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WHAT IS CLAIMED IS:
1. A photosensitive resin composition, comprising:
a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and
an infrared absorbent.
2. The photosensitive resin composition according to claim 1, wherein the
polycyclic structure comprises at least one structure selected from the group consisting of a
fused cyclic hydrocarbon structure, a fused polycyclic aromatic structure, and a structure
formed by a plurality of aromatic hydrocarbons being bonded through a single bond.
3. The photosensitive resin composition according to claim 1 or 2, wherein the
polymer compound comprises a structure represented by any one of the following Formulae
A-l toA-6:
wherein, in Formulae A-l to A-6, RAn, RA12, R^1, R^2, R^1 to R^3, RA41, RA42, RA51, RA52, and RA61 to RA63 each independently represent a hydrogen atom, a sulfonamide

group, a hydroxyl group, a carboxy group, an alkyl group, or a halogen atom; ZAn and Z^1 each independently represent -C(R)2-, -0-, -NR-, -S-, or a single bond, wherein R represents a
A91
hydrogen atom or an alkyl group; and X represents -C(R')2-, -0-, -NR'-, -S-, or a single bond, wherein R' represents a hydrogen atom or an alkyl group.
4. The photosensitive resin composition according to any one of claims 1 to 3, wherein the polymer compound comprises a structure represented by any one of the following Formulae B-l to B-6:
wherein, in Formulae B-l to B-6, RBn, RB12, RB21, RB22, RB31 to RB33, RB41, RB42, RB51, RB52, and RB61 to RB63 each independently represent a hydrogen atom, a sulfonamide group, a hydroxyl group, a carboxy group, an alkyl group, or a halogen atom; ZBn and ZB21 each independently represent -C(R)2-, -0-, -NR-, -S-, or a single bond, wherein R represents a hydrogen atom or an alkyl group; X represents -C(R')2-, -0-, -NR'-, -S-, or a single bond, wherein R' represents a hydrogen atom or an alkyl group; QBn, QB12, QB21, QB22, QB31, Q32, QB41, QB42, QB51, QB52, QB61, and QB62 each independently represent an alkylene group, an arylene group, a divalent saturated alicyclic hydrocarbon group, a divalent unsaturated alicyclic hydrocarbon group, or a divalent group formed by a plurality of these groups being linked to each other; and nBll, nB12, nB21, nB22, nB31, nB32, nB41, nB42, nB51, nB52, nB61, and nB62 each independently represent an integer of 1 or larger.
5. The photosensitive resin composition according to claim 4, wherein the polymer compound comprises a structure represented by the following Formula C-l or C-2 as the

structure represented by Formula B-l or comprises a structure represented by the following Formula C-3 or C-4 as the structure represented by Formula B-2:
wherein, in Formulae C-l to C-4, Rcn, RC12, RC21, RC22, RC31, RC32, RC41, and RC42 each independently represent a hydrogen atom, a sulfonamide group, a hydroxyl group, a
carboxy group, an alkyl group, or a halogen atom; Q ,Q ,Q ,Q ,Q ,Q ,Q , and Q each independently represent an alkyl ene group, an arylene group, a divalent saturated alicyclic hydrocarbon group, a divalent unsaturated alicyclic hydrocarbon group, or a divalent group formed by a plurality of these groups being linked to each other; and nCll, nC12, nC21, nC22, nC31, nC32, nC41, and nC42 each independently represent an integer of 1 or larger.
6. The photosensitive resin composition according to claim 5, wherein the polymer compound comprises the structure represented by Formula C-l or C-2.
7. The photosensitive resin composition according to any one of claims 1 to 6, wherein the polymer compound further comprises an alkyleneoxy group in the main chain thereof.
8. The photosensitive resin composition according to any one of claims 1 to 7, wherein the polymer compound further comprises at least one selected from the group consisting of a urea bond, a urethane bond, an imide bond, an amide bond, a carbonate bond, and a linking group formed by two or more of these bonds being bonded to each other, in the main chain thereof.
9. A planographic printing plate precursor, comprising:

a support having a hydrophilic surface; and
an image recording layer which comprises the photosensitive resin composition according to any one of claims 1 to 8, on the support.
10. The planographic printing plate precursor according to claim 9, which is a positive type planographic printing plate precursor.
11. The planographic printing plate precursor according to claim 9 or 10, which is a positive type planographic printing plate precursor, wherein the image recording layer comprises a lower layer and an upper layer in this order, on the support having a hydrophilic surface, and wherein at least one of the lower layer or the upper layer comprises the photosensitive resin composition.
12. The planographic printing plate precursor according to any one of claims 9 to 11, further comprising an undercoat layer between the support having a hydrophilic surface and the image recording layer.
13. A method for producing a planographic printing plate, comprising in the
following order:
an exposure step of image-wise exposing the planographic printing plate precursor according to any one of claims 9 to 12; and
a development step of performing development using an alkali aqueous solution having a pH of 8.5 to 13.5.
14. A polymer compound, comprising a structure represented by any one of the
following Formulae B-l to B-6:

wherein, in Formulae B-l to B-6, RBn, RB12, RB21, RB22, RB31 to RB33, RB41, RB42, RB51, RB52, and RB61 to RB63 each independently represent a hydrogen atom, a sulfonamide group, a hydroxyl group, a carboxy group, an alkyl group, or a halogen atom; ZBn and ZB21 each independently represent -C(R)2-, -0-, -NR-, -S-, or a single bond, wherein R represents a hydrogen atom or an alkyl group; X represents -C(R')2-, -0-, -NR'-, -S-, or a single bond, wherein R' represents a hydrogen atom or an alkyl group; QBn, QB12, QB21, QB22, QB31, Q32, QB41, QB42, QB51, QB52, QB61, and QB62 each independently represent an alkylene group, an arylene group, a divalent saturated alicyclic hydrocarbon group, a divalent unsaturated alicyclic hydrocarbon group, or a divalent group formed by a plurality of these groups being linked to each other; and nBll, nB12, nB21, nB22, nB31, nB32, nB41, nB42, nB51, nB52, nB61, and nB62 each independently represent an integer of 1 or larger.
15. The polymer compound according to claim 14, which comprises a structure represented by the following Formula C-l or C-2 as the structure represented by Formula B-l or comprises a structure represented by the following Formula C-3 or C-4 as the structure represented by Formula B-2:

(C-3) (C-4)
wherein, in Formulae C-l to C-4, Rcn, RC12, RC21, RC22, RC31, RC32, RC41, and RC42 each independently represent a hydrogen atom, a sulfonamide group, a hydroxyl group, a

carboxy group, an alkyl group, or a halogen atom; Q ,Q ,Q ,Q ,Q ,Q ,Q , and Q each independently represent an alkyl ene group, an arylene group, a divalent saturated alicyclic hydrocarbon group, a divalent unsaturated alicyclic hydrocarbon group, or a divalent group formed by a plurality of these groups being linked to each other; and nCll, nC12, nC21, nC22, nC31, nC32, nC41, and nC42 each independently represent an integer of 1 or larger.
16. The polymer compound according to claim 15, which comprises the structure represented by Formula C-l or C-2.
17. The polymer compound according to any one of claims 14 to 16, comprising an alkyleneoxy group in a main chain thereof.
18. The polymer compound according to any one of claims 14 to 17, further comprising at least one selected from the group consisting of a urea bond, a urethane bond, an imide bond, an amide bond, a carbonate bond, and a linking group formed by two or more of these bonds being bonded to each other, in the main chain thereof.