[0001]The present invention is a laminate, in particular, anti-counterfeit effect, a laminate to provide a decorative effect and / or aesthetic effect. Background technique [0002] 　Paper money, securities, certificates, to the brand-name products and personal authentication medium or the like, it is desired that counterfeiting is difficult. Therefore, in such articles, it is possible to support the excellent laminate anti-counterfeit effect. [0003] 　Many such laminates, a diffraction grating includes holographic and the lens array, the microstructure of such scattering structure. These microstructures are difficult to analyze. Further, in order to produce a laminate containing these microstructures, it requires expensive manufacturing facilities such as an electron beam lithography apparatus. Thus, such laminates can exhibit excellent anti-counterfeit effect. [0004] 　These laminates typically include a relief structure-forming layer having a main surface including the microstructure, and a reflective layer provided thereon. In this case, to further improve the anti-counterfeit effect, a reflective layer, may be formed in a pattern only on a part of the main surface. For example, on the main surface, a reflective layer is the outline provided so as to constitute a micro characters, micro characters like pattern that emits diffracted light is obtained. [0005] 　In Patent Document 1, to form a reflective layer with high positional accuracy, it adopts the following method. [0006] 　First, including depth width ratio with large uneven structure as a "first region", and with a smaller relief structure or depth width ratio is flat "second region" relief structure to prepare the formation layer. Then, the relief structure-forming layer is formed over a uniform surface density by vacuum deposition a metal reflective layer. Thereafter, a material having durability against an etching solution for etching the metal reflective layer is formed at a uniform surface density by a vacuum deposition method providing a "second layer". Then, subjecting the resulting laminate to an etching process. [0007] 　Part corresponding to the "first region" of the "second layer", deposited film depth width ratio is due to the large relief structure is discontinuous film, or etched to a porous membrane to penetrate the liquid. On the other hand, the portion corresponding to the "second region" of the "second layer", in order to provide a smaller relief structure or depth width ratio is flat, deposited film becomes uniform continuous film , not allowed to penetrate the etching solution. [0008] 　Therefore, by dipping the resulting laminate in an etching solution can be removed by etching only the metal reflecting layer corresponding to the "first region". That is, only the "second region", it is possible to form the metal reflective layer. [0009] 　This process is capable of forming a metal reflective layer with high positional accuracy, also from the viewpoint of not requiring the exposure process of the photosensitive layer, it is advantageous in terms of cost and productivity. CITATION Patent Literature [0010] Patent Document 1: JP 2012-63738 JP Summary of the Invention Problems that the Invention is to Solve [0011] 　However, in the method of Patent Document 1, as described above, by utilizing a difference in depth width ratio of the concavo-convex structure in each region, the region having a smaller concavo-convex structure having a depth-to-width ratio ( "second region" ) to only be able to leave the "metal reflective layer". In other words, it is difficult to leave a "metal reflective layer" is larger than the uneven structure portion of the depth-width ratio. [0012] 　Further, in the method of Patent Document 1, the case where the "metal reflective layer" is a large concavo-convex structure having a depth-to-width ratio, it is necessary to provide a large concavo-convex structure of the further depth width ratio "First region". Generally, in the case of providing a large concavo-convex structure having a depth-to-width ratio, it is necessary to increase the thickness of the final product. For example, when creating a relief structure greater "first region" of the depth-width ratio in the imprint method, it is necessary to mold layer thickness of about 5 to 10 times relative to the desired depth. [0013] 　Therefore, the case of manufacturing a large concavo-convex structure having a depth-to-width ratio, the thickness of the final laminate, increases may also occur problems such as increasing the cost of the process. [0014] 　From the above, does not depend on the difference in the depth-width ratio of the concavo-convex structure, it is required the construction of a new manufacturing method of laminates. [0015] 　An object of the present invention is that the first layer to provide a new laminate and a manufacturing method provided with high positional accuracy. Means for Solving the Problems [0016] 　The laminate of the invention, a relief structure-forming layer having a major surface comprising a first and a second region, provided in a portion and a second region of the only in the second region of the relief structure-forming layer, or the first region It was a laminate comprising a first layer, the relief structure-forming layer, in plan view, irregularities extending in the direction from the first direction or the first direction until 10 degrees to the left and right structures a first region having a, in plan view, the second having a convex-concave structure or a flat surface that extends in a direction from the second direction or a second direction perpendicular to the first direction to 65 degrees to the left and right and a region, the first layer comprises a first material which differs from the material of the relief structure-forming layer, characterized in that it has a surface shape corresponding to the surface shape of the relief structure-forming layer . [0017] 　The method of manufacturing the laminate of the present invention, a relief structure-forming layer having a major surface comprising a first and a second region, the relief in the second region only structures forming layer or a portion of the first region, and a second a method for producing a laminate comprising a first layer provided in a region, which extends in the direction of (a) in plan view, up to 10 degrees to the left and right from the first direction or a first direction has a first region having a concave-convex structure, in plan view, the concavo-convex structure or a flat surface that extends in a direction from the second direction or a second direction perpendicular to the first direction to 65 degrees to the left and right forming a relief structure-forming layer and a second region, the first and second regions of (b) the relief structure-forming layer, and depositing a first material that differs from the material of the relief structure-forming layer Te, the surface shape corresponding to the surface shape of the relief structure-forming layer Forming a first material laminate which, in (c) vapor deposition apparatus, such that the first direction and the conveying direction of the first material laminate according matches the step (a), the said first placing a material laminate, (d) conveys a first material laminate wherein arranged, the first obliquely to the plane that is deposited in the first material of the first material laminate the second material different from the first material by vapor deposition, forming a second material laminate, (e) a second material laminate, the reactive gas or liquid reacting with the first material exposed, thereby forming a laminate comprising the only in the second region of the relief structure-forming layer, or provided on a part and a second region of the first region, a first layer and a second layer in this order process and, especially in that it comprises a step of removing the second layer from the laminate formed in step (f) (e) To. [0018] 　Method for producing a laminate of the present invention, a relief structure-forming layer having a major surface comprising a first and a second region, wherein only the second region of the relief structure-forming layer, or a portion of the first region and the It provided 2 region, a first layer and a second layer to a method for producing a laminate comprising in this order, with (a) a plan view, to the left and right from the first direction or the first direction 10 a first region having a concave-convex structure extending in the direction to the degree, in plan view, extend in a direction from the second direction or a second direction perpendicular to the first direction to 65 degrees to the left and right forming a relief structure-forming layer and a second region having a convex-concave structure and / or flat surface are, (b) the first and second regions of the relief structure-forming layer, the relief structure-forming layer the material by depositing a first material that is different, the relief structure-forming layer Forming a first material laminate having a surface shape corresponding to the surface shape, (c) in the vapor deposition apparatus, the first direction and the conveying direction of the first material laminate according to step (a) as but matches the placing a first material laminate, (d) conveys a first material laminate wherein arranged are deposited in the first material of the first material laminate surface the second material that is different from said first material obliquely with vapor deposition with respect to, and forming a second material laminate, (e) a second material laminate, and the first material characterized in that it comprises a step of exposing the reactive gas or liquid to the reaction. Effect of the invention [0019] 　The laminate of the present invention includes a first layer with high positional accuracy (functional layer). Therefore, the laminate can be used an optical element, as various applications of members such as an electronic circuit. Further, according to the method of the present invention, without using the difference in depth width ratio of the concavo-convex structure in each region, it is possible to provide the first layer with high accuracy at a desired position. BRIEF DESCRIPTION OF THE DRAWINGS [0020] [FIG. 1A] is an external view schematically showing a laminate according to the first embodiment of the present invention. Is a plan view of the stack shown in FIG. 1B] FIG 1A. It is a [FIG 1C] IC-IC line sectional view of FIG. 1B. It is a [FIG 1D] ID-ID line sectional view of FIG. 1B. [Figure 2] A schematic cross-sectional views sequentially illustrating steps of a method for manufacturing a laminated body according to the first embodiment of the present invention, (a) illustrates the step of forming a relief structure-forming layer is a cross-sectional view, (b) is a sectional view illustrating a step of forming a first material laminate, (c), in the vapor deposition apparatus, illustrating a step of placing the first material laminate is a cross-sectional view, (d) is a cross-sectional view illustrating a step of forming a second material laminate, (e) is in the second region of the relief structure-forming layer, the first layer, the second layer is a cross-sectional view illustrating a step of forming a laminate formed by sequentially forming the bets, (f) are cross-sectional views illustrating a step of removing the second layer. [FIG 3A] is a schematic sectional view showing an example of a deposition apparatus in which the first material laminate is arranged. In FIG 3B] FIG. 3A, the first material laminate (1), (2) is a schematic diagram showing a state of the deposition surface in the first region passes through the positions of (3). In FIG. 3C] FIG. 3A, the first material laminate (1), (2) is a schematic diagram showing a state of the deposition surface in the second region when passing through the position of (3). [Figure 4A] in the first region, is a speculation view showing a section of the deposition geometry of the second material. [Figure 4B] in the second region, a speculation view showing a cross-section of a deposition geometry of the second material. FIG. 5 is a schematic top view of a laminate according to a second embodiment of the present invention. 6 is a schematic top view of a laminate according to the third embodiment of the present invention. 7 is a schematic top view of a laminate according to a fourth embodiment of the present invention. [FIG 8A] is a schematic plan view showing a laminated body according to a fifth embodiment of the present invention. A VIIIB-VIIIB line sectional view of FIG. 8B] Figure 8A. [Figure 9A] a plurality of linear recesses, extend in a first direction, and is a plan view showing a structure period of the recess is not constant schematically. A IXB-IXB line sectional view of FIG. 9B] Figure 9A. A recess extending in FIG. 10A] first direction is a plan view schematically showing a structure arranged randomly. Is a [FIG 10B] XB-XB line sectional view of FIG. 10A. [Figure 11A] linear recess is a plan view showing a structure extending discontinuously in a first direction schematically. A XIB-XIB line sectional view of FIG 11B] FIG 11A. [Figure 12A] a plurality of linear recesses, extend in the second direction, and is a plan view showing a structure period of the recess is not constant schematically. A XIIB-XIIB line sectional view of FIG 12B] FIG 12A. A recess extending in FIG. 13A] second direction is a plan view schematically showing a structure arranged randomly. A XIIIB-XIIIB line sectional view of FIG 13B] FIG 13A. [Figure 14A] linear recess is a plan view showing a structure extending discontinuously in the second direction schematically. A XIVB-XIVB line sectional view of FIG 14B] FIG 14A. Is a plan view schematically showing a flat surface with the FIG 15A] recess. A XVB-XVB line sectional view of FIG 15B] FIG 15A. Is a [FIG 16A] a plan view schematically showing a flat surface having a combination of two recesses. A XVIB-XVIB line sectional view of FIG 16B] FIG 16A. Is a plan view showing a modified example of FIG. 17A] FIG 15A. A XVIIB-XVIIB line sectional view of FIG 17B] FIG 17A. DESCRIPTION OF THE INVENTION [0021] 　The following describes in detail embodiments of the present invention. Although reference to the drawings in the following description, the embodiments described in the drawings are illustrative of the present invention, the present invention is not limited to the embodiments described in the drawings. In the drawings, components that achieve the same or similar functions are denoted by the same reference numerals, may be omitted redundant description. Further, dimensional ratios in the drawings are exaggerated for convenience of explanation, and may be different from the actual ratio. [0022] First Embodiment 　First, a description will be given of a first embodiment of the present invention. [0023] 　laminate according to the first embodiment of the present invention, a relief structure-forming layer having a major surface comprising a first and a second region, only the second region of the relief structure-forming layer or the, comprises a first layer which is provided on a part and a second region of the first region, wherein the relief structure-forming layer, in plan view, extend in a direction from the first direction or the first direction until 10 degrees to the left and right a first region having a to have concavo-convex structure, in plan view, irregularities extending in the direction from the second direction or a second direction perpendicular to the first direction to 65 degrees to the left and right structures and / or a second region having a flat surface, the first layer comprises a first material which differs from the material of the relief structure-forming layer has a surface shape corresponding to the surface shape of the relief structure-forming layer ing. [0024] 　1A is a laminate according to the first embodiment of the present invention is an external view schematically showing, Figure 1B is a plan view of the stack shown in FIG. 1A, FIG. 1C, IC of FIG. 1B a -IC line sectional view, FIG. 1D is a ID-ID line sectional view of FIG. 1B. In Figure 1A ~ FIG 1D, the direction and orthogonal to each other are parallel to the main surface of the laminate and X and Y directions, and a Z direction and the direction perpendicular to the main surface of the laminate. [0025] 　Laminate 10 illustrated in FIG. 1A, a relief structure-forming layer 2 having a main surface including a first region R1 and the second region R2, a first layer 4 provided in the second region R2 of the relief structure-forming layer 2 including the door. In the present invention, not limited to this, the first layer 4 may be provided in a part of the first region R1 of the relief structure-forming layer 2. The first layer 4 may not necessarily provided on the entire second region R2 of the relief structure-forming layer 2. Further, the laminate 10 of the present invention may comprise a second layer covering at least a first layer 4 (not shown). [0026] 　Hereinafter, the relief structure-forming layer 2 constituting the laminated body 10, the first layer 4 and the second layer is any layer will be described. [0027] (Relief structure-forming layer) 　The relief structure-forming layer 2, in the first region R1, has a fine uneven structure on the main surface of the one. [0028] 　In the example of the laminated body 10 shown in FIG. 1A, uneven structure, as seen in FIG. 1B, in the first region R1, and extends in the first direction. In the laminate 10 of the present invention, the uneven structure is in the first region R1, is not limited only to the first direction may extend in a direction from the first direction to 10 degrees to the left and right. The first direction is typically coincides with the conveying direction of the first material laminate 10 as specified in step (c) in the method for producing a laminate 10 of the present invention to be described later. [0029] 　Further, concavo-convex structure, in the first region R1, not limited to the extension of the one direction, if the direction from the first direction or the first direction until 10 degrees to the left and right, extend in two or more directions it may be. Furthermore, the uneven structure is in a plan view, it may be a cross-grating structure (grating structure). Furthermore, the uneven structure may extend discontinuously. [0030] 　In the present specification, the expression defining the extending direction of the convex-concave structure "depends on the alpha level", indicated as "± alpha degrees", the expression "right alpha level" is "+ alpha degree" or " shows the α level ", the expression" left-to-α level "is," - sometimes referred to as α level ". Further, to the certain extending direction, and the extending direction plus 180 degrees to the extending direction of the same. [0031] 　Uneven structure is provided in the first region R1, the concave structure and / or convex structures typically consist of a plurality of recess structures and / or convex structure. The plurality of recesses and / or protrusions also the period is a regular, it may be irregular. In this specification, each term "cycle" of the "period" and the convex portion of the concave portion, the distance between the centers of the concave portions adjacent and means the center-to-center distance between convex portions adjacent. In Figure 1C, it shows an example in which a plurality of recesses which are arranged at a predetermined period (groove) is provided. The plurality of recesses typically forms a diffraction structure which emits diffracted light when illuminated with white light. In the laminate 10 of the present invention, the period of the concave or convex portion in the first region R1 may be, for example 0.1 [mu] m ~ 3.0 [mu] m. [0032] 　The shape of the cross section perpendicular to the extending direction of the relief structure, eg, V-shaped, U-shaped (sine curve shape), and base and tapered such shape or a rectangular shape. FIG 1C, as an example, the cross-sectional shape depicts the case of a U-shape. [0033] 　Depth or height of the convex portion of the concave portion may be, for example 0.02 [mu] m ~ 1.5 [mu] m. [0034] 　The average value of the ratio of the depth or height to the period of the concave or convex portion (hereinafter, simply referred to as "aspect ratio") is, for example, to 3.0 or less, and typically from 1.0 to 0.15 be able to. [0035] 　Although the uneven structure provided in the first region R1 has been described with reference to FIGS. 1B and 1C, in the present invention, a concave-convex structure provided on the first region R1 is also a structure as shown in FIGS. 9A ~ Figure 11B included. [0036] 　9A is a plurality of linear recesses (grooves), it extends in a first direction, and is a plan view showing a structure period of the recess is not constant schematically, Figure 9B, a IXB-IXB line sectional view of FIG. 9A. In Figure 9A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0037] 　In the structure having a recess period as shown in FIG. 9A is not constant, the period is, but not particularly limited, in the range of 0.1 ~ 3.0 [mu] m, preferably 0.4 ~ 0.7 [mu] m it is possible to vary in the range. [0038] 　The distance between the concave portions adjacent, or 0.1 times the width of the recess, and is preferably 10 times or less. [0039] 　The depth of the recess can be, for example, 0.02 ~ 1.5 [mu] m. [0040] 　The average value of the ratio of the depth to the period of the recess, for example 3.0 or less, and typically may be 1.0 to 0.15. [0041] 　Figure 10A is a recess extending in a first direction (grooves) is a plan view showing a structure arranged randomly schematically, FIG. 10B, XB-XB line sectional view of FIG. 10A it is. In FIG. 10A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0042] 　The shape of each recess, as shown in the right end of FIG. 10A, in plan view, is typically a rectangular, each of the long side and short side is along the first direction and the second direction. Here, the ratio of the length of the long side against short side, is preferably 2 or more. [0043] 　Further, as shown in FIG. 10A, leading to a rectangular recess partially in plan view, it may form a recess polygonal in plan view. In this case, with respect to the outer circumference of the polygon, to the sum of the length of the side along the second direction, it is preferable that the total sum length of the side along the first direction is equal to or greater than 2-fold. Here, the outer periphery of the polygon, the concave portion means a periphery of the recess formed when the cut in the XY plane at the average depth. [0044] 　Figure 11A is a straight recess (groove) is a plan view showing a discontinuous (intermittent) extending Mashimashi to have structural schematically in a first direction, FIG. 11B, XIB in FIG. 11A a -XIB line cross-sectional view. In FIG. 11A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0045] 　In the structure in the second direction, the period of the recesses is in the range of 0.1 ~ 3.0 [mu] m, preferably in the range of 0.4 ~ 0.7 [mu] m, fixed and they may not be constant. [0046] 　The shape of each recess, as shown in FIG. 11A, in plan view, is typically a rectangular, each of the long side and short side is along the first direction and the second direction. Here, the ratio of the length of the long side against short side, is preferably 2 or more. [0047] 　Further, in the first direction, the spacing of the recesses, preferably sufficiently smaller than the recess width (rectangular short side), for example, a 1/2 or less. The lower limit of the recess of the interval is not particularly limited, it may be the ease of manufacture 1/10 or more. [0048] 　The depth of the recess can be, for example, 0.02 ~ 1.5 [mu] m. [0049] 　The average value of the ratio of the depth to the period of the recess, for example 3.0 or less, and typically may be 1.0 to 0.15. [0050] 　In the description with reference to above in FIG. 9A ~ Figure 11B, the extending direction of the recess, although the first direction is not limited thereto, extends in a direction from the first direction to 10 degrees to the left and right it may be. Also, description of recesses and what can be read as a description of the protrusion. [0051] 　Relief structure-forming layer 2, in the second region R2, and a fine uneven structure and / or a flat surface on the main surface of the one. [0052] 　In the example of the laminated body 10 shown in FIG. 1B, the uneven structure is in the second region R2, and extends in a second direction perpendicular to the first direction. In the laminate 10 of the present invention, in the second region R2, the uneven structure is not limited only in the second direction may extend in a direction from the second direction to 65 degrees to the left and right. [0053] 　Further, concavo-convex structure, in the second region R2, is not limited to extending in one direction, if the direction from the second direction or the second direction to 65 degrees to the left and right, extend in two or more directions it may be. Furthermore, the uneven structure is in a plan view, it may be a cross-grating structure (grating structure). Furthermore, the uneven structure may extend discontinuously. [0054] 　Uneven structure is provided in the second region R2, concave structure and / or convex structures typically consist of a plurality of concave structures and / or convex structures. The plurality of recesses and / or protrusions also the period is a regular, it may be irregular. The FIG. 1D, shows an example in which a plurality of recesses which are arranged with a constant period are provided. The plurality of recesses typically forms a diffraction structure which emits diffracted light when illuminated with white light. Period recesses or protrusions in the second region R2 may be, for example 0.1 [mu] m ~ 3.0 [mu] m. [0055] 　The shape of the cross section perpendicular to the extending direction of the relief structure, eg, V-shaped, U-shaped (sine curve shape), and base and tapered such shape or a rectangular shape. The FIG. 1D, as an example, the above sectional shape is painted case is U-shaped. [0056] 　Depth or height of the convex portion of the concave portion may be, for example 0.02 [mu] m ~ 1.5 [mu] m. [0057] 　The aspect ratio of the relief structure is provided in the second region R2 is preferably 1.0 or less, more preferably 0.8 or less, more preferably to 0.5 or less. It is also possible to 2 times the aspect ratio of the relief structure is provided in the first region R1. [0058] 　Although the uneven structure provided in the second region R2 has been described with reference to FIG. 1B and FIG. 1D, in the present invention, a concave-convex structure provided on the second region R2 be structured as shown in FIGS. 12A ~ FIG 14B included. [0059] 　12A is a plurality of linear recesses (grooves), which extends in the second direction, and is a plan view showing a structure period of the recess is not constant schematically, Fig. 12B, a XIIB-XIIB line sectional view of FIG. 12A. In Figure 12A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0060] 　In the structure having a recess period as shown in FIGS. 12A and 12B is not constant, the period is, but not particularly limited, in the range of 0.1 ~ 3.0 [mu] m, preferably from 0.4 to 0 it can range of .7Myuemu. [0061] 　The depth of the recess can be, for example, 0.02 ~ 1.5 [mu] m. [0062] 　The average value of the ratio of the depth to the period of the recess, for example 3.0 or less, and typically may be 1.0 to 0.15. [0063] 　Figure 13A is a recess extending in a second direction (grooves) is a plan view showing a structure arranged randomly schematically, FIG. 13B, XIIIB-XIIIB line sectional view of FIG. 13A it is. In FIG. 13A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0064] 　The shape of each recess, as shown in the lower end of FIG. 13A, in plan view, is typically a rectangular, each of the short and long sides are along the first direction and the second direction. Here, the ratio of the length of the long side to the short side is preferably 1.5 or more. [0065] 　Further, as shown in FIG. 13A, leading to a rectangular recess partially in plan view, it may form a recess polygonal in plan view. In this case, with respect to the outer circumference of the polygon, to the sum of the length of the side along the second direction, it is preferable that the total sum length of the side along the first direction is 1.5 times or more. Here, the outer periphery of the polygon, the concave portion means a periphery of the recess formed when the cut in the XY plane at the average depth. [0066] 　Figure 14A is a linear recess (groove) is a plan view showing a structure in which Mashimashi discontinuously (intermittently) extending in the second direction schematically, FIG. 14B, XIVB in FIG. 14A a -XIVB line cross-sectional view. In Figure 14A, in order to facilitate understanding of the concavo-convex structure, it shows a recess (groove) in black. [0067] 　In the structure in the first direction, the period of the recesses is in the range of 0.1 ~ 3.0 [mu] m, preferably in the range of 0.4 ~ 0.7 [mu] m, fixed and they may not be constant. [0068] 　The depth of the recess can be, for example, 0.02 ~ 1.5 [mu] m. [0069] 　The average value of the ratio of the depth to the period of the recess, for example 3.0 or less, and typically may be 1.0 to 0.15. [0070] 　The shape of each recess, as shown in FIG. 14A, in plan view, is typically a rectangular, each of the short and long sides are along the first direction and the second direction. Here, the ratio of the length of the long side to the short side is preferably 1.5 or more. [0071] 　In the description with reference to above in FIG. 12A ~ FIG 14B, the extending direction of the recess, although the second direction is not limited thereto, extends in a direction from the second direction to 65 degrees to the left and right it may be. Also, description of recesses and what can be read as a description of the protrusion. [0072] 　Moreover, the relief structure-forming layer 2, in the second region R2, may have a flat surface as described below. [0073] 　Figure 15A ~ FIG 17B is a schematic diagram showing a modification of the flat surface provided in the second region R2. In FIG. 15A, 16A, and 17A, it shows a recess in black. [0074] 　15A is a plan view schematically showing a flat surface having a recess, Fig. 15B is a XVB-XVB line sectional view of FIG. 15A. In this example, as shown in FIG. 15A, the outer shape of the recess in plan view, is a square, in the present invention, this not intended to be limited, for example, rectangular, are also included such as a circle. When the outer shape of the recess is rectangular, it is preferable the ratio of the length sides along the first direction with respect to sides along the second direction is 0.66 to 1.5. [0075] 　In the example of FIG. 15A, the period of the recesses adjacent, although not a constant, it may be constant. Here, the period of the recesses adjacent is preferably 0.2μm or more. [0076] 　The depth of the recess, for example, be a 0.1 ~ 5 [mu] m, it may be constant or may not be constant. [0077] 　The average value of the ratio of the depth to the period of the recess, for example 1.0 or less, and typically may be 0.5 or less. [0078] 　Figure 16A is a plan view schematically showing a flat surface having a combination of two recesses, FIG. 16B is a XVIB-XVIB line sectional view of FIG. 16A. [0079] 　In this example, as shown in FIG. 16A, the outer shape of the bottom surface of the concave portion is composed of two square of the difference in size, in part, two squares are polygons constructed overlap there. In the present invention, the outer shape of the bottom surface of the recess, more squares of differences in size, rectangular, and may be composed of a circular combinations. [0080] 　If the part constituting the polygon overlap with respect its periphery, to the sum of the length of the side along the second direction, the sum of the lengths of the sides along the first direction, preferably 0. was 66 to 1.5, more preferably from 1 ×. Here, the outer periphery of the polygon, the concave portion means a periphery of the recess formed when the cut in the XY plane at the average depth. [0081] 　Further, when the outer periphery of the recess is shaped a rounded, etc., it is difficult to measure the length of the side along the first direction and the second direction. In such a case, a portion surrounded by the outer periphery of the recess, spread in a square with a 1/100 area of ​​the area of ​​the portion, thereby, the sum of the length of the side along the first direction and the second direction the may be approximately calculated. [0082] 　Figure 17A is a plan view showing a modified example of FIG. 15A, FIG. 17B is a XVIIB-XVIIB line sectional view of FIG. 17A. [0083] 　In the example shown in FIG. 15A, while the external shape of the bottom surface does not overlap the recess is square, in the example shown in FIG. 17A, it forms a polygon overlap a portion of the recess. In the present invention, the outer shape of the bottom surface of each recess, square well, rectangular, may be circular. [0084] 　If the part constituting the polygon overlap with respect its periphery, to the sum of the length of the side along the second direction, - a first sum of the length of the side along the direction 0.66 1 is preferably .5 times, more preferably 1 times. Here, the outer periphery of the polygon, the concave portion means a periphery of the recess formed when the cut in the XY plane at the average depth. Further, when a shape the outer periphery of the recess is rounded, the portion surrounded by the outer peripheral, spread in a square with a 1/100 area of ​​the area of ​​the portion, thereby, along the second direction side the relative sum of the lengths may be approximately calculated magnification of the sum of the length of the side along the first direction. [0085] 　In the description with reference to the above FIGS. 15A ~ FIG 17B, a description of recesses and what can be read as a description of the protrusion. [0086] 　The film thickness of the relief structure-forming layer 2 may be a 3.0μm or less. In the present specification, the "thickness" of a layer refers to the average value of the distance between the perpendicular foot drawn down on the other surface of each point and the layer on one surface of the layer. [0087] 　Note that the material of the relief structure-forming layer 2, etc., are described in detail in which will be described later. [0088] (First layer) 　The first layer 4 is a layer provided on the relief structure-forming layer 2, rather than the entire surface of the relief structure-forming layer 2, only the second region R2, or one first region R1, It is provided in the parts and the second region R2. In the example of the laminated body 10 shown in Figure 1A, as shown in FIG. 1C and D, the first layer 4 is provided only in the second region R2. [0089] 　The first layer 4, as shown in FIG. 1C and D, has a shape corresponding to the surface shape of the relief structure-forming layer 2. [0090] 　The first layer 4 can be a variety of layers depending on the application of the laminate 10. For example, in the case of using the laminated body 10 to the optical element, the first layer 4 can be a reflective layer. Further, in the case of using the laminated body 10 to the electronic circuit, the first layer 4 can be a conductive layer. [0091] 　Thickness of the first layer 4, the uneven structure of the relief structure-forming layer 2 may be variously changed depending on the application of the laminate 10. For example, in the case of using the laminate 10 as an optical element, the first layer 4 can be used as the reflective layer, the relief structure, the reflectance may be appropriately selected in consideration of the optical effects and the like. Thickness of the first layer 4, in the case of forming a reflective layer using aluminum, may be about 20 nm ~ 200 nm. [0092] 　In the case of using a laminate 10 as the electronic circuit, the first layer 4 can be a circuit conductive layer may be appropriately selected in consideration of the resistance value and the like. In the case of forming the conductive layer for the circuit using aluminum may be about 40 nm ~ 300 nm. [0093] 　Note that the like of the first layer 4 materials are described in detail in which will be described later. [0094] (Second layer) 　is laminated body 10 of the present invention may comprise a second layer, in this case, the second layer is disposed so as to cover at least the first layer 4. The second layer may have a surface shape corresponding to the surface shape of the relief structure-forming layer 2, may not have. [0095] 　The film thickness of the second layer, resulting variously vary depending on the application of the laminated body 10, for example, in the case of using the laminate 10 as an optical element, can be about 10 nm ~ 300 nm. In the case of using a laminate 10 as an electronic circuit can be about 10 nm ~ 300 nm. [0096] 　Note that the materials of the second layer are described in detail in which will be described later. [0097] 　Laminate 10 described above comprises a first layer 4 with high positional accuracy. Therefore, the laminated body 10, for example, may be used an optical element, as a member such as an electronic circuit. [0098] 　Next, a method for manufacturing a laminated body according to the first embodiment of the present invention. [0099] 　Method for manufacturing a laminated body according to the first embodiment of the present invention, an uneven structure extending in the direction of (a) in plan view, up to 10 degrees to the left and right from the first direction or a first direction a first region having, in plan view, the first having a second direction or uneven structure and / or a flat surface that extends in a direction from the second direction to 65 degrees to the left and right perpendicular to the first direction forming a relief structure-forming layer and a second region, by depositing (b) the first and second regions of the relief structure-forming layer, the first material different from the material of the relief structure-forming layer , forming a first material laminate having a surface shape corresponding to the surface shape of the relief structure-forming layer, in (c) vapor deposition apparatus, wherein the first direction described in step (a) the as first conveying direction of the material laminate are matched, the first material laminate Placing a, (d) conveys a first material laminate the arranged, said first material from an oblique direction with respect to a plane that is deposited in the first material of the first material laminate the second material which differs by vapor deposition, forming a second material laminate, (e) a second material laminate, exposure to reactive gases or liquid reacts with the first material, wherein forming only the second region of the relief structure-forming layer, or provided on a part and a second region of the first region, a first layer, a laminate comprising a second layer in this order, ( and removing the second layer from the laminate formed in f) step (e). [0100] 　Hereinafter, with reference to FIG. 2 (a) ~ (f), a method for manufacturing a laminated body according to the first embodiment of the present invention. [0101] 　FIGS. 2 (a) ~ (f) are schematic sectional views sequentially showing each step of a method for manufacturing a laminated body shown in FIG. 1A, FIG. 2 (a), forming a relief structure-forming layer 2 is a cross-sectional view illustrating a step, FIG. 2 (b) is a sectional view illustrating a step of forming a first material laminate 20, FIG. 2 (c), placing the first material laminate 20 is a cross-sectional view illustrating a step, FIG. 2 (d) are cross-sectional views illustrating a step of forming a second material laminate 30, FIG. 2 (e) a second region of the relief structure-forming layer 2 a first layer 4 'to R2, a cross-sectional view illustrating a step of forming a laminate 40 that are sequentially formed and the second layer 6, FIG. 2 (f) the laminate 40 shown in FIG. 2 (e) from a cross-sectional view illustrating a step of removing the second layer 6. Incidentally, FIG. 2 (f) corresponds to Fig 1D. [0102] (Step (a)) 　First, as shown in FIG. 2 (a), to form the relief structure-forming layer 2 having a main surface including a first region R1 spare second region R2. [0103] 　Relief structure-forming layer 2 has in the first region R1, in plan view, the concavo-convex structure extending in the direction from the first direction or the first direction until 10 degrees to the left and right. In the second region R2, in plan view, the second direction or uneven structure and / or a flat surface that extends in a direction from the second direction to 65 degrees to the left and right perpendicular to the first direction a. For more information about the uneven structure in the first region R1 and the second region R2, it is as described in the section above of (relief structure-forming layer). [0104] 　Relief structure-forming layer 2, for example, can be formed by pressing a mold provided with minute projections on the resin. The shape of these protrusions, corresponding to the shape of the recess provided in the first region R1 and / or the second region R2. [0105] 　Relief structure-forming layer 2, for example, a thermoplastic resin is applied onto a substrate, the above the original plate protrusions are provided (mold) thereto, be formed by a method of pressing while applying heat good. Examples of the thermoplastic resin, for example, acrylic resins, epoxy resins, cellulose resins, vinyl resins, mixtures thereof, or can use these copolymer. [0106] 　Alternatively, the relief structure-forming layer 2, a thermosetting resin is applied onto a substrate, heat is applied while pressing the original plate which the above convex portions are provided, then, formed by a method of removing the original it may be. In this case, the thermosetting resin, for example, urethane resins, melamine resins, epoxy resins, phenolic resins, mixtures thereof, or can use these copolymer. Incidentally, the urethane resin is, for example, a reactive hydroxyl group having acrylic polyols and polyester polyols, the addition of polyisocyanate as a crosslinking agent, obtained by crosslinking them. [0107] 　Alternatively, the relief structure-forming layer 2, a radiation curable resin is applied on a substrate, which is irradiated with radiation such as ultraviolet rays to cure the material while pressing the original plate to, then, formed by a method of removing the original it may be. Alternatively, the relief structure-forming layer 2, pouring the composition between the substrate and the original, the radiation is allowed to cure the material, then it may be formed by a method of removing an original. [0108] 　Radiation curable resin typically contains a polymerizable compound and an initiator. [0109] 　As the polymerizable compound, for example, it can be used photoradical polymerization compound. As the photoradical polymerization compound; for example, a monomer having an ethylenically unsaturated bond or an ethylenically unsaturated group, oligomers or polymers can be used. Alternatively, a photo-radical polymerization compound; 1,6-hexanediol, neopentyl glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, pentaerythritol pentaacrylate and dipentaerythritol hexaacrylate monomers such as epoxy acrylates, oligomers such as urethane acrylate and polyester acrylate, or may be used polymers such as urethane-modified acrylic resin and an epoxy-modified acrylic resin. [0110] 　When using the photo-radical polymerization can be compound as the polymerizable compound, as the initiator, it is possible to use a photo-radical polymerization initiator. As the photo-radical polymerization initiator, such as benzoin, benzoin-based compounds such as benzoin methyl ether and benzoin ethyl ether, anthraquinone compounds such as anthraquinone and methylanthraquinone, acetophenone, diethoxyacetophenone, benzophenone, hydroxyacetophenone, 1-hydroxy phenyl ketone, alpha-aminoacetophenone and 2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-phenyl ketone compounds such as on, benzyl dimethyl ketal, thioxanthone, acylphosphine oxide, or Michler's ketone it can be used. [0111] 　Alternatively, the polymerizable compound may be used photo-cationic polymerization compound. The optical cationic polymerization compound; for example, monomers with an epoxy group, oligomers or polymers, oxetane skeleton-containing compound, or can be used vinyl ethers. [0112] 　When using the cationic photopolymerization capable compound as the polymerizable compound, as the initiator, it is possible to use an optical cationic polymerization initiator. As the cationic photopolymerization initiator, for example, it can be used aromatic diazonium salts, aromatic iodonium salts, aromatic sulfonium salts, aromatic sulfonium salts, aromatic phosphonium salts or mixed ligand metal salts. [0113] 　Alternatively, the polymerizable compound may be used a mixture of a photo-radical polymerization compound capable and photo-cationic polymerization compound. In this case, as the initiator, for example, it can be used a mixture of a photo-radical polymerization initiator and a cationic photopolymerization initiator. Alternatively, in this case, it may be used a polymerization initiator capable of functioning both as an initiator of radical photopolymerization and cationic photopolymerization. Examples of such initiators include, for example, can be used aromatic iodonium salt or aromatic sulfonium salt. [0114] 　The ratio of the initiator to total radiation curable resin, for example, be in the range of 0.1 to 15 wt%. [0115] 　Radiation curable resin, sensitizing dyes, dyes, pigments, polymerization inhibitors, leveling agents, antifoaming agents, anti-sagging agents, adhesion improvers, coating surface modifiers, plasticizers, nitrogen-containing compounds, crosslinking of the epoxy resin agent, may further comprise a release agent or a combination thereof. Further, the radiation curable resin, in order to improve its moldability, may further contain a non-reactive resin. As the non-reactive resin, for example, you can use the above thermoplastic resin and / or thermosetting resin. [0116] 　The above precursor for use in the formation of the relief structure-forming layer 2, for example, can be produced by means of an electron beam lithography system or nanoimprint apparatus. In this way, it is possible to form a plurality of recesses or high accuracy protrusions described above. In the present invention, the uneven structure provided on the relief structure-forming layer 2, 4 [mu] m 2 ~ 10000 2 can be repeatedly face with the structure of the unit structure of the area. In this case, it is possible to use repeated pattern to form a unitary structure, it is possible to greatly reduce the amount of data to be used for drawing. [0117] 　Relief structure-forming layer 2, typically includes a substrate and a resin layer formed thereon. As the base material, typically, it can be used a film substrate. As the film substrate, for example, it may be used polyethylene terephthalate (PET) film, a plastic film such as polyethylene naphthalate (PEN) films and polypropylene (PP) film. Alternatively, as the substrate, paper, synthetic paper, it may be used plastic multilayer sheet or a resin impregnated paper. In addition, the substrate may be omitted. For example, if the relief structure-forming layer 2 itself is a film molded body, it is possible to omit the substrate. [0118] 　Resin layer is formed, for example, by the method described above. The thickness of the resin layer may be, for example, a 0.1μm or in the range of 10 [mu] m. When the thickness is excessively large, formation of the protrusion of the resin and / or wrinkles due to pressurization at the time of processing is likely to occur. When the thickness is excessively small, there are cases where formation of the desired concave structure and / or convex structures becomes difficult. The thickness of the resin layer, or larger than equal to the depth or height of the recesses or projections to be provided on the main surface. This thickness, for example, in the range of 1 to 10 times the depth or height of the concave or convex portion, typically can be converted into their 3 to within a range of 5 times. [0119] 　Note that the relief structure of the relief structure-forming layer 2 (uneven structure) formed, for example, Patent No. 4194073 No. "pressing method" disclosed in Japanese is disclosed in Japanese Patent Utility Model Registration No. 2524092 "casting" , or it may be carried out using the "photopolymer method" disclosed in JP 2007-118563. [0120] (Step (b)) 　Next, as shown in FIG. 2 (b), the first region R1 and the second region R2 of the relief structure-forming layer 2, a first material that differs from the relief structure-forming layer 2 material It was deposited, on the relief structure-forming layer 2, to form a first material layer 4 'having a surface shape corresponding to the surface shape of the relief structure-forming layer 2. Thereby forming a first material laminate 20. [0121] 　As a method of depositing the first material may be a known coating method or a vapor deposition method capable of depositing the first material so as to correspond to the surface shape of the relief structure-forming layer 2. As the coating method, for example, a spray coating. The vapor deposition method includes, for example, vacuum deposition, sputtering, chemical vapor deposition (CVD) method. In particular, the deposition of the first material, it is preferable to use a vapor deposition method by later-described steps (c) and (d). This can be achieved by using the vapor deposition method, density portion is generated in the first material layer 4 '', in the later-described step (e), the first layer 4 and second layer 6 in the first region R1 This is because the selective removal is made easier. [0122] 　The first material is deposited so as to correspond to the surface shape of the relief structure-forming layer 2. Accordingly, the first material layer is formed by deposition of the first material 4 '' has a surface shape corresponding to the surface shape of the relief structure-forming layer 2. Further, the deposition of the first material is preferably carried out at a uniform density on plane direction parallel to the main surface of the relief structure-forming layer 2. Specifically, the deposition, the amount of the ratio of the first material at the location of the first region R1 to the area of ​​the apparent first region R1, to the area of ​​the apparent second region R2 of the second region R2 and the ratio of the amount of the first material in position is preferably carried out to be equal. [0123] 　The first material is a material which differs from the relief structure-forming layer 2 material. [0124] 　The first material may be appropriately selected materials used depending on the application of the laminate. [0125] 　For example, in the case of using the laminate the optical element, it is possible to use a material suitable for the reflective layer as the first material. In this case, it is preferable that the difference in refractive index between the relief structure-forming layer 2 material is a material is 0.2 or more. If this difference is small, the reflection at the interface between the first layer 4 to be described later relief structure-forming layer 2 may become difficult to occur. [0126] 　Further, in the case of using the laminate to the electronic circuit, the first material can be a material suitable for the conductive layer of the circuit. [0127] 　Examples of such first material, Al, Sn, Cr, Ni, Cu, Au, a metal such as Ag, as well as compounds of these metals and at least one metal material selected from the group consisting of alloys it can be mentioned. Here, the compound of the metal, means a compound comprising a metal oxide, a metal element such as a metal sulfide. [0128] 　Suitable materials for the reflective layer may be used as the first material ceramic material or organic polymeric materials listed below is relatively high transparency. [0129] 　That is, as the ceramic material, for example, Sb 2 O 3 , Fe 2 O 3 , TiO 2 , CdS, CeO2, ZnS, PbCl 2 , CdO, WO 3 , SiO, Si 2 O 3 , an In 2 O 3 , PbO, Ta 2 O 3 , Ta 2 O 5 , ZnO, ZrO 2 , MgO, SiO 2 , Si 2 O 2 , MgF 2 , CeF 3 , CaF 2 , AlF 3 , Al 2 O 3 , silicon oxide (SiO x, 1 . Specifically, in step (a), the first region R1 spare second region R2, to form a relief structure-forming layer to have a desired irregular structure, then, step a (b) ~ (f) it may be performed. [0198] 　According to this manufacturing method, as in the laminate 10 according to the second embodiment, the second region, even if the groove direction, period, providing a plurality of sub-regions with varying depth, etc., the first layer can be selectively provided to these sub-regions. [0199] Third Embodiment 　Next, a third embodiment of the present invention. [0200] 　Laminate according to the present embodiment is characterized in the first embodiment, in that both the first region and the second region comprises a plurality of sub-regions. Here, between the sub-region differs, the extending direction of the concavo-convex structure, period, or at least one depth (height) which varies. [0201] 　Figure 6 is a schematic plan view showing a laminate 10 according to the third embodiment of the present invention. In the multilayer body 10 shown in FIG. 6, the first and second regions each include two sub-regions. [0202] 　In the multilayer body 10 shown in FIG. 6, the first region is extending direction is the same, including the period, depth, and two subregions aspect ratio has an uneven structure that is different. Specifically, extend in a first direction, period 600 nm, depth 150 nm, the first sub-region R1-1 aspect ratio has an uneven structure is 0.25, extending in a first direction and Mashimashi includes period 400 nm, depth 400 nm, and a first sub-region R1-2 aspect ratio has an uneven structure is 1.00. [0203] 　In the present embodiment, not limited to the extending direction of the concavo-convex structure shown in FIG. 6, as described in the first embodiment, the first region (first subregion) is extending directions of the concavo-convex structure, the 1 direction or the first direction may be a direction of up to 10 degrees to the left and right. The period of the concavo-convex structure, a depth, for the aspect ratio, can be employed those described in the first embodiment. [0204] 　In Figure 6, the second region comprises two sub-regions having a relief structure extending direction are different. Specifically, the second sub-region R2-1 having a concavo-convex structure extending in the direction of 45 degrees to the right (+ 45 °) with respect to the second direction with respect to the second direction Te and a second sub-region R2-2 having a concavo-convex structure extending in the direction of 45 degrees to the left (-45 °). [0205] 　In the present embodiment, not limited to the extending direction of the concavo-convex structure shown in FIG. 6, as described in the first embodiment, in the second region (second subregion), the extending direction of the concavo-convex structure, the the second direction or the second direction may be a direction up to 65 degrees to the left and right. [0206] 　Further, in FIG. 6, in the second region, but the direction of extension of the uneven structure is illustrated a sub-region differs, in the present embodiment, the extending direction of the concavo-convex structure, the period or depth, (high at least one is) may include a sub-region differs. [0207] 　Further, in FIG. 6, both the first region and the second region, but includes two sub-areas is not limited to two, but may include three or more sub-regions. [0208] 　In the present invention, like the laminate 10 shown in FIG. 6 may be the depth of the concavo-convex structure provided on the sub-region R1-2. Thus, the adhesion of the upper and lower layers sandwiching the uneven structure is improved by the anchor effect (wedge effect). It is also possible to obtain the same anchoring effect by the cross-sectional shape as the rectangular without using an uneven structure of a high aspect ratio. [0209] 　In the laminate 10 of the present invention, by providing a structure having such an anchor effect partially, it is also possible to secure high adhesion. [0210] 　The laminate 10 according to the third embodiment can be manufactured by the method described in the above . Specifically, in step (a), the first region R1 spare second region R2, to form a relief structure-forming layer to have a desired irregular structure, then, step a (b) ~ (f) it may be performed. [0211] Fourth Embodiment 　Next, a fourth embodiment of the present invention. [0212] 　Laminate according to the present embodiment, like the third embodiment, includes a plurality of sub-regions in the first region and the second region. Here, in the sub-region which are different, the extending direction of the concavo-convex structure, period, or at least one depth (height) which varies. [0213] 　Figure 7 is a schematic plan view showing a laminate 10 according to the fourth embodiment of the present invention. [0214] 　In the laminate 10 shown in FIG. 7, the first region includes the period, and the two sub-regions having an aspect ratio has an uneven structure that is different. Specifically, the first sub-region R1-3 extends in a first direction, period 600 nm, depth 150 nm, the diffractive structure whose aspect ratio has a cross-sectional shape of a sine curve, which is 0.25 to form a picture of the star, including. The first sub-region R1-4 extends in a first direction, period 750 nm, depth 150 nm, a pattern of the sun aspect ratio comprises a diffractive structure having a cross-sectional shape of a sine curve, which is 0.20 It is formed. [0215] 　The second region includes two sub-regions having a relief structure extending direction are different. Specifically, the second sub-region R2-1 having a concavo-convex structure extending in the direction of 45 degrees to the right (+ 45 °) with respect to the second direction with respect to the second direction Te and a second sub-region R2-2 having a concavo-convex structure extending in the direction of 45 degrees to the left (-45 °). [0216] 　In the present embodiment, the extending direction of the concavo-convex structure, period, depth, and the aspect ratio is not limited to the example shown in FIG. 7, it can be employed those described in the first embodiment. [0217] 　Incidentally, in the laminate 10 shown in FIG. 7, the first region (first subregion), the first layer is removed. Therefore, in the first region, the material of the first layer it is also possible to obtain a diffraction effect in the first sub-region by providing a third layer made of a high refractive index material which is different. Specifically, aluminum is used as the material of the first layer, when using a high high-refractive index material transparent zinc sulfide as the material of the third layer, the second sub-region R2-1 and R2-2 In bright light diffracted by the aluminum was observed, the first sub-region R1-3, it is possible to obtain a highly transparent diffracted light by zinc sulfide in R1-4. [0218] 　The laminate 10 according to the fourth embodiment can be manufactured by the method described in the above . Specifically, in step (a), the first region R1 spare second region R2, to form a relief structure-forming layer to have a desired irregular structure, then, step a (b) ~ (f) it may be performed. Incidentally, in the case where the third layer, the first and second regions the entire surface of the first layer side of the laminate 10 obtained in the step (f) so that the material of the third layer to the desired thickness deposition may be. [0219] 　As a method for depositing a material of the third layer, it may be a known coating method or a vapor deposition method. As the coating method, for example, it can be used coating methods such as spray coating. The vapor deposition method can be used vacuum deposition method, a sputtering method, a vapor deposition method such as chemical vapor deposition (CVD). [0220] 　The material of the third layer, it is possible to use zinc sulfide, a highly transparent high refractive index material such as titanium oxide. [0221] Fifth Embodiment 　Next, a fifth embodiment of the present invention. [0222] 　This embodiment has in the first embodiment, a portion of the first region of the relief structure-forming layer, the first layer, the second layer, the etching mask layer is characterized in that included in the order. [0223] 　8A is a laminate 10 according to the fifth embodiment is a plan view schematically illustrating, FIG. 8B is a VIIIB-VIIIB line sectional view of FIG 8A. [0224] 　As shown in FIG. 8A, the first region includes star and the first region R1-5 and R1-6 crescent each have a concavo-convex structure extending in the first direction, the second region R2 has an uneven structure extending in a second direction. [0225] 　Further, the laminated body 10 shown in FIG. 8A, as shown in FIG. 8B, the relief structure-forming layer 2, a first layer 4 in the second region R2 and the first region R1-6, the first region R1-6 and a second layer 6 and the etching mask layer 8 in this order. [0226] 　In the present embodiment, not limited to the extending direction of the concavo-convex structure shown in FIG. 8A, also include the direction described in the first embodiment. The period of the concavo-convex structure, a depth, for the aspect ratio, can be employed those described in the first embodiment. [0227] 　In the laminate 10 according to this embodiment, it is possible to maintain the shape of the etching mask layer 8 as separate information. This is because the shape of the etching mask layer 8 is formed by closely related to the pattern of the relief structure-forming layer, to rewrite the individual information because it is very difficult. Thus, laminate 10 of the present embodiment exhibits high tamper prevention effect. [0228] 　The method for producing a laminate 10 according to the fifth embodiment, first, of the method described with reference to FIG. 2, FIGS. 2 (a) corresponds to the through Figure 2 (d) step (a) - step forming a second material laminate 30 by performing the (d). Then, by depositing a material of the etching mask layer 8 at a predetermined position of the first region, an etching mask layer 8. [0229] 　Installation of the etching mask layer 8 is, known printing methods, can be performed by photolithography or the like. The material of the etching mask layer 8, for example, a thermoplastic resin, a thermosetting resin or a radiation-curable resin can be used. Further, in the material, in order to improve the design and forgery prevention performance, colorant, fluorescent pigments are special pigments for security, the functionality of pigments such as phosphorescent pigments may be added. [0230] 　Then, the laminated body 10 with an etching mask layer 8 is exposed to the reactive gas or liquid reacting with the first material constituting the first material layer 4 ''. Some R1-5 of the first region, whereas the gap is generated in the second material layer 6 ', in the second region R2, mostly for the gap is not present, a portion of the first region R1-5 in easily etched than the second region R2. Further, as shown in FIG. 8B, the portion of the first region R1-5, no etching mask layer 8 is formed, in part R1-6 of the first region, is formed an etching mask layer 8 to have, R1-5 part of the first region is likely to be etched than the part R1-6 of the first region. [0231] 　Therefore, by adjusting the reactive gas or liquid concentration and temperature as well as the etching processing time, etc., it can be a first layer 4 and the second layer 6 is removed in R1-5 portion of the first region. [0232] 　Finally, to remove the second layer in the second region R2 from the laminate obtained by etching. [0233] 　As a method for removing the second layer, for example, a laminate obtained by the etching process of exposing the reactive gas or liquid to react only with a second material constituting the second layer 6. [0234] 　In some R1-6 of the first area, because it is provided with an etching mask layer 8, the remaining without being removed by etching. [0235] 　Thus, it is possible to obtain a laminate 10 according to the fifth embodiment as shown in FIGS. 8A and 8B. [0236] 　Thus, the method for producing a laminate 10 according to the first embodiment, more complex patterning of the first layer is made possible by combining the known printing method for forming an etching mask layer 8, and the like. [0237] 　Various embodiments described in the above may be applied in combination. [0238] 　The laminate of the present invention may be used as part of the adhesive label. The adhesive label includes a stack, a provided on the rear surface of the laminate adhesive layer. [0239] 　Alternatively, the laminate of the present invention may be used as part of a transfer foil. The transfer foil comprises a laminate, and a support layer which is releasably supported laminate. [0240] 　The laminate of the present invention may be used by supporting the article. For example, the laminate of the present invention may be supported on a plastic card. Alternatively, the laminate of the present invention may be used crowded plow on paper. The laminate of the present invention, by crushing the flake, may be used as a component of the pigment. [0241] 　The laminate of the present invention may be used for purposes other than forgery prevention. For example, toys, learning material, ornaments, can also be used as an electronic circuit. Example [0242] 　Hereinafter is a description of specifics of the present invention by showing Examples, the present invention is not limited to the following Examples. [0243] 　 　(Example 1) 　was first prepared ink composition shown below as a raw material of "relief structure-forming layer '. [0244] "Relief structure-forming layer ink composition" (ultraviolet curable resin) 　urethane acrylate 50.0 parts by mass (manufactured by Hitachi Chemical Co., Hitaloid 7903: multifunctional) 　Methyl ethyl ketone 30.0 parts by mass 　Ethyl acetate 20.0 parts by mass 　photoinitiator (Ciba Specialty Irgacure 184) 1.5 parts by weight [0245] 　On a support consisting of a transparent polyethylene terephthalate (PET) film having a thickness of 23 .mu.m, was coated by a gravure printing method to a dry film thickness of 1μm to "relief structure-forming layer ink composition". [0246] 　Then, by using a roll photopolymer method, the to the coated surface, the desired cylindrical precursor having a "first region" and "second region" having an uneven structure, 2 Kgf / cm 2 press pressure of, 80 ℃ of press temperature, was carried out the molding process by pressing by a press speed of 10m / min. [0247] 　Forming at the same time, from the PET film side, with ultraviolet exposure of 300 mJ / cm @ 2 using a high-pressure mercury lamp, and cured. [0248] 　As described above, the "first area", has a depth 120 nm, a wave plate structures of the period 700 nm, the "second area", has a depth 120 nm, a wave plate structures of the period 700 nm, the first the direction of extension of the corrugated structure in the region, and to obtain a relief structure-forming layer are orthogonal direction of extension of the corrugated structure in the second region. [0249] 　Then, a film conveying direction of the roll-type vacuum vapor deposition machine, and a direction of extension of the corrugated structure in the first region is disposed in parallel to become (matching) depositing machine the relief structure-forming layer as. Thereafter, as smooth planar portion a thickness of 70 nm, an aluminum as the first material on the entire surface of the relief structure-forming layer to form a first material laminate by depositing vacuum oblique. [0250] 　Furthermore, a film conveying direction of the deposition machine, and the first material laminate is arranged to roll vacuum deposition machine as the direction of extension of the corrugated structure in the first region are parallel. Thereafter, as the smooth flat portion a thickness of 50 nm, and the silicon oxide as the second material to form a second material laminate by depositing vacuum oblique to the first material layer over the entire surface of the first material laminate. [0251] 　Then, the second material laminate mass concentration 45 ° C. in a 1.5% sodium hydroxide aqueous solution, and immersed for 1 minute, the aluminum layer only in the second region of the relief structure-forming layer (first layer) and silicon oxide was obtained (second layer) sequentially including laminate. [0252] 　Thereafter, in order to protect the first layer and the second layer which is patterned by etching, it covered these layers in the coating layer. More specifically, the entire surface of the first layer and the second layer side was patterned by etching, after applying by bar coating printing method "coating layer ink composition" below, and dried for 1 minute at 120 ° C. oven , by forming a coating layer with a dry thickness of 2 [mu] m, to obtain a laminate. [0253] "Coating ink composition" 　VCVAC resin 50.0 parts by 　methyl ethyl ketone 30.0 parts by mass 　Ethyl acetate 20.0 parts by mass [0254] 　(Example 2) 　a second region of the relief structure-forming layer "region 2-1", "area 2-2", divided into three sub-regions of "area 2-3", the structure of each region below to obtain a laminate in the same manner as in example 1 except that provided as. [0255] 　"Area 2-1": extend in a direction forming a 25 ° relative to the film transport direction of the deposition machine, depth 120 nm, corrugated structures of the periodic 700nm 　"area 2-2": deposition processing machine It extends in a direction forming a 70 ° relative to the film transport direction, depth 120 nm, corrugated structures of the periodic 700nm 　"area 2-3": direction forming an 90 ° relative to the film transport direction of the deposition machine extends, depth 120 nm, corrugated structures of the periodic 700nm [0256] 　(Example 3) 　the first region of the relief structure-forming layer "region 11", is divided into two sub-regions of "area 1-2", the embodiment except that the structure of each region is provided as follows to obtain a laminate in the same manner as example 2. [0257] 　"Area 1-1": extends in the film transport direction of the deposition machine, depth 120 nm, corrugated structures of the periodic 700nm 　"area 1-2": 5 ° relative to the film transport direction of the deposition machine It extends in a direction forming a depth 120 nm, corrugated structures of the periodic 700nm [0258] 　(Example 4) 　"area 2-1", "area 2-2", in the same manner as in Example 3 except that the period of the corrugated structure and 1000nm in the three sub-regions of "area 2-3" to obtain a laminate. [0259] 　(Example 5) 　"area 1-1" to obtain a laminated body in the same manner as in Example 3 except that the period of the corrugated structure was 1000nm in the two sub-regions of "area 1-2". [0260] 　(Example 6) 　a first region of the relief structure-forming layer, depth 120 nm, a corrugated plate structure period 700 nm, ± grooves of the corrugated plate structure (recess) of the film conveying direction of the deposition machine 10 a cross grating structure extending in two directions °, the second region of the relief structure-forming layer, depth 120 nm, a corrugated plate structure period 700 nm, groove (concave portion) is deposited processing corrugated structure except that the cross-grating structure extending in two directions of 80 ° and 90 ° relative to the film transport direction of the machine is to obtain a laminate in the same manner as in example 1. [0261] 　(Example 7) 　a first region of the relief structure-forming layer, extends to the film transport direction of the deposition machine, depth 170 nm, a corrugated plate structure period 650 nm, a second region of the relief structure-forming layer extends in a direction perpendicular to the film conveying direction of the deposition machine to obtain a laminated body by a depth 170 nm, the same method as in example 1 except for using corrugated structure of the period 650 nm. [0262] 　(Example 8) 　a first region of the relief structure-forming layer, extends to the film transport direction of the deposition machine, depth 130 nm ~ 165 nm, the period is a scattering structure having a corrugated structure of 230 nm ~ 400 nm , the second region of the relief structure-forming layer, and a scattering structure extends in a direction perpendicular to the film conveying direction of the deposition machine, which depth is 130 nm ~ 165 nm, the period has a corrugated plate structure of 230 nm ~ 400 nm to obtain a laminate in the same manner as in example 1 except for using. [0263] 　(Example 9) 　a first region of the relief structure-forming layer, extends to the film transport direction of the deposition machine, depth 170 nm, a corrugated plate structure period 650 nm, a second region of the relief structure-forming layer extends in a direction perpendicular to the film conveying direction of the deposition machine, depth 130 nm ~ 165 nm, the same method as in example 1 except for using scattered structure period has a corrugated plate structure of 230 nm ~ 400 nm to obtain a laminate by. [0264] 　 　for Examples 1-9 were evaluated as follows. [0265] 　(First layer Evaluation of selective removal) 　About the obtained layered product in Example 1-9, the first layer in the first region (aluminum layer) is not removed, the first layer in the second region ( or aluminum layer) is removed (hereinafter, referred to as "selective removal of the first layer") was evaluated for. Specifically, the visible light transmittance of the part corresponding to the "first region" and "second region" of the laminate was measured and evaluated based on the following criteria. [0266] 　Visible light transmittance of the part corresponding to the "first region" of the stack is greater than 90%, and, what visible light transmittance of the part corresponding to the "second region" is 20% or less "○ and (Good) ", it was something other than it" × (Insufficient) ". [0267] 　The results are shown in Table 1 below. [0268] 　(First layer position accuracy evaluation) 　About the obtained layered product in Example 1-9 were evaluated for position accuracy of the first layer. Specifically, for each stack, the positional accuracy of the first layer, to measure the maximum value of the shortest distance between the boundary and the outline of the first layer of the "first region" and "second region", the following It was evaluated based on the criteria. [0269] 　If you are misaligned of less than 20 microns as "○ (Good)", if you are misaligned more than 20 microns was "× (Insufficient)". [0270] 　The results are shown in Table 1 below. [0271] [Table 1] [0272] 　In Table 1, "aspect ratio" means an average value of the ratio of the depth to the period of the grooves. [0273] 　As can be seen from Table 1, both resulting laminates in Examples 1-9, the visible light transmittance in the first region exceeds 90%, the visible light transmittance of 20% or less in the second region . As a result of observation of the appearance of the laminate, in the second region, the first layer without being partially removed, it was completely remained. Thus, the laminate obtained in Examples 1-9, it can be said that had the positional accuracy of the selective removal and the first layer of good first layer. [0274] 　As described above, the laminate obtained in Examples 1-9 is excellent in both the selective removal and positioning accuracy of the first layer of the first layer. [0275] 　Further, according to the method for producing a laminate of the present invention, the aspect ratio of the relief structure-forming layer, if it is equal in the first and second regions (Examples 1 to 3 and 6 to 8), or the first even if greater in the second region than the region (examples 5 and 9), it is possible to selectively remove the first layer from the first region. It utilizes the difference in the aspect ratio in the region of the first region and the second region, the conventional can leave the first layer only in the region having a smaller concavo-convex structure of the aspect ratio (the metal reflective layer) in a way that it does not give form. [0276] 　The laminate of Example 8, compared to the normal 0.1-0.3 about an aspect ratio used for the diffraction grating, the aspect ratio is high and from 0.41 to 0.57. Such a high aspect ratio relief structure, a lens such as a prism structure or for that can be the scattering structure for scattering light in a specific direction, and can leave the first layer to the structure, the degree of freedom of the design , it can be applied to the laminate in various applications. [0277] 　Furthermore, the present invention does not necessarily require a convex structure of high aspect ratio, it is possible to reduce the thickness of the final product, also has an advantage such as to a low cost. DESCRIPTION OF SYMBOLS [0278] 2 relief structure-forming layer 4 first layer 6 the second layer 10 stack WE CLAIM [Claim 1]　A relief structure-forming layer having a major surface comprising a first and a second region, the first layer provided on a part and a second region of the only in the second region of the relief structure-forming layer, or the first region a laminate comprising, 　the relief structure-forming layer, in plan view, a first region having a concave-convex structure extending in the direction from the first direction or the first direction until 10 degrees to the left and right, in plan view, and a second region having a second direction or uneven structure and / or a flat surface that extends in a direction from the second direction to 65 degrees to the left and right perpendicular to the first direction, 　the first layer comprises a first material which differs from the material of the relief structure-forming layer, characterized in that it has a surface shape corresponding to the surface shape of the relief structure-forming layer, laminate. [Claim 2] 　The second region includes a plurality of sub-regions, 　between the sub-region, the direction of extension of the concave-cycle, or at least one of the depth / height is characterized in that different, in claim 1 laminate according. [Claim 3] 　The first region includes a plurality of sub-regions, 　between the sub-region, the direction of extension of the concave-cycle, or at least one of the depth / height is characterized in that different, according to claim 1 or laminate according to 2. [Claim 4] 　The second region is characterized by having a cross-grating structure is a concave-convex structure extending in more than one direction, the laminated body according to any one of claims 1 to 3. [Claim 5] 　The first region is characterized by having a cross-grating structure is a concave-convex structure extending in more than one direction, the laminated body according to any one of claims 1 to 4. [Claim 6] 　Characterized in that it comprises a second layer covering at least the first layer, the laminated body according to any one of claims 1 to 5. [Claim 7] 　Characterized in that it comprises an etching mask layer on the second layer included in a portion of the first region of the relief structure-forming layer laminate according to claim 6. [8.] 　Said first material, Al, Sn, Cr, Ni , Cu, Au, Ag metal, compounds of these metals and alloys, Sb 2 O 3 , Fe 2 O 3 , TiO 2 , CdS, CeO 2 , ZnS, PbCl 2 , CdO, WO 3 , SiO, Si 2 O 3 , an In 2 O 3 , PbO, Ta 2 O 3 , Ta 2 O 5 , ZnO, ZrO 2 , MgO, SiO 2 , Si 2 O 2 , MgF 2 , CeF 3 , CaF 2 , AlF 3 , Al 2 O 3 , silicon oxide (SiO x, 1