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Chamber Sterilization With Pulsed Uv Laser, Ozone And Uv Light

Abstract: In this method of invention, purified air is passed through molecular sieved zeolite bed for elimination of nitrogen gas and increasing oxygen concentration in to the chamber selected for sterilization. This environment is flashed with nitrogen gaseous laser which acts as ultraviolet laser giving high intensity (330nm) flash of ultraviolet (UV) at l0kilowatt and 30 nanosecond pulse. The flash converts the oxygen collected in the chamber to ozone, without silent electric discharge for creating a germicidal environment. These nano second pulses are highly sufficient to kill any kind of microbes in the chamber selected. This chamber is further exposed with special ultraviolet tubes made up of gallium-iodide placed in argon gas in presence of mercury traces to stabilize peak UV emissions (250 nm). The high intensity of UV also reaches all the areas of the chamber throughout the sterilization time.

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Notices, Deadlines & Correspondence

Patent Information

Application #
Filing Date
24 September 2010
Publication Number
13/2013
Publication Type
INA
Invention Field
PHARMACEUTICALS
Status
Email
Parent Application

Applicants

EESAVYASA TECHNOLOGIES PVT. LTD.
108-B,I.D.A.KHANAPURAM,KHAMMAM, PIN-507 002

Inventors

1. DAMULURI PREM CHAKRAVARTHY
108-B,I.D.A.KHANAPURAM,KHAMMAM, PIN-507 002
2. KUNAM SASIDHAR REDDY
12-13-677/127,STREET NO-1,KIMTEE COLONY,TARNAKA,HYDERABAD, PIN - 500 017
3. JINUGA PREETHAM
12-13-677/127,STREET NO-1,KIMTEE COLONY,TARNAKA,HYDERABAD, PIN - 500 017

Specification

1. Title of the invention :

Chamber sterilization with pulsed UV laser, ozone and Ultraviolet light.

2. Applicant:

Name : Eesavyasa Technologies Pvt. Ltd.

Nationality : Indian

Address : 108-B, I.D.A. Khanapuram, Khammam(DT), Andhra Pradesh. Pin: 507002

3. Preamble to the description:

Complete specification:

Summary:

In the summary of invention, each important salient feature is explained as follows:

1. The concept of prolonging the half life of nascent oxygen by UV pulses is a novel concept.

2. H2O2 exposed to radio frequency is being used world wide as an effective sterilization method which overcomes the drawbacks of many other sterilization methods like autoclaving, hot air sterilization and some chemical sterilization methods. These drawbacks include inefficiency to sterilize deeper surfaces, internal areas, damage to material due to heat or chemical nature of sterilants, etc.

3. Ozone is also used instead of H2O2 for the sterilization procedures to produce nascent oxygen. But H2O2 when dissociated in presence of Radio Frequency gives prolonged life for nascent oxygen and so is superior than nascent oxygen released by ozone. With Mica or some material a small cassette is made and an arc made by radio frequency is sent into the H2O2 chamber to dissociate and give nascent oxygen. Until that arc continues the nascent state of oxygen molecule continues. But this sterilization has some problems. Microcontroller based surgical equipment cannot with stand these high arc environments which are present due to the RF generation. Equipment like clocks cannot be sterilized.

4. The instruments based on ozone generation for the sterilization procedures existing today have the drawback of lack of prolonged state of nascent oxygen.In order to overcome these problems we need, (a) A method to increase the prolonged state of nascent oxygen, (b) Without much or no arc, nascent oxygen should be produced.

5. Ozone is usually produced with silent electric discharge method. In this method, the silent electric discharge is not done in the sterilization chamber. So electric arc does not reach the sterilization chamber. Also, Ultraviolet light is a major medium of producing ozone than silent electric discharge. Nitrogen present inside the sealed container (not openly) of plasma tube of nitrogen and under very low pressure and when subjected to high voltage flashes (not arcs) produces UV laser.

6. The laser wavelength is around 3300to 3500 angstroms. This is in ultraviolet region. In H2Q2 sterilization we subject H2O2 to plasma state to prolong the life of nascent oxygen. In a similar fashion the flashes of UV laser is to keep the nascent oxygen in a more prolonged time period. This is a 100 percent replacement to any plasma sterilization.

7. The nitrogen laser is produced with a 10KW power and is flashed for almost 300 times per second. The length of each flash is almost 30 nanoseconds. So the duty cycle is very less. But for atomic split even one nanosecond is sufficient.

8. In H2O2 sterilization we subject H2O2 to plasma state to prolong the life of nascent oxygen. In a similar fashion the flashes of UV laser is to keep the nascent oxygen in a more prolonged time period. This is a 100 percent replacement to any plasma sterilization

4. Description:

1. In this method the novel concept of achieving extraordinary long life for nascent oxygen is achieved with maximum number of methods whichever is possible.

2. The ozone gas is produced by silent electric discharge of oxygen.from either electrolysis of water or from collection of concentrated oxygen obtained by passing atmospheric air through molecular sieves of nitrogen adsorbant, zeolytes.

3. This concentrated oxygen before sending into the sterilization chamber is subjected to silent electric discharge. The silent electric discharge chamber is at a considerable distance to the sterilization chamber (where sterilization take place). Ozone produced here is powerfully pushed into the sterilization chamber.

4. When ozone is passed into second chamber, arrangement is made for nitrogen laser production.

5. Here Nitrogen gas in a glass tube is subjected to very low pressure and plasma discharge which produces UV laser. The high voltage flashes produces UV laser. The laser wavelength is around 3300 to 3500 angstroms. This is in ultraviolet region.

6. The nascent oxygen produced is gushed into main sterilization chamber with pressure where complete evacuation is already provided with the help of vacuum pump systems like diffusion pump.

7. In this sterilization chamber nascent oxygen in atomic state is made available for any length of time.

8. This sterilization chamber can also be provided with gallium iodide UV source for further availability of ultraviolet radiation.

9. This sterilization chamber may also be connected with Radiofrequency dissociated H2O2 for liberating nascent oxygen. The chamber construction may be for Ozone alone or ozone with UV and Radiofrequency dissociated H2O2 or UV alone.

10. In each stage of ozone travel into other chambers microprocessor based control valves and positive pressure inducing systems are connected.

Background of invention

For the disinfection and sterilization of materials, instruments, etc different sterilization procedures have been developed over time. These include physical methods, chemical methods, radiation procedures etc. In sterilization procedures though procedures like autoclaving, hot air sterilization are commonly used, they have their own drawbacks as being not useful for heat sensitive materials like plastics, or instruments containing electronic apparatus, etc. Sterilization with radiations like Ultraviolet light also have disadvantages like being useful only in contact sterilization, or causing damage and discoloration to materials like plastics etc. Sterilization methods employing chemicals also have disadvantages like, long sterilization cycles or not applicable to all instruments especially those which contain electronic circuits, etc. Though Radio Frequency generated Plasma H2O2 is being recently employed for sterilization methods, it is expensive and procedures humidification of sterilization chamber are required. In order to overcome many of the drawbacks of different existing sterilization methods the current invention of production of nascent oxygen by ozone exposed to pulsed nitrogen laser has been presented for an efficient sterilization procedure.

6. Brief description of drawings:

1. Ozone generation is done by silent electric discharge of oxygen gas through siemen's ozonizer, brody's ozonizer or any other silent electric discharge method under high voltage. Here oxygen gas which is a feed gas will be procured either by means of extracting pure oxygen by passing atmospheric air over zeolytes or oxygen produced from electrolysis of water.

2. The second chamber is equipped with a glass tube which can produce UV laser by flashing high voltage flashes.

3. Sterilization chamber is utilized for placing the materials or instruments to be sterilized.

4. This main sterilization chamber is pre evacuated with the help of evacuating systems.

5. As an optional facility or additional facility nascent oxygen molecules can also be pumped into main sterilization chamber with the help of radiofrequency based H202 dissociation system.

6. The main chamber is also provided with an optional or additional facility of gallium iodide sourced UV radiation facility which can be used as pulsed UV.

7. All the chambers are connected with microprocessor controlled control valves.

7. Claims

1. We claim that we have taken all the possible necessary measures to increase the longevity of nascent atomic oxygen.

2. We claim that we are passing atmospheric air over molecular sieves of zeolytes which can adsorb nitrogen gas and over activated alumina balls to absorb humidity in air.

3. We claim that the life of nascent oxygen is extraordinarily enhanced with the help of nitrogen gas based high voltage flashed UV laser which is the main point of invention and as long as ozone gas is continuously pumped through UV laser chamber, the continuous availability of nascent oxygen is ensured which is a novel concept and completely proprietary concept of the invention.

4. We claim that gallium iodide based pulsed UV flashes are also made available for the nascent oxygen to enhance sterilization strength of the system.

5. We claim that an additional provision of nascent oxygen availability is provided by connecting radiofrequency based H2O2 sterilization system.

6. We claim that present system of sterilization is useful for any kind of sterilization like medical equipment, materials, electronic gadgets etc.

7. We claim that present system of sterilization is useful for any kind of sterilization in the fields of biology, agriculture, tissue culture, embryological sciences, seed purification, etc and where ever sterilization of above design and principle can be applied.

8. We claim that purification of defense appliances wherever the possibility of chemical contamination is suspected.

9. We claim that the proposed system of sterilization can be used at airports where inter-geographical contagious spread of diseases can be arrested.

10. We claim that the following salient features are advantageous that associate with our design, (a) The method is advantageous man RadioFrequency H2O2 method by the following ways - It is safe to the instruments, (b) It is highly reliable because ozone itself gives nascene oxygen, (c) The half life is more compared to plasma H2O2 than pulsed UV.

Documents

Orders

Section Controller Decision Date

Application Documents

# Name Date
1 2803-che-2010 form-2 24-09-2010.pdf 2010-09-24
1 2803-CHE-2010-Correspondence to notify the Controller [03-12-2022(online)].pdf 2022-12-03
2 2803-che-2010 form-1 24-09-2010.pdf 2010-09-24
2 2803-CHE-2010-FORM 13 [03-12-2022(online)].pdf 2022-12-03
3 2803-CHE-2010-FORM-26 [03-12-2022(online)].pdf 2022-12-03
3 2803-che-2010 description(provisional) 24-09-2010.pdf 2010-09-24
4 2803-CHE-2010-POA [03-12-2022(online)].pdf 2022-12-03
4 2803-che-2010 correspondence others 24-09-2010.pdf 2010-09-24
5 2803-CHE-2010-RELEVANT DOCUMENTS [03-12-2022(online)].pdf 2022-12-03
5 2803-CHE-2010 DRAWINGS 23-09-2011.pdf 2011-09-23
6 2803-CHE-2010-US(14)-HearingNotice-(HearingDate-05-12-2022).pdf 2022-11-16
6 2803-CHE-2010 DESCRIPTION (COMPLETE) 23-09-2011.pdf 2011-09-23
7 2803-CHE-2010-CLAIMS [04-03-2020(online)].pdf 2020-03-04
7 2803-CHE-2010 CORRESPONDENCE OTHERS 23-09-2011.pdf 2011-09-23
8 2803-CHE-2010-COMPLETE SPECIFICATION [04-03-2020(online)].pdf 2020-03-04
8 2803-CHE-2010 CLAIMS 23-09-2011.pdf 2011-09-23
9 2803-CHE-2010 FORM-2 23-09-2011.pdf 2011-09-23
9 2803-CHE-2010-DRAWING [04-03-2020(online)].pdf 2020-03-04
10 2803-CHE-2010 ABSTRACT 23-09-2011.pdf 2011-09-23
10 2803-CHE-2010-FER_SER_REPLY [04-03-2020(online)].pdf 2020-03-04
11 2803-CHE-2010 FORM-18 03-01-2013.pdf 2013-01-03
11 2803-CHE-2010-OTHERS [04-03-2020(online)].pdf 2020-03-04
12 2803-CHE-2010 FORM-13 03-01-2013.pdf 2013-01-03
12 2803-CHE-2010-FER.pdf 2019-09-04
13 2803-CHE-2010 FORM-13 03-01-2013.pdf 2013-01-03
13 2803-CHE-2010-FER.pdf 2019-09-04
14 2803-CHE-2010 FORM-18 03-01-2013.pdf 2013-01-03
14 2803-CHE-2010-OTHERS [04-03-2020(online)].pdf 2020-03-04
15 2803-CHE-2010 ABSTRACT 23-09-2011.pdf 2011-09-23
15 2803-CHE-2010-FER_SER_REPLY [04-03-2020(online)].pdf 2020-03-04
16 2803-CHE-2010 FORM-2 23-09-2011.pdf 2011-09-23
16 2803-CHE-2010-DRAWING [04-03-2020(online)].pdf 2020-03-04
17 2803-CHE-2010-COMPLETE SPECIFICATION [04-03-2020(online)].pdf 2020-03-04
17 2803-CHE-2010 CLAIMS 23-09-2011.pdf 2011-09-23
18 2803-CHE-2010-CLAIMS [04-03-2020(online)].pdf 2020-03-04
18 2803-CHE-2010 CORRESPONDENCE OTHERS 23-09-2011.pdf 2011-09-23
19 2803-CHE-2010-US(14)-HearingNotice-(HearingDate-05-12-2022).pdf 2022-11-16
19 2803-CHE-2010 DESCRIPTION (COMPLETE) 23-09-2011.pdf 2011-09-23
20 2803-CHE-2010-RELEVANT DOCUMENTS [03-12-2022(online)].pdf 2022-12-03
20 2803-CHE-2010 DRAWINGS 23-09-2011.pdf 2011-09-23
21 2803-CHE-2010-POA [03-12-2022(online)].pdf 2022-12-03
21 2803-che-2010 correspondence others 24-09-2010.pdf 2010-09-24
22 2803-CHE-2010-FORM-26 [03-12-2022(online)].pdf 2022-12-03
22 2803-che-2010 description(provisional) 24-09-2010.pdf 2010-09-24
23 2803-CHE-2010-FORM 13 [03-12-2022(online)].pdf 2022-12-03
23 2803-che-2010 form-1 24-09-2010.pdf 2010-09-24
24 2803-CHE-2010-Correspondence to notify the Controller [03-12-2022(online)].pdf 2022-12-03
24 2803-che-2010 form-2 24-09-2010.pdf 2010-09-24

Search Strategy

1 searchqueryandstrategyfor2803che2010_03-09-2019.pdf
1 searchqueryfor2803che2010_03-09-2019.pdf
2 searchqueryandstrategyfor2803che2010_03-09-2019.pdf
2 searchqueryfor2803che2010_03-09-2019.pdf