of the coating film is not good when the heat treatment temperature is less than 1000 ° C.
[0008]
　Patent Document 5 proposes a technique for forming an intermediate layer such as TiN on the surface of a mirror-oriented electrical steel sheet by PVD, CVD, or the like to ensure the adhesion of a tension film. However, this technology is expensive and has not been industrialized.
[0009]
　Patent Document 6 proposes a technique for forming an externally oxidized SiO 2 film by performing thermal oxidation on a grain-oriented electrical steel sheet with a relatively low oxidation potential . However, this technique has a problem that the adhesion of the tension film is not stable.
[0010]
　In Patent Document 7, an oxide or hydroxide is formed on the surface of a steel sheet, a liquid composed of colloidal silica or silicate is applied, and after drying, a tension film forming heat treatment is performed to form the steel sheet and the tension film. A technique has been proposed in which a coating layer containing Si is formed between the two, and at the same time, a SiO 2 film is formed at the interface between the coating layer and the mother steel sheet . However, the SiO 2 film formed by this technique has a problem that the adhesion after forming the tension film is not stable.
[0011]
　Patent Document 8 discloses an example in which an aluminum oxide film is formed on the surface of a steel sheet, heat treatment is performed to alleviate strain, and then a tension film formation heat treatment is performed. In this technique, there is no mention of the formation of the externally oxidized SiO 2 film in the heat treatment for strain relaxation, but even if the SiO 2 film is formed after the heat treatment , the oxide species, the amount of oxide and the atmosphere of the heat treatment Is not appropriate, so that the SiO 2 film as in the present invention is not formed, and the adhesion after forming the tension film is not sufficiently improved.
[0012]
　Patent Document 9 proposes a technique of performing a tension film forming heat treatment after a reducing heat treatment of a steel sheet in which an oxide remains on the surface of the steel sheet. In this technique, there is no mention of the formation of the externally oxidized SiO 2 film, but even if the SiO 2 film is formed after the reducing heat treatment, the amount of oxide before the heat treatment and the atmosphere of the heat treatment are not appropriate. The SiO 2 film having an appropriate oxygen balance as in the invention is not formed, and the adhesion after forming the tension film is not sufficiently improved.
[0013]
　Patent Document 10 proposes a technique of heat- treating a steel sheet in which oxides of Al, Si, Ti, Cr, and Y are formed on the surface of the steel sheet to form a SiO 2 film, and then performing a tension film forming heat treatment. However, since the oxide species, the amount of oxide, and the atmosphere of the heat treatment are not appropriate, the SiO 2 film itself formed does not fall outside the scope of other conventional techniques, and the adhesion after forming the tension film is not sufficiently improved.
Prior art literature
Patent documents
[0014]
Patent Document 1: Japanese Patent No. 4288022
Patent Document 2: Japanese Patent No. 4044739
Patent Document 3: Japanese Patent Application Laid-Open No. 09-078252 Japanese
Patent Document 4: Japanese Patent No. 3930696 Japanese
Patent Document 5: Japanese Patent Application Laid-Open No. 2005-264236
Patent Document 6: Japanese Patent Application Laid-Open No. 06-184762
Patent Document 7: Japanese Patent Application Laid-Open No. 2004-342679
Patent Document 8: Japanese Patent Application Laid-Open No. 02-243754
Patent Document 9: Japanese Patent Application Laid-Open No. 08-269573
Patent Document 10: Japanese Patent Application Laid-Open No. 2004-315880
Outline of the invention
Problems to be solved by the invention
[0015]
　In view of the current state of the prior art of grain-oriented electrical steel sheets having a tension film, the present inventors impart high film adhesion to the tension film of grain-oriented electrical steel sheets without introducing a large strain into the grain-oriented electrical steel sheets. Therefore, it is necessary to control the surface texture of the steel sheet (original sheet for grain-oriented electrical steel sheet) before forming the tension film. INDUSTRIAL APPLICABILITY According to the present invention, it is possible to stably secure the adhesiveness of the tension film even by thermal oxidation annealing in which the soaking temperature at which strain is less likely to be introduced into the electrical steel sheet is 1000 ° C. or less prior to the formation of the tension film. An object of the present invention is to provide an original plate for grain-oriented electrical steel sheets. Another object of the present invention is to provide a method for manufacturing such a base plate for grain-oriented electrical steel sheets, and a directional silicon steel plate as a material for such a base plate for grain-oriented electrical steel sheets. Another object of the present invention is to provide a method for producing a grain-oriented electrical steel sheet capable of forming a tension film having high adhesion without introducing a large amount of strain into the steel sheet.
Means to solve problems
[0016]
　In order to avoid deterioration of iron loss characteristics due to strain generation during thermal oxidation annealing, the present inventors perform thermal oxidation annealing with a soaking temperature of 1000 ° C. or less, and externally oxidize the original plate (original plate) for grain-oriented electrical steel sheets. We diligently examined the formation of layers.
[0017]
　Conventionally, in order to avoid distortion during thermal oxidation annealing, the external oxide layer formed by thermal oxidation annealing at 1000 ° C. or lower basically has a small amount of oxygen. When the original plate having such an external oxide layer was formed by baking a tension film in a normal atmosphere, an internal oxide layer was formed on the base iron side, and sufficient adhesion of the tension film could not be ensured.
[0018]
　Further, since the external oxide layer formed by thermal oxidation annealing at 1000 ° C. or lower is relatively thin, the tension film cannot be stably maintained in the heat treatment for forming the tension film, and a part of the tension film cannot be maintained. It was sometimes missing. That is, according to the original plate obtained by thermal oxidation annealing at 1000 ° C. or lower, it was difficult to stably obtain good adhesion of the tension coating.
[0019]
　As a result of diligent studies on a method for solving the above problems, the present inventors can control the surface morphology (evaluated by IR measurement) of the original plate for grain-oriented electrical steel sheets, even if the amount of oxygen in the external oxide layer is small. It has been found that the formation of an internal oxide layer on the iron side can be avoided and the adhesion of the tension film can be sufficiently ensured.
[0020]
　Further , in an atmosphere in which the amount of oxygen on the surface of the finish-annealed directional silicon steel sheet (finish-annealed steel sheet) before thermal oxidation annealing is adjusted within a predetermined range, and then the oxidation potential PH2O / PH2 is within a predetermined range. If thermal oxidation annealing is performed at a soaking temperature of 1000 ° C. or lower, the formation of an internal oxide layer is avoided while avoiding the introduction of strain into the original plate, and an external oxide layer mainly composed of SiO 2 is formed. We have found that it is possible to manufacture original plates for electromagnetic steel sheets.
[0021]
　Furthermore, the manufacturing oriented electrical steel sheet plate precursor prepared by the process, tension film-forming coating agent is applied, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 oxidation potential of 0.001 to 0.20 indicated by It has been found that a grain-oriented electrical steel sheet having good adhesion of an insulating film can be produced by performing a tension film forming heat treatment in the baking atmosphere of the above.
[0022]
　The present invention has been made based on such findings, and the gist thereof is as follows.
[0023]
[1] In the original plate for a directional electromagnetic steel plate according to one aspect of the present invention, the amount of oxygen x per surface of the original plate and the peak of SiO 2 on the surface of the original plate obtained by reflective infrared spectroscopic analysis. The value y of (ΔR / R 0 @ 1250 cm -1 )
　　　　　satisfies y ≧ 1500 x 2.5 ... (1)
　　　　　y ≧ 0.24 ... (2)
.
[2] The original plate for grain-oriented electrical steel sheets according to the above [1] may further satisfy
　　　　　y ≦ 0.89 ... (3)
.
[3] The original plate for
　　　　　grain- oriented electrical steel sheets according to the above [1] or [2] may further satisfy 6440 x 2.5 ≧ y ... (4)
.
[4] The material steel sheet according to another aspect of the present invention is the material steel sheet of the original sheet for grain-oriented electrical steel sheet according to any one of the above [1] to [3], and oxygen per one side of the surface thereof. amount 0.01 g / m 2 ultra 0.1 g / m 2 or less.
[5] The method for manufacturing a grain-oriented electrical steel sheet according to another aspect of the present invention is the method for manufacturing a grain-oriented electrical steel sheet according to any one of the above [1] to [3]. the surface oxygen amount per one side of the finish annealing has been oriented silicon steel sheet 0.01 g / m 2 ultra 0.05 g / m 2 or less, or 0.05 g / m 2 ultra 0.10 g / m 2 comprising the steps of arranging the following The finish-annealed directional silicon steel sheet has an oxidation potential represented by a ratio of water vapor pressure to hydrogen pressure of PH2O / PH2 , wherein the surface oxygen content is more than 0.01 g / m 2 and 0.05 g / m 2 or less. If during 0.0081 following atmosphere, the surface oxygen content 0.05 g / m 2 ultra 0.10 g / m 2 0.005 in the following atmosphere is less than or equal, thermal oxidation at soaking temperature 1000 ° C. or less It is provided with a step of annealing and forming an external oxide layer on the surface of the directional silicon steel sheet.
[6] A method for producing a grain-oriented electrical steel sheet according to another aspect of the present invention is a coating agent for forming a tension film on a grain-oriented electrical steel sheet original plate according to any one of [1] to [3] above. And the ratio of water vapor pressure to hydrogen pressure PH2O / PH2It is provided with a step of performing a tension film forming heat treatment in a baking atmosphere having an oxidation potential of 0.001 to 0.20 shown by.
Effect of the invention
[0024]
　According to the present invention, at a soaking temperature of 1000 ° C. or lower, the adhesiveness of the tension film can be sufficiently stably ensured on the surface of the original plate for grain-oriented electrical steel sheets while avoiding the introduction of strain into the original plate. An external oxide layer mainly composed of SiO 2 can be formed. As a result, a grain-oriented electrical steel sheet having stable and good adhesion of the tension film can be industrially manufactured by an ordinary annealing line.
A brief description of the drawing
[0025]
FIG. 1 shows the amount of oxygen per side (g / m 2 ) and the peak of SiO 2 on the surface (IR spectral intensity ) obtained by reflective infrared spectroscopic analysis in the original plate for a directional electromagnetic steel plate according to one aspect of the present invention. : ΔR / R 0　@ 1250 cm -1 ) and the adhesion of the tension coating of the directional electromagnetic steel plate obtained by using this original plate.
[Fig. 2] Fig. 2 is a flowchart showing a method of manufacturing an original plate (original plate) for grain-oriented electrical steel sheets according to one aspect of the present invention.
FIG. 3 is a flowchart showing a method for manufacturing a grain-oriented electrical steel sheet according to one aspect of the present invention.
Mode for carrying out the invention
[0026]
　Hereinafter, the original plate for grain-oriented electrical steel sheets according to the present embodiment (hereinafter, may be referred to as “the original plate according to the present embodiment”) and the like will be described. Here, the original plate according to the present embodiment is described as an original plate for grain-oriented electrical steel sheet without a glass coating before forming a tension coating. However, the technical scope of the original plate according to the present embodiment extends to the grain-oriented electrical steel sheet after forming the tension coating.
[0027]
　In the original plate according to the present embodiment, the amount of oxygen x per side of the surface of the original plate and the value y of the peak (ΔR / R 0　@ 1250 cm -1 ) of SiO 2 on the surface of the original plate obtained by the reflection infrared spectroscopic analysis. However, 　　　　　y ≧ 1500 x 2.5　... (1) and y ≧ 0.24 ... (2) are satisfied. Further, the original plate according to the present embodiment may further satisfy the following mathematical formulas, if necessary. 　　　　　y ≤ 0.89 ... (3) 　　　　　6440 x 2.5 ≥ y ... (4)

[0028]
　The manufacturing method of the original plate for grain-oriented electrical steel sheet according to the present embodiment (hereinafter, may be referred to as “the original plate manufacturing method according to the present embodiment”) is a manufacturing method for manufacturing the original plate according to the present embodiment, and finishes. the amount of oxygen per one side of the surface of the annealed pre-oriented silicon steel sheet 0.01 g / m 2 ultra 0.05 g / m 2 or less, or 0.05 g / m 2 ultra 0.10 g / m 2 comprising the steps of arranging below, the finish annealing has been oriented silicon steel sheet, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 oxidation potential indicated by the surface oxygen content is 0.01 g / m 2 ultra 0.05 g / m 2 when it is less 0 .0081 in the following atmosphere, the surface oxygen content 0.05 g / m 2 ultra 0.10 g / m 2 in an atmosphere of 0.005 or less when it is less (less than 0.0055), at soaking temperature 1000 ° C. or less It is characterized by comprising a step of performing thermal oxidation annealing to form an external oxide layer on the surface of the directional silicon steel sheet.
[0029]
　The directional silicon steel plate according to the present embodiment is a directional silicon steel plate which is a material of the original plate according to the present embodiment, and is the above-mentioned finish-annealed directional silicon steel plate, and the amount of oxygen per one side of the surface. Is more than 0.01 g / m 2 and 0.1 g / m 2 or less.
[0030]
　Method for producing a grain-oriented electrical steel sheet according to the present embodiment, the original plate of the present embodiment, the step of applying tension film-forming coating agent, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 oxidation potential indicated by It is characterized by comprising a step of performing a tension film forming heat treatment in a baking atmosphere of 0.001 to 0.20.
[0031]
　Hereinafter, the original plate according to the present embodiment, the method for producing the original plate according to the present embodiment, and the method for producing the grain-oriented electrical steel sheet according to the present embodiment will be described.
[0032]
　First, a finish-annealed directional silicon steel sheet (finish-annealed steel sheet) having no glass coating on the surface, which is used as the material steel sheet of the original plate according to the present embodiment, will be described. As shown in FIG. 2, in the original plate for directional electromagnetic steel plate according to the present embodiment, first, hot rolling, cold rolling, decarburization annealing, application and drying of an annealing separator, winding, and finishing are performed on a steel piece. It is obtained by producing a finish-annealed directional silicon steel sheet by annealing, and then subjecting the finish-annealed directional silicon steel sheet to surface oxygen content control and thermal oxidation annealing. That is, the finish-annealed directional silicon steel sheet is an intermediate material for the original sheet for grain-oriented electrical steel sheets.
[0033]
　The original plate according to the present embodiment has the surface texture (oxygen amount x per side of the original plate surface and the peak of SiO 2 on the original plate surface (ΔR / R 0　@ 1250 cm -1 ) obtained by reflection infrared spectroscopic analysis ). The value y satisfies the above formulas (1) and (2), and further satisfies the above formulas (3) and (4), if necessary). Since the surface texture of the original plate is substantially unaffected by the chemical composition other than Si of the finish-annealed directional silicon steel sheet used as the material steel sheet, the chemical composition of the finish-annealed directional silicon steel sheet is particularly Si. It is not limited to chemical compositions other than. Hereinafter, preferred chemical compositions will be described by way of example.
[0034]
　The chemical composition of this finish-baked steel sheet is mass%, contains Si: 0.8 to 7.0% as a basic element, C: 0 to 0.085% as a selective element, and acid-soluble Al: 0 to 0. .065%, N: 0 to 0.012%, Mn: 0 to 1.0%, Cr: 0 to 0.3%, Cu: 0 to 0.4%, P: 0 to 0.5%, Sn : 0 to 0.3%, Sb: 0 to 0.3%, Ni: 0 to 1.0%, S: 0 to 0.015%, Se: 0 to 0.015% A chemical composition containing Fe and an impurity as a balance is preferable.
[0035]
　The chemical component is a preferable chemical component for forming a Goss texture in which the crystal orientations are accumulated in the {110} <001> orientation. Since the selected element may be appropriately contained depending on the purpose, the lower limit may be 0%. Moreover, the said selective element may be contained as an impurity. The impurity means an element mixed in the finished annealed steel sheet from the steel raw material (ore, scrap, etc.) and / or from the manufacturing environment.
[0036]
　In the production of grain-oriented electrical steel sheets, usually, at the time of secondary recrystallization, purification annealing for discharging inhibitor-forming elements to the outside of the steel sheet is performed at the same time. In particular, the contents of N and S are reduced to 50 ppm or less, respectively. Preferably, the contents of N and S are each reduced to 9 ppm or less, more preferably 6 ppm or less. Purification annealing may be carried out sufficiently to reduce the contents of N and S to a extent that cannot be detected by ordinary analysis (1 ppm or less).
[0037]
　The chemical composition of the finished annealed steel sheet may be analyzed by a general analysis method. For example, ICP-AES (Inductively Coupled Plasma-Atomic Emission Spectrum) may be used to analyze the chemical composition of the finished annealed steel sheet. For example, a 35 mm square test piece can be collected from the central position of the finished annealed steel sheet and analyzed based on a calibration curve prepared in advance using an ICPS-8100 or the like (measuring device) manufactured by Shimadzu Corporation. In addition, C and S may be analyzed by using the combustion-infrared absorption method, and N may be analyzed by using the inert gas melting-thermal conductivity method.
[0038]
　In a general method for manufacturing an original sheet for grain-oriented electrical steel sheet, a glass film is formed on the surface of the finished annealed steel sheet. The glass coating is composed of a composite oxide such as forsterite (Mg 2 SiO 4 ), spinel (Mg Al 2 O 4 ), or cordierite (Mg 2 Al 4 Si 5 O 16 ). The glass film is interposed between the steel sheet and the tension film, and in particular, forms complicated irregularities at the interface between the steel sheet and the tension film, and the so-called anchor effect causes an oxide film (glass film and tension film) on the steel sheet. ) Is a film formed to ensure adhesion. The glass coating is formed in one finish annealing step of the grain-oriented electrical steel sheet manufacturing process.
[0039]
　On the other hand, the method for producing a master plate according to the present embodiment is characterized in that a steel sheet that has been finish-annealed under the condition that a glass film is not formed is used as a base plate material (that is, a finish-annealed steel sheet). Alternatively, the original plate material may be a steel sheet in which the glass film is formed, the glass film is removed by pickling or the like, and then the steel sheet is mirror-surfaced by chemical polishing or the like.
[0040]
　Next, a method for manufacturing the original plate for grain-oriented electrical steel sheets (original plate manufacturing method) according to the present embodiment will be described. In the following description, general conditions will be exemplified as examples of conditions that are not limited requirements in the original plate manufacturing method according to the present embodiment. However, the manufacturing method according to the present embodiment is not limited to the general conditions described later with respect to the conditions that are not the limiting requirements. Even if the known conditions are applied for a known purpose with respect to the conditions that are not the limiting requirements, the production method according to the present embodiment exhibits the required effect.
[0041]
　First, molten steel is continuously cast into a slab. The chemical composition of this slab is not particularly limited, but for example, in mass%, Si: 0.8 to 7.0%, C: more than 0 to 0.085%, acid-soluble Al: 0 to 0.065%, N. : 0 to 0.012%, Mn: 0 to 1.0%, Cr: 0 to 0.3%, Cu: 0 to 0.4%, P: 0 to 0.5%, Sn: 0 to 0. It consists of 3%, Sb: 0 to 0.3%, Ni: 0 to 1.0%, S: 0 to 0.015%, Se: 0 to 0.015%, the balance: Fe and impurities.
[0042]
　The slab is heated to a predetermined temperature (for example, 1050 to 1400 ° C.) and subjected to hot rolling. By this hot rolling, the slab is made into a hot-rolled steel sheet having a plate thickness of, for example, 1.8 to 3.5 mm. Subsequently, the hot-rolled steel sheet is annealed under predetermined heat treatment conditions (for example, at 750 to 1200 ° C. for 30 seconds to 10 minutes). The hot-rolled steel sheet after annealing is pickled and then subjected to cold rolling. By this cold rolling, the hot-rolled steel sheet is made into a cold-rolled steel sheet having a thickness of, for example, 0.15 to 0.35 mm.
[0043]
　Next, the cold-rolled steel sheet is subjected to a decarburization annealing treatment under predetermined heat treatment conditions (for example, at 700 to 900 ° C. for 1 to 3 minutes). By this decarburization annealing, C of the cold-rolled steel sheet is reduced to a predetermined amount or less, and a primary recrystallization structure is formed. Further, an oxide layer containing silica (SiO 2 ) as a main component is formed on the surface of the cold-rolled steel sheet (hereinafter referred to as decarburized annealed steel sheet) after decarburization annealing .
[0044]
　If necessary, a process of nitriding the decarburized annealed steel sheet before applying the annealing separator may be included.
[0045]
　Subsequently, an annealing separator containing alumina (Al 2 O 3 ) as a main component is applied to the surface of the decarburized annealed steel sheet (the surface of the oxide layer) , dried, and then the decarburized annealed steel sheet is wound up. .. Then, the decarburized annealed steel sheet is finish-annealed under predetermined heating conditions (for example, the coil is heated at 1100 to 1300 ° C. for 20 to 24 hours). By this finish annealing treatment, secondary recrystallization occurs in the decarburized annealed steel sheet, and the steel sheet is purified. As a result, it is possible to obtain a finish-annealed steel sheet in which the crystal orientation is controlled so that the easily magnetized axis of the crystal grains and the rolling direction coincide with each other.
[0046]
　Generally, the annealing separator contains magnesia (MgO) as a main component. In the finish annealing of the decarburized annealed steel sheet coated with such an annealed separating agent, the oxide layer containing silica as the main component reacts with the annealing separating agent containing magnesia as the main component on the surface of the decarburized annealed steel sheet. A glass film containing a composite oxide such as forsterite (Mg 2 SiO 4 ) is formed on the surface of the steel sheet .
[0047]
　However, in the original plate manufacturing method according to the present embodiment, it is preferable not to form a glass film on the surface of the finished annealed steel sheet. If, for example, an annealing separator containing alumina (Al 2 O 3 ) as a main component is used as the annealing separator, secondary recrystallization can be completed without forming a glass film on the surface of the steel sheet in finish annealing. it can. However, a glass film may be formed once on the surface of the finished annealed steel sheet and then removed.
[0048]
　In the production of general grain-oriented electrical steel sheets, a tension film is immediately formed on the finished annealed steel sheet. However, the original plate manufacturing method according to the present embodiment is characterized in that the finish-annealed steel sheet having no glass coating is subjected to a surface oxygen content control treatment and further thermal oxidation annealing prior to the formation of the tension coating. In the original plate manufacturing method according to the present embodiment, a thin and dense external oxide film is formed by thermal-oxidation-annealing a finish-annealed steel sheet having an adjusted amount of oxygen on the surface.
[0049]
　Then, by forming a tension film on the external oxide film while ensuring good film adhesion, a grain-free directional electromagnetic steel sheet having excellent iron loss characteristics can be obtained. The method for manufacturing the grain-oriented electrical steel sheet according to this embodiment will be described later.
[0050]
　The original plate obtained by the above method includes a steel plate and an external oxide film mainly composed of SiO 2 arranged on the surface thereof . Next, the characteristics of the external oxide film formed by the original plate manufacturing method according to the present embodiment will be described.
[0051]
　Patent Document 1, Patent Document 2, Patent Document 4, etc. describe that a good film thickness of an externally oxidized SiO 2 film is 40 nm or more. Further, Patent Document 3 describes that setting the amount of SiO 2 per one side of the original plate to 100 mg / m 2 or less is effective in suppressing the deterioration of the iron loss characteristic. Here, when "SiO 2 amount 100 mg / m 2 or less" is converted into a film thickness with the specific gravity of SiO 2 being 2, the film thickness of the externally oxidized SiO 2 film of the steel sheet disclosed in Patent Document 3 is "50 nm or less". "It is estimated to be. In the externally oxidized SiO 2 film having such a film thickness, there remains a problem of suppressing deterioration of iron loss characteristics and ensuring adhesion of the tension film. When the amount of externally oxidized SiO 2 is small, it tends to be difficult to secure adhesion.
[0052]
　Further, when the amount of SiO 2 on the surface of the original plate is 100 mg / m 2 or less per one side of the original plate , or when the film thickness of SiO 2 on the surface of the original plate is less than 40 nm, the tension coating is applied in a nitrogen atmosphere in a normal baking atmosphere. When baked, there are cases where a relatively good film adhesion with a film thickness residual area ratio of about 90 to 95%, which is measured by the method described later, can be obtained, and cases where it cannot be obtained. That is, in the above case, the adhesion of the tension film is not stable. This tendency becomes remarkable especially when the tension film forming heat treatment is carried out at a low oxidation potential.
[0053]
　Therefore, the present inventors consider that when forming a thin externally oxidized SiO 2 film having a film thickness of less than 40 nm, it is necessary to positively control the structure of the SiO 2 film more than the conventional method , and the control thereof. We studied the method diligently.
[0054]
　The present inventors have found that the external oxidized SiO per original plate sided 2 although there are basically correlation between the amount and the insulating film adhesion, specifically, external oxidized SiO 2 to have increased the amount It was found that the film adhesion may be worsened. In particular, the present inventors have found that this tendency is remarkable when the soaking time in the thermal oxidation annealing for forming the externally oxidized SiO 2 is extended. In investigating the cause of this, the present inventors investigated the amount of oxygen x per surface of the original plate and the value of the peak (ΔR / R 0　@ 1250 cm -1 ) of SiO 2 on the surface of the original plate obtained by the reflection infrared spectroscopic analysis. Focused on y.
[0055]
　On the other hand, when the heat soaking time in the thermal oxidation annealing is extended, the present inventors hardly increase the amount of externally oxidized SiO 2 per one side of the original plate, and further decrease the amount of oxygen per one side of the original plate. It was discovered that good film adhesion can be obtained when this phenomenon occurs. With this in mind, the present inventors have found that between the original plate this phenomenon did not occur with the original plate generated, external oxidized SiO 2 conceived that there is some difference in form, of the outermost surface SiO 2 of We focused on the IR spectrum at 1250 cm -1 , which indicates the abundance .
[0056]
　Therefore, the present inventors changed the amount of oxygen x per surface of the original plate and the value y of the peak intensity ΔR / R 0 of the IR spectrum at 1250 cm -1 , which indicates the amount of SiO 2 on the outermost surface , of the tension coating. The film adhesion was evaluated.
[0057]
　As a result, in thermal oxidation annealing, the amount of oxygen per one side of the original plate and the peak of SiO 2 obtained by reflective infrared spectroscopic analysis on the outermost surface of the external oxidation type SiO 2 film of the original plate (ΔR / R 0　@ 1250 cm -1). ) Was controlled under the required relationship, and it was found that an external oxide film capable of ensuring good film adhesion of the tension film could be formed on the surface of the original plate.
[0058]
　FIG. 1 shows the amount of oxygen per side of the surface of the original plate (g / m 2 ) and the peak of SiO 2 on the surface of the original plate obtained by reflective infrared spectroscopic analysis (IR spectral intensity: ΔR / R 0　@ 1250 cm -1 ). And the adhesion of the tension film are shown.
[0059]
　The relationship shown in FIG. 1 is obtained by subjecting a finish-annealed steel sheet containing Si: 3.3% by mass to thermal oxidation annealing at a soaking temperature of less than 1000 ° C. by changing the oxidation potential of the annealing atmosphere and the annealing soaking time. In the thermal oxidation annealed steel sheet (original plate for directional electromagnetic steel plate), the amount of oxygen per side of the original plate x (g / m 2 ) and the peak of SiO 2 on the surface of the original plate obtained by reflective infrared spectroscopic analysis (IR spectral intensity) : [Delta] R /　R 0 @ 1250 cm -1 and), the oxidation potential P H2 O / P H2 : the relationship between the coating adhesion tension film formed on the original plate in a 0.012 nitrogen atmosphere of hydrogen. Here, the film adhesion is the ratio of the residual area of ​​the film on the surface of the steel sheet on the center of curvature side, which was evaluated after winding the directional electromagnetic steel sheet sample around a cylinder having a diameter of 20 mm. In FIG. 1, the sample plotted by the symbol “◯” had a coating residual area ratio of 95% or more, and the sample plotted by the symbol “x” had a coating residual area ratio of less than 95%.
[0060]
　From FIG. 1, when the tension film forming heat treatment is carried out with a low oxidation potential, the amount of oxygen x per surface of the original plate and the peak of SiO 2 on the surface obtained by the reflection infrared spectroscopic analysis (ΔR / R 0　@ 1250 cm −). It can be seen that when the value y of 1 ) satisfies y ≧ 1500 x 2.5 , good film adhesion with a film residual area ratio of 95% or more can be surely obtained. In the sample in which y ≧ 1500 × 2.5 was not satisfied, good film adhesion could not be stably obtained. In some of the samples in which y ≧ 1500 x 2.5 was not satisfied, the film residual area ratio was 95% or more, which is considered to be accidental.
[0061]
The peak of 　SiO 2 is calculated by a general method. For example, in an infrared absorption spectrum curve obtained in the range of 500 to 2000 cm -1 , when the background height at the position of the 1250 cm -1 absorption peak indicating the presence of SiO 2 near the outermost surface is R 0 , ΔR / R 0 is calculated by assuming that the difference in intensity between the peak top and the background is ΔR . It is considered that this ΔR / R 0 corresponds to the abundance of SiO 2 in the vicinity of the outermost surface and the bonding state of O. Incidentally, △ R / R 0 so is the ratio of the intensity of the peak top and background, measurement conditions △ R, and R 0 effect on the measurement of, △ R / R 0 in is canceled. It is preferable to carry out this calculation at five locations on the surface of the original plate and set the average value to ΔR / R 0 .
[0062]
　The amount of oxygen per surface of the original plate is determined by analyzing the amount of oxygen at 5 points on the surface of the original plate with EMGA-920 manufactured by HORIBA, and from the analysis value, the amount of oxygen per surface of the original plate at the measurement point is determined by the plate thickness of the test material. It is calculated by using the specific gravity of the Fe—Si alloy described in JIS according to the amount of Si, and is obtained by averaging these values.
[0063]
　It should be noted that the amount of oxygen per surface of the original plate obtained here is not only due to the oxide of Si, but also to oxides such as Fe, Mn, Al, Cr and Ti (that is, mainly in the present embodiment). It also contains the amount of oxygen due to (an oxide different from the controlled external oxidation type SiO 2 film). That is, the amount of oxygen obtained here has a value completely irrelevant to the thickness of the externally oxidized SiO 2 film. In steel sheets in which oxides such as Fe, Mn, Al, Cr, and Ti are formed not only by external oxidation but also by internal oxidation, the amount of oxygen and the abundance of externally oxidized SiO 2 film , which is quantified separately , Is far apart.
[0064]
　The present inventors presume the reason why good film adhesion can be obtained when x and y satisfy y ≧ 1500 x 2.5 as follows.
[0065]
　Internal oxidation occurs in the region where x is high, and the adhesion of the insulating coating is significantly reduced. And, in the region where y is low, the amount of externally oxidized SiO 2 is small if it is simply considered, but if the elemental amount of Si and the elemental amount of O are the same in this region, oxygen is efficient in this region. It means that it is not bound to Si. As a result of these, as a situation in which an externally oxidized SiO 2 in a preferable form is formed while suppressing internal oxidation, an upward-sloping line (“y = 1500 2.5 ) ” is shown in FIG. 1 showing the relationship between x and y. The left side of the line on the left side with the formula 　(1) , that is, the region on the upper left side
　　　　　divided by y ≧ 1500 × 2.5 ... (1)
is preferable for adhesion. Is y ≧ 1600 x 2.5 , y ≧ 1800 x 2.5 , y ≧ 2000 x 2.5 , or y ≧ 2500 x 2.5 .
[0066]
　However, the x low region, oxygen is external oxidized SiO 2 as to form a external oxidized SiO 2 since the amount of a small (thickness of the external oxide film is too thin), the stability of the membrane It may be inferior. Further, as will be described later, in a region where y is excessively high, a factor may occur in which the adhesion of the tension film is lowered from the viewpoint of atomic bonding with an element other than Si in the base material. Furthermore, it is also difficult to detect a very high y value in a region where x is very low (the amount of oxide itself is very small) by a general measurement-sensitive reflective infrared spectroscopic analysis. Considering these, it is considered preferable to make a limitation such that the upper left region of FIG. 1 is excluded.
　Therefore, in the present embodiment, it is preferable that x and y satisfy the relationship with
　　　　　6440 x 2.5 ≧ y ... (4)
. More preferably, 4037 x 2.5 ≧ y.
[0067]
　In fact, a thermal oxidation annealed atmosphere with an oxidation potential of PH2O / PH2 : about 0.008 , which is an ordinary finish-annealed steel sheet with 75% by volume of hydrogen and 25% by volume of nitrogen and a dew point of 0 ° C. When the externally oxidized SiO 2 film was formed in the above, good film adhesion could not be obtained. However, it has been found that good film adhesion can be obtained by controlling both the amount of oxygen on the surface of the finish-annealed steel sheet before thermal oxidation annealing and the oxidation potential of the thermal oxidation annealed atmosphere within a predetermined range. Specifically, when the surface oxygen content of the finished annealed steel sheet is more than 0.01 g / m 2 and 0.05 g / m 2 or less, the oxidation potential is set to 0.0081 or less and the surface oxygen content is 0.05 g / m 2. When it is super 0.10 g / m 2 or less, it is necessary to set the oxidation potential to 0.005 or less (less than 0.0055).
[0068]
　Oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 for the necessity of controlling the as described above, are considered as follows.
[0069]
　Oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 case is excessive, external oxidized SiO at the surface of the finish annealed steel sheet 2 but produces, on the one hand, Fe-based oxides are not generated, Mn and Cr, etc. May form an oxide in combination with SiO 2 . As described above, if the SiO 2 film thickness of the original plate is thin under the condition that trace elements are oxidized , internal oxidation occurs during baking and formation of the tension film, and the film adhesion is lowered.
[0070]
　Therefore, during the thermal oxidation annealing, SiO 2 as an oxide other than does not produce as much as possible, oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 of 0.0081 or less, or is required to be 0.005 or less.
[0071]
　The upper limit of the allowable oxidation potential is determined according to the amount of oxygen on the surface of the finish-annealed steel sheet before thermal oxidation annealing.
[0072]
　Usually, prior to thermal oxidation annealing, the finish annealed steel sheet is pickled or washed with water in order to remove the annealing separator such as alumina used in the finish annealing. On the other hand, in the method for producing an original plate according to the present embodiment, the amount of oxygen per surface of the original plate is more than 0.010 g / m 2 , preferably 0, as the surface texture of the finish-annealed steel sheet that is thermally oxidized after pickling or washing with water. .015G / m 2 or more, more preferably 0.020 g / m 2 or more, more preferably 0.025 g / m 2 or more, the upper limit, 0.100 g / m 2 or less, preferably 0.060 g / m 2 or less , More preferably 0.050 g / m 2 or less. The surface oxygen amount per surface finish annealed steel sheet 0.01 g / m 2 Ultra 0.05 g / m 2 if you are following, in the subsequent thermal oxidation annealing oxidation potential P H2 O / P H2 if the between 0.0081 or less Good. On the other hand, the surface oxygen content per surface finish annealed steel sheet is 0.05 g / m 2 Ultra 0.10 g / m 2 is less than or equal to, the oxidation potential P in the subsequent thermal oxidation annealing H2O / P H2 may be 0.005 or less.
[0073]
　The method of controlling the amount of oxygen on the surface of the finished annealed steel sheet is not limited. Those skilled in the art can easily control the amount of oxygen in the above range by controlling the amount of oxides or hydroxides on the surface of the steel sheet. However, it should be noted that the findings of the present inventors that the oxygen content of the finish-annealed steel sheet before thermal oxidation annealing should be controlled to a certain value or more, and its remarkable effect are not known.
[0074]
　An example of a method of controlling the amount of oxygen on the surface of the finished annealed steel sheet will be described below. Specifically, in the original plate according to the present embodiment, it is possible to apply a means for leaving an appropriate amount of the annealing separator in the process of removing the annealing separator, which is an oxide, which is carried out after finish annealing. .. Alternatively, the surface may be oxidized by completely removing the oxide containing the annealing separator, mirroring the surface, and then performing heat treatment in an appropriate atmosphere.
[0075]
　Present on annealed steel sheet surface oxide finish, and the oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 is low, SiO present in finish annealing the steel sheet surface 2 , such as oxides other than the (iron oxide or the like) Since the external oxide-type SiO 2 layer is formed during the reduction, it is considered that the formation of the external oxide-type SiO 2 film proceeds slowly and the external oxide-type SiO 2 film of the original plate becomes dense.
[0076]
　The amount of oxygen per side of the finished annealed steel sheet was determined by analyzing the amount of oxygen at five points on the surface of the finished annealed steel sheet with EMGA-920 manufactured by HORIBA in the same manner as the amount of oxygen per side of the original plate after thermal oxidation. From the analytical values, the amount of oxygen per one side of the finished annealed steel sheet at each measurement point was determined by using the specific gravity of the Fe—Si alloy described in JIS according to the thickness of the test material and the amount of Si, and the oxygen at each measurement point. It can be obtained by calculating the amount and averaging these.
[0077]
　In the method for producing a master plate according to the present embodiment, the external oxide film formed by thermal oxidation annealing is an oxide film containing 50% by mass or more of SiO 2 . When SiO 2 is 50% by mass or more, the film structure becomes dense, internal oxidation generated during the heat treatment for forming the tension film is suppressed, and the film adhesion of the tension film is improved.
[0078]
　As the amount of SiO 2 in the external oxide film increases, the effect of suppressing internal oxidation during the heat treatment for forming the tension film increases, so the upper limit of the amount of SiO 2 is not particularly limited. Therefore, the external oxide film may be a SiO 2 film (a film substantially composed of only SiO 2 ). However, practically, the upper limit of the amount of SiO 2 in the external oxide film is about 99%.
[0079]
　However, when the external oxide film of the original plate becomes an almost pure SiO 2 film, the atomic bond between Fe or the like of the steel plate and the external oxide film disappears from the viewpoint of atomic bond with an element other than Si in the base material. Therefore, the adhesion of the tension film may decrease. That is, it is preferable that not all of O in the external oxide film is completely bonded to Si, but a part of O is bonded to Fe diffused from the steel sheet, especially on the side where the film is in contact with the steel sheet. it is conceivable that.
[0080]
　It is preferable that the original plate according to the present embodiment satisfies the provision of
　　　　y ≦ 0.89 ... (3)
. When the formula (3) is satisfied, the above situation is achieved, which is more preferable. y is more preferably 0.74 or less, still more preferably 0.66 or less.
[0081]
　The outer oxide film of the original plate formed by the method for producing the original plate according to the present embodiment preferably has a film thickness of 2 nm or more and less than 40 nm. When the film thickness is 40 nm or more, there is no problem from the viewpoint of the adhesion of the tension film. However, since high-temperature annealing is required in the thermal oxidation annealing to achieve such a film thickness, there is a high possibility that strain will be introduced and the iron loss characteristics of the grain-oriented electrical steel sheet will be impaired. Therefore, the film thickness of the external oxide film is preferably less than 40 nm.
[0082]
　On the other hand, if the film thickness of the external oxide film of the original plate is less than 2 nm, it becomes difficult to suppress internal oxidation during the heat treatment for forming the tension film. The external oxide layer formed by the method for producing the original plate according to the present embodiment preferably has a film thickness of 2 nm or more. However, the amount of oxygen x and y (ΔR / R 0 ) indicating the abundance of SiO 2 in the vicinity of the outermost surface satisfy the above formula (1), and y further satisfies the formula (2) described later. If this is the case, the amount of SiO 2 required to increase the film thickness to 2 nm or more is secured. In fact, as confirmed by the present inventors, the film thickness of the external oxide film satisfying the formulas (1) and (2) was 2 nm or more. Therefore, it is considered that it is not necessary to particularly limit the film thickness of the external oxide film.
[0083]
　The thickness of the external oxide film is measured by preparing a sliced ​​section sample including the base iron-SiO 2 interface by the focused ion beam method (FIB method ) and observing it with a transmission electron microscope (TEM). The above-mentioned measurements are carried out at five points, and the average of these measurements is regarded as the film thickness of the external oxide film of the original plate.
[0084]
　In the original plate according to the present embodiment , the lower limit for y is defined in consideration of the bonding state of O in the SiO 2 film as well as the film thickness . This is because the SiO 2 film does not exist on the surface of the original plate in which the peak of SiO 2 is not detected , and the above-mentioned effect is not exhibited.
[0085]
　In the original plate according to the present embodiment, the lower limit value of
　　　　y
is defined as y ≧ 0.24 ... (2) by the following formula (2) . y is preferably 0.25 or more, and more preferably 0.27.
[0086]
　Original plate according to the present embodiment, the finish annealed steel sheet trimmed the oxygen content of the surface, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 in the atmosphere in the oxidation potential predetermined range to be displayed, the soaking temperature 1000 ° C. It is manufactured by subjecting thermal oxidation annealing below to form an external oxide layer mainly composed of SiO 2 on the surface of the finish-annealed steel sheet .
[0087]
　When the soaking temperature in the thermal oxidation annealing exceeds 1000 ° C., not only the finish-annealed steel sheet softens and the sheet-passing property deteriorates, but also the film thickness of the external oxide film becomes excessive and the sheet-passing speed fluctuates locally. , Strain is introduced into the finish-annealed steel sheet, and the iron loss characteristics of the grain-oriented electrical steel sheet deteriorate. Therefore, the soaking temperature in thermal oxidation annealing is set to 1000 ° C. or lower. The soaking temperature in thermal oxidation annealing is preferably 950 ° C. or lower.
[0088]
　The soaking temperature in thermal oxidation annealing may be any temperature as long as it can form an external oxide film satisfying the above requirements, and the lower limit is not particularly limited. However, if the soaking temperature in thermal oxidation annealing is less than 600 ° C, it is difficult to form an external oxide film of sufficient thickness within a practical annealing time, so the soaking temperature should be 600 ° C or higher. preferable.
[0089]
　As described above, the surface oxygen amount per surface finish annealed steel sheet 0.01 g / m 2 Ultra 0.05 g / m 2 if you are below the oxidation potential P in the subsequent thermal oxidation annealing H2 O / P H2 of 0.0081 It may be as follows. Preferably the oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 0.005 or less, or 0.004 or less. On the other hand, the surface oxygen content per surface finish annealed steel sheet is 0.05 g / m 2 Ultra 0.10 g / m 2 is less than or equal to, subsequent oxidation potential P is a thermal oxidation annealing H2 O / P H2 0.005 less and do it. It is preferably 0.004 or less.
Oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 when is excessive, the external oxidized SiO 2 while the thickness of the film becomes thicker, such as Mn and Cr is also oxidized. These oxides serve as a starting point for internal oxidation that occurs during the heat treatment for forming the tension film, and there is a concern that the film adhesion may be impaired. Therefore, the oxidation potential P of the thermal oxidation annealing atmosphere H2O / P H2 shall be less than or equal to the above value.
[0090]
　Oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 may be appropriately set within the above range, the lower limit is not particularly limited. However, oxidation potential P less than 0.00001 H2 O / P H2 is difficult to industrially realize. Furthermore, when an oxidation potential of less than 0.00001 PH2O / PH2 is applied, it is difficult to form an external oxide film having a sufficient thickness within a practical annealing time in a temperature range in which the through plate is stable. is there. Therefore, 0.00001 oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 is a substantial lower limit. Oxidation potential P of the thermal oxidation annealing atmosphere H2 O / P H2 is preferably 0.00010 or more.
[0091]
　Method for producing a grain-oriented electrical steel sheet according to the present embodiment, the original plate of the present embodiment, by applying a coating agent for tensioning the film formation, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 oxidation potential indicated by It is characterized in that the tension film forming heat treatment is performed in a baking atmosphere of 0.001 to 0.20.
[0092]
　A tension film is formed on the surface of the original plate on which the external oxide film is formed by thermal oxidation annealing. In the method for producing grain-oriented electrical steel sheets according to the present embodiment, a coating agent for forming a tension film, for example, a coating agent containing colloidal silica and a phosphate is applied to the surface of the external oxide film of the original plate according to the present embodiment. The coating is applied and a tension film forming heat treatment is performed at a predetermined heat treatment temperature, for example, 750 to 920 ° C. By this tension film forming heat treatment, a grain-oriented electrical steel sheet having a steel sheet and a tension film arranged on the surface thereof can be finally obtained.
[0093]
　The tension film forming heat treatment is performed in an atmosphere in which the ratio PH2O / PH2 (oxidation potential) of water vapor pressure to hydrogen pressure is 0.001 to 0.20. By forming the tension film in this atmosphere, the predetermined externally oxidized SiO 2 film formed by the production method according to the present embodiment suppresses slight internal oxidation that occurs at the initial stage of film formation, and the tension film is formed. Sufficient and stable adhesion can be ensured.
[0094]
　If the oxidation potential in the tension film forming heat treatment is more than 0.20, H in the atmosphere 2 internal oxidation caused by the O. Therefore, the PH2O / PH2 (oxidation potential) in the tension film forming heat treatment is set to 0.20 or less. P in tension film forming heat treatment H2 O / P H2 is preferably 0.10 or less. On the other hand, P in tension film forming heat treatment H2 O / P H2 when (oxidation potential) is less than 0.001, H and phosphate decompose during heat treatment 2 O is generated, the internal oxidation occurs. Therefore, P in the tension film forming heat treatment H2 O / P H2 is 0.001 or more. P in tension film forming heat treatment H2 O / P H2 is preferably 0.003 or more.
[0095]
　The heat treatment temperature in the tension film forming heat treatment is preferably 750 to 920 ° C. If the heat treatment temperature in the tension film forming heat treatment is less than 750 ° C., the required film adhesion may not be obtained. Therefore, the heat treatment temperature is preferably 750 ° C. or higher. On the other hand, if the heat treatment temperature in the tension film forming heat treatment exceeds 920 ° C., the required film adhesion may not be obtained, so the heat treatment temperature is preferably 920 ° C. or lower.
Example
[0096]
　Hereinafter, examples of the present invention will be described. The conditions adopted in the examples are examples for confirming the feasibility and effect of the present invention, and the present invention is not limited thereto. Various conditions can be adopted as long as the object of the present invention is achieved without departing from the present invention.
[0097]
　(Example 1)
　A cold-rolled steel sheet for manufacturing a directional electromagnetic steel sheet having a thickness of 0.225 mm and Si of 3.3% by mass is decarburized and annealed, and the surface of the decarburized and annealed steel sheet is annealed mainly of alumina. A water slurry of the separating agent is applied, dried, and then wound into a coil. Next, the decarburized annealed steel sheet is secondarily recrystallized in a dry nitrogen atmosphere and purified annealed (finish annealed) at 1200 ° C. in a dry hydrogen atmosphere to obtain a finish annealed directional silicon steel sheet. Since this finish-annealed steel sheet does not contain MgO in the annealing separator, it does not have a glass coating on its surface.
[0098]
　The pickling time of this finished annealed steel sheet is adjusted with 0.3% sulfuric acid solution, and the amount of oxygen per side is controlled to 0.01 g / m 2 , 0.04 g / m 2 , or 0.06 g / m 2 . .. Then, in each finished annealed steel sheet, the pH2O / PH2 (oxidation potential) and the dew point are in the atmosphere shown in the table at 25% by volume of nitrogen and 75% by volume of hydrogen , and the soaking temperature (thermal oxidation) shown in the table is shown. Temperature), thermal oxidation annealing is performed with a soaking time of 30 seconds. A steel sheet having an oxygen content of 0.01 g / m 2 per side is in a state called "mirror surface state" or "absence of inorganic mineral substances" in the prior art.
[0099]
　The amount of oxygen per side of the original plate (original plate) for grain-oriented electrical steel sheets after thermal oxidation annealing is analyzed, and the infrared absorption spectrum of the surface of this original plate is measured. Further, a mixed solution (coating agent) consisting of 50 ml of a 50 mass% aluminum phosphate aqueous solution, 100 ml of a 20 mass% colloidal silica aqueous dispersion, and 5 g of chromic anhydride was applied to the surface of the original plate and baked at 830 ° C. for 30 seconds. Annealing (heat treatment for forming a tension film) is performed.
[0100]
　The annealing atmosphere during this annealing (tension film forming heat treatment) is an atmosphere in which nitrogen is 25% by volume, hydrogen is 75% by volume, and the dew point is + 5 ° C. (oxidation potential PH2O / PH2 : 0.012).
[0101]
　After forming the tension film, the film adhesion is evaluated by the ratio of the remaining area of ​​the film when the sample is wound around a cylinder having a diameter of 20 mm and then unwound. The adhesiveness of the tension film having a film residual rate of 95% or more is judged as "G" (Good), and the adhesiveness of the tension film having a film residual rate of 90% or more and less than 95% is "B" (BAD). The adhesiveness of the tension coating having a coating residual ratio of less than 90% is determined to be "VB" (VERY BAD). The original plate whose adhesiveness is determined to be "G" is determined to be an original plate capable of stably ensuring the adhesiveness of the tension coating. The results are shown in Table 1. In the example of the invention, it can be seen that the film adhesion is excellent.
[0102]
[table 1]

[0103]
　(Example 2)
　Test No. in Table 1 A mixed solution containing 50 liters of a 50 mass% aluminum phosphate / magnesium aqueous solution, 100 liters of a 20 mass% colloidal silica aqueous dispersion, and 5 kg of chromic anhydride on a steel sheet prepared in the same manner as in 1-2 after thermal oxidation annealing. Was applied and annealed at 850 ° C. for 20 seconds. The atmosphere at the time of annealing and annealing was nitrogen: 25% by volume, hydrogen: 75% by volume, and a dew point: −30 ° C. to + 60 ° C.
[0104]
　After forming a tension film on the steel sheet, the test piece collected from the steel sheet was wound around a cylinder having a diameter of 20 mm, and then the film adhesion was evaluated by the film residual area ratio when unwound. The results are shown in Table 2. The evaluation criteria for the adhesion of the coating film are the same as in Example 1. In the second embodiment, the condition of the tension film forming heat treatment in which the adhesion is determined to be "G" is a method for manufacturing a grain-oriented electrical steel sheet capable of stably ensuring the adhesion of the tension film. to decide. In the example of the invention, it can be seen that the film adhesion is excellent.
[0105]
[Table 2]

[0106]
　(Example 3) The
　finished annealed steel sheet produced in the same manner as in Example 1 is pickled, chemically polished, and then heat-treated at 300 to 500 ° C. in a nitrogen atmosphere to oxidize the surface of the steel sheet to obtain oxygen. Adjust the amount. These are thermally oxidized with a predetermined oxidation potential, and then annealing and film adhesion evaluation are carried out under the same conditions as in Example 1. The evaluation criteria for the adhesion of the coating film are the same as in Example 1. The original plate whose adhesiveness is determined to be "G" is determined to be an original plate capable of stably ensuring the adhesiveness of the tension coating. The results are shown in Table 3. In the example of the invention, it can be seen that the film adhesion is excellent.
[0107]
[Table 3]

Industrial applicability
[0108]
　As described above, according to the present invention, the adhesion of the tension coating can be stably ensured even at the thermal oxidation annealing temperature without strain introduction. Specifically, according to the present invention, by controlling the surface texture of the finish-annealed steel sheet before thermal oxidation annealing and controlling the atmosphere during thermal oxidation annealing, the original plate for directional electromagnetic steel sheet is used at a soaking temperature of 1000 ° C. or less. An external oxide layer mainly composed of SiO 2 can be formed on the surface of the steel sheet, which can avoid the introduction of strain into the original plate and can sufficiently secure the adhesion of the tension film . As a result, according to the present invention, a grain-oriented electrical steel sheet having good adhesion of an insulating coating can be industrially manufactured by an ordinary annealing line. Therefore, the present invention has great utility in the electromagnetic steel sheet manufacturing industry and the electromagnetic steel sheet utilization industry.
The scope of the claims
[Claim 1]
　An original plate for grain-oriented electrical steel sheets, the
　amount of oxygen x per side of the surface of the original plate and the peak of SiO 2 on the surface of the original plate obtained by reflective infrared spectroscopic analysis (ΔR / R 0　@ 1250 cm −). A 　master plate for
　　　　　grain- oriented electrical steel sheets , wherein the value y of 1 ) satisfies y ≧ 1500 x 2.5　... (1)
and y ≧ 0.24 ... (2)
.
[Claim 2]
　Further, the original plate for grain-oriented electrical steel sheets according to claim 1 , wherein
　　　　　y ≦ 0.89 ... (3)
is satisfied.
[Claim 3]
　The 　original plate for grain-oriented electrical steel sheets according to claim 1 or 2, further
　　　　　satisfying 6440 x 2.5 ≧ y ... (4)
.
[Claim 4]
　A directional silicon steel sheet used as a material for the original plate for grain-oriented electrical steel sheets according to any one of claims 1 to 3, wherein the amount of oxygen per one side of the surface is 0.01 g / m 2 or more and 0.1 g /. A directional silicon steel sheet having m 2 or less.
[Claim 5]
　The method for manufacturing a grain-oriented electrical steel sheet according to any one of claims 1 to 3, wherein the
　amount of surface oxygen per side of the finish-annealed grain-oriented silicon steel sheet is more than 0.01 g / m 2 . 05G / m 2 or less, or 0.05 g / m 2 ultra 0.10 g / m 2 comprising the steps of arranging the following
　to the finish annealing has been oriented silicon steel sheet, the ratio P of the water vapor pressure and hydrogen pressure H2 O / P H2 shown in oxidation potential, the surface oxygen content 0.01 g / m 2 ultra 0.05 g / m 2 0.0081 in the following atmosphere is less than or equal, the surface oxygen content 0.05 g / m 2 ultra 0.10g A step of performing thermal oxidation annealing at a soaking temperature of 1000 ° C. or lower in an atmosphere of 0.005 or less when the temperature is 2 / m 2 or less to form an external oxide layer on the surface of the directional silicon steel sheet
is provided. A characteristic method for manufacturing a base plate for grain-oriented electrical steel sheets.
[Claim 6]
　The step of applying the coating agent for forming a tension film to the original plate for grain-oriented electrical steel sheet according to any one of claims 1 to 3, and the oxidation potential represented by
　the ratio of water vapor pressure to hydrogen pressure PH2O / PH2. A
method for producing a grain-oriented electrical steel sheet, which comprises a step of performing a tension film forming heat treatment in a baking atmosphere of 0.001 to 0.20 .