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Method Of Preparing Lithographic Printing Plate

Abstract: According to a method of preparing a lithographic printing plate substantially comprising a step of imagewise exposing a negative lithographic printing plate precursor having an image-recording layer containing (i) a sensitizing dye, (ii) a photopolymerization initiator, (iii) an addition polymerizable compound having an ethylenically unsaturated double bond and (iv) a binder polymer on a support and a step of processing the exposed lithographic printing plate precursor with an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a surfactant, the processing property is improved, a printing plate free from the tackiness on the surface thereof can be provided, even when the printing plate is stored after the development until printing, deterioration of the printing durability does not occur, and it becomes possible to conduct one solution development with a weak alkaline processing solution.

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Patent Information

Application #
Filing Date
22 February 2011
Publication Number
48/2011
Publication Type
INA
Invention Field
PHYSICS
Status
Email
Parent Application
Patent Number
Legal Status
Grant Date
2018-09-26
Renewal Date

Applicants

FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME, MINATO-KU, TOKYO

Inventors

1. KAWAUCHI, IKUO
C/O FUJIFILM CORPORATION, 4000, KAWASHIRI, YOSHIDA-CHO, HAIBARA-GUN, SHIZUOKA
2. INNO, TOSHIFUMI
C/O FUJIFILM CORPORATION, 4000, KAWASHIRI, YOSHIDA-CHO, HAIBARA-GUN, SHIZUOKA
3. KURAMOTO, MAMORU
C/O FUJIFILM CORPORATION, 4000, KAWASHIRI, YOSHIDA-CHO, HAIBARA-GUN, SHIZUOKA
4. ADACHI, KEIICHI
C/O FUJIFILM CORPORATION, 4000, KAWASHIRI, YOSHIDA-CHO, HAIBARA-GUN, SHIZUOKA

Specification

TITLE OF THE INVENTION METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE TECHNICAL FIELD [0001] The present invention relates to a method of preparing a lithographic printing plate, in particular, to a method of preparing a lithographic printing plate which is excellent in processing property and enables processing with one solution. BACKGROUND ART [0002] In general, a lithographic printing plate is composed of an oleophilic image area accepting ink and a hydrophilic non-image area accepting dampening water in the process of printing. Lithographic printing is a printing method which comprises rendering the oleophilic image area of the lithographic printing plate to an ink-receptive area and the hydrophilic non-image area thereof to a dampening water-receptive area (ink unreceptive area), thereby making a difference in adherence of ink on the surface of the lithographic printing plate, and depositing the ink only on the image area by utilizing the nature of water and printing ink to repel with each other, and then transferring the ink to a printing material, for example, paper. In order to prepare the lithographic printing plate, a lithographic printing plate precursor (PS plate) comprising a hydrophilic support having provided thereon an oleophilic photosensitive resin layer (a photosensitive layer or an image-recording layer) has heretofore been broadly used. Ordinarily, the lithographic printing plate is obtained by conducting plate making according to a method of exposing the lithographic printing plate precursor through an original, for example, a lith film, and then while leaving the image-recording layer in the portion for forming the image area, removing the unnecessary image-recording layer other than the image area by dissolving with an alkaline developer or an organic solvent thereby revealing the hydrophilic surface of support to form the non-image area. [0003] Thus, in the hitherto known plate making process of lithographic printing plate precursor, after exposure, the step of removing the unnecessary portion of the image-recording layer by dissolving with a developer or the like is required. However, in view of the environment and safety, a processing with a developer closer to a neutral range and a small amount of waste liquid are problems to be solved. Particularly, since disposal of waste liquid discharged accompanying the wet treatment has become a great concern throughout the field of industry in view of the consideration for global environment in recent years, the demand for the resolution of the above-described problems has been increased more and more. [4] On the other hand, digitalized technique of electronically processing, accumulating and outputting image information using a computer has been popularized in recent years, and various new image outputting systems responding to the digitalized technique have been put into practical use. Correspondingly, attention has been drawn to a computer-to-plate (CTP) technique of carrying digitalized image information on highly converging radiation, for example, laser light and conducting scanning exposure of a lithographic printing plate precursor with the light thereby directly preparing a lithographic printing plate without using a lith film. Thus, it is one of important technical subjects to obtain a lithographic printing plate precursor adaptable to the technique described above. [5] As described above, the decrease in alkali concentration of developer and the simplification of processing step have been further strongly required from both aspects of the consideration for global environment and the adaptation for space saving and low running cost. However, since conventional development processing step comprises three steps of developing with an aqueous alkali solution having pH of 11 or more, washing of the alkali agent with a water washing bath and then treating with a gum solution mainly comprising a hydrophilic resin as described above, an automatic developing machine per se requires a large space and problems of the environment and running cost, for example, disposal of the development waste liquid, water washing waste liquid and gum waste liquid still remain. [6] In response to the above situation, for instance, in Patent Document 1, a developing method of processing with a developer having pH from 8.5 to 11.5 and a dielectric constant from 3 to 30 mS/cm and containing an alkali metal carbonate and an alkali metal hydrogen carbonate is proposed. However, since the developing method is required a water washing step and a treatment step with a gum solution, it does not resolve the problems of the environment and running cost. Also, processing with a processing solution having pH from 11.9 to 12.1 and containing a water-soluble polymer compound is described in the example of Patent Document 2. However, since the printing plate obtained by the processing is left in the state that the alkali of pH 12 adheres on the surface thereof, a problem in view of safety of an operator arises and in addition, with the lapse of long time after the preparation of the printing plate until printing, the image area gradually dissolves to result in deterioration of printing durability and ink-receptive property. In Patent Document 3, processing with a processing solution having pH from 3 to 9 and containing a water-soluble polymer compound is described. However, since the processing solution does not contain a base component, it is necessary to make a binder polymer in the photosensitive layer hydrophilic to enable development thereby causing a problem of severe deterioration of printing durability. In Patent Document 4, a method of preparing a printing plate in which development processing is conducted using an aqueous solution containing substantially a surfactant, a water-soluble film-forming hydrophilic polymer and an alkali agent in an amount necessary for adjusting a pH of the solution to 9.5 to 14 and after that a gum treatment step is not conducted is described. However, there is no description with respect to combination use of a carbonate ion and a hydrogen carbonate ion. Further, the method is still insufficient in view of processing ability, tackiness of a plate surface after development, development scum, repeated running aptitude (image reproducibility when continuously processed) or the like. PRIOR ART DOCUMENT PATENT DOCUMENT [7] Patent Document 1: JP-A-11-65126 Patent Document 2: EP-A-1868036 Patent Document 3: JP-T-2007-538279 Patent Document 4: WO 2007/144096 DISCLOSURE OF THE INVENTION PROBLEMS THAT THE INVENTION IS TO SOLVE [8] Accordingly, an object of the invention is to provide a method of preparing a lithographic printing plate which overcomes the drawbacks of the prior art described above, specifically to provide a method of preparing a lithographic printing plate which is safe, exhibits excellent processing property, does not cause tackiness of a surface of printing plate, prepares a printing plate which does not cause deterioration of printing durability even when stored after the development until printing, and enables processing with one solution. MEANS FOR SOLVING THE PROBLEMS [0009] As a result of the intensive investigation, the inventor has found that the above-described object can be achieved by the constitution described below to complete the invention. Specifically, the invention is as follows. [0010] (1) A method of preparing a lithographic printing plate substantially comprising a step of imagewise exposing a negative lithographic printing plate precursor having an image-recording layer containing (i), (ii), (iii) and (iv) shown below on a support and a step of processing the exposed lithographic printing plate precursor with an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a surfactant (i) a sensitizing dye, (ii) a photopolymerization initiator, (iii) an addition polymerizable compound having an ethylenically unsaturated double bond, (iv) a binder polymer. (2) The method of preparing a lithographic printing plate as described in (1) above, wherein the aqueous solution does not contain a water-soluble polymer compound. (3) The method of preparing a lithographic printing plate as described in (1) or (2) above, wherein (i) the sensitizing dye has an absorption maximum in a wavelength range from 350 to 450 nm. (4) The method of preparing a lithographic printing plate as described in (3) above, wherein (i) the sensitizing dye is a sensitizing dye represented by any of formulae (1) to (5) shown below: [0011] [0012] (in formula (1), A represents an aromatic cyclic group which may have a substituent or a heterocyclic group which may have a substituent, X represents an oxygen atom, a sulfur atom or N-(R3), and R1, R2 and R3 each independently represents a monovalent non-metallic atomic group, or A and R1 or R2 and R3 may be combined with each other to form an aliphatic or aromatic ring); [0013] [14] (in formula (2), A represents a sulfur atom or NR6, R6 represents a monovalent non-metallic atomic group, Y represents a non-metallic atomic group necessary for forming a basic nucleus of the dye together with adjacent A and the adjacent carbon atom, and X1 and X2 each independently represents a monovalent non-metallic atomic group or X1 and X2 may be combined with each other to form an acidic nucleus of the dye); [15] [16] (in formula (3), =Z represents an oxo group, a thioxo group, an imino group or an alkylydene group represented by a partial structural formula (1') described above, X1 and X2 have the same meanings as defined in formula (2) respectively, and R7 to R12 each independently represents a monovalent non-metallic atomic group); [17] [18] (in formula (4), Ar3 represents an aromatic group which may have a substituent or a heteroaromatic group which may have a substituent, R13 represents a monovalent non-metallic atomic group, or Ar3 and R13 may be combined with each other to form a ring); [0019] [0020] (in formula (5), X3, X4 and R44 to R21 each independently represents a monovalent non-metallic atomic group). (5) The method of preparing a lithographic printing plate as described in (3) above, wherein (i) the sensitizing dye is a sensitizing dye represented by formula (I), (II) or (III) shown below: [0021] [0022] [0023] In formula (I), R1 to R14 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a cyano group or a halogen atom, provided that at least one of R1 to R10 represents an alkoxy group having 2 or more carbon atoms. In formula (II), R15 to R32 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a cyano group or a halogen atom, provided that at least one of R15 to R24 represents an alkoxy group having 2 or more carbon atoms. [0024] [0025] In formula (HI), R1, R2 and R3 each independently represents a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, an aralkyl group which may have a substituent, an -NR4R5 group or an -OR6 group, R4, R5 and R6 each independently represents a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, and k, m and n each represents an integer from 0 to 5. (6) The method of preparing a lithographic printing plate as described in any one of (1) to (5) above, wherein the step of imagewise exposure is conducted using laser emitting light from 350 to 450 nm. (7) The method of preparing a lithographic printing plate as described in any one of (1) to (6) above, wherein pH of the aqueous solution is from 8.5 to 10.8. (8) The method of preparing a lithographic printing plate as described in any one of (1) to (7) above, wherein (iv) the binder polymer has an acid group in its side chain. (9) The method of preparing a lithographic printing plate as described in (8) above, wherein the acid group is a carboxylic acid group. (10) The method of preparing a lithographic printing plate as described in any one of (1) to (9) above, wherein the lithographic printing plate precursor has a protective layer on the image-recording layer. (11) The method of preparing a lithographic printing plate as described in (10) above, wherein the protective layer contains an acid-modified polyvinyl alcohol. (12) The method of preparing a lithographic printing plate as described in any one of (1) to (11) above, wherein the processing with an aqueous solution is conducted with one solution. (13) The method of preparing a lithographic printing plate as described in any one of (1) to (11) above, wherein the processing with an aqueous solution is conducted with one bath. (14) A lithographic printing plate precursor which is used in the method of preparing a lithographic printing plate as described in any one of (1) to (13) above. ADVANTAGE OF THE INVENTION [0026] The method of preparing a lithographic printing plate according to the invention is excellent in the processing property and provides a printing plate free from the tackiness on the surface thereof. Further, even when the printing plate is preserved after the development until printing, deterioration of the printing durability does not occur. Moreover, since it becomes possible to conduct one solution development with a weak alkaline processing solution, advantages, for example, simplification of processing steps, consideration for global environment and adaptation for space saving and low running cost can be provided. BRIEF DESCRIPTION OF THE DRAWING [27] Fig. 1 is a view schematically showing a configuration of an automatic development processor. MODE FOR CARRYING OUT THE INVENTION [28] [Negative lithographic printing plate precursor] With the negative lithographic printing plate precursor for use in the invention, the constitution thereof will be described in turn below. [0029] [Support] At the beginning, a support for the lithographic printing plate precursor used in the invention is described. Although any support having a hydrophilic surface may be used, a dimensionally stable plate-like material is preferably used for the support The support includes, for example, paper, paper laminated with plastic (for example, polyethylene, polypropylene or polystyrene), a plate of metal, for example, aluminum, zinc or copper or its alloy (for example, as aluminum alloy, alloy including silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, nickel or the like), a plastic film, for example, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate or polyvinyl acetal, and paper or a plastic film having laminated with or vapor-deposited thereon the metal or alloy as described above. Of the supports, an aluminum plate (including an aluminum alloy plate) is particularly preferred, because it has extremely dimensional stability and is inexpensive. Further, a composite sheet comprising a polyethylene terephthalate film having bonded thereon an aluminum sheet described in JP-B-48-18327 is also preferred. Ordinarily, the thickness of the support is approximately from 0.05 to 1 mm. [30] In case of using a support having a metal surface, particularly, an aluminum surface, the support is preferably subjected to a surface treatment, for example, a graining treatment, an immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, a phosphate or the like, or anodizing treatment described below. [Graining treatment] As a method for the graining treatment, an electrochemical graining method wherein surface graining is electrochemically conducted in an electrolytic solution of hydrochloric acid or nitric acid or a mechanical graining method, for example, a wire brush graining method wherein a surface of aluminum plate is scratched with a metal wire, a ball graining method wherein a surface of aluminum plate is grained with abrasive balls and an abrasive or a brush graining method wherein a surface of aluminum plate is grained with a nylon brush and an abrasive can be employed. The graining methods may be used individually or in combination of two or more thereof. For instance, a method of conducting mechanical graining, chemical etching and electrolytic graining is described in JP-A-56-28893. Specifically, a method of forming useful surface roughness is an electrochemical graining method wherein surface graining is electrochemically conducted in an electrolytic solution of hydrochloric acid or nitric acid and suitable current density is in a range from 100 to 400 C/dm . More specifically, it is preferred to perform electrolysis in an electrolytic solution containing from 0.1 to 50% of hydrochloric acid or nitric acid under the conditions of temperature from 20 to 100°C, time from one second to 30 minutes and current density from 100 to 400 C/dm . The aluminum support subjected to the graining treatment is then chemically etched with an acid or an alkali. The method of using an acid as an etching agent takes time for destroying fine structures. Such a problem may be resolved by using an alkali as the etching agent. Examples of the alkali agent preferably used include sodium hydroxide, sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, potassium hydroxide and lithium hydroxide. Preferable ranges of the concentration and temperature are form 1 to 50% and from 20 to 100°C, respectively. The conditions for providing a dissolution amount of aluminum in a range from 5 to 20 g/m3 are preferred. After the etching procedure, the aluminum support is subjected to washing with an acid for removing stain (smut) remaining on the surface thereof. Examples of the acid for use in the acid-washing step include nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid and hydrofluoroboric acid. As the method for removing smut after the electrochemical graining treatment, a method of bringing the aluminum support into contact with a 15 to 65% by weight aqueous sulfuric acid solution having a temperature from 50 to 90°C as described in JP-A-53-12739 and a method of performing alkali etching as described in JP-B48-28123 are preferred. Surface roughness (Ra) of the aluminum support is preferably from 0.3 to 0.7 Jim. [32] [Anodizing treatment] The aluminum support subjected to the graining treatment described above may further be subjected to anodizing treatment The anodizing treatment can be conducted in a manner conventionally used in the field of art. Specifically, it is performed by applying direct current or alternating current to the aluminum support in an aqueous solution or non-aqueous solution containing sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, or a combination of two or more thereof to form an anodic oxide film on the surface of aluminum support. The conditions of anodizing treatment cannot be determined generally, since they vary widely depending on the electrolytic solution to be used. However, it is ordinarily suitable that a concentration of the electrolytic solution is in a range from 1 to 80%, a temperature of the electrolytic solution is in a range from 5 to 70°C, a current density is in a range from 0.5 to 60 Ampere/dm2, a voltage is in a range from 1 to 100 V, and a period of electrolysis is in a range from 10 to 100 seconds. Of the anodizing treatments, a method of anodizing in a sulfuric acid solution with a high current density described in British Patent 1,412,768 and a method of anodizing using phosphoric acid as an electrolytic bath described in U.S. Patent 3,511,661 are particularly preferred. The amount of anodic oxide film is preferably from 1 to 10 g/m2. When the amount is less than 1 g/m , the printing plate is apt to be scratched. When the amount exceeds 10 g/m, a large quantity of electric power is necessary and thus it is economically disadvantageous. The amount of anodic oxide film is more preferably from 1.5 to 7 g/m2, and still more preferably from 2 to 5 g/m2. [33] The aluminum support may further be subjected to a sealing treatment of the anodic oxide film after the graining treatment and anodizing treatment The sealing treatment is performed by immersing the aluminum support in hot water or a hot aqueous solution containing an inorganic salt or an organic salt, or in a water vapor bath. Moreover, the aluminum support may be subjected to a surface treatment, for example, silicate treatment with an alkali metal silicate or immersion treatment in an aqueous solution of potassium fluorozirconate, a phosphate or the like. [34] On a support (in case of an aluminum support, the aluminum support appropriately subjected to the surface treatment as described above is preferred), for example, an image-recording layer comprising a photopolymerizable photosensitive composition is coated and, if desired, a protective layer is coated on the image-recording layer to prepare a lithographic printing plate precursor. In advance of the coating of image-recording layer, an organic or inorganic undercoat layer may be provided on the support, if desired. A sol-gel treatment where a functional group capable of initiating an addition reaction upon a radical is covalently bonded on the surface of support as described in JP-A-7-159983 may be performed. [35] As a substance for forming the organic undercoat layer, for instance, a water-soluble resin, for example, polyvinylphosphonic acid, a polymer or copolymer having a sulfonic acid group in its side chain or polyacrylic acid, a yellow dye or an amine salt is exemplified. Specifically, the organic compound used in the organic undercoat layer is selected form, for example, carboxymethyl cellulose, dextrin, gum arabic, a phosphonic acid having an amino group, for example, 2-aminoethylphosphonic acid, an organic phosphonic acid, for example, phenylphosphonic acid, naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, polyvinylphosphonic acid, methylenedipbosphonic acid or ethylenediphosphonic acid, each of which may have a substituent, an organic phosphoric acid, for example, phenylphosphoric acid, naphthylphosphoric acid, alkylphosphoric acid or glycerophosphoric acid, each of which may have a substituent, an organic phosphinic acid, for example, phenylphosphinic acid, naphthylphosphinic acid, alkylphosphinic acid or glycerophosphinic acid, each of which may have a substituent, an amino acid, for example, glycine or β-alanine, and a hydrochloride of amine having a hydroxy group, for example, triethanolamine hydrochloride. The organic compounds may be used as a mixture of two or more thereof. [36] The organic undercoat layer can be provided by the following methods. Specifically, there are a method of dissolving the organic compound described above in water, an organic solvent, for example, methanol, ethanol or methyl ethyl ketone, or a mixed solvent thereof, coating the resulting solution on a support and drying it to provide the organic undercoat layer, and a method of dissolving the organic compound described above in water, an organic solvent, for example, methanol, ethanol or methyl ethyl ketone, or a mixed solvent thereof, immersing a support in the resulting solution to adsorb the organic compound, washing the support with water or the like, and drying it to provide the organic undercoat layer. In the former method, the solution containing the organic compound in a concentration from 0.005 to 10% by weight can be coated by various methods. Any method including, for example, bar coaler coaling, spin coating, spray coating or curtain coating may be used. In the latter method, the concentration of the organic compound in the solution is from 0.01 to 20% by weight, preferably from 0.05 to 5% by weight, the immersion temperature is from 20 to 90°C, preferably from 25 to 50°C, and the immersion time is from 0.1 second to 20 minutes, preferably from 2 seconds to 1 minute. The solution used may also be used by adjusting its pH to a range from 1 to 12 with a basic substance, for example, ammonia, triethylamine or potassium hydroxide or an acidic substance, for example, hydrochloric acid or phosphoric acid. Moreover, a yellow dye may also be added to the solution in order to improve the tone reproducibility of the lithographic printing plate precursor. The coverage of the organic undercoat layer after drying is suitably from 2 to 200 mg/m2, and preferably from 5 to 100 mg/m2. When the coverage of die organic undercoat layer is less than 2 mg/m2, sufficient printing durability may not be obtained in some cases. When the coverage thereof is more than 200 mg/m2, the same problem may also arise. [37] Examples of the substance used in the inorganic undercoat layer include an inorganic salt, for example, cobalt acetate, nickel acetate or potassium fluorotitanate. The method of providing the inorganic undercoat layer is similar to that of the organic undercoat layer described above. [38] From the standpoint of increase in printing durability, the undercoat layer preferably contains a polymer or copolymer having any one of a phosphonic acid group, a phosphoric acid group and a sulfonic acid group in its side chain. In case of the copolymer, it contains a polymerization component having such a group preferably from 10 to 90% by mole, and more preferably from 20 to 50% by mole. Further, the copolymer preferably contains an ethylenically unsaturated bond in its side chain. The copolymer contains a polymerization component having the ethylenically unsaturated bond preferably from 10 to 90% by mole, and more preferably from 15 to 40% by mole. [39] [Image-recording layer] The image-recording layer (hereinafter, also referred to as a photosensitive layer) of the lithographic printing plate precursor for use in the invention contains as the essential components, (i) a sensitizing dye, (ii) a photopolymerization initiator, (iii) an addition polymerizable compound having an ethylenically unsaturated double bond and (iv) a binder polymer. [40] [Sensitizing dye] The sensitizing dye for use in the invention is a dye capable of transmitting the energy of laser beam absorbed at the image exposure to a photopolymerization initiator with energy transfer or electron transfer. An absorption wavelength of the sensitizing dye is not particularly restricted as long as the sensitizing dye has the above-described function. The sensitizing dye is appropriately selected depending on a wavelength of laser used for the exposure. In the invention, particularly, a sensitizing dye having an absorption maximum in a wavelength range from 350 to 450 nm is preferably used. Such sensitizing dyes include, for example, merocyanine dyes represented by formula (2) shown below, benzopyrans or coumarins represented by formula (3) shown below, aromatic ketones represented by formula (4) shown below and anthracenes represented by formula (5) shown below. [41] [42] (in formula (2), A represents a sulfur atom or NR& represents a monovalent non-metallic atomic group, Y represents a non-metallic atomic group necessary for forming a basic nucleus of the dye together with adjacent A and the adjacent carbon atom, and Xi and X2 each independently represents a monovalent non-metallic atomic group or Xi and X2 may be combined with each other to form an acidic nucleus of the dye.) [43] [44] (in formula (3), =Z represents an oxo group, a thioxo group, an imino group or an alkylydene group represented by the partial structural formula (1') described above, X1 and X2 have the same meanings as defined in formula (2) respectively, and R7 to R12 each independently represents a monovalent non-metallic atomic group.) [45] [46] (in formula (4), Ar3 represents an aromatic group which may have a substituent or a heteroaromatic group which may have a substituent, and R13 represents a monovalent non-metallic atomic group. R13 preferably represents an aromatic group or a heteroaromatic group. Ar3 and R13 may be combined with each other to form a ring.) [47] [48] (in formula (5), X3, X4 and R14 to R21 each independently represents a monovalent non-metallic atomic group. Preferably, X3 and X4 each independently represents an electron-donating group having a negative Hammett substituent constant) [49] In formulae (2) to (5), preferable examples of the monovalent non-metallic atomic group represented by any one of X1 to X4 and to R21 include a hydrogen atom, an alkyl group (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a hexadecyl group, an octadecyl group, an eucosyl group, an isopropyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an isopentyl group, a neopentyl group, a 1- methylbutyl group, an isohexyl group, a 2-ethylhexyl group, a 2-methylhexyl group, a cyclohexyl group, a cyclopentyl group, a 2-norbornyl group, a chloromethyl group, a bromomethyl group, a 2- chloroethyl group, a trifluoromethyl group, a methoxymethyl group, a methoxyethoxyethyl group, an allyloxymethyl group, a phenoxymethyl group, a methylthiomethyl group, a tolylthiomethyl group, an ethylaminoethyl group, a diethylaminopropyl group, a morpholinopropyl group, an acetyloxymethyl group, a benzoyloxymethyl group, an N-cyclohexylcarbamoyloxyetiiyl group, an N-phenylcarbamoyloxyethyl group, an acetylaminoethyl group, an N-methylbenzoylaminopropyl group, a 2-oxoethyl group, a 2-oxopropyl group, a carboxypropyl group, a methoxycarbonylethyl group, an allyloxycarbonylbutyl group, a chlorophenoxycarbonylmethyl group, a carbamoylmethyl group, an N-methylcarbamoylethyl group, an N,N-dipropylcarbamoylmethyl group, an N-(methoxyphenyl)carbamoylethyl group, an N-methyl-N-(sulfophenyl)carbamoylmethyl group, a sulfobutyl group, a sulfonatobutyl group, a sulfamoylbutyl group, an N-ethylsulfamoylmethyl group, an N,N-dipropylsulfamoylpropyl group, an N-tolylsulfamoylpropyl group, an N-methyl-N-(phosphonophenyl)sulfamoyloctyl group, a phosphonobutyl group, a phosphonatohexyl group, a diethylphosphonobutyl group, a diphenylphosphonopropyl group, a methylphosphonobutyl group, a methylphosphonatobutyl group, a tolylphosphonohexyl group, a tolylphosphonatohexyl group, a phosphonooxypropyl group, a phosphonatooxybutyl group, a benzyl group, a phenethyl group, an a-methylbenzyl group, a 1-methyl-1-phenylethyl group, a p-methylbenzyl group, a cinnamyl group, an allyl group, a 1-propenylmethyl group, a 2-butenyl group, a 2-methylallyl group, a 2-methylpropenylmethyl group, a 2-propynyl group, a 2-butynyl group or a 3-butynyl group), an aryl group (for example, a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, a mesityl group, a cumenyl group, a chlorophenyl group, a bromophenyl group, a chloromethylphenyl group, a hydroxyphenyl group, a methoxyphenyl group, an ethoxyphenyl group, a phenoxyphenyl group, an acetoxyphenyl group, a benzoyloxyphenyl group, a methylthiophenyl group, a phenylthiophenyl group, a methylaminophenyl group, a dimethylaminophenyl group, an acetylaminophenyl group, a caiboxyphenyl group, a methoxycarbonylphenyl group, an ethoxycarbonylphenyl group, a phenoxycarbonylphenyl group, an N-phenylcarbamoylphenyl group, a nitrophenyl group, a cyanophenyl group, a sulfophenyl group, a sulfonatophenyl group, a phosphonophenyl group or a phosphonatophenyl group), a heteroaryl group (for example, a group derived from a heteroaryl ring, for example, thiophene, thiathrene, furan, pyran, isobenzofuran, chromene, xanthene, phenoxazine, pyrrole, pyrazole, isothiazole, isoxazole, pyrazine, pyrimidine, pyridazine, indolizine, isoindolizine, indole, indazole, purine, quinolizine, isoquinoline, phthalazine, naphthylidine, quinazoline, cinnoline, pteridine, carbazole, carboline, phenanthrine, acridine, perimidine, phenanthroline, phthalazine, phenarsazine, phenoxazine, furazane or phenoxazine), an alkenyl group (for example, a vinyl group, a 1-propenyl group, a 1-butenyl group, a cinnamyl group or a 2-chloro-l-ethenyl group), an alkynyl group (for example, an ethynyl group, a 1-propynyl group, a 1-butynyl group or a trimethylsilylethynyl group), a halogen atom (for example, -F, -Br, -CI or -I), a hydroxy group, an alkoxy group, an aryloxy group, a mercapto group, an alkylthio group, an aiylthio group, an alkyldithio group, an aryldithio group, an amino group, an N-alkylamino group, an N,N-dialkylam i no group, an N-aiylamino group, an N,N-diarylamino group, an N-alkyl-N-arylamino group, an acyloxy group, a carbamoyloxy group, an N-alkylcarbamoyloxy group, an N-arylcarbamoyloxy group, an N,N-dialkylcarbamoyloxy group, an N,N-diaryl- carbamoyloxy group, an N-alkyl-N-arylcarbamoyloxy group, an alkylsulfoxy group, an arylsulfoxy group, an acylthio group, an acylamino group, an N-alkylacylamino group, an N-arylacylamino group, a ureido group, an N'-alkylureido group, an N',N'-dialkylureido group, an N'-arylureido group, an N'^N'-diarylureido group, an N'-alkyl-N'-arylureido group, an N-alkylureido group, an N-arylureido group, an N'-alkyl-N-alkylureido group, an N'-alkyl-N-arylureido group, an N',N'-dialkyl-N-a]]3 ring resonator (430 nm, 30 mW), a combination of a waveguide-type wavelength conversion element with an AlGaAs or InGaAs semiconductor (380 nm to 450 nm, 5 mW to 100 mW), a combination of a waveguide-type wavelength conversion element with an AlGalnP or AlGaAs semiconductor (300 nm to 350 nm, 5 mW to 100 mW) and AlGalnN (350 nm to 450 nm, 5 mW to 30 mW); and as a pulse laser, N2 laser (337 nm, pulse 0.1 to 10 mJ) and XeF (351 nm, pulse 10 to 250 mJ). Among them, an AlGalnN semiconductor laser (commercially available InGaN semiconductor laser, 400 to 410 nm, 5 to 30 mW) is preferred in view of the wavelength characteristics and cost. [246] As for the exposure device for the lithographic printing plate precursor of scanning exposure system, the exposure mechanism may be any of an internal drum system, an external drum system and a flat bed system. As the light source, among the fight sources described above, those capable of conducting continuous oscillation can be preferably utilized. [247] Further, as other examples of the exposure light source usable in the invention, an ultra-high pressure, high pressure, medium pressure or low pressure mercury lamp, a chemical lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, various visible or ultraviolet laser lamps, a fluorescent lamp, a tungsten lamp, sunlight and the like are exemplified. [248] Now, the development step is described in detail. A conventional processing process comprises removing a protective layer in a pre-water washing step, conducting alkali development, removing the alkali in a post-water washing step, conducting gum treatment in a gumming step and drying in a drying step. On the contrary, according to the invention, it is characterized to conduct the pre-water washing, development and gumming at the same time by using an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a surfactant. Thus, the pre-water washing step is not particularly necessary, and after conducting the pre-water washing, development and gumming only using one solution, further with one bath, the drying step can be performed. After the development, the excess processing solution is preferably removed using a squeeze roller or the like, followed by conducting drying. [249] The development step is preferably performed by an automatic processor equipped with a rubbing member. As the automatic processor, for example, an automatic processor in which a lithographic printing plate precursor after image exposure is subjected to a rubbing treatment while it is transported described in JP-A-2-220061 and JP-A-60-59351, and an automatic processor in which a lithographic printing plate precursor after image exposure placed on a cylinder is subjected to a rubbing treatment while rotating the cylinder described in U.S. Patents 5,148,746 and 5,568,768 and British Patent 2,297,719 are exemplified. Among them, the automatic processor using a rotating brush roller as the rubbing member is particularly preferred. [250] The rotating brush roller which can be used in the invention can be appropriately selected by taking account of scratch resistance of the image area, and further, nerve strength of the support of the lithographic printing plate precursor and the like. As for the rotating brush roller, a known rotating brush roller produced by implanting a brush material in a plastic or metal roller can be used. For example, a rotating brush roller described in JP-A-58-159533 and JP-A-3-100554, or a brush roller in which a metal or plastic groove-type member having implanted therein in rows a brush material is closely radially wound around a plastic or metal roller acting as a core as described in JP-U-B-62-167253 can be used. As the brush material, a plastic fiber (for example, a polyester-based, e.g., polyethylene terephthalate or polybutylene terephthalate, a polyamide-based, e.g., nylon 6.6 or nylon 6.10, a polyacrylic based, e.g., polyacrylonitrile or polyalkyl (meth)acrylate, and a polyolefin-based, e.g., polypropylene or polystyrene) can be used. For instance, a brush material having a fiber bristle diameter from 20 to 400 μm and a bristle length from 5 to 30 mm can be preferably used. The outer diameter of the rotating brush roller is preferably from 30 to 200 mm, and the peripheral velocity at the tip of the brush rubbing the plate surface is preferably from 0.1 to 5 m/sec. It is preferred to use a plurality of the rotating brush rollers. [251] The rotary direction of the rotating brush roller may be the same direction or the opposite direction with respect to the transporting direction of the lithographic printing plate precursor, but when two or more rotating brush rollers are used, it is preferred that at least one rotating brush roller rotates in the same direction and at least one rotating brush roller rotates in the opposite direction with respect to the transporting direction. By such arrangement, the non-image area of the photosensitive layer is more certainly removed. Further, it is also effective to rock the rotating brush roller in the rotation axis direction of the brush roller. [252] After the development step, a drying step is preferably provided continuously or discontinuously. The drying is conducted using hot air, an infrared ray, a far-infrared ray or the like. [253] An example of the configuration of automatic processor preferably used in the method of preparing a lithographic printing plate according to the invention is schematically shown in Fig. 1. The automatic processor shown in Fig. 1 comprises basically a developing unit 6 and a drying unit 10. A lithographic printing plate precursor 4 is subjected to the development and gumming in a developing tank 20 and dried in the drying unit 10. [254] A processing solution (hereinafter, also referred to as a developer) for use in the development step is an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a surfactant. Due to the presence of a carbonate ion and a hydrogen carbonate ion, a buffer function is expressed and fluctuation of the pH can be prevented even when the developer is used for a long period of time. Thus, the deterioration of developing property resulting from the fluctuation of pH, the occurrence of development scum and the like are restrained. In order for a carbonate ion and a hydrogen carbonate ion to be present in a developer, a carbonate and a hydrogen carbonate may be added to the developer or a carbonate ion and a hydrogen carbonate ion may be generated by adding a carbonate or a hydrogen carbonate to a developer and then adjusting the pH. The carbonate or hydrogen carbonate used is not particularly restricted and it is preferably an alkali metal salt thereof. As the alkali metal, lithium, sodium and potassium are exemplified and sodium is particularly preferred. The alkali metals may be used individually or in combination of two or more thereof. The pH of the developer is not particularly restricted as long as it is pH at which the buffer function is expressed and is preferably in a range from 8.5 to 10.8. When the pH is lower than 8.5, the developing property of the non-image area is degraded. When the pH is higher 10.8, the processing ability is degraded due to the influence of carbon dioxide in the atmosphere. [255] The total amount of the carbonate ion and hydrogen carbonate is preferably from 0.3 to 20% by weight, more preferably from 0.5 to 10% by weight, particularly preferably from 1 to 5% by weight, based on the weight of the aqueous alkali solution. When the total amount is 0.3% by weight or more, the developing property and processing ability are not degraded. When the total amount is 20% by weight or less, precipitates and crystals hardly generate and since gelation at neutralization of waste liquid of the developer hardly occur, treatment of the waste liquid can be carried out without trouble. [256] Further, for the purpose of finely adjusting the alkali concentration or aiding dissolution of the photosensitive layer in the non-image area, other alkali agent, for example, an organic alkali agent may be supplementarily used together. The organic alkali agent includes monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, tetramethylammonium hydroxide and the like. The supplementary alkali agents may be used individually or in combination of two or more thereof. [257] The surfactant for use in the processing solution according to the invention is any of anionic, nonionic, cationic and amphoteric surfactants. The surfactant contributes to improvement in the processing property. The anionic surfactant includes fatty acid salts, abietic acid salts, hydroxyalkanesulfonic acid salts, alkanesulfonic acid salts, dialkylsulfosuccinic acid salts, straight-chain alkylbenzenesulfonic acid salts, branched alkylbenzenesulfonic acid salts, alkylnaphthalenesulfonic acid salts, alkylphenoxy polyoxyethylene propylsulfonic acid salts, polyoxyethylene alkylsulfophenyl ether salts, N-methyl-N-oleyltaurine sodium salt, N-alkylsulfosuccinic acid monoamide disodium salts, petroleum sulfonic acid salts, sulfated castor oil, sulfated beef tallow oil, sulfate ester slats of fatty acid alkyl ester, alkyl sulfate ester salts, polyoxyethylene alkyl ether sulfate ester salts, fatty acid monoglyceride sulfate ester salts, polyoxyethylene alkyl phenyl ether sulfate ester salts, polyoxyethylene styryl phenyl ether sulfate ester salts, alkyl phosphate ester salts, polyoxyethylene alkyl ether phosphate ester salts, polyoxyethylene alkyl phenyl ether phosphate ester salts, partially saponified products of styrene-maleic anhydride copolymer, partially saponified products of olefin-maleic anhydride copolymer, naphthalene sulfonate formalin condensates, aromaticsulfonic acid salts, aromatic substituted polyoxyethylenesulfonic acid salts and the like. Of the compounds, dialkylsulfosuccinic acid salts, alkyl sulfate ester salts and alkylnaphthalenesulfonic acid salts are particularly preferably used. [258] The cationic surfactant is not particularly limited and conventionally known cationic surfactants can be used. For example, alkylamine salts, quaternary ammonium salts, polyoxyethylene alkyl amine salts and polyethylene polyamine derivatives are exemplified. [259] The nonionic surfactant include polyethylene glycol type higher alcohol ethylene oxide addacts, alkylphenol ethylene oxide addacts, polyethylene glycol addacts of aromatic compounds, fatty acid ethylene oxide addacts, polyhydric alcohol fatty acid ester ethylene oxide addacts, higher alkylamine ethylene oxide addacts, fatty acid amide ethylene oxide addacts, ethylene oxide addacts of fat, polypropylene glycol ethylene oxide addacts, dimethylsiloxane-ethylene oxide block copolymers, dimethylsiloxane-(propylene oxide-ethylene oxide) block copolymers, fatty acid esters of polyhydric alcohol type glycerol, fatty acid esters of pentaerythritol, fatty acid esters of sorbitol and sorbitan, fatty acid esters of sucrose, alkyl ethers of polyhydric alcohols, fatty acid amides of alkanolamines and the like. [260] In the invention, ethylene oxide addacts of sorbitol and/or sorbitan fatty acid esters, polypropylene glycol ethylene oxide addacts, dimethylsiloxane-ethylene oxide block copolymers, dimethylsiloxane-(propylene oxide-ethylene oxide) block copolymers and fatty acid esters of polyhydric alcohols are more preferred. [0261] Further, from the standpoint of stable solubility in water or opacity, with respect to the nonionic surfactant, the HLB (hydrophile-lipophile balance) value thereof is preferably 6 or more, and more preferably 8 or more. Moreover, an oxyethylene adduct of acetylene glycol type or acetylene alcohol type or a surfactant of fluorine-based, silicon-based or the like can also be used. [0262] The amphoteric surfactant for use in the developer according to the invention is a compound having an anionic site and a cationic site in its molecule as well known in the field of surfactant and includes amphoteric surfactants of amino acid type, betain type, amine oxide type and the like. As the amphoteric surfactant used in the developer according to the invention, a compound represented by formula <1> shown below and a compound represented by formula <2> shown below are preferred. [263] [264] In formula <1>, R8 represents an alkyl group, R9 and RIO each represents a hydrogen atom or an alkyl group, RI 1 represents an alkylene group, and A represents a carboxylate ion or a sulfonate ion. In formula <2>, R18, R19 and R20 each represents a hydrogen atom or an alkyl group, provided that all of RI 8, R19 and R20 are not hydrogen atoms at the same time. [265] In formula <1>, the alkyl group represented by R8, R9 or RIO or the alkylene group represented by RI 1 may be a straight chain or branched structure, may also contain a connecting group in the chain thereof and may further have a substituent. As the connecting group, a connecting group containing a hetero atom, for example, an ester bond, an amido bond or an ether bond is preferred Further, as the substituent, a hydroxy group, an ethylene oxide group, a phenyl group, an amido group, a halogen atom or the like is preferred. Alternatively, R8, R9 and RIO may be connected with each other in the sate of a ring. As the state of a ring, a state of forming a 5-membered or 6-membered ring is preferred, and a state where the ring is a heterocyclic ring containing a hetero atom is particularly preferred. The hetero atom is preferably an oxygen atom, a nitrogen atom or a sulfur atom is preferred. In particular, a cationic structure of a substituted imidazole ring, a substituted imidazoline ring, a substituted imidazolidine or the like is preferred. In the compound represented by formula <1>, as the total number of carbon atoms increases, the hydrophobic portion becomes large and dissolution of the compound in an aqueous developer becomes difficult. In such a case, the dissolution is improved by adding a dissolution auxiliary agent, for example, an organic solvent, e.g., an alcohol. However, when the total number of carbon atoms excessively increases, the surfactant can not be dissolved in the proper amount in some cases. Therefore, the total number of carbon atoms included in R8 to RI 1 is preferably from 8 to 25, and more preferably from 11 to 21. [0266] In formula <2>, the alkyl group represented by RI 8, R19 or R20 may be a straight chain or branched structure, may also contain a connecting group in the chain thereof and may further have a substituent As the connecting group, a connecting group containing a hetero atom, for example, an ester bond, an amido bond or an ether bond is preferred. Further as the substituent, a hydroxy group, an ethylene oxide group, a phenyl group, an amido group, a halogen atom or the like is preferred. In the compound represented by formula <2> as the total number of carbon atoms increases, the hydrophobic portion becomes large and dissolution of the compound in an aqueous developer becomes difficult. In such a case, the dissolution is improved by adding a dissolution auxiliary agent, for example, an organic solvent, e.g., an alcohol. However, when the total number of carbon atoms excessively increases, the surfactant can not be dissolved in the proper amount in some cases. Therefore, the total number of carbon atoms included in RI 8 to R20 is preferably from 8 to 22, and more preferably from 10 to 20. [267] The total number of carbon atoms in the amphoteric surfactant may be influenced depending on property of the materials used in the photosensitive layer, especially, a binder polymer. When the binder polymer having high hydrophilicity is used, it tends to be preferred that the total number of carbon atoms is relatively small. When the binder having low hydrophilicity is used, it tends to be preferred that the total number of carbon atoms is relatively large. [268] Preferable specific examples of the amphoteric surfactant for use in the developer are set forth below, but the invention should not be construed as being limited thereto. [0269] [271] As the surfactant for use in the processing solution according to the invention, an anionic surfactant is preferred and an anionic surfactant containing a sulfonic acid or a sulfonic acid salt is particularly preferred. The surfactants may be used individually or in combination. The content of the surfactant in the developer is preferably from 0.01 to 10% by weight, and more preferably from 0.01 to 5% by weight [272] The processing solution in the invention may contain a wetting agent, an antiseptic agent, a chelating agent, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt or the like in addition the components described above. However, a water-soluble polymer compound is preferably not added, because in case of adding the water-soluble polymer compound, in particular, when the processing solution fatigues, the tackiness of plate surface tends to occur. [273] As the wetting agent, ethylene glycol, propylene glycol, triethylene glycol, butylene glycol, hexylene glycol, diethylene glycol, dipropylene glycol, glycerin, trimethylol propane, diglycerin or the like is preferably used. The wetting agents may be used individually or in combination of two or more thereof. The wetting agent is ordinarily used in an amount from 0.1 to 5% by weight based on the total weight of the processing solution [274] As the antiseptic agent, phenol or a derivative thereof, formalin, an imidazole derivative, sodium dehydroacetate, a 4-isothiazolin-3-one derivative, benzisotiazolin-3-one, 2-methyl-4-isothiazolin-3-one, a benzotriazole derivative, an amidine guanidine derivative, a quaternary ammonium salt, a derivative of pyridine, quinoline, guanidine or the like, diazine, a triazole derivative, oxazole, an oxazine derivative, a nitrobromoalcohol-based compound, e.g., 2-bromo-2-nitropropane-l,3-diol, l,l-dibromo-l-nitro-2-ethanol, l,l-dibromo-l-nitro-2-propanol or the like is preferably used. It is preferred to use two or more kinds of the antiseptic agents so as to exert the effect to various molds and bacteria The amount of the antiseptic agent added is an amount stably exerts the effect to bacterium, molds, yeast or the like. Although the amount of the antiseptic agent added may be varied depending on the kind of the bacterium, molds, yeast or the like, it is preferably in a range from 0.01 to 4% by weight based on the processing solution [275] As the chelating agent, for example, ethylenediaminetetraacetic acid, potassium salt thereof, sodium salt thereof; diethylenetriaminepentaacetic acid, potassium salt thereof, sodium salt thereof; triethylenetetraminehexaacetic acid, potassium salt thereof, sodium salt thereof; hydroxyethylethylenediaminetriacetic acid, potassium salt thereof, sodium salt thereof; nitrilotriacetic acid, sodium salt thereof; an organic phosphonic acid, for example, 1-hydroxy ethane-1,1-diphosphonic acid, potassium salt thereof, sodium salt thereof, aminotri(methylenephosphonic acid), potassium salt thereof, sodium salt thereof or a phosphonoalkanetricarboxylic acid is exemplified. A salt of an organic amine is also effectively used in place of the sodium salt or potassium salt in the chelating agent The chelating agent is so selected that it is stably present in the processing solution and does not impair the printing property. The content of the chelating agent is preferably from 0.001 to 1.0% by weight based on the processing solution. [276] As the defoaming agent a conventional silicone-based self-emulsifying type or emulsifying type defoaming agent, a nonionic compound having HLB of 5 or less or the like is used. The silicone defoaming agent is preferably used. Any of emulsifying dispersing type, solubilizing type and the like can be used. The content of the defoaming agent is preferably from 0.001 to 1.0% by weight based on the processing solution. [277] As the organic acid, citric acid, acetic acid, oxalic acid, malonic acid, salicylic acid, caprylic acid, tartaric acid, malic acid, lactic acid, levulinic acid, p-toluenesulfonic acid, xylenesulfonic acid, phytic acid, an organic phosphonic acid or the like is exemplified. The organic acid can also be used in the form of an alkali metal salt or an ammonium salt The content of the organic acid is preferably from 0.01 to 0.5% by weight based on the processing solution. [278] As the organic solvent, for example, an aliphatic hydrocarbon (e.g., hexane, heptane, ISOPAR E, ISOPAR H, ISOPAR G (produced by ESSO Chemical Co., Ltd.), gasoline or kerosene), an aromatic hydrocarbon (e.g., toluene or xylene), a halogenaled hydrocarbon (e.g., methylene dichloride, ethylene dichloride, trichlene or monochlorobenzene) or a polar solvent is exemplified. [279] As the polar solvent, an alcohol (e.g., methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethyoxyethanol, diethylene glycol monoethyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether, polyethylene glycol monomethyl ether, polypropylene glycol, tetraethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monobenzyl ether, ethylene glycol monophenyl ether, methyl phenyl carbinol, n-amyl alcohol or methylamyl alcohol), a ketone (e.g., acetone, methyl ethyl ketone, ethyl butyl ketone, methyl isobutyl ketone or cyclohexanone), an ester (e.g., ethyl acetate, propyl acetate, butyl acetate, amyl acetate, benzyl acetate, methyl lactate, butyl lactate, ethylene glycol monobutyl acetate, polyethylene glycol monomethyl ether acetate, diethylene glycol acetate, diethyl phthalate or butyl levulinate), others (e.g., triethyl phosphate, tricresyl phosphate, N-phenylethanolamine or N-phenyldiethanolamine) or the like is exemplified. [280] Further, when the organic solvent is insoluble in water, it may be employed by being solubilized in water using a surfactant or the like. In the case where the developer contains the organic solvent, the concentration of the organic solvent is desirably less than 40% by weight in view of safety and inflammability. [0281] As the inorganic acid or inorganic salt, phosphoric acid, methaphosphoric acid, ammonium primary phosphate, ammonium secondary phosphate, sodium primary phosphate, sodium secondary phosphate, potassium primary phosphate, potassium secondary phosphate, sodium tripolyphosphate, potassium pyrophosphate, sodium hexamethaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogen sulfate, nickel sulfate or the like is exemplified. The content of the inorganic salt is preferably from 0.01 to 0.5% by weight based on the total weight of the processing solution. [0282] The temperature of the development is ordinarily 60°C or lower, and preferably from about 15 to about 40°C. In the case of conducting the development processing using an automatic developing machine, the developer becomes fatigued in accordance with the processing amount, and hence the processing ability may be restored using a replenisher or a fresh developer. [283] In the method of preparing a lithographic printing plate according to the invention, the entire surface of the lithographic printing plate precursor may be heated between the exposure and the development, if desired. By the heating, the image-forming reaction in the image-recording layer is accelerated and advantages, for example, improvements in the sensitivity and printing durability and stabilization of the sensitivity may be achieved. [284] The conditions of the heating can be appropriately determined in a range for achieving such effects. As the heating means, a conventional convection oven, an IR irradiation apparatus, an IR laser, a microwave apparatus, a Wisconsin oven or the like is exemplified For instance, the heat treatment can be conducted by maintaining the lithographic printing plate precursor at a plate surface temperature ranging from 70 to 150°C for a period from one second to 5 minutes, preferably at 80 to 140°C for 5 to one minute, more preferably at 90 to 130°C for 10 to 30 seconds. The above-described range is preferred because the effects described above are efficiently achieved and an adverse affect, for example, change in shape of the lithographic printing plate precursor due to the heat can be preferably avoided It is preferred that a heat treatment means used in the heat treatment step is connected with a plate setter used in the exposure step and a development apparatus used in the development processing step and the lithographic printing plate precursor is subjected to automatically continuous processing. Specifically, a plate making line wherein the plate setter and the development apparatus are connected with each other by transport means, for example, a conveyer is exemplified. Also, the heat treatment means may be placed between the plate setter and the development apparatus or the heat treatment means and the development apparatus may constitute a unit apparatus. [285] In case where the lithographic printing plate precursor used is apt to be influenced by surrounding light under a working environment, it is preferred that the plate making line is blinded by a filter, a cover or the like. The entire surface of lithographic printing plate after development may be exposed to active ray, for example, ultraviolet light to accelerate curing of the image area. As a light source for the entire surface exposure, for example, a carbon arc lamp, a mercury lamp, a gallium lamp, a metal halide lamp, a xenon lamp, a tungsten lamp or various laser beams is exemplified. In order to obtain sufficient printing durability, the amount of the entire surface exposure is preferably 10 mJ/cm2 or more, and more preferably 100 mJ/cm2 or more. Heating may be performed at the same time with the entire surface exposure. By performing the heating, further improvement in the printing durability is recognized. Examples of the heating means include a conventional convection oven, an IR irradiation apparatus, an IR laser, a microwave apparatus or a Wisconsin oven. The plate surface temperature at the heating is preferably from 30 to 150°C, more preferably from 35 to 130°C, and still more preferably from 40 to 120°C. Specifically, a method described in JP-A-2000-89478 can be utilized. Further, for the purpose of increasing printing durability, the lithographic printing plate after development can be heated under very strong conditions. The heat temperature is ordinarily in a range from 200 to 500°C. When the temperature is too low, a sufficient effect of strengthening the image may not be obtained, whereas when it is excessively high, problems of deterioration of the support and thermal decomposition of the image area may occur sometimes. The lithographic printing plate thus-obtained is mounted on an off-set printing machine to use for printing a large number of sheets. EXAMPLES [286] The invention will be described in more detail with reference to the following examples, but the invention should not be construed as being limited thereto. [0287] [Preparation of support] An aluminum plate (US A1050) having a thickness of 0.03 mm was subjected to surface treatment shown below. (a) Mechanical surface roughening treatment Mechanical surface roughening treatment of an aluminum plate was conducted by means of rotating roller-form nylon brush while supplying a suspension having specific gravity of 1.12 of an abrasive (pumice) in water as an abrasion slurry liquid to a surface of the aluminum plate. The average particle size of the abrasive was 30 jam and the maximum particle size was 100 μm. The material of the nylon brush was 6-10 nylon and the brush has a bristle length of 45 mm and a bristle diameter of 0.3 mm. The nylon brush was made by making holes in a stainless steel cylinder having a diameter of 300 mm and densely filling the brush bristles. Three of the rotating nylon brushes were used. Two supporting rollers (each having a diameter of 200 mm) were provided under the brush rollers at 300 mm intervals. The brush rollers were pressed against the aluminum plate till the load applied to a driving motor for rotating the brush became 7 kW greater than the load before pressing the brush rollers against the aluminum plate. The rotating direction of the brushes was the same as the moving direction of the aluminum plate. The rotation number of the brushes was 200 rpm. [0288] (b) Alkali etching treatment Alkali etching treatment of the aluminum plate was conducted by spraying an aqueous solution having a sodium hydroxide concentration of 26% by weight, aluminum ion concentration of 6.5% by weight and temperature of 70°C to dissolve the aluminum plate in an amount of 10 g/m . Subsequently, the plate was washed with water by spraying. [289] (c) Desmut treatment Desmut treatment of the aluminum plate was conducted by spraying an aqueous solution having a nitric acid concentration of 1% by weight (containing 0.5% by weight of aluminum ion) and temperature of 30°C, followed by washing with water by spraying. [290] (d) Electrochemical surface roughening treatment Electrochemical surface roughening treatment of the aluminum plate was continuously conducted by applying 60 Hz alternating current voltage. The electrolytic solution used was an aqueous solution containing 10.5 g/liter of nitric acid (containing 5 g/liter of aluminum ion and 0.007% by weight of ammonium ion) and the solution temperature was 50°C. The electrochemical surface roughening treatment was conducted using a trapezoidal rectangular wave alternating current where time (TP) for reaching the current to its peak from zero was 0.8 msec and a duty ratio was 1:1, and using a carbon electrode as a counter electrode. A ferrite was used as an auxiliary anode. Hie electrolytic cell used was a radial cell type. The current density was 30 A/dm2 at die peak current, and the electric quantity was 220 C/dm2 in terms of the total electric quantity during the aluminum plate functioning as an anode. To the auxiliary anode, 5% of the current from the electric source was divided. Subsequently, the plate was washed with water by spraying. [291] (e) Alkali etching treatment Alkali etching treatment of the aluminum plate was conducted at 32°C by spraying an aqueous solution having a sodium hydroxide concentration of 26% by weight and an aluminum ion concentration of 6.5% by weight to dissolve the aluminum plate in an amount of 0.50 g/m2. Thus, the smut component mainly comprising aluminum hydroxide formed in the precedent step of electrochemical surface roughening treatment using alternating current was removed and an edge portion of the pit formed was dissolved to smoothen the edge portion. Subsequently, the plate was washed with water by spraying. [292] (f) Desmut treatment Desmut treatment of the aluminum plate was conducted by spraying an aqueous solution having a sulfuric acid concentration of 15% by weight (containing 4.5% by weight of aluminum ion) and temperature of 30°C, followed by washing with water by spraying. [293] (g) Electrochemical surface roughening treatment Electrochemical surface roughening treatment of the aluminum plate was continuously conducted by applying 60 Hz alternating current voltage. The electrolytic solution used was an aqueous solution containing 5.0 g/liter of hydrochloric acid (containing 5 g/liter of aluminum ion) and the solution temperature was 35°C. The electrochemical surface roughening treatment was conducted using a trapezoidal rectangular wave alternating current where time (TP) for reaching the current to its peak from zero was 0.8 msec and a duty ratio was 1:1, and using a carbon electrode as a counter electrode. A ferrite was used as an auxiliary anode. The electrolytic cell used was a radial cell type. The current density was 25 A/dm2 at the peak current, and the electric quantity was 50 C/dm2 in terms of the total electric quantity during the aluminum plate functioning as an anode. Subsequently, the plate was washed with water by spraying. [294] (h) Anodizing treatment Anodizing treatment of the aluminum plate was conducted using an anodizing treatment apparatus according to a two-stage feeding electrolytic treatment method (lengths of a first electrolytic unit and a second electrolytic unit: 6 m each; lengths of a first feeding unit and a second feeding unit: 3 m each; lengths of a first feeding electrode unit and a second feeding electrode unit: 2.4 m each). The electrolytic solutions supplied to the first electrolytic unit and second electrolytic unit had a sulfuric acid concentration of 50 g/liter (containing 0.5% by weight of aluminum ion) and temperature of 20°C, respectively. Subsequently, the plate was washed with water by spraying. The amount of the final anodic oxide film was 2.7 g/m2. [295] The aluminum plate subjected to conducting all steps (a) to (h) was referred to as Support 1. The aluminum plate subjected to conducting only steps (d) to (h) was referred to as Support 2. The aluminum plate subjected to conducting only steps (d) to (f) and (h) was referred to as Support 3. The center line average roughness (Ra indication according to JIS B0601) of each support was measured using a stylus having a diameter of 2 jam and it was found that the center line average roughness of Support 1, Support 2 and Support 3 were 0.52 μm, 0.28 μm and 0.25 μm, respectively. [296] Supports 1 to 3 were immersed in an aqueous solution containing 4 g/liter of polyvinylphosphonic acid of 40°C for 10 seconds, washed with tap water of 20°C for 2 seconds and dried to prepare Supports 4 to 6, respectively. On Supports 1 to 3 was coated Undercoat solution 1 shown below using a bar coater so as to have a dry coating amount of 2 mg/m2, followed by drying at 80°C for 20 seconds to prepare Supports 7 to 9, respectively. [297] [Undercoat solution 1] Polymer (SP1) shown below (Mw = 50,000) 0.3 g Pure water 60.0 g Methanol 939.7 g [298] Polymer (SP1) [299] On Supports 1 to 3 was coated Undercoat solution 2 shown below using a bar coater so as to have a dry coating amount of 20 mg/m , followed by drying at 80°C for 20 seconds to prepare Supports 10 to 12, respectively. [300] [Undercoat solution 2] Sol solution shown below 200 g Methanol 800 g [301] (Sol solution) PHOSMER PE (produced by Uni-Chemical Co., Ltd) 52 g Methanol 44 g Water 14 g Phosphoric acid (85% by weight) 11 g Tetraethoxysilane 36 g 3-Methacryloxypropyltrimethoxysilane 12 g [302] On Supports 1 to 3 was coated Undercoat solution 3 shown below using a bar coater so as to have a diy coating amount of 2 mg/m2, followed by (hying at 80°C for 20 seconds to prepare Supports 13 to 15, respectively. [303] [Undercoat solution 3] Polymer (SP2) shown below (Mw = 30,000) 0.3 g Pure water 60.0 g Methanol 939.7 g [304] Polymer (SP2) [305] [Formation of Photosensitive layer] Coating solution 1 for photosensitive layer having the composition shown below was coated on a support using a bar coater and dried at 90°C for one minute to form Photosensitive layer 1. The dry coating amount of the photosensitive layer was 1.35 g/m . [306] (Coating solution 1 for photosensitive layer) Polymerizable compound (PLEX 6661-0, produced by Degussa 1.69 parts by AG) weight Binder polymer PP-3 described hereinbefore 1.87 parts by weight Sensitizing dye (D40) described hereinbefore 0.13 parts by weight Polymerization initiator shown below (produced by Kurogane Kasei 0.46 parts by Co., Ltd.) weight 25% Methyl ethyl ketone dispersion of e-Phthalocyanine (Fl) shown 1.70 parts by below weight Mercapto group-containing heterocyclic compound (SH-8) described 0.34 parts by hereinbefore weight Fluorine-based nonionic surfactant (MEGAFAC F-780F, produced 0.03 parts by by Dainippon Ink & Chemicals, Inc.) weight CUPFERRON AL (produced by Wako Pure Chemical Industries, 0.12 parts by Ltd)(l 0% tricresyl phosphate solution) weight Methyl ethyl ketone 27.0 parts by weight Propylene glycol monomethyl ether 26.7 parts by weight NOVOPERM YELLOW H2G (produced by Clariant Corp.) 0.20 parts by weight [307] Binder Polymer PP-3 used in the coating solution for photosensitive layer had a molar ratio of the repeating units of 10:14:76 in order from the left and a weight average molecular weight of 90,000. [308] e-Phthalocyanine (Fl) [309] Polymerization initiator [310] Coating solution 2 for photosensitive layer having the composition shown below was coated on a support so as to have a dry coating amount of 1.4 g/m2 and dried at 100°C for one minute to form Photosensitive layer 2. [311] (Coating solution 2 for photosensitive layer) Polymerizable compound (Compound A) 4.0 parts by weight Binder polymer (Binder A) (Mw= 100,000) 2.0 parts by weight Sensitizing dye (C-l) shown below 0.32 parts by weight Polymerization initiator (D-l) shown below 0.61 parts by weight Chain transfer agent (E-l) shown below 0.57 parts by weight N-Nitrosophenylhydroxylamine aluminum salt 0.020 part by weight Dispersion of s-phthalocyanine pigment 0.71 parts by (pigment: 15 parts by weight; dispersing agent (Polymer (1) weight shown below): 10 parts by weight; solvent (cyclohexanone/methoxypropyl acetate/1-methoxy-2-propanol = 15 parts by weight/20 parts by weight/40 parts by weight)) Fluorine-based nonionic surfactant (MEGAFAC F-780, produced 0.016 part by by Dainippon Ink & Chemicals, Inc.) weight Methyl ethyl ketone 47 parts by weight Propylene glycol monomethyl ether 45 parts by weight [0312] Compound A Mixture of the isomers shown above Binder A [313] Sensitizing dye (C-l) Polymerization initiator (D-l) Chain transfer agent (E-l) [314] Coating solution 3 for photosensitive layer having the composition shown below was coated on a support using a bar and dried in an oven at 100°C for 44 seconds to form Photosensitive layer 3 having a dry coating amount of 1.3 g/m2. [315] (Coating solution 3 for photosensitive layer) Binder polymer PU-A shown below 0.45 g Polymerizable Compound (1) shown below 0.52 g (PLEX 6661-0, produced by Degussa Japan) Sensitizing dye (1) shown below 0.04 g Polymerization initiator (1) shown below 0.08 g Co-sensitizer (1) shown below 0.05 g Dispersion of e-phthalocyanine pigment 0.40 g (pigment: 15 parts by weight; dispersing agent (Polymer (1) shown below): 10 parts by weight; solvent (cyclohexanone/methoxypropyl acetate/l-methoxy-2-propanol = 15 parts by weight/20 parts by weight/40 parts by weight)) Thermal polymerization inhibitor 0.006 g (N-nitrosophenylhydroxylamine aluminum salt) Fluorine-based surfactant (1) shown below 0.002 g l-Methoxy-2-propanol 8.0 g Methyl ethyl ketone 8.0 g [0316] Mw: 70,000, Average value of n: 17 Binder polymer PU-A [317] [318] Fluorine-based surfactant (1) [319] Photosensitive layer 4 was formed in the same manner as in the formation of Photosensitive layer 1 except for using Sensitizing dye (A) shown below in place of Sensitizing dye (D40) used in Coating solution 1 for photosensitive layer. [320] Sensitizing dye (A) [321] Photosensitive layer 5 was formed in the same manner as in the formation of Photosensitive layer 1 except for using Sensitizing dye (B) shown below in place of Sensitizing dye (D40) used in Coating solution 1 for photosensitive layer. [322] Sensitizing dye (B) [323] [Formation of protective layer] Coating solution for protective layer having the composition shown below was coated on a photosensitive layer using a bar coater so as to have a dry coating amount of 2.5 g/m2 and dried at 120°C for one minute to form Protective layer 1. (Coating solution for protective layer) PVA 105 (saponification degree: 98% by mole, produced by 1.80 parts by Kuraray Co., Ltd.) weight Polyvinylpyrrolidone 0.40 parts by weight EMALEX 710 (nonionic surfactant, produced by Nihon 0.04 parts by Emulsion Co., Ltd.) weight PION1ND230 (surfactant, produced by Takemoto Oil & Fat Co., 0.05 parts by Ltd.) weight LUVISKOL V64W (produced by BASF) 0.06 parts by weight 13% Aqueous solution of polymer (Mw = 50,000) shown below 0.36 parts by weight Pure water 36.0 parts by weight [324] [325] Protective layer 2 was prepared in the same manner as in the formation of Protective layer 1 except for changing PVA 105 used in Protective layer 1 to GOSERAN CKS-50 (produced by Nippon Synthetic Chemical Industry Co., Ltd., saponification degree: 99% by mole; average polymerization degree: 300; modification degree: about 0.4% by mole). [326] A mixed aqueous solution of 80% by weight of polyvinyl alcohol (saponification degree: 98% by mole, polymerization degree: 500), 17% by weight of polyvinylpyrrolidone (LUVISKOLK-30, produced by BASF), 1.0% by weight of EMALEX 710 (nonionic surfactant, produced by Nihon Emulsion Co., Ltd.) and 2% by weight of a surfactant (PIONIN D230, produced by Takemoto Oil & Fat Co., Ltd.) was coated on a photosensitive layer using a wire bar and dried by a hot air drying device at 125°C for 75 seconds to form Protective layer 3 having a dry coating amount of 2.45 g/m2. [327] Coating solution for protective layer having the composition shown below was coated on a photosensitive layer using a bar and dried in an oven at 125°C for 70 seconds to form Protective layer 4 having a dry coating amount of 1.25 g/m . (Coating solution for protective layer) Dispersion of mica shown below 0.6 g Sulfonic acid-modified polyvinyl alcohol (GOSERAN CKS-50, 0.8 g produced by Nippon Synthetic Chemical Industry Co., Ltd., saponification degree: 99% by mole, average polymerization degree: 300, modification degree: about 0.4% by mole) Vinyl pyrrolidone/vinyl acetate (1/1) copolymer (molecular 0.001 g weight: 70,000) Surfactant (EMALEX 710, produced by Nihon Emulsion Co., 0.002 g Ltd.) Water 13 g [328] (Dispersion of mica) In 368 g of water was added 32 g of synthetic mica (SOMASIF ME-100, produced by CO-OP Chemical Co., Ltd., aspect ratio: 1,000 or more) and the mixture was dispersed using a homogenizer until Ihe average particle diameter (measured by a laser scattering method) became 0.5 mm to obtain the dispersion of mica. [329] Supports 4 to 15, Photosensitive layers 1 to 5 and Protective layers 1 to 4 described above were used in the combination as shown in Table A below to prepare 15 kinds of lithographic printing plate precursors. [330] [Exposure, Development and Printing] Each lithographic printing plate precursor was subjected to image exposure by Violet Semiconductor Laser Plate Setter Vx9600 (equipped with InGaN semiconductor laser (emission wavelemgth: 405 nm ±10 nm/output: 30 mW)) produced by FFEI, Ltd. The image drawing was performed using an FM screen (TAFFETA 20, produced by FUJIFILM Corp.) at resolution of 2,438 dpi. and in a plate surface exposure amount of 0.05 mJ/cm . Then, the exposed lithographic printing plate precursor was pre-heated at 100°C for 30 seconds and subjected to development processing (one solution and one bath processing) by an automatic development processor having a structure as shown in Fig. 1 using each processing solution having the composition shown below. The automatic development processor had a 25 liter developing tank and one brush roller having an outer diameter of 50 mm and being implanted with fiber of polybutylene terephthalate (bristle diameter: 200 |am, bristle length: 17 mm), and the brush roller was rotated at 200 rpm in the same direction as the transporting direction (peripheral velocity at the tip of brush: 0.52 m/sec). The temperature of the processing solution was 30°C. The transportation of the lithographic printing plate precursor was performed at transporting speed of 100 cm/min. After the development processing, drying was conducted in a drying unit. The temperature of the drying was 80°C. [331] Processing solution 1 (pH: 9.7) Water 9279.8 g Sodium carbonate 13 0 g Sodium hydrogen carbonate 70 g NEWCOLB13 500 g (polyoxyalkylene aryl ether (nonionic surfactant produced by Nippon Nyukazai Co., Ltd.)) Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-l,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [332] Processing solution 2 (pH: 9.7) Water 8963.8 g Sodium carbonate 200 g Sodium hydrogen carbonate 100 g NEWCOL B4SN (61 % aqueous solution) (polyoxyethylene naphthyl 656 g ether sulfate (anionic surfactant produced by Nippon Nyukazai Co., Ltd.)) EDTA 4Na 80 g 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [333] Processing solution 3 (pH: 9.7) Water 8665 g Potassium carbonate 150 g Potassium hydrogen carbonate 80 g ELEMINOL MON (47% aqueous solution) 745 g (sodium dodecyldiphenyl ether disulfonate (anionic surfactant produced by Sanyo Chemical Industries, Ltd.)) Ammonium primary phosphate 180 g Sodium hexametaphosphate 180 g [334] Processing solution 4 (pH: 9.5) Water 9009.8 g Sodium carbonate 200 g Sodium hydrogen carbonate 140 g PIOMND3HO 450 g (polyoxyethylene laurylamino ether (nonionic surfactant produced by Takemoto Oil & Fat Co., Ltd.)) Sodium citrate 100 g Ammonium primary phosphate 20 g Propylene glycol 80 g 2-Bromo-2-nitropropane-l,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [335] Processing solution 5 (pH: 9.8) Water 8150.8 g Sodium carbonate 200 g Sodium hydrogen carbonate 80 g PELEX NBL (35% aqueous solution) 1429 g (sodium alkylnaphthalenesulfonate (anionic surfactant produced by Kao Corp.)) Citric acid 40 g Ammonium primary phosphate 20 g Propylene glycol 80 g 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [336] Processing solution 6 (pH: 9.5) Water 8250 g Sodium carbonate 160 g Sodium hydrogen carbonate 160 g PIONIN CI57K (40% aqueous solution) (amphoteric surfactant, W-2 1250 g described hereinbefore) Sodium hexametaphosphate 180 g [337] Processing solution 7 (pH: 9.4) Water 7099.8 g Sodium carbonate 13 0 g Sodium hydrogen carbonate 70 g TAKESURF C-157-L (30% aqueous solution) (amphoteric surfactant 2500 g produced by Takemoto Oil & Fat Co., Ltd., W-2 described hereinbefore) 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g Sodium citrate 150 g EDTA 4Na 50 g [338] Processing solution 8 (pH: 9.7) Water 9219.8 g Potassium carbonate 13 0 g Potassium hydrogen carbonate 70 g W-l 560 g (betaine surfactant) Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [339] Processing solution 9 (pH: 9.7) Water 8969.8 g Potassium carbonate 200 g Potassium hydrogen carbonate 100 g W-l 8 650 g EDTA 4Na 80 g 2-Bromo-2-nitropropane-l,3-diol 0.1 g 2-MethyM-isothiazolin-3 -one 0.1 g [340] Processing solution 10 (pH: 8.6) Water 9219.8 g Potassium carbonate 10 g Potassium hydrogen carbonate 200 g W-l 560 g (betaine surfactant) Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-l,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [341] Processing solution 11 (pH: 10.5) Water 9219.8 g Sodium carbonate 180 g Sodium hydrogen carbonate 20 g W-l 560 g (betaine surfactant) Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-l,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [342] Comparative processing solution 1 (pH: 9.7) Water 9779.8 g Sodium carbonate 130 g Sodium hydrogen carbonate 70 g Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [343] Comparative processing solution 2 (pH: 11.9) Water 9448.8 g Potassium carbonate 17 g KOH (48%) 14 g NEWCOLB13 500 g Ammonium primary phosphate 20 g 2-Bromo-2-nitropropane-1,3-diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [344] Comparative processing solution 3 (pH: 11.9) Water 7799.8 g SURFYNOL 465 500 g (ethoxylated 2,4,7,9-tetramethyl-5-decyn-4,7-diol (nonionic surfactant produced by Airproducts and Chemicals Inc.)) Sodium tertiary phosphate 500 g EMDEX 30AN45 1200 g (dextrin derived from potato starch, produced by Emsland Staerke GmbH) 2-Bromo-2-nitropropane-1,3 -diol 0.1 g 2-Methyl-4-isothiazolin-3-one 0.1 g [345] The lithographic printing plate obtained was mounted on a printing machine (SOR-M, produced by Heidelberg) and printing was performed at a printing speed of 6,000 sheets per hour using dampening water (EU-3 (etching solution, produced by FUJIFILM Corp.))/waler/isopropyl alcohol = 1/89/10 (by volume ratio)) and TRANS-G(N) black ink (produced by Dai-Nippon Ink & Chemicals, Inc.). [346] [Evaluation] Using each lithographic printing plate precursor, the developing property, processing property and printing durability were evaluated in the manner described below. [347] After each lithographic printing plate precursor was subjected to development processing under the conditions described above in an amount of 500 m2 taking one week, the occurrence of scum adhered on the tank wall of the automatic development processor was visually observed. The scum occurred was mainly caused by the binder of the protective layer. The evaluation was conducted according to the following criteria: 0: Case where the scum did not occur. A: Case where although the scum occurred, it was at the acceptable level. X: Case where the occurrence of scum was severe. [348] After the development processing of 500 m2 described above, the last plate was touched with hands to compare the degree of tackiness of the plate surface. The evaluation was conducted as relative comparison according to the following criteria: O: Case where the plate surface was dry. X: Case where the plate surface was tacky. A: Case of intermediate degree. [349] As increase in the number of printed materials, the image area of the photosensitive layer formed on the lithographic printing plate was gradually abraded to cause decrease in the ink receptivity, resulting in decrease in ink density of the image on the printed material. A number of printed materials obtained until die ink density (reflection density) decreased by 0.1 from that at the initiation of printing was determined to evaluate the printing durability (just after preparation). Also, after the preparation of the lithographic printing plate, it was allowed to stand under an environment of temperature of 25°C and humidity of 60% for one week and then subjected to the printing under the conditions described above to evaluate the printing durability (after one week preservation) in the same manner. The results of the evaluation are shown in Table A. [350] [351] From the results shown in Table A, it can be seen that according to the method of preparing a lithographic printing plate of the invention, despite the one bath processing with the weak alkaline developer, the occurrence of scum in the developing tank is prevented, the processing property is excellent, and the tackiness of the surface of printing plate is prevented. Further, the deterioration of the printing durability caused by preservation of lithographic printing plate after the development processing is hardly recognized. INDUSTRIAL APPLICABILITY [352] The method of preparing a lithographic printing plate according to the invention is excellent in the processing property and provides a lithographic printing plate free from the tackiness on the surface thereof. Further, even when the lithographic printing plate is preserved after the development until printing, deterioration of the printing durability does not occur. Moreover, since it becomes possible to conduct one solution development with a weak alkaline processing solution, advantages, for example, simplification of processing steps, consideration for global environment and adaptation for space saving and low running cost can be achieved. [353] Although the invention has been described in detail and by reference to specific embodiments, it is apparent to those skilled in the art that it is possible to add various alterations and modifications insofar as the alterations and modifications do not deviate from the spirit and the scope of the invention. This application is based on a Japanese patent application filed on August 22, 2008 (Japanese Patent Application No. 2008-214507) and a Japanese patent application filed on December 4, 2008 (Japanese Patent Application No. 2008-309666), and the contents thereof are incorporated herein by reference. DESCRIPTION OF REFERENCE NUMERALS AND SIGNS [354] 4 Lithographic printing plate precursor 6 Developing unit 10 Drying unit 16 Transport roller 20 Developing tank 22 Transport roller 24 Brush roller 26 Squeeze roller 28 Backup roller 36 Guide roller 38 Skewer roller CLAIMS 1. A method of preparing a lithographic printing plate, substantially comprising: imagewise exposing a negative lithographic printing plate precursor comprising an image-recording layer containing the following (i), (ii), (iii) and (iv) on a support; and processing the exposed lithographic printing plate precursor with an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a surfactant, (i) a sensitizing dye, (ii) a photopolymerization initiator, (iii) an addition polymerizable compound having an ethylenically unsaturated double bond, (iv) a binder polymer. 2. The method of preparing a lithographic printing plate as claimed in claim 1, wherein the aqueous solution does not contain a water-soluble polymer compound. 3. The method of preparing a lithographic printing plate as claimed in claim 1 or 2, wherein the sensitizing dye (i) has an absorption maximum in a wavelength range from 350 to 450 nm. 4. The method of preparing a lithographic printing plate as claimed in claim 3, wherein the sensitizing dye (i) is a sensitizing dye represented by one of the following formulae (1) to (5): wherein, in the formula (1), A represents an aromatic cyclic group which may have a substituent or a heterocyclic group which may have a substituent, X represents an oxygen atom, a sulfur atom or N-(R3), and Ri, R2 and R3 each independently represents a monovalent non-metallic atomic group, or A and Ri or R2 and R3 may be combined with each other to form an aliphatic or aromatic ring; wherein in the formula (2), A represents a sulfur atom or NR6,R6 represents a monovalent non-metallic atomic group, Y represents a non-metallic atomic group necessary for forming a basic nucleus of the dye together with adjacent A and the adjacent carbon atom, and X1 and X2 each independently represents a monovalent non-metallic atomic group or X1 and X2 may be combined with each other to form an acidic nucleus of the dye; wherein, in the formula (3), =Z represents an oxo group, a thioxo group, an imino group or an alkylydene group represented by the foregoing partial structural formula (1'), X1 and X2 have the same meanings as defined in the formula (2) respectively, and R7 to R12 each independently represents a monovalent non-metallic atomic group; wherein, in the formula (4), Ar3 represents an aromatic group which may have a substituent or a heteroaromatic group which may have a substituent, R13 represents a monovalent non-metallic atomic group, or Ar3 and R13 may be combined with each other to form a ring; wherein, in the formula (5), X3, X4 and R14 to R21 each independently represents a monovalent non-metallic atomic group. 5. The method of preparing a lithographic printing plate as claimed in claim 3, wherein the sensitizing dye (i) is a sensitizing dye represented by the following formula (I), (II) or (III): wherein, in the formula (I), R1 to R14 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a cyano group or a halogen atom, provided that at least one of R1 to R10 represents an alkoxy group having 2 or more carbon atoms, in the formula (II), R15 to R32 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a cyano group or a halogen atom, provided that at least one of R15 to R24 represents an alkoxy group having 2 or more carbon atoms, wherein in the formula (HI), R1 , R2 and R3 each independently represents a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, an aralkyl group which may have a substituent, an -NR4R5 group or an -OR6 group, R4, R5 and R6 each independently represents a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, and k, m and n each represents an integer from 0 to 5. 6. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 5, wherein the imagewise exposing is conducted using laser emitting light from 350 to 450 nm. 7. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 6, wherein pH of the aqueous solution is from 8.5 to 10.8. 8. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 7, wherein the binder polymer (iv) has an acid group in its side chain. 9. The method of preparing a lithographic printing plate as claimed in claim 8, wherein the acid group is a carboxylic acid group. 10. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 9, wherein the lithographic printing plate precursor comprises a protective layer on the image-recording layer. 11. The method of preparing a lithographic printing plate as claimed in claim 10, wherein the protective layer contains an acid-modified polyvinyl alcohol. 12. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 11, wherein the processing with an aqueous solution is conducted with one solution. 13. The method of preparing a lithographic printing plate as claimed in any one of claims 1 to 11, wherein the processing with an aqueous solution is conducted with one bath. 14. A lithographic printing plate precursor which is used in the method of preparing a lithographic printing plate as claimed in any one of claims 1 to 13.

Documents

Application Documents

# Name Date
1 1213-CHENP-2011 PCT 22-02-2011.pdf 2011-02-22
2 1213-CHENP-2011 FORM-5 22-02-2011.pdf 2011-02-22
3 1213-CHENP-2011 FORM-3 22-02-2011.pdf 2011-02-22
4 1213-CHENP-2011 FORM-2 22-02-2011.pdf 2011-02-22
5 1213-CHENP-2011 FORM-1 22-02-2011.pdf 2011-02-22
6 1213-CHENP-2011 DRAWINGS 22-02-2011.pdf 2011-02-22
7 1213-CHENP-2011 DESCRIPTION(COMPLETE) 22-02-2011.pdf 2011-02-22
8 1213-CHENP-2011 CLAIMS 22-02-2011.pdf 2011-02-22
9 1213-CHENP-2011 ABSTRACT 22-02-2011.pdf 2011-02-22
10 1213-CHENP-2011 CORRESPONDENCE OTHERS 22-02-2011.pdf 2011-02-22
11 1213-CHENP-2011 POWER OF ATTORNEY 22-02-2011.pdf 2011-02-22
12 1213-CHENP-2011 FORM-3 23-08-2011.pdf 2011-08-23
13 1213-CHENP-2011 CORRESPONDENCE OTHERS 23-08-2011.pdf 2011-08-23
14 1213-CHENP-2011 FORM-18 14-08-2012..pdf 2012-08-14
15 1213-CHENP-2011 FORM-13 14-08-2012..pdf 2012-08-14
16 1213-CHENP-2011 CORRESPONDENCE OTHERS 14-08-2012..pdf 2012-08-14
17 1213-CHENP-2011 AMENDED CLAIMS 14-08-2012..pdf 2012-08-14
18 1213-CHENP-2011 CORRESPONDENCE OTHERS 04-07-2014.pdf 2014-07-04
19 1213-CHENP-2011-FER.pdf 2018-03-28
20 1213-CHENP-2011-PETITION UNDER RULE 137 [30-08-2018(online)].pdf 2018-08-30
21 1213-CHENP-2011-OTHERS [30-08-2018(online)].pdf 2018-08-30
22 1213-CHENP-2011-FORM 3 [30-08-2018(online)].pdf 2018-08-30
23 1213-CHENP-2011-FER_SER_REPLY [30-08-2018(online)].pdf 2018-08-30
24 1213-CHENP-2011-DRAWING [30-08-2018(online)].pdf 2018-08-30
25 1213-CHENP-2011-CLAIMS [30-08-2018(online)].pdf 2018-08-30
26 1213-CHENP-2011-ABSTRACT [30-08-2018(online)].pdf 2018-08-30
27 Marked Up Claims_Granted 301461_26-09-2018.pdf 2018-09-26
28 Drawing_Granted 301461_26-09-2018.pdf 2018-09-26
29 Description_Granted 301461_26-09-2018.pdf 2018-09-26
30 Claims_Granted 301461_26-09-2018.pdf 2018-09-26
31 Abstract_Granted 301461_26-09-2018.pdf 2018-09-26
32 1213-CHENP-2011-PatentCertificate26-09-2018.pdf 2018-09-26
33 1213-CHENP-2011-IntimationOfGrant26-09-2018.pdf 2018-09-26
34 1213-CHENP-2011-RELEVANT DOCUMENTS [15-03-2019(online)].pdf 2019-03-15
35 1213-CHENP-2011-RELEVANT DOCUMENTS [09-03-2020(online)].pdf 2020-03-09
36 1213-CHENP-2011-RELEVANT DOCUMENTS [10-08-2021(online)].pdf 2021-08-10
37 1213-CHENP-2011-RELEVANT DOCUMENTS [14-09-2022(online)].pdf 2022-09-14

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3rd: 09 Oct 2018

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