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"Memory Device With Reduced Leakage Current"

Abstract: The present invention describes a novel technique for reducing the bitline leakage current and at the same time, maintaining a level of performance characteristics of low threshold voltage transistors in deep submicron CMOS technology. The present invention incorporates the reference voltage generator circuit in compination with bias transistor MBIAS for reducing the leakage current to a negligible level along with improved performance. The output of the static logic gate is connected to the inpudt terminal (i.e.gate terminal) of the pull-down devices. This helps in reducing the leakage current through pull-down devices whenever a read operation is not performed. This results in significant reduction in overall leakage current in the circuit

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Patent Information

Application #
Filing Date
30 December 2004
Publication Number
06/2007
Publication Type
INA
Invention Field
ELECTRONICS
Status
Email
Parent Application

Applicants

STMICROELECTRONICS PVT. LTD
Plot No. 2, 3 & 18, Sector 16A, Institutional Area, Noida-201 3001, Uttar Pradesh, India

Inventors

1. DEVESH DWIVEDI
Vill. Shahnevajpur, PO-Darshan Nagar, Faizabad, UP-224001
2. ASHISH KUMAR
House no M/17, Housing Colony, Ranchi, India-834009.

Specification

Field the Invention
The invention relates to a memory device with reduced leakage current.
Background of the Invention
Impact of the subthreshold leakage current on the circuit performance should be considered seriously as device dimension have scaled down to deep submicron level in CMOS technology. This is a significant problem is memory structures using precharging circuitry which frequently require discharging of the bitlines to allow bit sensing in memories
Figure 1 illustrates the schematic diagram for a conventional memory cell that operates as a single storage unit in a larger memon,' structure. A problem with such memory cells is the leakage current through multiple read transistors 30 coupled to a shared bitline 14 can result in erroneous read operation. Increased leakage current severely affects the performance of the memery circuits (e.g. register file). Further, the problem is increased by noise on read signal line due to the coupling noise. One way to reduce the leakage current is utilization of high threshold voltage (Vx) devices. The penalty incurred in such devices is reduced performance in terms of device speed and area. Also cost of manufacturing is increased in high Vi devices as additional silicon layers are required in such devices.
To overcome this problem, Figure 2 illustrates memory circuits according to US 6,320,795. This illustrates a register file cell 40, which is capable of reducing leakage current and is less likely to require a larger keeper transistor 26 to prevent erroneous reads. The memory cell 40 includes a pull-down transistor (MPD) 42, a static logic gate 44, and a storage cell 46. The pull-down transistor 42 is operative for discharging the bitline 14 to the ground 36 when a predetermined control indication is received at the input terminal thereof from the logic gate 44. In this embodiment, an N-channel IGFET device is used as the pull-down transistor 42 and, therefore, the predetermined control indication is a logic high value applied to the gate terminal of the pull-down transistor 42.
The logic gate 44 acts to buffer the input of the pull-down transistor 42 from the noise commonly associated with the read signal. The logic gate 44 includes two input terminals 48 and 50.
When the read signal is logic low and the data stored in the register file cell is logic high, the logic gate 44 (NOR gate) outputs a logic high value to the gate terminal of the pulldown transistor 42. As a result, the pull-down transistor 42 discharges the bitline 42 to ground 36. When stored data value in cell is logic low and when the read signal is logic low, the output of logic gate 44 is logic low which results in the pull-down transistor 42 to be turned off and hence, the bitline 14 is not discharged. The output of the logic gate 44 is logic low when the active low read signal is logic high, regardless of the data bit value stored in the cell 46.
Thus the goal is to isolate the pull-down transistor 42 from the read noise associated with the read signal. Although the application of static logic gate helps to reduce such leakage current to a significant level in such circuits, this approach is effective for reducing the leakage currents generated only due to the noise voltages on the input terminal of the pull-down transistor 42. It does not have significant impact on the leakage currents typically associated with low VT scaled devices.
Figure 3 shows a schematic diagram illustrating a register file cell 60 with another embodiment. The memory cell 60 includes a pull-down transistor 62 (MPD), logic gate 64, a storage cell 66, a bias device 72 and a read transistor 74 (MREAD), The logic gate 64 of the memory cell 60 provides isolation between a possibly noisy read signal and the input terminal of the pull-down transistor 62, same way as in previous case. In addition, the bias device 72 is operative for applying a bias voltage to the pull-down transistor 62 during appropriate periods that significantly reduces the level of the current leakage through the device during those periods. Thus the memory cell 60 can be implemented using low VT transistors to achieve high performance operation while still maintaining high robustness.
When the read signal is logic high, the read transistor 74 couples the second output terminal of the pull-down transistor 62 to the ground 36. Therefore a logic low voltage is present at the second mput 70 of the logic gate 64. During a read operation, the output of the logic gate 64 is logic high when the data bit stored within the cell 66 is logic low. Under this condition, the pull-down transistor 62 is turned on and the bitline 14 is discharged to the ground 36 through the read transistor 74. When data bit stored within the cell 66 is logic high, the output of the logic gate 64 is low and the pull-down transistor 62 remains off.
When the read signal is logic high (i. e. read operation is being performed for the cell 60), the bias device 72 (P-channel IGFET) is off and has substantially no effect on the circuit. When the read signal is logic low (i. e. read operation is not being performed for the cell 60), the bias device 72 couples the supply terminal 18 to the second output terminal of the pull-down transistor 62. This places a logic high voltage on the second input 70 of the logic gate 64 which forces the output of the logic gate to a logic low value. Therefore a negative voltage exists from the input terminal of the pull-down transistor 62 to the second output terminal of the pull-down transistor 62. As transistor 62 is an N-channel IGFET device the negative voltage from the input terminal (the gate) of the pull-down transistor 62 to the second output terminal ( the source) of the pull-down transistor 62 reduces the leakage current through the pull-down transistor 62 to the negligible levels. When the read signal again switches to a logic high value, the bias voltage is removed from the pull-down transistor 62 and a read operation takes place.
As described in the prior art, such an embodiment is capable of reducing leakage current through pull-down transistor 62 due to the effect of read noise associated with read signal on the input of pull-down transistor 62, Also it helps to reduce the leakage level through pull-down transistor 62 due to generation of a negative voltage from the input terminal (i.e, the gate terminal) of the pull-down transistor 62 to the second output terminal (i, e. source terminal) of the pull-down transistor 62,
The drawback of such an arrangement is its inability to check the leakage current through pull-down transistor 74. Also the presence of bias transistor X raises the potential of intermediate node 80 near to supply voltage whenever read signal is low (i. e. read operation is not being performed). This does not seem very promising as proposed scheme is unable to reduce the leakage current to the same order at a very low potential of intermediate node. In such memory circuit arrangement, significant leakage current is produced because of low VT (in order to maintain high performance) pull-down devices 107 and 117. Hence, the goal of the bias device is to reduce leakage through the pulldown transistor 62 during some or all of the non-read period associated with register file cell.
Object and Summary of the Invention
To obviate the aforesaid drawbacks the object of the instant invention is to provide a memory device with reduced leakage current.
Another object of the instant invention is to lower down the leakage current through pulldown low threshold voltage (VT) semiconductor device.
Another object of the instant invention is to provide memory cells using submicron technology with improved performance characteristics in speed, area and cost.
A memory device with reduced leakage current comprising;
atleast one bitline,
a plurality of memory cells; each memory cell passing atleast one output of a storage cell and each said output coupled to each said bitline through a read access circuitry; said read access circuitry comprising.
a logic device responsive to data value stored in said storage cells and a read signal for generating a control output.
a first switching device with its control terminal coupled to
the control output of said logic device and its first terminal
coupled to the bitline;
a second switching device with its control terminal coupled
to the control output of said logic device for passing a low
voltage to a common terminal of said first and said second
switching devices; and
a third switching/for passing a node reference voltage to
said common terminal responsive to the control output of
said logic device.
The node reference voltage for the third switching device in all memory cells is passed iVom a common reference voltage generator.
The common reference voltage generator comprises a plurality of diode-connected transistors connected in series with one end coupled to a high vohage source and other end coupled to the output of the common reference vohage generator.
Brief Description of The Accompanying Drawings
Figure 1 illustrates a commonly used memory circuit.
Figure 2 and 3 show embodiments of USPN 6,320,795.
Figure 4 shows a circuit in accordance with the invention.
Figure 5 illustrates another embodiment of the present invention.
Figure 6 show the simulation results.
Description of the Invention
Figure 4 illustrates a memory cell according to one of the embodiments of the instant invention. The memory cell 100 comprises the storage cell 101, a static logic gate 102, a reference voltage generator circuit 104, pull-down transistors 107 and 117, and a bias transistor MBIAS 115. A pull-down transistor 107 is coupled to bitline 108 for conditionally discharging the precharged bitline 108 during a read operation based on a data stored in the storage cell 101. Static logic gate 102, which is a NOR gate in the present embodiment, drives the pull-down transistor 107 depending upon the Read signal and data stored in the cell 101. It also act as a buffer between possibly noisy read signal and the input terminal of the pull-down transistor 107. In present embodiment a reference voltage generator circuit 104 along with a bias transistor MBIAS(P-channel MOSFET) is used for significant reduction of bitline 108 leakage through ground 113.
When read signal is logic low (i. e. read operation is to be performed) and data stored in the bit cell 101 is also logic low, output of the static logic gate 102 is logic high. This turns on the pull-down transistors 107 and 117 resulting in discharging of bitline 108 through the ground 113. Under this condition a logic high is present at the gate terminal 116 of bias transistor MBIAS and hence turning it off. Therefore no effect of reference vohage generator 104 is seen at node 118 of the circuit. For the opposite case when read signal is logic high, the output of the static logic gate 102 is logic low regardless of data bit value stored in cell 101. As output of the static logic gate 102 is connected to gate terminal of the both the pull-down transistors 107 and 117, both the pull-down devices are off and therefore bitline 108 is decoupled from the ground 113.
When read signal is high (i. e. no read operation is being performed) a low logic value at the output of the static logic gate 102, turns on the bias transistor MBIAS. Therefore the voltage reference generator circuit 104 raises the potential level of the intermediate node 118, just above the threshold voltage (depending on the nature of the reference voltage generator circuit) of the pull-down devices 107 and 117. The leakage current through pull-down transistor 107, is approaching to a lower level as the potential at intermediate node 118, is just above the threshold voltage of the pull-down device. Also, as
intermediate node 118 is charged to a lower potential (just above the VT of pull-down
4-. device), unlike to the supply level as in the prior art (US6,320,795 Bl), hence circuit
performance is also improved due to reduction in charging/discharging time.
Figure 5 illustrates a simplest embodiment of the voltage reference generator of the present invention. Accoding to this embodiment, diode connected transistors 51 and 52 are connected in series to high voltage supply 109 to produce voltage drop and produce desired voltage at the output.The goal behind the adding of voltage reference generator circuit is to provide a lower voltage (just above Vr of pull-down device) to the intermediate node 118 unlike near to supply in prior art. The area overhead due to the addition of the circuit 104 is negligible because the reference voltage generator circuit 104 is shared among number of memory cell circuit 100.
Figure 6 illustrates that the goal of lowering down the leakage current through pulldown device 107 is achieved at a very low potential (just above the VT of pull-down device) of intermediate node 118, in comparison to a significantly high potential (near to supply) of the same in prior art of US6,320,795 Bl. As the intermediate node 118 potential reaches below the V r of pull-down device the bit-Line leakage current increases abruptly Hence, the best case scenario is when the intermediate node potential is just above the VT of the pull-down device 107.
Table 1, shows the simulation results for the set-up of the prior art as shown in figure 2.
Simulation results for the set-up of the present invention shown in figure 4 are given in Table 2. Simulation is performed under the condition as below:
the sizes of the pull-down devices 107 and 117 are 4 micron. The sizes of static logic gate 102, and keeper device 110 are kept minimum and the load of the bitline 108 is taken as 100 ff.
Table 2 shows the variation in leakage current with potential at intermediate node 118. The bitline 108 is pulled down only when both read enable and data value stored in the cell 101 are logic low.
As the intermediate node potential approaches above VT of pull-down device the total leakage current reduces significantly. Simulation result shows -57% reduction in total leakage current, at node potential 305 mv in comparison to the prior art.
Table 1: PRIOR ART SIMULATIONS.

Table 1: PROPOSAL SIMULATIONS

(Table Removed)
Although the present invention is described in reference to register file memories with a single bitline, it can applied to all types of memories in CMOS ICs requiring precharge/discharge mechanism. According to yet another embodiment, the circuitry can be extended to memories with multiple bitline for memories producing stored data value and its complementary value. According to yet another embodiment, the logic gates or transistor used in the embodiment may be changed for the memory to be in active phase
for high read signal. Those of ordinary skill in the art will appreciate that various combinations and arrangements may be employed without departing from the scope of the invention
It is believed that the present invention and many of its attendant advantages will be understood by the foregoing description. It is also believed that it will be apparent that various changes may be made in the form, construction and arrangement of the components thereof without departing from the scope and spirit of the invention or without sacrificing all of its material advantages. The form herein before described being merely an exemplary' embodiment thereof it is the intention of the following claims to encompass and include such changes

We claim:
1. A memory device with reduced leakage current comprising:
- atleast one bitline;
- a plurality of memory cells; each memory cell passing atleast one output of a storage cell and each said output coupled to each said bitline through a read access circuitry; said read access circuitry comprising:

- a logic device responsive to data value stored in said storage cells and a read signal for generating a control output;
- a first switching device with its control terminal coupled to the control output of said logic device and its first terminal coupled to the bitline,
~ a second switching device with its control terminal coupled to the control output of said logic device for passing a low voltage to a common terminal of said first and said second switching devices; and
- a third switching for passing a node reference voltage to said
common terminal responsive to the control output of said logic
device.
2. A memory device with reduced leakage current as claimed in claim 1 wherein
said node reference voltage for said third switching device in all said memory
cells is passed from a common reference voltage generator.
3. A memory device with reduced leakage current as claimed in claim 2 wherein
said common reference voltage generator comprises a plurality of diode-
connected transistors connected in series with one end coupled to a high voltage
source and other end coupled to the output of said common reference voltage
generator.
4. , A memory device with reduced leakage current as claimed in claim 1 wherein
said logic device comprises a NOR gate.
5 A memory device with reduced leakage current as claimed in claim 1 wherein
said first switching device is a N-type metal-oxide semiconductor (NMOS) device.
6. A memory device with reduced leakage current as claimed in claim 1 wherein
said second switching device is a NMOS device.
7 A memory devce with reduced leakage current as claimed in claim 1 wherein
said third switching device is a P-type metal-oxide semiconductor (PMOS)
device
8. A memory de\ice with reduced leakage current as claimed in claim 3 wherein said diode-connected transistor is a PMOS device.
9. A memory de\ice with reduced leakage current as claimed in claim 1 wherein said node reference voltage is larger than threshold voltage for said first and second switching devices.
10. A memory device with reduced leakage current substantially as herein described

Documents

Application Documents

# Name Date
1 2598-del-2004-abstract.pdf 2011-08-21
1 2598-del-2004-pa.pdf 2011-08-21
2 2598-del-2004-claims.pdf 2011-08-21
2 2598-del-2004-form-5.pdf 2011-08-21
3 2598-del-2004-form-3.pdf 2011-08-21
3 2598-del-2004-correspondence-others.pdf 2011-08-21
4 2598-del-2004-form-2.pdf 2011-08-21
4 2598-del-2004-description (complete).pdf 2011-08-21
5 2598-del-2004-description (provisional).pdf 2011-08-21
5 2598-del-2004-form-1.pdf 2011-08-21
6 2598-del-2004-drawings.pdf 2011-08-21
7 2598-del-2004-description (provisional).pdf 2011-08-21
7 2598-del-2004-form-1.pdf 2011-08-21
8 2598-del-2004-description (complete).pdf 2011-08-21
8 2598-del-2004-form-2.pdf 2011-08-21
9 2598-del-2004-correspondence-others.pdf 2011-08-21
9 2598-del-2004-form-3.pdf 2011-08-21
10 2598-del-2004-form-5.pdf 2011-08-21
10 2598-del-2004-claims.pdf 2011-08-21
11 2598-del-2004-pa.pdf 2011-08-21
11 2598-del-2004-abstract.pdf 2011-08-21