1
FORM 2
THE PATENTS ACT, 1970
(39 of 1970)
& The Patent Rules, 2003
COMPLETE SPECIFICATION
1.TITLE OF THE INVENTION:
MULTI-APERTURE IMAGING DEVICE HAVING A LOW INSTALLATION
HEIGHT AND A SWITCHABLE VIEWING DIRECTION, IMAGING SYSTEM
AND METHOD FOR PROVIDING A MULTI-APERTURE IMAGING DEVICE
2. APPLICANT:
Name: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER
ANGEWANDTEN FORSCHUNG E.V.
Nationality: Germany
Address: Hansastraße 27c, 80686 München, Germany.
3. PREAMBLE TO THE DESCRIPTION:
The following specification particularly describes the invention and the manner in
which it is to be performed:
2
5
Description
The present invention relates to a multi-aperture imaging device, an imaging system and a
10 method for providing a multi-aperture imaging device. The present invention further relates
to a multi-aperture imaging device and a multi-aperture imaging system having a movable
array arrangement.
Conventional cameras have an imaging channel that images the entire object field. The
15 cameras have adaptive components that enable a relative lateral, two-dimensional
displacement between an objective and an image sensor for realizing an optical image
stabilization function.
Multi-aperture imaging systems having a linear channel arrangement consist of several
20 imaging channels, each only capturing a part of the object and containing a deflecting
mirror. The deflecting mirror may be rotatably supported and, among other things, enable
switching the viewing direction so that the same camera may see different viewing
directions, e.g., the viewing directions forming an angle of 180°. The installation height of
the mirror influences the overall height of the camera, whereas the lenses needed for
25 imaging comprise a low overall height, i.e., the mirrors are taller than the lenses. By using
the camera in two viewing directions as a result of a rotation of the mirrors into another
deflecting position, the required installation height is additionally increased in a
disadvantageous manner.
30 Concepts for capturing object regions or fields of view in a multi-channel manner which
enable high quality image capturing would be desirable.
Thus, it is the object of the present invention to provide a multi-aperture imaging device, an
imaging system and a method for providing a multi-aperture imaging device which enable
35 a low installation height of the multi-aperture imaging device, particularly along a thickness
direction.
3
The object is solved by the subject-matter of the independent patent claims.
It is one finding of the present invention to have recognized that, due to the combination of
a movement of the beam-deflecting means of the multi-aperture imaging 5 device and a
movement of the array lenses, an overall lower resulting installation height may be obtained
for the different deflection positions of the beam-deflecting means, leading to a lower size
of an overhang of the beam-deflecting means with respect to the optics.
10 According to an embodiment, a multi-aperture imaging device includes an image sensor,
an array of optical channels, wherein each optical channel includes an optic for imaging a
partial field of view of a total field of view onto an image sensor region of the image sensor,
and a beam-deflecting means switchable between a first rotational position and a second
rotational position by executing a switching movement, and configured to deflect, in a first
15 rotational position, optical paths of the optical channels into a first viewing direction and to
deflect, in a second rotational position, the optical paths of the optical channels into a
second viewing direction. The array is configured to execute based on the switching
movement an adjustment movement for adjusting an orientation of the array with respect to
the beam-deflecting means.
20
Further embodiments relate to an imaging system, a method for providing a multi-aperture
imaging device and a method for capturing an object region.
Further advantageous embodiments are the subject-matter of the dependent claims.
25
In the following, preferred embodiments of the present invention are explained with
reference to the accompanying drawings, in which:
Fig. 1a shows a schematic perspective view of a multi-aperture imaging device
30 according to an embodiment;
Fig. 1b shows a schematic side sectional view of the multi-aperture imaging device
of Fig. 1a with a first rotational position of a beam-deflecting means;
4
Fig. 1c shows a schematic side sectional view of the multi-aperture imaging device
of Fig. 1a in a theoretical state and with a second rotational position of a
beam-deflecting means;
Fig. 1d shows a schematic side sectional view of the multi-aperture 5 imaging device
of Fig. 1a in an inventive state and with the second rotational position of a
beam-deflecting means, wherein an array of optical channels has executed
a translational adjustment movement;
10 Fig. 1e shows a schematic side sectional view of a modified multi-aperture imaging
device with to a single-line array with a first viewing direction according to an
embodiment;
Fig. 1f shows a schematic side sectional view of the multi-aperture imaging device
15 of Fig. 1e with a second viewing direction according to an embodiment;
Fig. 2a shows a schematic side sectional view of a multi-aperture imaging device
according to an embodiment and a first rotational state of the beamdeflecting
means;
20
Fig. 2b shows a schematic side sectional view of the multi-aperture imaging device
of Fig. 2a according to an embodiment in a second rotational state of the
beam-deflecting means, wherein an array of optical channels has executed
a rotational adjustment movement;
25
Fig. 2c shows a schematic side sectional view of the multi-aperture imaging device
of Fig. 2a in a third rotational state of the beam-deflecting means according
to an embodiment;
30 Figs. 3a-d show schematic side sectional views of a device according to an
embodiment, wherein the beam-deflecting means is movable out of a
housing of the device;
Fig. 3e-f show schematic top views of implementations of the multi-aperture imaging
35 device according to Figs. 3a-d according to embodiments;
5
Fig. 4 shows a schematic side sectional view of a multi-aperture imaging device
according to an embodiment, wherein an array of optical channels is formed
in a single-line manner;
Fig. 5 shows a schematic side sectional view of a multi-aperture 5 imaging device
according to an embodiment, wherein the beam-deflecting means is
configured to execute a rotational movement about a rotation axis;
Figs. 6a-f show advantageous implementations of a beam-deflecting means according
10 to embodiments;
Fig. 7a shows a schematic view of a multi-aperture imaging device according to an
embodiment in a first rotational position of the beam-deflecting means,
wherein a diaphragm structure closes a slit;
15
Fig. 7b shows a schematic view of the multi-aperture imaging device of Fig. 5a in the
second position of the beam-deflecting means, wherein the diaphragm
structure closes a slit at a different spot;
20 Fig. 7c shows a schematic view of the multi-aperture imaging device of Fig. 5a in an
optional intermediate position between the first position and the second
position;
Fig. 8 shows a schematic side sectional view of a multi-aperture imaging device
25 according to an embodiment, comprising an optical image stabilizer;
Fig. 9 shows a schematic perspective view of a multi-aperture imaging device
according to an embodiment, comprising transparent structures that are
arranged along the viewing directions of the multi-aperture imaging device
30 starting from the beam-deflecting means;
Fig. 10 shows a schematic side sectional view of a multi-aperture imaging device
according to an embodiment, which may optionally include the transparent
structures, but may easily also be implemented without the same;
35
6
Fig. 11 shows a schematic illustration of a total field of view according to an
embodiment, for example, as may be captured with an above-described
multi-aperture imaging device;
Fig. 12 shows a schematic perspective view of an imaging system 5 comprising a
housing and at least one first and one second multi-aperture imaging device;
Fig. 13 shows a schematic design including a first multi-aperture imaging device and
a second multi-aperture imaging device, for example, as may be arranged in
10 the imaging system of Fig. 12, according to an embodiment;
Fig. 14 shows a schematic flow diagram of a method for providing a multi-aperture
imaging device according to an embodiment; and
15 Fig. 15 shows a schematic flow diagram of a method for capturing an object region
according to an embodiment.
Before embodiments of the present invention will subsequently be described in detail with
reference to the drawings, it shall be pointed out that identical, functionally identical and
20 operatively identical elements, objects and/or structures are provided in the different figures
with identical reference numerals so that the description of these elements in different
embodiments is interchangeable and/or mutually applicable.
Subsequent embodiments refer to multi-aperture imaging devices. Multi-aperture imaging
25 devices may be configured to capture by means of a plurality or multitude of apertures a
total field of view (total object region) by capturing several partial fields of view (partial object
regions) that partially and incompletely overlap each other. For this, the multi-aperture
imaging device may include an image sensor, an array of optical channels and a beamdeflecting
means.
30
The image sensor may comprise several image sensor regions onto each of which a partial
field of view is imaged. The image sensor may be configured to output an analog or digital
image sensor signal based on the captured partial field of view. The image sensor regions
may be part of an integral image sensor and/or may at least partially be mechanically
35 decoupled from other image sensor regions (multi-piece image sensor), e.g., to enable an
7
individual movement of the image sensor region for one, several or all image sensor
regions.
The array of optical channels may be implemented as a single-line or multi-line sequence
of optical channels. Each optical channel includes an optic for imaging 5 one of the partial
fields of view onto an image sensor region of the image sensor. Each of the optics may
include one or several optic elements such as lenses, diffractive elements, refractive
elements, diaphragm elements or the like. For example, several optic elements may
together form an optic stack forming at least a part of the optic of the optical channel. Optic
10 elements of an optic stack may be supported with respect to each other by a mutual stack
carrier or lens carrier and/or with respect to an optional carrier or the substrate. The stack
carrier or lens carrier may enable between the optic elements a distance which is constant
or variable by means of a force element (actuator), e.g., for setting an imaging function of
the optic and/or a focus.
15
The optical channels of the array of optical channels may be arranged in a single-line or a
multi-line manner, wherein a line of the array may be formed such that the optical channels
of a line are essentially arranged along a straight line determined by the outer optical
channels of the line. In this case, essentially may be understood such that a deviation from
20 the course of the line of at most 15%, at most 10%, or at most 5% is admissible.
The optics of different optical channels may be formed to be identical or to be different in
order to obtain an imaging function that is identical or channel-individual with respect to
some, several or all optical channels. The optics of the optical channels may be connected
25 in groups, having at least one, several or all optics per group of optical channels, with a
substrate to obtain a support and/or movement of the group of optics. Several optics of a
group of optical channels may be individually connected to the substrate or may comprise
in sub-groups with at least one, several or all optics of the optics of the group of optical
channels a mutual carrier at which the optics of the sub-group of optics are arranged and
30 which enables an arrangement of the optics with respect to the substrate. At least for the
wavelength range to be captured by the multi-aperture imaging device, the carrier may be
formed to be transparent in pass bands to an extent of at least 50%, at least 70%, at least
90% or even at least 98%. In the pass bands, optical paths of the optical channels may
pass through the transparent carrier. Beside the pass bands, the carrier may also be formed
35 to be transparent; however, may alternatively also be formed to be less transparent or to
even be opaque for at least a part of the wavelength range in order to provide filtering or a
8
diaphragm function, e.g., for suppressing stray light. Such a carrier enables holding and/or
moving the optics of the group of optical channels together with respect to the substrate so
that the movement is possible with a high precision and/or holding is possible with a smaller
number of elements.
5
The carrier may be directly connected to the substrate. Alternatively or additionally, the
carrier may be connected to another component, e.g., to the image sensor and/or to a
housing for receiving the optics and/or the image sensor and/or the beam-deflecting means.
This means that the optics and/or the carrier may be suspended at the substrate. For
10 example, the optics and/or the carrier may be directly supported at the substrate in a
movable manner or in an immovable manner, or may be indirectly supported via an actuator,
for example. Also, the optics of one, several or all optical channels and associated image
sensor regions may be mechanically coupled to each other, e.g., at, on or in a travel carriage
for mutually moving the components. The travel carriage may provide a mechanical
15 connection between the housing 23 and the beam-deflecting means 18 and may optionally
also provide a mechanical connection to the image sensor 12 and/or the array 14, which
means that it includes said components. The travel carriage may comprise a housing.
The beam-deflecting means may be configured to guide the optical paths of the optical
20 channels from a direction between the image sensor and the optics towards the total field(s)
of view. For example, the beam-deflecting means may be configured to guide the optical
paths in a temporally alternating manner in a first position into a first direction towards a first
total field of view and in a second position into a second direction towards a second total
field of view. Alternatively, parallel capturing of the first and second total fields of view may
25 be carried out, e.g., by providing a number of optical channels for simultaneously capturing
the partial fields of view of the first total field of view and the partial fields of view of the
second total field of view as well as deflecting a first number of optical channels towards
the first total field of view and a second number of optical channels towards the second total
field of view.
30
Deflecting an optical path of an optical channel may occur in beam-deflecting regions. The
beam-deflecting means may be formed as a mirror, wherein the mirror may be configured
in a planar manner across several or all beam-deflecting regions. For example, the optical
paths of the optical channels may be provided in a course from the image sensor to the
35 beam-deflecting means with a two-dimensional divergence or deflection of the viewing
direction so that the optical channels are deflected by identical deflection into partial fields
9
of view distributed in the total field of view in a two-dimensional manner. Alternatively, the
beam-deflecting means may be formed such that at least two portions of the beamdeflecting
means are inclined towards each other along at least one direction in order to
completely or partially implement a deflection or divergence of the optical channels into the
at least one direction in the total field of view so that the optical channels 5 may be provided
with a direction divergence to a lower extent in a region between the image sensor and the
beam-deflecting means along the corresponding direction, or may even extend in parallel.
The portions may comprise beam-deflecting regions for one or several optical channels and
10 may be referred to as facets. For example, one facet may be provided per optical channel;
however, facets of several optical channels may also be used. Each optical channel may
be assigned to a facet. When considering the case in which the beam-deflecting means
comprises only one facet, this may be implemented as a planar mirror.
15 The beam-deflecting means may be configured to guide, in the first position, the optical
paths with a first main side or mirror side of the beam-deflecting means into the first direction
and to guide, in the second position, the optical paths with the first main side or mirror side
into the second direction. Alternatively, the beam-deflecting means may be configured to
guide, in the second position, the optical paths with a second main side or mirror side into
20 the second direction. Switching between the first position and the second position may be
carried out by a translational and/or rotational movement of the beam-deflecting means.
With a translational movement, the beam-deflecting means may comprise a first axial
portion that enables a deflection of the optical paths into the first direction, and comprise a
second axial portion that enables a deflection of the optical paths into the second direction.
25 In order to switch between the first position and the second position, the beam-deflecting
means may be moved in a translational manner along an axial direction along which the
axial portions are arranged, e.g., in parallel to a line-extension direction of the array.
For using a rotational movement, the beam-deflecting means may comprise in the first
30 direction a first tilt angle of a reflecting plane or faceted main side to the array in order to
deflect the optical paths into the first direction, and may comprise in a second position a
second tilt angle, e.g., rotated by 90° with respect to the first tilt angle, to deflect the optical
paths into the second direction. This may lead to a situation in which a surface normal of
the main side of the beam-deflecting means points in parallel to a direction between the
35 optics of the array and the beam-deflecting means. In this orientation, perpendicularly to the
direction and perpendicularly to a line-extension direction of the array, an installation space
10
requirement of the beam-deflecting means may be high or at a maximum. The beamdeflecting
means may comprise two reflecting main sides and may be formed to be
reflective on both sides, e.g., as a planar or faceted mirror formed to be reflective on both
sides. The beam-deflecting means may be configured to deflect, in the first position, the
optical paths with a first one of the main sides into the first direction and 5 to deflect, in the
second direction, the optical paths with a second one of the main sides into the second
direction. This enables to switch between the first and second positions with a low rotational
switching angle, i.e., a low actuator travel, enabling fast and energy efficient switching.
Furthermore, the position in which the surface normal is parallel to a direction between the
10 array and the beam-deflecting means may be avoided so that a smaller installation height
may be obtained. The main sides may be in parallel or tilted towards each other.
The beam-deflecting means may be suspended at a substrate and may be translationally
and/or rotationally supported. For example, the beam-deflecting means may be directly or
15 indirectly supported at the substrate, e.g., via an actuator.
Some of the embodiments described herein refer to a movement of components such as
the array of optical channels, the beam-deflecting means, the optics or the image sensor.
Controllable actuators may be used for obtaining such a movement. This may be done using
20 pneumatic, hydraulic, piezoelectric actuators, DC motors, stepper motors, thermal
actuators, electrostatic actuators, electrostrictive and/or magnetostrictive actuators or
drives, unless otherwise described.
Fig. 1a shows a schematic perspective view of a multi-aperture imaging device 10 according
25 to an embodiment. The multi-aperture imaging device 10 includes an image sensor, an
array of optical channels 16a-h and a beam-deflecting means 18. Each optical channel 16ah
includes an optic 64a-h for imaging a partial field of view of a total field of view onto an
image sensor region 24a-h of the image sensor 12. The optical channels 16a-h may be
understood to be a course of optical paths 26a-h. The optical paths 26a-h schematically
30 refer to center beams of the total optical paths, which means that each center beam is
assigned a bundle of beam having edge beams. The optical paths 26a-h may be influenced
by the respective optic 64a-h arranged in the array 14, e.g., through scattering or
concentration. The individual optical channels 16a-h may each form or include a complete
imaging optic and may comprise at least one optical component, or optic, e.g., a refractive,
35 diffractive or hybrid lens, and may image a section of the total object captured with the multiaperture
imaging device. This means that one, several or all of the optics 64a-h may also
11
be a combination of optic elements. An aperture diaphragm may be arranged with respect
to one, several or all of the optical channels 16a-h.
The optics 64a-h may be arranged at a carrier 47 individually, in groups or together in a
direct manner or by means of a lens holder. The carrier may be an element 5 that is formed
at least locally in a region of the optical paths in a transparent manner, e.g., a glass carrier.
Alternatively or additionally, the array 14 may also comprise a housing in which the optics
64a-h are arranged, wherein, optionally, the image sensor 12 may also be arranged in the
housing. Alternatively, the arrangement of the carrier 47 may also be omitted, e.g., if the
10 optics 64a-h are suspended at a substrate. Such a substrate may be immovable, while it is
also possible to implement the substrate to be movable, e.g., to enable a movement of the
optics 64a-h for image stabilization and/or focusing.
For example, the image sensor regions 24a-h may each be formed of a chip including a
15 corresponding pixel array, wherein the image sensor regions 24a-h may be mounted onto
a mutual substrate, or a mutual circuit carrier, such as a mutual circuit board or a mutual
flex board. Alternatively, it would obviously also be possible to form each of the image
sensor regions 24a-h of a respective part of a mutual pixel array, which continuously
extends across the image sensor regions 24a-h, wherein the mutual pixel array is formed
20 on an individual chip, for example. In this case, e.g., only the pixel values of the mutual pixel
array are read out in the image sensor regions 24a-h. Different mixtures of these
alternatives are obviously also possible, e.g., the presence of a chip for two or more optical
channels and of a further chip for other optical channels or the like. In the case of several
chips of the image sensor 12, these may, e.g., be mounted on one or several boards or
25 circuit carriers, e.g., together or in groups or the like.
The beam-deflecting means 18 is configured to deflect the optical paths 26a-h of the optical
channels 16a-h. For this, e.g., the beam-deflecting means 18 may comprise a reflecting
main side facing the optics 64a-h, or the array 14, and inclined thereto, i.e., comprising a
30 rotational position. Due to the inclination, the optical paths 26a-h may be deflected into a
viewing direction 271, wherein the viewing direction 271 may describe a relative direction
with respect to the multi-aperture imaging device 10, along which the object region to be
captured is arranged. As is subsequently explained in detail, the beam-deflecting means 18
may be switchable between the illustrated first rotational position and a second rotational
35 position, e.g., by executing a switching movement. The switching movement may include a
rotational movement 38 about a rotation axis 44 of the beam-deflecting means 18. Thus,
12
based on the rotational movement 38, at least the first rotational position or position and the
second rotational position or position of the beam-deflecting means 18 may be obtained. In
the different rotational positions, the optical paths 26a-h of the optical channels 16a-h may
be deflected into different viewing directions 271 and 272, respectively. For this, the multiaperture
imaging device 10 may include an actuator (not illustrated) which 5 may provide the
rotational movement, or the switching movement.
The array 14 is configured to execute, based on the switching movement 38, an adjustment
movement 11 for adjusting an orientation of the array 14 with respect to the beam-deflecting
10 means 18. For this, the multi-aperture imaging device 10 may include an actuator 13
configured to provide a translational adjustment movement 111 and/or a rotational
adjustment movement 112 of the optics 64a-h. This means that the actuator 13 may provide
the adjustment movement 11, wherein this may comprise mutually moving all of the optics
64a-h of the array 14, e.g., by moving the carrier 47 and/or a housing. Alternatively, the
15 optics 64a-h may also be moved individually, e.g., if they are individually arranged or
supported at a substrate. The adjustment movement may be executed together with the
image sensor 12, which means that, according to an embodiment, the image sensor 12 may
be moved together with the optics 64a-h of the array 14 in the context of the adjustment
movement 11. Optionally, actuators of a focusing means for providing an autofocus may be
20 moved along by generating a relative movement between the array 14 and the image
sensor 12 along an axial direction of the courses of the optical paths and/or actuators of an
optical image stabilizer.
The adjustment movement 11 makes it possible to arrange overhangs of the beam25
deflecting means 18, which are required due to basic geometric conditions, with respect to
the array 14 along a thickness direction y, which is perpendicular to an axial direction x
between the image sensor 12 and the array 14 and perpendicular to a line-extension
direction z of the array 14, in the space in such a manner that a thickness (dimension) of
the multi-aperture imaging device along the y direction is smaller than in an immovable
30 arrangement of the array 14.
In this case, the adjustment movement 11 may be differentiated from other movements,
e.g., from movements for focusing which, e.g., change a distance between the array 14 and
the image sensor 12. This means that the adjustment movement occurs in the absence of
35 a translational distance change between the array 14 and the image sensor 12 along a
direction parallel to an extension of the optical channels between the image sensor 12 and
13
the array 14, i.e., along the direction x. However, this is not to be understood as limiting in
such a way that the adjustment movement may not be combined or overlapped with a
movement for focusing, which is intended in embodiments. However, this is the overlap of
two or several movements, the adjustment movement being one of them. The adjustment
movement itself and exclusively may then be executed while maintaining 5 the distance.
A plurality or multitude of partial fields of view of a total field of view may be captured by the
optical channels, wherein each partial field of view may be captured by at least one optical
channel 16a-h. Thus, each optical channel may be assigned a partial field of view which
10 may be captured with the optical channel. For example, each partial field of view may,
starting from the multi-aperture imaging device 10 and/or the beam-deflecting means 18,
be assigned a direction in which the respective optical path 26a-h of the optical channel
16a-h is deflected with the beam-deflecting means 18.
15 Fig. 1b shows a schematic side sectional view of the multi-aperture imaging device 10,
wherein a sectional plane through the image sensor regions 24a and 24e as well as the
optics 64a and 64e is exemplarily illustrated. The inclination of the beam-deflecting means
18 with respect to the optical paths 26a and 26e for deflecting the same may lead to the
fact that the beam-deflecting means 18 comprises a variable, i.e., increasing or decreasing,
20 distance along the x direction and with respect to the optics 64a and 64e along the thickness
direction y. The diverging beams of the optical paths of the optical channels preferably strike
the beam-deflecting means 18 to an extent of at least 90%, at least 95%, or at least 99.5%,
ideally 100%. Each of the optical channels of the array 14 and, thus, the combination of
several optical channels across several lines may comprise a divergence of the optical
25 paths, as is indicated by the edge beams 15 of the array 14, for example. The divergence
or beam expansion along the x direction in combination with the inclination of the beamdeflecting
means 18 leads to the fact that, additionally to a dimension A of the multi-aperture
imaging device 10 that is attributable to the image sensor 12 and the array 14, an overhang
B or B1 of the beam-deflecting means 18 with respect to the optics 64a to 64e and/or of the
30 image sensor 12 is required to completely deflect the optical paths of the optical channels.
An incomplete deflection may lead to a loss of image quality.
For the illustrated orientation of the beam-deflecting means 18, this results in a total
installation space requirement for the multi-aperture imaging device 10 of A and additionally
35 B (A+B) in order to deflect the optical paths 26a and 26e into the viewing direction 271.
14
Fig. 1c shows a schematic side sectional view of the multi-aperture imaging device 10 in a
theoretical state in which the beam-deflecting means 18 executes the rotational movement
38 for switching between the viewing direction 271 and the viewing direction 272 of the multiaperture
imaging device 10, which means that the beam-deflecting means 18 is rotated
about the rotation axis 44, for example. The viewing directions 271 and 272 5 are arranged to
be reversed or antiparallel towards each other in a tolerance range of ± 30°, ± 15°, or ± 5°.
Along the thickness direction y, an overhang of the multi-aperture imaging device 10 is now
required along the other direction, or viewing direction 272. In the unmoved state of the array
14, a first overhang B1 along the first viewing direction 271 and a second overhang B2 along
10 the second viewing direction 272 is required for providing both viewing directions 271 and
272, wherein B1 = B2 may apply in the symmetrical case.
Fig. 1d shows a schematic side sectional view of the multi-aperture imaging device 10
according to an embodiment, wherein the array 14 has executed the adjustment movement
15 111 along the y direction. For example, the image sensor regions 24a and 24e may also be
moved to maintain a constant relative position of the array 14 to the image sensor 12. This
means that the vertical position of the image sensor, the array optic and, thus, the optical
axes may be variable. Alternatively, by using other measures such as an additional beam
deflection between the array 14 and the image sensor 12 and/or a redundant
20 implementation of the image sensor 12 in terms of size, a movement of the image sensor
12 may be omitted.
In combination with the lateral adjustment movement 111, the beam-deflecting means 18
may also be moved laterally in parallel to the y direction. An extent of a movement 17 of the
25 beam-deflecting means 18 in connection with the adjustment movement 111 may be equal
to an extent of the adjustment movement 111 in a tolerance range of 20%, 10% or 5%. The
switching movement between the beam-deflecting means 18 for switching between the
viewing direction 271 to the viewing direction 272 may therefore include the rotational
movement 38 and, additionally, the translational movement 17 of the beam-deflecting
30 means 18 along the movement direction y. The adjustment movement 111 may include a
further translational movement relating to the array 14. The array 14 may move along the
same movement direction as the beam-deflecting means 18. For example, during the
switching movement for switching to the second viewing direction 272, the adjustment
movement 111 and the translational movement 17 may be executed along the other viewing
35 direction 271. As is illustrated by the image sensor regions 24’’a and 24’’e as well as the
optics 64’’a and 64’’e as well as the beam-deflecting means 18’’, which show an unchanged
15
position of the components in accordance with Fig. 1c, an installation space requirement of
the multi-aperture imaging device 10 may be saved along the thickness direction y up to the
extent of an overhang B1 or B2 compared to the theoretical state of Fig. 1c.
If the optical paths of the array 14 are each deflected in a symmetrical 5 manner about the
viewing direction before striking onto the beam-deflecting means 18, e.g., as may be the
case if the viewing directions 271 and 272 comprise an angle of 180° with respect to each
other and the array 14 is arranged at an angle of 90° with respect to the viewing directions
271 and 272, a position or lateral dimension of the beam-deflecting means 18 along the
10 thickness direction y may be identical or at least identical to an extent of at least 20%, at
least 80%, or at least 90% in the rotational positions for deflecting the optical paths into the
viewing directions 271 and 272. This means that a projection of the beam-deflecting means
into a plane in parallel to the line-extension direction, e.g., in parallel to a course of the
optical path between the image sensor 12 and the array 14 or in parallel to a main side of
15 the image sensor 12, is identical in both rotational positions in this extent (overlaps) and is
congruent when 100% identical.
In the illustrated case of the translational adjustment movement 111, the saving in
installation space requirement may be described by the shift of the beam-deflecting means
20 18 through the translational movement 17, which makes it possible that a part of a
movement range of the beam-deflecting means that is required due to the switching
movement is reduced compared to the immovable array according to Fig. 1c, since the
installation space is used several times, whereas in the theoretical state of Fig. 1c each
overlap B1 and B2 is arranged in an individual installation space to be provided for this. The
25 adjustment movement may be understood to be a movement of the array 14 that is adjusted
to this lateral movement 17. Thus, the array 14 may be moved to adjust a relative position
between the array 14 and the beam-deflecting means 18. The same may also be obtained
by generating a rotational movement of the array 14, as is discussed below.
30 Thus, a required installation height and/or a dimension of the multi-aperture imaging device
10 within a housing may fulfill the condition that a thickness D is smaller than a height of
the arrangement of the image sensor 12 and the array 14 and twice an overhang B, which
means that the following may apply:
35 D < A + 2 B
16
Fig. 1e and Fig. 1f show a schematic perspective view of a multi-aperture imaging device
10’ in a first rotational position and a second rotational position. Beside other modifications
with respect to the multi-aperture imaging device 10 which are explained in connection with
Fig. 2a to Fig. 2c, the array 14 is formed in a single-line manner, which means that the
optics 64 of the array 14 are located in a single line. The optics 64 may 5 be mechanically
connected to each other via a carrier and/or a lens holder so that a mutual movement of the
optics 64 in the array 14 is possible by a movement/actuation of the array 14. Alternatively,
each optic 64 or lens 19a-c of the same may be supported and/or moved individually.
Combinational solutions are also possible, e.g., wherein a mutual carrier and/or a connected
10 lens holder is implemented in order to obtain a mutual movement of the optics 64. For
example, this may occur in a travel carriage or the like. Additionally, further actuators may
be provided, enabling a channel-individual movement of the lenses, e.g., for providing
channel-individual focusing. It is understood that channel-global focusing may also be
obtained through a mutual movement of all lenses without modification.
15
According to an embodiment, the beam-deflecting means 18 may be configured to execute
during the switching movement only a rotational movement 38 about a rotation axis 44. In
this case, the rotation axis or rotational axis 44 may be arranged in the thickness direction
y in the center of the y-expansion of the facet, or beam-deflecting means, i.e., at (A+B)/2,
20 for example, A+B referring to the total expansion of the beam-deflecting means 18 along
the thickness direction y. In a non-tilted normal position of the array 14, the thickness
direction y may be arranged perpendicular to a line-extension direction of the array 14 and
perpendicular to a course of the optical paths between the image sensor 12 and the array
14. Centering the rotation axis 44 onto the center may be carried out as accurately as
25 possible; however, is still advantageous within a tolerance range of 20%, 10%, or 5%. This
means that the switching movement is executed, e.g., exclusively by the rotational
movement 38, wherein a rotational axis of the rotational movement 38 along a thickness
direction of the multi-aperture imaging device may be centered within a tolerance range of
20% with respect to a largest expansion of the beam-deflecting means 18 along the
30 thickness direction y.
Fig. 1f illustrates the multi-aperture imaging device 10’ after executing the adjustment
movement 111. The beam-deflecting means 18 has been moved accordingly, as is
described in connection with Fig. 1d. An overhang B2 may also be arranged along the
35 second viewing direction 272. B1 = B2 = B may apply, e.g., in a symmetrical implementation
of the multi-aperture imaging device 10’. A total installation space requirement A+B may be
17
low, since a single overhang may be sufficient, which may be less compared to a double
provision according to Fig. 1a. This means that the switching movement includes a
rotational movement 38 of the beam-deflecting means 18, wherein the adjustment
movement 11 includes a translational movement 111 of the array 14 along a movement
direction/thickness direction y which is perpendicular to a line-extension 5 direction z and
parallel to a thickness direction y of the multi-aperture imaging device.
Fig. 2a shows a schematic side sectional view of the multi-aperture imaging device 10’,
which is again described and which comprises several changes compared to the multi10
aperture imaging device 10, which may each be implemented optionally and individually
and independently. The array 14 may be formed as a single-line array, which, in view of
Fig. 1a, may be understood as the arrangement solely of the optics 64a to 64d or any other
number of optics in an individual and single line, for example. Furthermore, an optic 64 may
comprise a plurality of optic elements 19a, 19b and/or 19c which are used together for the
15 beam formation. The array 14 and the image sensor 12 may be arranged in a mutual
housing to enable a mutual movement of the array 14 and the image sensor 12.
Furthermore, the beam-deflecting means 18 may be formed as an individual or a plurality
of facets comprising main sides 174a and 174b that are inclined towards each other.
20 The multi-aperture imaging device 10’ is solely selected for a better presentation.
Alternatively, the multi-aperture imaging device 10 may also be used, and without any
limiting effects, for the description in connection with the adjustment movement 112. In Fig.
2a, through to the orientation of the beam-deflecting means 18, the multi-aperture imaging
device 10’ is implemented such that capturing along the viewing direction 271 is possible.
25
In Fig. 2b, the beam-deflecting means 18 is rotated with the rotational movement 38 about
the rotation axis 44. For example, this may take place in the clockwise direction. The
adjustment movement 112 also includes a rotational movement of the array 14, e.g., by
moving the housing 21. In Figs. 2a and 2b, the adjustment movement 112 may lead to the
30 fact that, with respect to a symmetrical viewing direction of the array 14 before striking onto
the beam-deflecting means 18, as is illustrated in Figs. 1b, 1c and 1d, for example, a preinclination
of the optical paths 26 is obtained so that these strike at an angle y1 and/or y2
with respect to the reference direction, e.g., in parallel to the x-direction, so that a deflection
of the optical paths 26 by means of the beam-deflecting means 18 may be less as compared
35 to a course of the center beams of the optical paths 26 in parallel to the x-direction.
18
For example, the array 14 and the image sensor 12 may be mechanically coupled to each
other via the housing 21 and may be configured to mutually execute the adjustment
movement 11. The housing 21 may be referred to as a travel carriage or the like. This may
also be understood such that, instead of a total influence of the viewing direction by means
of the beam-deflecting means 18, part of switching the viewing directions 5 271 and 272 may
be obtained by a movement of the array 14. For example, if the viewing directions 271 and
272 are arranged to be opposite to each other and comprise an angle of 180°, and if the
beam-deflecting means 18 is arranged by means of a mirror that is reflective on both sides
with main sides that are arranged in parallel towards each other, as is illustrated in Fig. 1b,
10 a rotation about 90° is necessary in the configuration according to Fig. 1b in order to cause
the switching movement. For example, this leads to an orientation of ± 45° with respect to
the x-direction. By applying the adjustment movement 112 using the corresponding
rotational movements of the array 14, this orientation or inclination may be reduced to 45°-
y1 or 45°-y2 so that the overall rotational movement 38 may be reduced to 90°-(y1+y2).
15
By using the main surfaces 174a and 174b, which are inclined towards each other, a further
reduction is possible. By means of the pre-inclination of the optical paths 26 about the
angles y1 and y2, a lower requirement for rotation of the beam-deflecting means 18 may be
necessary in order to switch between the viewing directions 271 and 272. This smaller range
20 of rotation leads to a smaller overhang of the beam-deflecting means 18 with respect to the
array 14, which is indicated with C. Even when using the beam-deflecting means 18
according to Figs. 1a to 1d, B > C may apply. This means that the smaller size of the
installation space requirement may be obtained along the y-direction by reducing the
rotation range of the beam-deflecting means 18 by means of the adjustment movement 112.
25 This means that the switching movement from the first into the second rotational position
may include the rotational movement 38 of the beam-deflecting means 18, and that the
adjustment movement 112 may include a further rotational movement. The two rotational
movements may preferably take place in the same direction, e.g., both in the clockwise
direction or both in the counterclockwise direction. The sums of angles values by which the
30 beam-deflecting means 18 is rotated through the rotational movement 38 and the array 14
is rotated through the adjustment movement 112 may result in an angle sum of 90° within a
tolerance range of 20%, 10%, or 5%.
Although overlaps C1 and C2 are necessary along the positive y-direction and along the
35 negative y-direction, respectively, these are small in comparison to the overlap B, B1 or B2,
leading to an advantageous implementation. For example, the following may apply:
19
C = C1 = C2 > B = B1 = B2
Thus, the necessary dimensions of A + C1 + C2 and A + 2C, respectively, may 5 also fulfill the
following condition:
D < A + 2B
10 Based on Figs. 1a to 1d, 2a and 2b, implementations in which the adjustment movement
11 includes a translational movement 111 or a rotational movement 112 were exemplarily
described. According to embodiments, it is also possible to execute the adjustment
movement 11 such that the translational movement 111 and the rotational movement 112
are executed. For example, a rotation of the array 14 may be implemented in Figs. 1b and
15 1d, e.g., by the actuator 11. Alternatively or additionally, the array 14 and/or the housing 21
according to Figs. 2a and 2b may additionally be moved with the adjustment movement 111,
e.g., in a positive y-direction when switching between the viewing direction 271 and the
viewing direction 272. With this, a reduction of the remaining overlapping region may be
obtained additionally to avoiding one of the two overlapping spaces B1 or B2 and C1 or C2,
20 respectively.
This means that the switching movement from the first into the second rotational position
includes a first rotational movement of the beam-deflecting means and a translational
movement of the beam-deflecting means along a first movement direction, i.e., the
25 rotational movement 38 and the translational movement 17. The adjustment movement may
include a translational movement of the array along the movement direction, i.e., the
adjustment movement 111 and may additionally include a rotational movement, the
adjustment movement 112.
30 In other words, in addition to the rotational movement of the beam-deflecting means, the
unit consisting of the image sensor and the array optic may be moved in order to achieve a
different viewing direction of the multi-aperture camera. So far, the latter was stationary at
least in the thickness direction. As a result of the required inclined position of the mirror
facet or of the mirror, the edge of the mirror facet facing away from the array optic projects
35 beyond the lens array in the thickness direction and, thus, essentially determines the
installation height. The edge facing the array optic projects to a smaller degree or not at all
20
beyond the installation height, which predetermined by the lenses of the array optic. With
regard to stationary optical axes of the array, the lenses form the distances 1/2 A + B in the
thickness direction. A similar image results when switching the viewing direction by rotating
the beam-deflecting means. With regard to the overall structure, an installation height of A
+ 2B results for the desired realization of the two viewing directions. 5 According to
embodiments, in addition to the rotation of the beam-deflecting means, the unit consisting
of the image sensors and the array optic is moved, which means that the adjustment
movement 11 is executed. On the one hand, this may include a translational movement 111
along the thickness direction, a rotational movement with the rotation axis in parallel to the
10 line-extension direction, c.f. adjustment movement 112, or a combination thereof. As a
result, the required installation height may be reduced to the value of up to A + B. In order
to realize additional movements for implementing an autofocus and/or optical image
stabilization, further drives may be arranged to move the unit consisting of the image
sensors and the array optic. The multi-aperture imaging devices according to embodiments
15 may be implemented without autofocus and/or image stabilization. Alternatively or
additionally, the actuator 13 may be configured to provide a corresponding movement for
focusing and/or image stabilization.
Fig. 2c shows a schematic side sectional view of the multi-aperture imaging device 10’ in a
20 third rotational position, e.g., which may be obtained during the switching movement and/or
which may be obtained in an inactive state of the multi-aperture imaging device 10, e.g.
during standby. In the illustrated rotational position, a dimension of the beam-deflecting
means 18 along the thickness direction y may be smaller than or equal to a dimension of
the housing 21 and/or the image sensor 12 and/or the array 14. This means that the
25 thickness of the multi-aperture imaging device 10’ is preferably not determined by the beamdeflecting
means 18 in this state. This enables storing the multi-aperture imaging device in
a thin manner. This means that a rotational position and, thus, a vertical position of the
image sensor, the array optic and, thus, the optical axes may be variable.
30 Fig. 3a shows a schematic side sectional view of a device 30 according to an embodiment.
The device 30 comprises a first operation state in which the multi-aperture imaging device
10 is arranged within a housing 23 having side surfaces 23a, 23b and 23c, e.g., the side
surfaces 23a and 23b being main sides, e.g., a front side and a back side. For example, the
device 30 is a mobile telephone such as a smartphone or a tablet computer so that at least
35 one of the main sides may comprise a display. The side surface 23c may be an auxiliary
side and may be referred to as cover. By flipping open or moving the cover 23c, the multi21
aperture imaging device 10 and/or the beam-deflecting means 18 may be completely or
partially moved out of a housing volume 25 to enable a beam deflection outside of the
housing volume 25 in order to obtain a second operation state in which the multi-aperture
imaging device 10 captures images of fields of view, for example. In the first operation state,
a beam-deflecting position may comprise a center position between the first 5 and the second
rotational positions, as is described in connection with Fig. 2c. The beam-deflecting means
18 comprises a first position within a housing.
The device 30 comprises at least partially transparent covers 37a and 37b which may be
10 connected to the cover 23c. Thus, the covers 37a and 37b may be movable together with
the beam-deflecting means 18 along a translational movement direction 28 so that the
beam-deflecting means 18 is partially or completely moved out of the housing 23. The at
least partially transparent covers 37a and 37b may be arranged in the illustrated first
position at different sides of the beam-deflecting means 18 between the same and the
15 housing 23. This means that the beam-deflecting means 18 may be arranged between the
covers 37a and 37b.
In the first operation state, the covers 37a and 37b may be partially or completely arranged
within the housing volume 25. For example, the covers 37a and 37b may be arranged at a
20 travel carriage or may be transparent regions of the travel carriage. During the movements
of the beam-deflecting means out of the housing 23 or into the housing 23, the array 14
and/or the image sensor 12 may remain stationary or may also be moved along the lateral
movement direction 28 such that, e.g., a distance between the image sensor 12, the array
14 and the beam-deflecting means 18 remains unchanged. In this case, the travel carriage
25 may also include the image sensor 12 and/or the array 14.
Fig. 3b shows a schematic side sectional view of the device 30, wherein the beam-deflecting
means 18 comprises an intermediate position between the first position and the second
position. For example, the intermediate position of the beam-deflecting means may be
30 obtained during retraction or extension of the beam-deflecting means 18 into the housing
volume 25 or out of the housing volume 25. The beam-deflecting means 18 is partially
moved out of the housing volume 25.
Fig. 3c shows a schematic side sectional view of the device 30, wherein the beam-deflecting
35 means 18 comprises the second position, i.e., the beam-deflecting means 18 is completely
extended from the housing volume 25, for example. The at least partially transparent covers
22
37a and 37b comprise a distance E1 towards each other which is smaller than a comparable
distance between side surfaces 23a and 23b of the housing.
Fig. 3d shows a schematic side sectional view of the device 30, wherein a distance of the
at least partially transparent covers 37a and 37b is enlarged in comparison 5 to Figs. 3a-c.
The at least partially transparent covers 37a and/or 37b may be movable along a
translational movement direction facing away from the other at least partially transparent
cover 37a and 37b, respectively, e.g., in parallel to the thickness direction y, i.e., along a
positive or a negative y direction. The state of the at least partially transparent covers 37a
10 and 37b illustrated in Figs. 3a-c may be understood as a retracted or folded state. The state
illustrated in Fig. 3d may be understood as a extended or unfolded state, wherein a distance
E2 between the at least partially transparent covers 37a and 37b is changed in comparison
to the distance E1, e.g., increased, i.e., E2>E1 applies. For example, the distance E2 may be
larger than or equal to the distance between the comparable sides of the housing 23. The
15 beam-deflecting means 18 is configured to deflect the optical paths of the optical channels
such that they run through the at least partially transparent covers 37a and/or 37b.
In comparison to the first operation state of Fig. 3a or the state in Fig. 3b or Fig. 3c, the
angle orientation of the beam-deflecting means 18 may be changed such that the area of
20 the beam-deflecting unit used by the optical path of the multi-aperture imaging device
increases in comparison to the first operation state, and the first rotational position or second
rotational position is obtained. Alternatively or additionally, the increased distance E2 may
enable a larger range of the rotational movement 38. With the rotational movement 38, the
beam-deflecting means 18 may be switchable at least between a first and a further rotational
25 position, wherein each position may be assigned to a viewing direction of the multi-aperture
imaging device. The rotation of the beam-deflecting means 18 may occur analogously or in
a bistable manner or in a multi-stable manner. The rotational movement 38 for changing a
viewing direction of the multi-aperture imaging device may be combined with a rotational
movement of the beam-deflecting means 18 for an optical image stabilization. The covers
30 37a and/or 37b may encapsulate the other components of the multi-aperture imaging
device.
The multi-aperture imaging device may carry out the switching movement and the
adjustment movement within the distance E2. Thus, for example, the extension of the covers
35 37a and 37b may provide a movement space for the array 14 and/or the image sensor 12
which may be small, according to the discussions of the Figs. 1a-d and Figs. 2a-c, based
23
on the adjustment movement, also enabling a small expansion of the device 30 along the
thickness direction.
The oppositely arranged covers 37a and/or 37b, or transparent regions thereof, may
comprise a switchable diaphragm 33a and/or 33b so that the switchable 5 diaphragm 33a-b
is introduced, e.g., above and/or below or along any other direction of the beam-deflecting
means. The diaphragm 33a-b may be switched according to the operation state or viewing
direction of the camera. For example, a respective viewing direction of the multi-aperture
imaging device which is not used may at least be partially closed by the diaphragm 33a-b
10 in order to reduce an entry of stray light. For example, the diaphragms 33a-b may be
mechanically moved or be electrochromic. The regions influenced by the diaphragm 33a-b
may additionally be provided with a switchable diaphragm 33a-b that covers the optical
structure in case the same is not used. The diaphragm 33a-b may be electrically controllable
and may include an electrochromic layer (sequence). Alternatively or additionally, the
15 diaphragm 33a-b may include a mechanically moved part. The movement may be carried
out using pneumatic, hydraulic, piezoelectric actuators, DC motors, stepper motors, thermal
actuators, electrostatic actuators, electrostrictive and/or magnetostrictive actuators or
drives. In a state of the multi-aperture imaging device in which the viewing direction
penetrates a diaphragm, the diaphragm 33a-b may be switched to allow the optical paths
20 of the optical channels to pass through. This means that the multi-aperture imaging device
may comprise a first operation state and a second operation state. The beam-deflecting
means may deflect the optical path of the optical channels in the second operation state
and in a first rotational position such that the same extends through a first transparent region
of the cover 37a. In the second rotational position of the second operation state, the optical
25 path of the optical channels may be deflected such that the same extends through a second
transparent region of the cover 37b. A first diaphragm 33a may be configured to at least
partially optically close in an optical manner the first transparent region in the second
operation state. A second diaphragm 33b may be configured to at least partially close in a
temporary optical manner the second transparent region in the first operation state. With
30 this, an entry of stray light from a direction that is not the actual viewing direction of the
multi-aperture imaging device may be reduced, which is advantageous with respect to the
image quality. The first and/or second diaphragm 33a-b may be operable for at least one,
for at least two, or for all of the optical channels. For example, at least one, at least two, or
all optical channels of the multi-aperture imaging device may extend through the first
35 diaphragm if the optical path of the optical channels is guided through the first transparent
24
region, and may extend through the second diaphragm if the optical path of the optical
channels is guided through the second transparent region.
It is to be understood that it is possible to combine a mechanism for unfolding the beamdeflecting
means with a mechanism for translationally moving, i.e., mixed 5 forms may exist.
Unfolding the housing and/or extending the beam-deflecting means may be carried out such
that, if applicable, the capturing module, i.e., the optical channels, optics thereof and/or the
image sensor are moved out of the housing volume. A change of angle of the beamdeflecting
means may make it possible that an expansion of the multi-aperture imaging
10 device in the thickness direction is large and/or that the beam-deflecting means may deflect
the optical path in an unhindered manner towards the “front” and the “back”. Covering
glasses such as the covers 37 may also be fixed with respect to the unfolded, or extended,
elements. The covering glasses may comprise any planar or non-planar surface areas.
15 In other words, the multi-aperture imaging device may at least be partially attached on a
movement carriage/ travel carriage and may extend out of a flat housing such as a
smartphone. In this case, beam-deflecting means and the unit consisting of the image
sensor and the array optic may take other positions than in the case of images being
captured in both viewing directions. The positioning may be carried out in such a way that
20 a minimal installation height results and the tips of the both-way mirrored facets of the beamdeflecting
means or a thin edge of the beam-deflecting unit is directed towards the array
optic in this position.
Fig. 3e shows a schematic top view of the multi-aperture imaging device 30, wherein a
25 function of an exemplary travel carriage 43, which may be movably arranged in the housing
23. The travel carriage 43 may comprise a frame or another fixing structure 45 with which
the beam-deflecting means 18, the image sensor 12 and the array 14 are directly or
indirectly, i.e., movably thereto, arranged or supported. For example, the beam-deflecting
means 18 comprises a channel-individual faceting, i.e., one beam-deflecting region per
30 channel, wherein the facets may be inclined with respect to each other to obtain a channelindividual
deflection of the optical path. The beam-deflecting means 18 may be rotationally
supported with respect to the frame 45 and may be moved based on a movement of the
frame 45 and also based on the rotational movement 38 with respect to the frame 45. Some
of the components, e.g., the image sensor 12 and the array 14, may be mechanically
35 coupled to each other by means of a travel unit 49 so that a movement of the travel unit 49
causes a movement of the components coupled thereto. Within the travel carriage 43, e.g.,
25
the travel unit 49 may be configured to carry out the adjustment movement and, in this
connection, execute a relative movement with respect to the frame 45. Alternatively or
additionally, optional drives or actuators 51a and/or 51b, e.g., of the focusing means or of
the optical image stabilizer, may simultaneously be moved. Corresponding drives 51a
and/or 51b, e.g., pneumatic, hydraulic, thermal, piezoelectric, electrostatic, 5 electrodynamic,
magnetostrictive or electrostrictive actuators, may be arranged within the housing 21 and/or
within the travel unit 49 or, as illustrated, outside of the housing 21. In this way, the focus
and/or the image stabilization may be provided or set by the actuators 51a and/or 51b, while
the travel unit 49, which is moved due to this, is moved additionally to obtaining the
10 adjustment movement.
Fig. 3f shows a schematic top view of the multi-aperture imaging device 30, wherein the
travel carriage 43, or the travel unit 49, is modified. Specifically, e.g., the actuators 51a and
51b are part of the travel unit 49 and, e.g., are arranged in the housing 21, so that the
15 actuators 51a and/or 51b are moved along during executing the adjustment movement. The
travel unit 49 may include the array 14, the image sensor 12, and the actuators 51a/51b for
autofocusing and optical image stabilization. This means that the array 14, the image sensor
12 and the actuators 51a/51b for providing a focusing for the optical image stabilization are
mechanically coupled to each other and are configured to mutually execute the adjustment
20 movement 11.
The travel carriage 43 may be used to extend in a sideways manner the entire multi-aperture
camera out of the housing 23. For example, the image sensor 12, the array 14, the beamdeflecting
unit 18, actuators for autofocus and optical image stabilization, and, if applicable,
25 covering glasses are arranged at this travel carriage, moving along in the x-direction. For
the adjustment movement 11, the unit consisting of the image sensor, the array and, if
applicable, the autofocus and/or the optical image stabilization may be additionally moved
in a separate manner and along y, e.g., by means of the travel unit 49.
30 Fig. 4 shows a schematic side sectional view of a multi-aperture imaging device 40
according to an embodiment, wherein the array 14 is formed in a single-line manner, which
means, contrary to the double-line array of Fig. 1, solely one line of optics 64 may be
arranged. Regardless of this, the multi-aperture imaging device 40 may comprise a
diaphragm structure 22.
35
26
A slit 29, i.e., a distance, is arranged between the array 14 and the beam-deflecting means
18. In this case, the multi-aperture imaging device 10 is implemented such that the
diaphragm structure 22 at least partially closes the slit 29. In this connection, the diaphragm
structure 22 may overlap the array 14, or a carrier 47, and/or the beam-deflecting means
18, as is illustrated. This means that the diaphragm structure 22 may 5 be in mechanical
contact with the array 14 and/or the beam-deflecting means 18 and may be arranged
outside of a region or volume which is spatially arranged between the beam-deflecting
means 18 and the array 14. As an alternative to the mechanical contact with the array 14,
the diaphragm structure 22 may be in mechanical contact with a transparent structure, e.g.,
10 a transparent structure 42 as described in connection with Fig. 7. Alternatively, the
diaphragm structure 22 may be arranged at the array 14 and/or the beam-deflecting means
18 such that the diaphragm structure is spatially located between the array 14 and the
beam-deflecting means 18. In both cases, the slit 29 between the array 14 and the beamdeflecting
means 18 is at least partially, i.e., at least 50 %, at least 70 %, at least 90 %, or
15 preferably entirely closed.
The diaphragm structure 22 may be configured to prevent or at least partially an entry of
light, in particular from a direction that differs from the directions assigned to the partial
fields of view of the currently set viewing direction. By arranging the diaphragm structure 22
20 at an end of the carrier 47 and/or the beam-deflecting means 18 that is located or arranged
opposite the viewing direction 27, an entry of stray light from the direction opposite to the
viewing direction 27 may at least partially be reduced. If the slit 29 is completely closed and
if the diaphragm structure 22 is configured to be completely opaque, an amount of the stray
light, e.g., from the direction opposite to the viewing direction or also from further directions,
25 may also be entirely reducible. With an increasing amount of reduction of the stray light, an
increase in image quality may be obtained to an increasing extent.
The diaphragm structure 22 may be mechanically connected in a fixed manner to at least
one of the arrays 14 and/or the beam-deflecting means 18 and be supported by this element
30 in such a way. At the other element, a loose or fixed mechanical contact may be obtained
in order to close the slit 29.
Fig. 5 shows a schematic side sectional view of a multi-aperture imaging device 50
according to a further embodiment, wherein the beam-deflecting means 18 is configured to
35 execute the rotational movement 38 about the rotation axis 44, wherein a first position and
a second position of the beam-deflecting means 18 may be obtained based on the rotational
27
movement 38. The beam-deflecting means 18 is configured to guide, in the first position,
the optical paths 26 into a first viewing direction 271. The beam-deflecting means 18 is
further configured to deflect, in a second position, which is illustrated by dotted lines, the
optical paths 26 into a second viewing direction 272. For example, the beam-deflecting
means 18 may comprise two opposing main sides 174a and 174b that 5 are formed to be
reflecting, wherein different reflecting main sides 174a or 174b are facing the optics 64 in
the different positions. This means that the beam-deflecting means 18 deflects the optical
paths 26 with different main sides in the different positions.
10 Based on positions between which may be switched by means of the rotational movement
38, a first slit 291 may at least be partially closed in a first position by means of a diaphragm
structure 221, as is described in connection with the multi-aperture imaging device 40, for
example. Based on the rotational movement 38, the slit 291 may vary in its dimension in a
direction x extending in parallel to a direction starting from the image sensor 12 to the beam15
deflecting means 18 and in parallel to a line-extension direction of the array 14. In the
second position, the slit 292 may be closed by means of the diaphragm structure 222 in order
to prevent an entry of stray light from the unused viewing direction 271.
According to some requirements of multi-aperture imaging devices, a low or even minimal
20 height of the multi-aperture imaging device along a direction perpendicular to the x-direction
and perpendicular to the line-extension direction may be desired, e.g., along a y-direction,
which may also be referred to as thickness direction. Due to the diagonal arrangement of
the beam-deflecting means 18 with respect to the image sensor 12 and/or the array 14, a
surface dimension of the beam-deflecting means 18 may be comparably larger than a
25 surface of the image sensor 12 in order to make it possible to completely image and/or
deflect the optical path 26. This means that, if the beam-deflecting means 18 was inclined
such that the main sides 174a and/or 174b were arranged in parallel to the y-direction, the
beam-deflecting means 18 would exceed the array 14 and/or the image sensor 12,
counteracting the aim for a minimal installation height.
30
In order to switch between the two illustrated positions, it is also possible to execute the
control of the beam-deflecting means 18 such that, in a direction between the first and the
second positions, the main sides 174a and/or 174b extend in parallel to the x-direction. In
this case, auxiliary sites of the beam-deflecting means 18 could approximate and/or
35 distance themselves from the array 14 during the movement so that the slit 291 and/or 292
is variable in its dimension. However, a finite distance between the beam-deflecting means
28
18 and the array 14 is simultaneously required in order to enable the corresponding
movement. This distance leads to the slits 291 and/or 292, which may be closed by the
described diaphragm structures 221 and/or 222 in order to at least partially prevent an entry
of stray light through the corresponding slit.
5
In other words, it may be necessary to set a distance between a front edge of the mirror
(beam-deflecting means) and subsequent array of imaging optics so that the deflecting
mirror may rotate. This slit is transparent and therefore light-transmissive. By this, light may
disadvantageously penetrate the structure from a direction that does not correspond to the
10 intended viewing direction of the camera, therefore deteriorating the imaging quality. This
effect may be counteracted with the diaphragm structures 221 and/or 222.
A diaphragm made of opaque and/or flexible material which extends across the entire
expansion of the beam-deflecting means and, thus, across the entire width of the array
15 objective may be arranged at the side/edge of the beam-deflecting means of the multiaperture
imaging device. For example, the same may be similar to a sealing lip.
Based on the implementation of the adjustment movement, the diaphragm structure may
be moved along during the translational adjustment movement 111 and/or may compensate
20 the rotational adjustment movement 112 based on an overhang and/or a flexible
implementation of the beam diaphragm structure 22.
Before further details with respect to herein-described multi-aperture imaging devices are
subsequently explained, a preferred embodiment of the beam-deflecting means 18 is to be
25 described. Although the same may also be formed as a planar mirror or as a double-sided
mirror, a space-saving realization may be obtained based on a wedge-shape. Furthermore,
several wedges may be arranged in the beam-deflecting means 18 and may each form a
facet of the same, wherein each optical channel of the multi-aperture imaging device is
assigned to a facet. Through different inclinations of the facets with respect to a reference
30 position of the beam-deflecting means, the optical paths may be deflected in different
directions, enabling a divergence of the direction deflection, i.e., a different direction
deflection or a difference between two direction deflections so that different partial regions
of the total object region may be captured.
35 Advantageous implementations of the beam-deflecting means 18 are described based on
Figs. 6a-f. The discussions show a number of advantages that may be executed individually
29
or in any combination, however, which are not intended to be limiting. The illustrated
diaphragm structure 22 is optional so that embodiments may also be implemented without
the same.
Fig. 6a shows a schematic side sectional view of a beam-deflecting element 5 172 that may
be used as one of the beam-deflecting regions 46 in beam-deflecting means described
herein. The beam-deflecting element 172 may be operable for one, a plurality of or all of
the optical channels 16a-d and may comprise a traverse-type cross section. Although a
triangular cross section is shown, any other polygon is also possible. Alternatively or
10 additionally, the cross section may also comprise at least one curved surface, wherein,
particularly with respect to reflecting surfaces, an implementation which is planar at least in
regions may be advantageous in order to prevent imaging aberrations. The two main sides
174a and 174b may be inclined towards each other by an angle σ. The angle σ may
comprise a value between 1° and 89°, preferably comprises a value between 5° and 60°,
15 and particularly preferably comprises a value between 10° and 30°. Preferably, the main
sides 174a and 174b are inclined towards each other at an angle of at most 60°.
For example, the beam-deflecting element 172 comprises a first side 174a, a second side
174b and a third side 174c. At least two sides, e.g., the sides 174a and 174b, are configured
20 to be reflective so that the beam-deflecting element 172 is configured to be reflective on
both sides. The sides 174a and 174b may be main sides of the beam-deflecting element
172, i.e., sides having a surface that is larger than that of the side 174c.
In other words, the beam-deflecting element 172 may be formed to be wedge-shaped and
25 to be reflective on both sides. Opposite to the surface 174c, i.e., between the surfaces 174a
and 174b, a further surface may be arranged, which is substantially smaller than the surface
174c, however. In other words, the wedge formed by the surfaces 174a, 174b and 174c
does not arbitrarily taper, but is provided at its pointed side with a surface and is therefore
blunted.
30
Fig. 6b shows a schematic side sectional view of the beam-deflecting element 172, wherein
a suspension or a displacement axis 176 of the beam-deflecting element 172 is described.
For example, the displacement axis 176 may be the rotation axis 44. The displacement axis
176 about which the beam-deflecting element 172 may be rotationally or translationally
35 movable in the beam-deflecting means 18 may be displaced eccentrically with respect to a
centroid 178 of the cross section. The centroid may alternatively also be a point that
30
describes half of the dimension of the beam-deflecting element 172 along a thickness
direction 182 and along a direction 184 perpendicular thereto.
The main side 174a may comprise a surface normal 175a, whereas the main side 174b
may comprise a surface normal 175b. If a rotational movement about the 5 displacement axis
176 is used to switch between the first position and the second position of the beamdeflecting
means, the rotational movement of the beam-deflecting means may be executed
such that it avoids an orientation between the two positions in which one of the main sides
174a or 174b is entirely facing the array 14, as is described in combination with Fig. 5. This
10 may also be understood such that, when switching between the first and the second
operation state or position by means of the rotational movement, the surface normal 175a
and the surface normal 175b of the second main side comprise at each point in time an
angle of at least 10° as to a direction towards the image sensor and, if applicable, in parallel
to a surface normal of the image sensor. In this way, it may be avoided that one of the
15 angles is 0° or 180°, which could indicate a large or approximately maximum expansion of
the beam-deflecting means along the thickness direction.
For example, the displacement axis 176 may be unchanged along a thickness direction 182
and may comprise any offset in a direction perpendicular thereto. Alternatively, an offset
20 along the thickness direction 182 is also conceivable. For example, the displacement may
be carried out such that, upon a rotation of the beam-deflecting element 172 about the
displacement axis 176, a larger actuator travel is obtained as when rotating about the
centroid 178. Thus, by means of to the displacement of the displacement axis 176, the
distance about which the edge between the sides 174a and 174b is moved upon a rotation
25 may increase at the same rotation angle in comparison to a rotation around the centroid
178. Preferably, the beam-deflecting element 172 is arranged such that the edge, i.e., the
pointed side of the wedge-shaped cross section, between the sides 174a and 174b faces
the image sensor. By means of small rotational movements, a respectively other side 174a
or 174b may deflect the optical path of the optical channels. It is evident that the rotation
30 may be executed such that a space requirement of the beam-deflecting means along the
thickness direction 182 is low, since a movement of the beam-deflecting element 172 in
such a way that a main side is perpendicular to the image sensor is not required.
The side 174c may also be referred to as auxiliary side or as back side. Several beam35
deflecting elements may be connected with each other such that a connecting element is
arranged at the side 174c or extends through the cross section of the beam-deflecting
31
elements, i.e., it is arranged on the beam-deflecting elements, e.g., in the region of the
displacement axis 176. In particular, the holding element may be arranged such that it does
not project beyond the beam-deflecting element 172 along the direction 182 or only to a
small extent, i.e., at most 50°, at the most 30°, or at most 10°, so that the holding element
does not increase or determine an expansion of the total structure along 5 the direction 182.
Alternatively, the expansion in the thickness direction 182 may be determined by the lenses
of the optical channels, i.e., they comprise the dimension defining the minimal thickness.
The beam-deflecting element 172 may be formed of glass, ceramics, glass ceramics,
10 plastics, metal, or any combination of these materials and/or further materials.
In other words, the beam-deflecting element 172 may be arranged such that the tip, i.e., the
edge between the main sides 174a and 174b, is directed towards the image sensor. Holding
the beam-deflecting elements may be carried out such that it solely occurs at the back side
15 or in the interior of the beam-deflecting elements, i.e., the main sides are not covered. A
mutually holding or connecting element may extend across the back side 174c. The rotation
axis of the beam-deflecting element 172 may be eccentrically arranged.
Fig. 6c shows a schematic perspective view of a multi-aperture imaging device 60 including
20 an image sensor 12 and a single-line array 14 of optical channels 16a-d arranged side-byside.
The beam-deflecting means 18 includes a number of beam-deflecting elements 172ad
which may correspond to the number of optical channels. Alternatively, a smaller number
of beam-deflecting elements may be arranged, e.g., if at least one beam-deflecting element
is used by two optical channels. Alternatively, a larger number may also be arranged, e.g.,
25 if switching the deflection direction of the beam-deflecting means 18 is executed by a
translational movement. Each beam-deflecting element 172a-d may be assigned to an
optical channel 16a-d. The beam-deflecting element 172a-d may be formed as a multitude
of elements 172. Alternatively, at least two, several or all of the beam-deflecting elements
172a-d may be formed integrally with each other.
30
Fig. 6d shows a schematic side sectional view of the beam-deflecting element 172, whose
cross section is formed as a free-form surface, which means that it does not necessarily
correspond to a simple triangle or square. Thus, the side 174c may comprise a recess 186
that enables fixing a holding element, wherein the recess 186 may also be formed as a
35 projecting element, e.g., as a groove of a tongue-groove system. The cross section further
32
comprises a fourth side 174d having a smaller surface expansion than the main sides 174a
and 174b and connecting the same to each other.
Fig. 6e shows a schematic side sectional view of a first beam-deflecting element 172a and
a second beam-deflecting element 172b arranged behind the former in 5 the illustration
direction. In this case, the recesses 186a and 186b may be arranged such that they are
substantially congruent so that an arrangement of a connecting element in the recesses is
possible.
10 Fig. 6f shows a schematic perspective view of the beam-deflecting means 18, e.g.,
comprising four beam-deflecting elements 172a-d connected with a connecting element
188. The connecting element may be usable to be translationally and/or rotationally moved
by an actuator manner. The connecting element 188 may be integrally configured and may
extend across an extension direction, e.g., the y direction, at or in the beam-deflecting
15 elements 172a-d. Alternatively, the connecting element 188 may also only be connected
with at least one side of the beam-deflecting means 18, e.g., if the beam-deflecting elements
172a-d are integrally formed. Alternatively, a connection to an actuator and/ or a connection
of the beam-deflecting elements 172a-d may also be carried out in any other way, e.g., by
means of gluing, bonding or soldering. The beam-deflecting elements 172a-d may be
20 formed with a small distance or even directly in contact with each other so that there are no
gaps or as few gaps as possible implemented between the beam-deflecting elements 172ad.
This means that the beam-deflecting means 18 may be formed as an array of adjacently
25 arranged facets, each optical channel being assigned to one of the facets. The diaphragm
structure may extend across the array of facets.
The beam-deflecting means may comprise a first and a second reflecting main side 174a
and 174b, wherein the main sides may be inclined towards each other with an angle δ of
30 60° or less.
Based on Figs. 7a-7c, a multi-aperture imaging device 70 including the rotationally movable
beam-deflecting means 18 including the wedge-shaped facets according to Figs. 6a-4f is
subsequently described. Optics 64 of the array 14 are exemplarily formed as multi-part lens
35 combinations. The multi-aperture imaging device 70 includes the diaphragm structure 22
which may be mechanically fixed at a connection edge between the main sides 174a and
33
174b or at the auxiliary side 174d, for example. The optics 64 may be arranged in the
housing 21. Optionally, the image sensor 12 may also be arranged in the housing 21.
Although the subsequent discussions relate to a housing in which the optics 64 are
arranged, the same discussions also apply without limitations to an array of optical
channels, e.g., comprising a carrier, as is described for the carrier 47. 5 The optics 64 may
directly or indirectly be arranged via holding structures at the carrier 47, which is possibly
formed in a transparent manner. For example, the housing 21 may comprise main sides 211
and 212, wherein the main side 211 is characterized in that it is arranged to face the beamdeflecting
means 18 and provides a side of the housing 21 adjacent to the beam-deflecting
10 means 18. For example, when considering Fig. 1, the carrier 47 may also comprise a main
side arranged to face the beam-deflecting means 18, and a main side arranged to face the
image sensor 12. Auxiliary sides 213 and 214 may connect the two main sides 211 and 212
to each other. At least the main side 211 of the housing 21 may also be understood to be a
main side of the array.
15
Fig. 7a now illustrates the multi-aperture imaging device 70 with a first position of the beamdeflecting
means 18, wherein the diaphragm structure 22 closes the slit 291.
Fig. 7b illustrates the multi-aperture imaging device 70 in a second position of beam20
deflecting means 18, wherein the diaphragm structure 22 closes the slit 292. In the first
position illustrated in Fig. 7a, the diaphragm structure may mechanically contact as far on
the outer side as possible, which means adjacently to the auxiliary side 214, which means
the main side 211 adjacent to the auxiliary side 214 or, as is exemplarily illustrated in Fig. 1,
the auxiliary side 214. Fig. 7b illustrates a situation in which the diaphragm structure 22
25 mechanically contacts the housing 21, or the array, adjacently to the auxiliary side 213.
Fig. 7c illustrates the multi-aperture imaging device 70 in an optional intermediate position
between the first position and the second position. In this third position, the diaphragm
structure 22 is directed towards a region between the auxiliary sides 213 and 214. Based on
30 the illustration according to Figs. 7a and 7b, the diaphragm structure 22 may be elastically
or flexibly formed and may provide, e.g., a flexible diaphragm or sealing lip. For this, the
diaphragm structure 22 may include elastic materials such as silicon, polyurethane or other
elastomers. When switching between the first and second position, the diaphragm structure
22 may brush across the main side 211. However, as is illustrated in Fig. 7c, based on a
35 variable distance between the beam-deflecting means 18 and the array 14, or the housing
21, a situation in which the diaphragm structure 22 is free of contact to the array 14, or the
34
housing 21, may be obtained. For this, the multi-aperture imaging device 70 may include
an actuator, for example, which is configured to translationally move the beam-deflecting
means 18 and/or the array 14 in order to temporarily increase a distance between the array
and the beam-deflecting means 18. This means that the multi-aperture imaging device 70
may be configured to provide a translational movement between the 5 array 14 and the
diaphragm structure 22 during the rotational movement of the beam-deflecting means in
order to temporarily increase a distance between the array and the diagram structure.
In other words, a diaphragm, which is preferably made from a flexible material, extending
10 across all facets of the mirror and therefore across the entire width of the array objective is
arranged at a side/edge of the beam-deflecting means of the multi-aperture imaging device
having a linear channel arrangement. The same is similar to a sealing lip. In the two states
of use, i.e., the first and the second positions, the flexible diaphragm is arranged either
above or below the array objective and closes the gap between the array objective and the
15 beam-deflecting means such that stray light cannot not enter into the camera or only to a
limited extent. In a third state, in which the camera is not used and in which the beamdeflecting
means is parked in an intermediate position, the flexible diaphragm may neither
be located above or below the array objective.
20 Fig. 8 shows a schematic side sectional view of a multi-aperture imaging device 80
according to an embodiment. In comparison to the multi-aperture imaging device 70, the
multi-aperture imaging device 80 comprises an optical image stabilizer 34 configured to
apply a force to the array 14, or the housing 21, and/or the beam-deflecting means 18. Due
to the generated force, a relative movement between the image sensor 12, the array 14 and
25 the beam-deflecting means 18 may be obtained, e.g., by a translational displacement of the
array 14 along one or both of the image axes of an image provided by the image sensor 12.
For example, provided for this may be a movement along a z-direction in parallel to the lineextension
direction or along a y-direction which may be arranged in parallel to image axes
36 and/or 38 or may at least partially extend in this direction, which means that they
30 comprise a corresponding direction component. Alternatively or additionally, a translational
relative movement of the beam-deflecting means 18, e.g., along the y-direction, and/or a
rotational movement around the axis 176 may be generated to obtain an optical image
stabilization along the image direction 36 or 38, which is arranged in parallel to the ydirection,
for example. This enables a low complexity since, in this case, the array 14 may
35 only be moved along one direction, e.g., z, and an image stabilization may be obtained
along two directions together with a movement of the beam-deflecting means, whose
35
movement freedom in order to switch directions may already be provided. Alternatively or
additionally to a movement of the array 14, a movement of the image sensor 12 may also
be provided in order to completely or partially implement the optical image stabilization.
Optical image stabilization may be advantageous if, in a capturing process during which
partial fields of view or the total field of view are being captured, the multi-5 aperture imaging
device 60 is moved with respect to the object region whose field of view is being captured.
The rotational movement for the image stabilization may be overlapped with the rotational
movement 38 and may be provided by the same actuator, for example.
10 The optical image stabilizer 34 may be configured to at least partially counteract this
movement to reduce or prevent shaking of the image. For the optical image stabilization
along a first image axis 36, e.g., which may be arranged in parallel to the line-extension
direction z, the optical image stabilizer 34 may be configured to generate a first relative
movement between the image sensor 12, the array 14 and the beam-deflecting means 18.
15 For the optical image stabilization along a second image axis 39 arranged perpendicularly
hereto, the optical image stabilizer 34 may be configured to generate a second relative
movement between the image sensor 12, the array 14 and the beam-deflecting means 18.
For the first relative movement, the optical image stabilizer 34 may be configured to
translationally shift the array 14, or the image sensor 12, along the image axis 36.
20 Alternatively or additionally, the optical image stabilizer 34 may be configured to generate
a translational movement of the beam-deflecting means 18 along the image axis 36. In this
case, the optical image stabilizer 34 is configured to execute the movements of the
components such that the corresponding relative movement is created between the image
sensor 12, the array 14 and the beam-deflecting means 18. The relative movement may be
25 carried out in parallel to the line-extension direction z and perpendicularly to the optical
paths. However, it may be advantageous to put the array 14 in a translational movement
with respect to the image sensor 12 in order to mechanically stress an electronic circuitry
of the image sensor 12 as little as possible or not at all with respect to further components,
for example.
30
In order to generate the second relative movement, the optical image stabilizer 34 may be
configured to generate a rotational movement of the beam-deflecting means 18 or to enable
the same. The same may be overlapped with a movement for rotationally switching the
beam-deflecting means 18. Individual actuators or a combined actuator means may be
35 provided for both rotational movements. Alternatively or additionally, the optical image
stabilizer may be configured to provide a translational relative movement between the
36
image sensor 12 and the array 14 along the image axis 39 and/or a translational relative
movement between the array 14 and the beam-deflecting means 18, wherein corresponding
actuators may be arranged for this. In order to generate the rotational movement, e.g., in
parallel to the rotational movement 38 or as a part thereof, the optical image stabilizer 34
may include, e.g., an actuator configured to generate the rotational movement 5 38. Although
it is possible for obtaining the image stabilization to implement the optical image stabilizer
34 such that it controls the first and second relative movements as translational relative
movements, an implementation of the second relative movement as rotational movement
38 may be advantageous since a translational movement of components along the second
10 image axis 39 may be avoided in this case. This direction may be in parallel to a thickness
direction of the multi-aperture imaging device 60, which according to some embodiments,
is to be kept as low as possible. Such an object may be achieved by the rotational
movement.
15 When considering Fig. 8 and the rotational movement 38 and/or a translational movement
of the array 14 along the z-direction, which may be triggered by the optical image stabilizer
34, a restoring force may be obtained based on the elasticity of the diaphragm structure 22,
or the rigidity of the diaphragm structure, as well as the mechanical contact between the
diaphragm structure 22 and the array 14, or the beam-deflecting means 18, if the respective
20 relative movement is generated by the optical image stabilizer 34, since a deformation of
the diaphragm structure 22 occurs based on the relative movement. Alternatively or
additionally, such a restoring force may at least be partially obtained by separate spring
structures, e.g., elastic connection elements. The restoring force may be configured to
restore at least 30%, at least 20%, or at least 10% of a maximum relative movement, i.e., a
25 maximum deflection in connection with the relative movement by means of the optical image
stabilizer 34 if the force of the optical image stabilizer 34 is retracted.
In other words, the flexible diaphragm 22 itself, or additional elements that are introduced
or attached, may serve as spring elements for the beam-deflecting means and may
30 therefore have a restoring effect when using the latter for optical image stabilization, for
example.
Although the optical image stabilizer is described in combination with the flexible diaphragm,
the optical image stabilizer may also be arranged in absence of the same, e.g., in the multi35
aperture imaging device 10.
37
Fig. 9 shows a schematic perspective view of a multi-aperture imaging device 90 according
to an embodiment, comprising transparent structures 37a and 37b which are arranged
along the viewing directions 271 and 272 starting from the beam-deflecting means 18. The
transparent structures 37a and 37b may be configured to prevent an entry of dirt or particles
in the direction of the housing 21, the beam-deflecting means 18 or further 5 components.
Alternatively or additionally, touching the beam-deflecting means 18, e.g., by means of a
finger of a user or the like, may be prevented or made more difficult. For example, the multiaperture
imaging device 90 comprises two viewing directions and two transparent structures
37a and 37b, wherein each of the transparent structures 37a and 37b may be associated
10 with one of the viewing directions 271 and 272, respectively. For example, when considering
the multi-aperture imaging device 10, which may be formed to comprise only one viewing
direction, the multi-aperture imaging device may also be implemented with only one
transparent structure 37.
15 For example, the transparent structures 37a may include a glass material and/or polymer
material and may be formed to be essentially transparent for the electromagnetic radiation
to be captured by the multi-aperture imaging device 90, it also being conceivable that filters
are introduced into the transparent structures. The transparent structures 37a and/or 37b
may comprise a surface roughness that is low, which means that the transparent structures
20 37a and/or 37b may be implemented to be smooth.
An exemplary value of a roughness Ra for the transparent structures 37a and/or 37b,
however, which is not to be constructed as limiting, may be at most 0.03 μm, at most 0.005
μm, or at most 0.0005 μm, for example. The diaphragm structure 22 may comprise a
25 roughness whose roughness value is comparably larger than the roughness of the
transparent structures 37a and/or 37b. This makes it possible to make an adhesion of the
diaphragm structure 22 at a transparent structure 37a and/or 37b be more difficult or to
avoid the same upon a mechanical contact between the two. This means that, alternatively
to the mechanical contact with the array 14, the diaphragm structure 22 may be in
30 mechanical contact with the transparent structure 37a and/or 37b, e.g., in a temporally
alternating manner. In the first position and in the second position, the diaphragm structure
may be in mechanical contact with the array 14 or one of the transparent structures 37a
and 37b on the one hand, and with beam-deflecting means 18, on the other hand.
35 In other words, the flexible diaphragm 22 may comprise a rough surface so that the
diaphragm may not adhere to smooth surfaces such as cover glasses 37a and/or 37b and/or
38
may be released from the surface upon small forces applied by the beam-deflecting means.
This means that, even in the presence of an adhesion, the diaphragm structure 22 may be
easily released from the transparent structures 37a and/or 37b due to the rotational
movement.
5
Fig. 10 shows a schematic side sectional view of a multi-aperture imaging device 100 which
may optionally include the transparent structures 37a and/or 37b; however, is easily
implementable without the same. The multi-aperture imaging device 80 includes a
diaphragm structure 22’ that may be formed in a similar manner as the diaphragm structure
10 22; however, which may additionally include a magnetic or magnetizable material, e.g.,
ferromagnetic or paramagnetic materials. For example, these materials may be introduced
as particles, chips, sawings, or grindings into the material of the diaphragm structure 22.
This means that that diaphragm structure 22’ may include magnetic materials. A magnetic
field-providing element 44a and/or 44b, i.e., a magnetic field source, may be arranged
15 adjacent to the housing 21 and/or the transparent structures 37a and/or 37b and therefore
adjacent to the diaphragm structure 22. The magnetic field-providing elements 44a and/or
44b may preferably be elements that provide, in a temporal alternation, a magnetic field that
is preferably strong or preferably weak or provide none at all. For example, the magnetic
field sources 44a and 44b may be electromagnets. Alternatively or additionally, it is also
20 conceivable that the magnetic field sources, e.g., include permanent magnets and be
arranged with a variable distance to the diaphragm structure 22’ in order to provide a
comparably large magnetic field at a small distance and to provide a comparably small
magnetic field at a large distance.
25 Magnetic fields of the magnetic field sources 44a and 44b may be configured such that an
attracting force is applied to the diaphragm structure 22‘ based on the magnetic field so that
the attracting force executes the rotational movement of the beam-deflecting means 18 or
at least supports the same. Alternatively or additionally, it is also conceivable that, after the
rotational movement of the beam-deflecting means 18, a part of the diaphragm structure
30 22’ that possibly remains in the field of view of the array 14 is moved out this field of view,
i.e., is pulled out by the attracting force.
In other words, electromagnets attracting the flexible diaphragm in addition to the rotational
movement of the beam-deflecting means 18 may be formed above and below the array
35 objective from a coil and, if applicable, an additional core so that the diaphragm has an even
more improved light-sealing effect.
39
The above-described arrangement of a diaphragm structure enables an improvement of the
stray light suppression in multi-aperture imaging devices. Such multi-aperture imaging
devices and/or multi-aperture imaging systems may be used in concepts having a linear
channel arrangement and a smallest installation 5 size.
According to embodiments, a focusing means may be provided which is configured to
change, in a channel-individual manner for two or several or possibly all optical channels,
a focus of the multi-aperture imaging device 100 or of another of the herein described multi10
aperture imaging devices, e.g., the multi-aperture imaging device 10, 10’, 40, 50, 60, 70,
80, or 90. For this, an actuator may be used to, e.g., change a distance between at least
one optic of the array 14, or the entire array 14, and the image sensor 12. This may lead to
a variable distance between the optic, or the array 14, and the beam-deflecting means 18,
e.g., if the optic of the optical channel, i.e., the objective, is axially moved. By means of a
15 flexible or elastic diaphragm, the slit between the array 14 and the beam-deflecting means
18 may remain closed, e.g., if an axial expansion of the diaphragm structure 22’ along the
x-direction is larger than or equal to a maximum distance between the array 14 and the
beam-deflecting means 18. When decreasing the distance and/or subsequently increasing
the same, a linear compression/elongation or deformation of the diaphragm structure 22’
20 may keep the slit closed.
Although the means for optical image stabilization, or the optical image stabilizer, and the
focusing means are described in connection with a flexible diaphragm, both means may be
provided individually or in combination and also in absence of such a diaphragm. For
25 example, the array 14 and the image sensor 12 may be moved as a mutual unit by an
actuator of the optical stabilizer, e.g., by arranging and moving the unit in, at or on a movable
travel carriage. Within this unit, one or several actuators may be provided to provide a
movement between one, several, or all optics of the array and the beam-deflecting means
18 and/or the image sensor 12. Such a movement may occur by moving the optics and/or
30 possible carriers connected to the optics.
In the adjustment movement, the means for optical image stabilization and/or the focusing
means may be accordingly moved along. Alternatively or additionally, the same actuators
or actuating means may also be used for generating a movement.
35
40
Fig. 11 shows a schematic illustration of a total field of view 71, as may be detected, e.g.
with an above-described multi-aperture imaging device, e.g., the multi-aperture imaging
device 10, 10’, 40, 50, 60, 70, 80, 90, or 100. Although the above-described multi-aperture
imaging devices are described such that they exemplarily comprise four optical channels
for capturing four partial fields of view 72a-72d of the total field of view, it is 5 to be noted that
the herein-described multi-aperture imaging devices may also be formed with a different
number of optical channels, e.g., with a number of at least 2, at least 3, at least 4, at least
10, at least 20, or any higher value. Furthermore, it is to be noted that it is conceivable that
some of the partial fields of view 72a-72d may be captured with a number of more than one
10 optical channel. The optical paths of the optical channels of the multi-aperture imaging
devices may be guided to different partial fields of view 72a-d, wherein each optical channel
may be assigned a partial field of view 72-d. For example, the partial fields of view 72a-d
overlap with each other to enable joining individual partial fields of view to a total field of
view. If the multi-aperture imaging device comprises a number of optical channels that
15 differs from 4, the total field of view 71 may comprise a number of partial fields of view that
differs from 4. Alternatively or additionally, at least one partial field of view 72a-d may be
captured by a second optical channel or by any higher number of optical channels having
any higher number of modules (multi-aperture imaging devices) to form stereo cameras,
trio cameras, quattro cameras, or cameras of higher values. The individual modules may
20 be shifted by fractions of a pixel and may be configured to implement methods of superresolution.
For example, a number of optical channels and/or a number of multi-aperture
imaging devices and/or a number of partial fields of view is/are arbitrary.
Fig. 12 shows a schematic perspective view of an imaging system 120 comprising a housing
25 73 and a first multi-aperture imaging device 10a and a second multi-aperture imaging device
10b arranged in the housing 73. The imaging system 120 is configured to capture the total
field of view 71 at least partially, e.g., in the overlapping region of the capturing regions of
the multi-aperture imaging devices 10a and 10b, in a stereoscopic manner with the multiaperture
imaging devices 10a and 10b. The overlapping region may form a part of the total
30 field of view 71, but may cover the total field of view 71 almost entirely or entirely, i.e., with
a ratio of at least 95%, at least 97%, or at least 99%. For example, the total field of view 71
is arranged at a main side 74b of the housing 73 facing away from a main side 74a. For
example, the multi-aperture imaging devices 10a and 10b may capture the total field of view
71 through transparent regions 68a and 68, respectively, wherein diaphragms 78a and 78c
35 arranged in the main side 74b may at least be partially transparent. Diaphragms 78b and
78d arranged in the main side 74a may include transparent regions 78b and 78d,
41
respectively, that at least partially optically close the transparent regions 68b and 68d so
that an amount of stray light, which could falsify recordings of the multi-aperture imaging
devices 10a and/or 10b, from a side facing the main side 74a is at least reduced. The main
side 74a may be comparable to the housing side 23a of the apparatus 30. In the same way,
the main side 74b may be comparable to the housing side 23b. As an alternative 5 to providing
a diaphragm 68a-d, the beam-deflecting means of one or both multi-aperture imaging
devices 10a and/or 10b or a mutual beam-deflecting means may be moved out of the
housing 73.
10 Although the multi-aperture imaging devices 10a and 10b are illustrated to be arranged
spaced apart from each other, the multi-aperture imaging devices 10a and 10b may also be
arranged to be spatially neighboring or in a combined manner. For example, the arrays of
the imaging devices 10a and 10b may be arranged next to each other or in parallel to each
other. The arrays may be formed in a multi-line manner or in a single-line manner and may
15 form lines that are arranged towards each other, wherein each multi-aperture imaging
device 10a and 10b comprises a single-line array, for example. The multi-aperture imaging
devices 10a and 10b may comprise a mutual beam-deflecting means and/or a mutual
carrier 47 and/or a mutual image sensor 12. This means that the multi-aperture imaging
devices 10a and 10b and/or further multi-aperture imaging devices may comprise a mutual
20 image sensor, a mutual electronic carrier for controlling and/or reading-out the multiaperture
imaging devices and/or a mutual beam-deflecting unit. Alternatively or additionally
to the multi-aperture imaging device 10a and/or 10b, at least the multi-aperture imaging
device 10’, 40, 50, 60, 70, 80, 90 and/or 100, and/or a further multi-aperture imaging device
10 may be arranged. The above-described mutual elements, e.g., the beam-deflecting
25 means 18 or the array 14, may be used by a mutual optical image stabilizer, since a
movement of the beam-deflecting means may mutually act for optical channels of several
modules, which enables a mutual optical image stabilization, for example. Accordingly, the
optical image stabilizer may also be mutually implemented for several modules and/or a
mutual reference channel may be used for several modules.
30
The transparent regions 68a-d may be additionally equipped with a switchable diaphragm
78a-d that covers the optical structure in case they are not used. The diaphragms 78a-d
may include a mechanically moved part. The movement of the mechanically moved part
may be carried out using an actuator, e.g., as may be provided for other movements. The
35 diaphragms 78a-d may alternatively or additionally be electrically controllable and include
42
an electrochromic layer or an electrochromic layer sequence, i.e., be formed as an
electrochromic diaphragm.
Fig. 13 shows a schematic structure including a first multi-aperture imaging device 10a and
a second multi-aperture imaging device 10b, as may be arranged in 5 the imaging system
120, for example. The arrays 14a and 14b may be formed in a single-line manner and may
form a mutual line. The image sensors 12a and 12b may be marked on a mutual substrate,
or on a mutual circuit carrier, such as a mutual circuit board or a mutual flex board.
Alternatively, the image sensors 12a and 12b may also include different substrates.
10 Different mixes of these alternatives are obviously also possible, e.g., multi-aperture
imaging devices including a mutual image sensor, a mutual array and/or a mutual beamdeflecting
means 18 as well as further multi-aperture imaging devices comprising separate
components. An advantage of a mutual image sensor, a mutual array and/or a mutual
beam-deflecting means is that a movement of the respective components may be obtained
15 with a higher precision by controlling a lower number of actuators, and a synchronization
between actuators may be used or avoided. Furthermore, a high thermal stability may be
obtained. Alternatively or additionally, other and/or different multi-aperture imaging devices
may comprise a mutual array, a mutual image sensor and/or a mutual beam-deflecting
means.
20
Fig. 14 shows a schematic flow diagram of a method 1400 providing a multi-aperture
imaging device, e.g., the multi-aperture imaging device 10.
The method 1400 includes step 1410 of providing an image sensor. A step 1420 includes
25 arranging an array of optical channels such that each optical channel includes an optic for
imaging a partial field of view of a total field of view onto an image sensor region of the
image sensor. Step 1430 includes arranging a beam-deflecting means such that the same
is switchable between a first rotational position and a second rotational position by
executing a switching movement and is configured to deflect, in a first rotational position,
30 optical paths of the optical channels into a first viewing direction, and to deflect, in a second
rotational position, the optical paths of the optical channels into a second viewing direction.
The method is executed such that the array is configured to execute, based on the switching
movement, an adjustment movement for adjusting an orientation of the array with respect
to the beam-deflecting means.
35
Fig. 15 shows a schematic flow diagram of a method 1500 for capturing an image region.
43
The method 1500 includes step 1510 of imaging a first object region with an array of optical
channels, wherein each optical channels includes an optic for imaging a partial field of view
of a total field of view onto an image sensor region of the image sensor; by deflecting optical
paths of the optical channels into a first viewing direction with a first beam-5 deflecting means
in a first rotational position. Step 1520 includes executing a switching movement of the
beam-deflecting means in order to switch the same between the first rotational position and
a second rotational position such that the optical channels are deflected into a second
viewing direction. Step 1530 includes executing an adjustment movement of the array
10 based on the switching movement in order to adjust an orientation of the array with respect
to the beam-deflecting means.
Even though some aspects have been described within the context of a device, it is
understood that said aspects also represent a description of the corresponding method, so
15 that a block or a structural component of a device is also to be understood as a
corresponding method step or as a feature of a method step. By analogy therewith, aspects
that have been described within the context of or as a method step also represent a
description of a corresponding block or detail or feature of a corresponding device.
20 The above-described embodiments merely represent an illustration of the principles of the
present invention. It is understood that other persons skilled in the art will appreciate
modifications and variations of the arrangements and details described herein. This is why
it is intended that the invention be limited only by the scope of the following claims rather
than by the specific details that have been presented herein by means of the description
25 and the discussion of the embodiments.
44
We Claim:
1. Multi-aperture imaging device, comprising:
an image 5 sensor (12);
an array (14) of optical channels (16a-h), each optical channel (16a-h) including
an optic (64a-h) for imaging a partial field of view (72a-d) of a total field of view (71)
onto an image sensor region (24a-h) of the image sensor (12); and
10
a beam-deflecting means (18) switchable between a first rotational position and a
second rotational position by executing a switching movement and configured to
deflect, in a first rotational position, optical paths (26a-h) of the optical channels
(16a-h) into a first viewing direction (271) and to deflect, in a second rotational
15 position, the optical paths (26a-h) of the optical channels (16a-h) into a second
viewing direction (271);
wherein the array (14) is configured to execute, based on the switching movement,
an adjustment movement (11) for adjusting an orientation of the array (14) with
20 respect to the beam-deflecting means (18).
2. Multi-aperture imaging device according to claim 1, wherein the partial fields of
view (72a-d) overlap with each other to enable joining individual partial fields of
view to a total field of view.
25
3. Multi-aperture imaging device according to any one of the preceding claims,
wherein the viewing directions are arranged to be reversed towards each other
within a tolerance range.
30 4. Multi-aperture imaging device according to any one of the preceding claims,
wherein the beam-deflecting means (18) is configured to guide, in the first position,
the optical paths with a first main side of the beam-deflecting means into the first
viewing direction (271) and to guide, in the second position, the optical paths with
a second main side into the second viewing direction (272).
35
45
5. Multi-aperture imaging device according to any one of the preceding claims,
wherein the beam-deflecting means is configured to deflect all optical channels
(16a-h) of the array (14).
6. Multi-aperture imaging device according to any one of the 5 preceding claims,
wherein the adjustment movement (11) differentiates itself from a movement for
focusing and for optical image stabilization and the adjustment movement occurs
in the absence of a translational distance change between the array (14) and the
image sensor (12) along a direction parallel to an extension of the optical channels
10 (16a-h) between the image sensor (12) and the array (14).
7. Multi-aperture imaging device according to any one of the preceding claims,
wherein the adjustment movement (11) takes place while maintaining a
translational distance between the array (14) and the image sensor (12) along a
15 direction arranged in parallel to an extension of the optical channels between the
image sensor (12) and the array (14).
8. Multi-aperture imaging device according to any one of the preceding claims,
configured to move the array (14) during the adjustment movement (11) in order to
20 adjust a relative position between the array (14) and the beam-deflecting means
(18).
9. Multi-aperture imaging device according to any one of the preceding claims,
wherein, based on the adjustment movement (11), at least part of a movement
25 range of the beam-deflecting means (18) required by the switching movement is
reduced in comparison to an immovable array.
10. Multi-aperture imaging device according to any one of the preceding claims,
wherein, in the first rotational position and in the second rotational position, a lateral
30 position of the beam-deflecting means along a thickness direction (y) of the multiaperture
imaging device, which position is arranged perpendicularly to an axial
direction (x) between the image sensor and the array and perpendicularly to a lineextension
direction (z) of a line of the array along which optical channels are
essentially arranged along a straight line, is equal to an extent of at least 20%.
35
46
11. Multi-aperture imaging device according to anyone of the preceding claims,
wherein the switching movement includes a rotational movement (38) of the beamdeflecting
means (18), wherein the adjustment movement (11) includes a
translational movement (111) of the array (14) along a movement direction (y)
perpendicular to a line-extension direction (z) of a line of the 5 array along which
optical channels are essentially arranged along a straight line and in parallel to a
thickness direction of the multi-aperture imaging device.
12. Multi-aperture imaging device according to any one of the preceding claims,
10 wherein the switching movement includes a rotational movement (38) of the beamdeflecting
means (18) and a first translational movement (17) of the beamdeflecting
means (18) along a first movement direction (y), wherein the adjustment
movement (11) includes a second translational movement (111) of the array (14)
along the movement direction.
15
13. Multi-aperture imaging device according to claim 12, wherein the first movement
direction (y) is arranged along the first viewing direction (271).
14. Multi-aperture imaging device according to claim 12 or 13, wherein the first
20 translational movement (17) and the second translational movement (111) are
equal within a tolerance range of 20% with respect to their magnitude.
15. Multi-aperture imaging device according to any one of the preceding claims,
wherein the switching movement from the first into the second rotational position
25 includes a first rotational movement (38) of the beam-deflecting means (18), and
the adjustment movement (11) includes a second rotational movement (112).
16. Multi-aperture imaging device according to claim 15, wherein the first (17) and the
second (112) rotational movement occur in the same direction.
30
17. Multi-aperture imaging device according to claim 15 or 16, wherein a sum of a size
of an angle of the first rotational movement (38) and a size of an angle (δ1, δ2) of
the second rotational movement (112) results in 90° within a tolerance range of
20%.
35
47
18. Multi-aperture imaging device according to any one of claims 15 to 18, wherein the
switching movement is exclusively executed by the rotational movement (38),
wherein a rotation axis of the rotational movement (38) along a thickness direction
of a multi-aperture imaging device is centered within a tolerance range of 20% to
a largest expansion of the beam-deflecting means (18) along 5 the thickness
direction (y).
19. Multi-aperture imaging device according to any one of claims 1 to 10, wherein the
switching movement from the first into the second rotational position includes a
10 first rotational movement (38) of the beam-deflecting means (18) and a
translational movement (17) of the beam-deflecting means (18) along a first
movement direction (y);
wherein the adjustment movement (11) includes a translational movement (111) of
15 the array (14) along the first movement direction (y), and includes a second
rotational movement (111).
20. Multi-aperture imaging device according to any one of the preceding claims,
wherein the adjustment movement (11) includes a translational movement (111)
20 along a thickness direction (y) perpendicular to a line-extension direction of a line
of the array along which optical channels are essentially arranged along a straight
line of the multi-aperture imaging device.
21. Multi-aperture imaging device according to any one of the preceding claims,
25 wherein the array (14) is configured to execute the adjustment movement (11) such
that diverging beams of the optical path (26a-h) of the optical channels (16a-h)
strike the beam-deflecting means (18) to an extent of at least 90%.
22. Multi-aperture imaging device according to any one of the preceding claims,
30 wherein the first viewing direction (271) and the second viewing direction (272) are
arranged in the opposite direction within a tolerance range of ± 30°.
23. Multi-aperture imaging device according to any one of the preceding claims,
wherein a required dimension D of the multi-aperture imaging device along a
35 direction perpendicular to a line-extension direction of a line of the array along
which optical channels are essentially arranged along a straight line and
48
perpendicular to a course of the optical paths between the image sensor (12) and
the array (14) fulfils, due to the adjustment movement, the following condition:
D