WE CLAIM:
.1. A resin composition comprising:
an (a) resin having a structure represented by Chemical Formula (1);
5
(in Chemical Formula (1), X represents a tetravalent
tetracarboxylic acid residue having two or more carbon
atoms and Y represents a divalent diamine residue having
two or more carbon atoms; Z represents a structure
10 represented by Chemical Formula (2); n represents a
positive integer; R1 and R2 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, an alkylsilyl group having 1 to 10 carbon atoms, an alkali metal ion, an ammonium ion, an imidazolium ion, or a
15 pyridinium ion; and * indicates that the carbon atom is bonded to another atom),

(in Chemical Formula (2), a represents a monovalent hydrocarbon group having 2 or more carbon atoms and P and y 20 each independently represent an oxygen atom or a sulfur atom; and * indicates a bonding point of Z in Chemical Formula (1)); and
a (b) solvent, wherein
an amount of a compound represented by Chemical 25 Formula (3) is 0.1 ppm by mass or more and 40 ppm by mass or less,

(in Chemical Formula (3), Y represents a divalent diamine residue having 2 or more carbon atoms; and Z represents a structure represented by Chemical Formula (2)).
2. The resin composition according to claim 1, wherein the amount of the compound represented by Chemical Formula (3) is 4 ppm by mass or more.
3. A resin composition comprising:
an (a') resin having a repeating unit represented by Chemical Formula (4) as a main component; and
a (b) solvent, wherein
the (a') resin comprises one or more resins selected from a group consisting of the following (A) and (B):
(A) a resin mixture comprising a resin (A-l) comprising two or more partial structures represented by Chemical Formula (5) in a molecule and a resin (A-2) comprising two or more partial structures represented by Chemical Formula (6) in a molecule; and
(B) a resin comprising one or more partial structures represented by Chemical Formula (5) and one or more partial structures represented by Chemical Formula (6) in a molecule,

(in Chemical Formulas (4) to (6), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; in Chemical Formula (5) , W represents a structure represented by Chemical Formula (7); Z represents a structure represented by Chemical Formula
(2) ; R3 and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms or an alkylsilyl group having 1 to 10 carbon atoms, an alkali metal ion, an ammonium ion, an imidazolium ion, or a pyridinium ion; and * in Chemical Formulas (5) and (6) indicates that the nitrogen/carbon atom is bonded to another atom),

(8 in Chemical Formula (7) and a in Chemical Formula (2) each independently represent a monovalent hydrocarbon group having two or more carbon atoms; 6 in Chemical Formula (7) and P and y in Chemical Formula (2) each independently represent an oxygen atom or a sulfur atom; * in Chemical Formula (7) indicates a bonding point of W in Chemical Formula (5) and * in Chemical Formula (2) indicates a bonding point of Z in Chemical Formula (6)).
4. The resin composition according to any one of claims 1 to 3, wherein P and y in Chemical Formula (2) are oxygen atoms.
5. The resin composition according to any one of claims 1 to 4, wherein a in Chemical Formula (2) is a tert-butyl group.
6. The resin composition according to any one of claims 1 to 5, further comprising a (c) thermal acid generator.
7. A method for producing a resin represented by Chemical Formula (1), the method comprising:
(A) a step of producing a compound represented by Chemical Formula (41) by gradually adding a solution in which a terminal amino group blocking agent that is reactive with an amino group of a diamine compound is dissolved in a reaction solvent in 20% by mass or less to

the diamine compound over a time of 10 minutes or more;

(in Chemical Formula (41), Y represents a divalent diamine residue having two or more carbon atoms; and Z represents a structure represented by Chemical Formula (2)),

(in Chemical Formula (2), a represents a monovalent hydrocarbon group having 2 or more carbon atoms and P and y each independently represent an oxygen atom or a sulfur atom; and * indicates a bonding point of Z in Chemical Formula (41)); and
(B) a step of reacting the compound represented by Chemical Formula (41), a tetracarboxylic acid, and a residual diamine compound having not reacted with the terminal amino group blocking agent in the (A) step,

(in Chemical Formula (1), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; Z represents a structure represented by Chemical Formula (2); n represents a positive integer; R1 and R2 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, an alkylsilyl group having 1 to 10 carbon atoms, an alkali metal ion, an ammonium ion, an imidazolium ion, or a pyridinium ion; and * indicates that the carbon atom is

bonded to another atom).
8. A method for producing a resin represented by Chemical Formula (1), the method comprising:
(C) a step of producing a resin having a structure
represented by Chemical Formula (42) by reacting a diamine
compound and a tetracarboxylic acid;

(in Chemical Formula (42), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; n represents a positive integer; R1 and R2 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, an alkylsilyl group having 1 to 10 carbon atoms, an alkali metal ion, an ammonium ion, an imidazolium ion, or a pyridinium ion; and * indicates that the carbon atom is bonded to another atom); and
(D) a step of producing a resin having a structure
represented by Chemical Formula (1) by reacting the resin
having the structure represented by Chemical Formula (42)
and a terminal amino group blocking agent that is reactive
with a terminal amino group of the resin having the
structure represented by Chemical Formula (42),


(in Chemical Formula (1), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; Z represents a structure represented by Chemical Formula (2); n represents a positive integer; R1 and R2 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, an alkylsilyl group having 1 to 10 carbon atoms, an alkali metal ion, an ammonium ion, an imidazolium ion, or a pyridinium ion; and * indicates that the carbon atom is bonded to another atom),

(in Chemical Formula (2), a represents a monovalent hydrocarbon group having 2 or more carbon atoms and P and y each independently represent an oxygen atom or a sulfur atom; and * indicates a bonding point of Z in Chemical Formula (1)).
9. A method for producing a resin represented by Chemical Formula (4A), the method comprising:
(E) a step of producing a compound represented by Chemical Formula (41) by reacting a diamine compound and a terminal amino group blocking agent that is reactive with an amino group of the diamine compound;


(in Chemical Formula (41), Y represents a divalent diamine residue having 2 or more carbon atoms; and Z represents a structure represented by Chemical Formula (2)),

(in Chemical Formula (2), a represents a monovalent hydrocarbon group having 2 or more carbon atoms and P and y each independently represent an oxygen atom or a sulfur atom; and * indicates a bonding point of Z in Chemical Formula (41));
(F) a step of producing one or more resins selected from a group consisting of the following (A') and (B1) by reacting the compound represented by Chemical Formula (41) , a tetracarboxylic dianhydride, and a residual diamine compound having not reacted with the terminal amino group blocking agent in the (E) step;
(A') a resin mixture comprising a resin (A'-l) comprising two or more partial structures represented by Chemical Formula (52) in a molecule and a (A'-2) resin comprising two or more partial structures represented by Chemical Formula (6A) in a molecule,
(B') a resin comprising one or more partial structures represented by Chemical Formula (52) and one or more partial structures represented by Chemical Formula (6A) in a molecule,

(in Chemical Formulas (52) and (6A), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; Z represents the structure represented by Chemical Formula (2); and in Chemical Formulas (52) and (6A), * indicates that the nitrogen/carbon atom is bonded to another atom); and
(G) a step of producing a resin having a structure represented by Chemical Formula (5A) by reacting a terminal carbonyl group blocking agent that is reactive with the partial structure represented by Chemical Formula (52),

(in Chemical Formulas (4A) and (5A), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; in Chemical Formula (5A), W represents a structure represented by Chemical Formula
(7); 8 in Chemical Formula (7) represents a monovalent hydrocarbon group having two or more carbon atoms; 6 in Chemical Formula (7) represents an oxygen atom or a sulfur atom; in Chemical Formula (5A), * indicates that the nitrogen atom is bonded to another atom; and * in Chemical Formula (7) indicates a bonding point of W in Chemical Formula (5A)).
10. A method for producing a resin represented by Chemical Formula (4A), the method comprising:
(H) a step of producing a compound represented by Chemical Formula (53) by reacting a tetracarboxylic dianhydride and a terminal carbonyl group blocking agent;

(in Chemical Formula (53), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms; and W represents a structure represented by Chemical Formula (7)):

(8 in Chemical Formula (7) represents a monovalent hydrocarbon group having two or more carbon atoms and e represents an oxygen atom or a sulfur atom; and * in Chemical Formula (7) indicates a bonding point of W in Chemical Formula (53));
(I) a step of producing one or more resins selected from a group consisting of the following (A'') and (B'1) by reacting the compound represented by Chemical Formula (53) , a diamine compound, and a residual tetracarboxylic dianhydride having not reacted with the terminal carbonyl group blocking agent in the (H) step;
(A'') a resin mixture comprising a resin (A''-l) comprising two or more partial structures represented by Chemical Formula (54) in a molecule and a resin (A''-2) comprising two or more partial structures represented by Chemical Formula (5A) in a molecule;
(B1') a resin comprising one or more partial structures represented by Chemical Formula (54) and one or more partial structures represented by Chemical Formula (5A) in a molecule;

(in Chemical Formulas (54) and (5A), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; in Chemical Formulas (54) and (5A), * indicates that the carbon/nitrogen atom is bonded to another atom; and W represents a structure represented by Chemical Formula (7)); and
(J) a step of producing a resin having a structure represented by Chemical Formula (6A) by reacting the partial structure represented by Chemical Formula (54) with a terminal amino group blocking agent,

(in Chemical Formulas (4A) and (6A), X represents a tetravalent tetracarboxylic acid residue having two or more carbon atoms and Y represents a divalent diamine residue having two or more carbon atoms; in Chemical Formula (6A), * indicates that the carbon atom is bonded to another atom; Z represents a structure represented by Chemical Formula
(2); a in Chemical Formula (2) represents a monovalent hydrocarbon group having 2 or more carbon atoms; P and y in Chemical Formula (2) each independently represent an oxygen atom or a sulfur atom; and * in Chemical Formula (2) indicates a bonding point of Z in Chemical Formula (6)).
11. A method for producing a resin film, the method comprising:
a step of applying the resin composition according to any one of claims 1 to 6 to a support; and
a step of heating the obtained applied film at a
temperature of 220°C or more.

12. A method for producing an electronic device, the
method comprising:
a step of forming a resin film by the method according to claim 11; and
a step of forming an electronic device on the resin film.
13. The method for producing an electronic device according to claim 12, wherein the electronic device is an image display device.
14. The method for producing an electronic device according to claim 12, wherein the electronic device is an organic EL display.