1. Fragrance, flavor and/or deodorizing/masking composition comprising an aceta! selected from compounds of formula (1), formula (2), formula (3) or of formula (4)
wherein compound (1) is 2-ethoxy-l-(l-ethoxyemoxy)-4-methylbenzene; compound (2) is 3-etrioxy-4~(l-ethoxyethoxy)benzaldehyde; compound (3) is 2-(3-ethoxy-4-(l-ethoxyethoxy)phenyl)-4-methyl-l,3-dioxolane; and compound (4) is 2-ethoxy-l-(l-ethoxyethoxy)-4-(methoxymethyl)benzene.
2. Fragrance, flavor and/or deodorizing/masking compositions according to claim 1 wherein the acetal is selected from compound (1), compound (3) and compound (4).
3. Fragrance, flavor and/or deodorizing/masking compositions according to any of the preceding claims wherein the content of the acetal compound is comprised between 0.0001 and95wt%.

4. Fragrance, flavor and/or deodorizing/masking compositions according to claim 3
wherein the content of the acetal compound is comprised between 0.1 and 10 wt, %.
5. Fragrance, flavor and/or deodorizing/masking compositions according to any of the
preceding claims wherein the composition further comprises at least one ester and/or
one alcohol.
6. Fragrance, flavor and/or deodorizing/masking compositions according to claim 5 wherein the total content of the compound(s) of formula (1) or of formula (2) or of formula (3) or of formula (4) together with the ester(s) and/or alcohol(s) is superior to 25 wt%.
7. Fragrance, flavor and/or deodorizing/masking compositions according to any of the preceding claims wherein the composition further comprises in addition to the acetais of formula (1) or of formula (2) or of formula (3) or of formula (4) their respective parent phenol of formula (5) or of formula (6) or of formula (7) or of formula (8)
8. Fragrance, flavor and/or deodorizing/masking compositions according to claim 7
wherein the total content of the compound(s) of formula (1) or of formula (2) or of
fonnuia (3) or of formula (4) together with their respective parent phenol of formula (5) or of fonnuia (6) or of formula (7) or of formula (8) is superior to 5 wt%.
9. Fragrance, flavor and/or deodorizing/masking compositions according to any of
claims 7 or 8 wherein the weight ratio between the acetais of fonnuia (1) or of
fonnuia (2) or of fonnuia (3) or of formula (4) and their respective parent phenol of
fonnuia (5) or of formula (6) or of formula (7) or of fonnuia (8) is comprised between

0.01/99.99 and 99.99/0.01, for example between 0.1/99.9 and 99.9/0.1, for example between 1/99 and 99/1, for example between 1/99 and 20/80.
10. Fragrance, flavor and/or deodorizing/masking compositions according to any of claims 7 or 8 wherein the weight ratio between the acetals of formula (1) or of formula (2) or of formula (3) or of formula (4) and their respective parent phenol of formula (5) or of formula (6) or of formula (7) or of formula (8) is comprised between 80/20 and 99/1.
11. Fragrance, flavor and/or deodorizing/masking compositions according to any of the preceding claims wherein the composition further comprises, in addition to the acetals of formula (1) or of formula (2) or of formula (3) or of formula (4), a reaction product of the reaction between the respective parent phenol of formula (5) or of formula (6) or of formula (7) or of formula (8) with ethoxyethene.
12. Acetal of formula (1), formula (2), formula (3) or of formula (4) useful in the perfume, aroma and/or deodorizing/masking composition according to claim 1
wherein compound (1) is 2-ethoxy-l-(l-ethoxyethoxy)-4-methylbenzene; compound (2) is 3-ethoxy-4-(l-ethoxyethoxy)benzaldehyde; compound (3) is 2-(3-ethoxy-4-(l-

ethoxyethoxy)phenyl)-4-methyl-l,3-dioxolane; and compound (4) is 2-ethoxy-l-(l-ethoxyethoxy)-4-(methoxymethyl)benzene.
13. Acetal according to claim 12 wherein the acetal is selected from compound (1), compound (3) and compound (4).
14. Use of a fragrance, flavor and/or deodorizing/masking composition according to any of claims 1 to 11 in a perfumed or flavored product,
15. Use of an acetal according to any of claims 12 to 13 in a perfumed or flavored product.
16. Process for preparing acetal of formula (1), formula (2), fotmula (3) or of formula (4)
from compounds of formula (5), (6), (7), (8) respectively

by subjecting said compounds of formula (5), (6), (7), (8) to an acetalization synthesis
step.
17. Process for preparing acetal according to claim 16 wherein the synthesis is performed by reacting the compounds of formula (5), (6), (7), or (8) with ethoxyethene.
18. Process for preparing acetal according to claim 17 wherein the synthesis is performed under acidic conditions.