DESC:FIELD OF THE INVENTION
The present invention relates to a substrate holding chuck to hold substrates on a rotating chuck. Further the present invention relates to a method for holding substrates on a rotating chuck using physical or mechanical constraints. Advantageously the present invention relates to a substrate holder for holding substrates on the rotating chuck of a spin coater using the physical or mechanical constraints in a secure and protective manner.

BACKGROUND OF THE INVENTION
Generally spin coater has a motor which drives the shaft and this shaft helps rotating the chuck which is snapped to the shaft of the spin coater. The substrates that are to be coated are placed on the rotating chuck. The coating solution is dropped at the center of the substrate and the chuck is made to rotate at suitable RPM or revolutions per minute. After running the spin coater at the desired RPM, the film gets coated/ deposited on the substrate.

US6168669B1 discloses a substrate holding apparatus and substrate process system. Supporting members are provided at three places, for example, on a frame section of a pair of tweezers. Each supporting member has a tapered face as an inclined guide for allowing a rim portion of a substrate to slide down to be guided to a predetermined position. A vertical wall which is formed continuing from the tapered face and being nearly perpendicular to a supported face of a wafer is provided at an upper end of the tapered face. Even when the rim portion of the wafer rises along the tapered face with the movement of the tweezers, the rim portion stops by hitting against the vertical wall, thereby preventing the wafer from falling from the tweezers. However it is fit only for stationary apparatus and stationary substrate processing system and not for a rotating chuck.

US5989342A discloses an apparatus for substrate holding. A substrate holding apparatus holds a rotating substrate without idly rotating the substrate and keeps the substrate in proper balance while the substrate is rotated. In a revolvable holding member, a column-shaped holding part is disposed on a top surface of a column-shaped supporting part, at an eccentric position with respect to a rotation axis of the supporting part. The revolvable holding member is supported by a rotation base for free rotation, and linked to a magnet holding part which incorporates a permanent magnet. On the other hand, a ring-shaped magnet which is disposed in a processing liquid collecting cup is freely driven by an air cylinder in a vertical direction. As the ring-shaped magnet is moved upward or downward and crosses a predetermined line as viewed in a positional relationship relative to the permanent magnet, which is at a height where the permanent magnet is disposed, the direction of a magnetic line of flux of the ring-shaped magnet is reversed. As a result, the direction of the revolving force which acts upon the permanent magnet is reversed, whereby the revolvable holding member holds or releases a substrate. However multiple sized substrates are not held in a fixed position in a rotating environment.

US5253012A discloses a substrate holding apparatus for vertically holding a substrate in an exposure apparatus. A substrate holding apparatus for vertically holding a substrate to be exposed by radiation includes a substrate holding member for attracting a substrate by a magnetic force or vacuum and an engaging device for engaging the substrate on the substrate holding member. The engaging device is retractably supported by or fixed to the substrate holding member, and is engageable with or engages the substrate in such a manner that the engagement between the vertically held substrate and the engaging device is maintained even if the substrate holding member ceases to attract the substrate. Thus, dropping of the substrate by gravitation is prevented even if the substrate ceases to be attracted by the substrate holding member. However it is fit only for stationary apparatus and stationary exposure systems like X-ray exposure and not for a rotating chuck.

US9922861B2 discloses a substrate gripping device and substrate processing apparatus. A rotary table; a drive motor M configured to rotate the rotary table; a pin base supported by the rotary table; a pin fixing member configured to move closer to or away from C1 upon the pin base revolving; first chuck pins and second chuck pins provided on the pin fixing member and configured to be into contact with an outer edge of the substrate W; a substrate gripping force generation mechanism including a spring member; a chuck pin switching mechanism including an inertia member configured to be rotated coaxially with the rotary table and a protruded member provided on an outer peripheral part of the inertia member; and a cam member provided on the pin fixing member and configured to engage with protruded member. However the invention turns out to be much more complicated and bulky for processing environment like spin coating as the mechanical parts surrounded the substrate should be as minimum as possible to achieve the desired processing or coating.

US5376216A discloses a device for holding and rotating a substrate. A plurality of substrate holding members and a substrate pressing member are disposed on a rotation stage at a peripheral portion. The substrate pressing member includes a magnet and is pivotally supported by the rotation stage. A ring-shaped permanent magnet is located below the rotation stage and forms a ring around the rotation axis of the rotation stage. When a substrate mounted on the rotation stage is rotated and processed, the ring-shaped permanent magnet is positioned in the vicinity of the magnet of the substrate pressing member. This creates a magnetic force between the magnets, causing the substrate pressing member to pivot so that the substrate pressing member contacts the edge of the substrate with a predetermined amount of pressure. However it cannot hold any or multiple sized substrate in a fixed position in a rotating environment (usually at 12000 rpm) like in processing environment like the spin coater.
Accordingly, there exists a need for a substrate holding chuck to hold substrates on a rotating chuck. Further there exists a method for holding substrates onto a rotating chuck using physical or mechanical constraints.

OBJECTS OF INVENTION
It is the primary object of the present invention to provide a substrate holding chuck to hold substrates on a rotating chuck.

It is another object of the present invention, wherein the physical constraints or the mechanical constraints act as barriers in the X-Y axis to prevent the substrate from moving.

It is another object of the present invention, wherein the substrate holder for rotating chuck confines the substrate during a rotational motion, without deformation.

SUMMARY OF THE INVENTION
One or more of the problems of the conventional prior art may be overcome by various embodiments of the present invention.

It is the primary aspect of the present invention to provide a substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater, comprising:
a holder body [1] having a holding surface to hold a substrate;
one or more physical constraints;
one or more mechanical constraints [2]; and
a protrusion on the counterface of the holder body with atleast one guided groove,
characterized in that, the physical constraints or mechanical constraints [2] acts as barriers in X-Y axis or plane to secure/ hold the substrate at higher rpm,
wherein the holder body [1] confines the substrate in X-Y axis during a rotational motion,
wherein the physical constraint comprises one or more slots on the holding surface slots [3] configured to house the substrate, and
wherein the mechanical constraints [2] comprise of one or more detachable screws [5] and sliders [4] configured to confine the substrate on the holder body [1].

It is another aspect of the present invention, wherein the chuck [100] is circular in shape and is configured to rotate around the axis of the holder body [1].

It is another aspect of the present invention, wherein the shape of the slots [3] is selected from one or more of rectangular, square, circular and triangular.

It is another aspect of the present invention, wherein the slots [3] are of varying dimensions corresponding to the substrate to be engaged.

It is another aspect of the present invention, wherein a largest slot is at the periphery of the holder body [1] and a smallest slot is at the centre of the holder body [1].

It is another aspect of the present invention, wherein the slots [3] of the physical constraints starts from a perimeter of the holder body [1], and intersects at a centre of the holder body [1].

It is another aspect of the present invention, wherein the screws [5] and sliders [4] are detachably secured to confine the substrate at a distance from the centre of the holder body [1], and the distance corresponds to the dimensions of the substrate.

It is another aspect of the present invention to provide a method for holding substrates on the substrate holding chuck [100], comprising:
placing the substrate on the holding surface of the holder body [1]; and
confining the substrate on the holding body by the physical constraints or the mechanical constraints [2],
characterized in that, the physical constraints or mechanical constraints [2] acts as barriers in X-Y axis which makes the substrate stationary and ensures uniform coating of the substrate at higher rpm.
BRIEF DESCRIPTION OF THE DRAWINGS:
So that the manner in which the features, advantages and objects of the invention, as well as others which will become apparent, may be understood in more detail, more particular description of the invention briefly summarized above may be had by reference to the embodiment thereof which is illustrated in the appended drawings, which form a part of this specification. It is to be noted, however, that the drawings illustrate only a preferred embodiment of the invention and is therefore not to be considered limitation of the invention's scope as it may admit to other equally effective embodiments.

Figure 1: illustrates the sectional views of the substrate holding chuck according to one embodiment of the present invention.
Figure 2: illustrates the sectional views of the screw for universal chuck according to one embodiment of the present invention.
Figure 3: illustrates the sectional views of the slider for screw according to one embodiment of the present invention.
Figure 4: illustrates the sectional views of the substrate holder with concentric slots according to another embodiment of the present invention.
Figure 5: illustrates the sectional views of the substrate holder with a rectangular slot according to another embodiment of the present invention.
Figure 6: illustrates the sectional views of the substrate holder body with mechanical constraints according to another embodiment of the present invention.
Figure 7: illustrates the counterface and axis of the substrate holder according to another embodiment of the present invention.
Figure 8: illustrates the schematic view of the substrate holder in a rotating chuck according to one embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION
It is to be understood that the present disclosure is not limited in its application to the details of construction and the arrangement of components set forth in the following description or illustrated in the drawings. The present disclosure is capable of other embodiments and of being practiced or of being carried out in various ways. Also, it is to be understood that the phraseology and terminology used herein is for the purpose of description and should not be regarded as limiting.

The present invention relates to a substrate holding chuck to hold substrates on a rotating chuck. Further the present invention relates to a method for holding substrates on a rotating chuck using physical or mechanical constraints. Advantageously the present invention relates to a substrate holder for holding substrates on the rotating chuck of a spin coater using the physical or mechanical constraints in a secure and protective manner.

The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater, comprises of a holder body [1] having a holding surface to hold a substrate, one or more physical constraints, one or more mechanical constraints [2] and a protrusion on the counterface of the holder body with atleast one guided groove. The physical constraints or mechanical constraints [2] act as barriers in X-Y axis or plane to secure/ hold the substrate at higher rpm. The holder body [1] confines the substrate in X-Y axis during a rotational motion. The physical constraint comprises one or more slots on the holding surface slots [3] configured to house the substrate. The mechanical constraints [2] comprise of one or more detachable screws [5] and sliders [4] configured to confine the substrate on the holder body [1]. The chuck [100] is circular in shape and is configured to rotate around the axis of the holder body [1]. The shape of the slots [3] is selected from one or more of rectangular, square, circular and triangular. The slots [3] are of varying dimensions corresponding to the substrate to be engaged.

Referring to Figure 1, the sectional views of the substrate holding chuck according to one embodiment of the present invention are illustrated. The different views of the substrate holding chuck are illustrated clearly in the figure 1.

Referring to Figure 2, the sectional views of the screw for universal chuck according to one embodiment of the present invention are illustrated. The different views of the screw for universal chuck are illustrated clearly in the figure 2.
Referring to Figure 3, the sectional views of the slider for screw according to one embodiment of the present invention are illustrated. The different views of the slider for screw are illustrated clearly in the figure 3.

Referring to Figure 4, the sectional views of the substrate holder with concentric slots according to another embodiment of the present invention are illustrated. The different views of the substrate holder with concentric slots are illustrated clearly in the figure 4.

Referring to Figure 5, the sectional views of the substrate holder with a rectangular slot according to another embodiment of the present invention are illustrated. Referring to Figure 6, the sectional views of the substrate holder body with mechanical constraints according to another embodiment of the present invention are illustrated. Referring to Figure 7, the counterface and axis of the substrate holder according to another embodiment of the present invention are illustrated. Referring to Figure 8, the schematic view of the substrate holder in a rotating chuck according to one embodiment of the present invention is illustrated.

A largest slot is at the periphery of the holder body [1] and a smallest slot is at the centre of the holder body [1]. The slots [3] of the physical constraints start from a perimeter of the holder body [1], and intersect at a centre of the holder body [1].
The screws [5] and sliders [4] are detachably secured to confine the substrate at a distance from the centre of the holder body [1], and the distance corresponds to the dimensions of the substrate.

A method for holding substrates on the substrate holding chuck [100] is provided, comprising of the following steps. The substrate is placed on the holding surface of the holder body [1]. The substrate is confined on the holding body by the physical constraints or the mechanical constraints [2]. The physical constraints or mechanical constraints [2] act as barriers in X-Y axis which makes the substrate stationary and ensures uniform coating of the substrate at higher rpm.

The chuck of any material is designed in such a way that the grooves are machined according to the substrate sizes. The substrate which needs to be placed in the chuck and held is seated in those grooves firmly. The chuck is made to spin at higher rpm in an application like spin coater where the user drops a liquid on the substrate to get it coated. Once it is done, when the chuck comes to rest position the substrates are removed carefully through tweezers. The holding can be achieved either through machining of grooves, or providing mechanical sliding pins which slides along the surface of the chuck, gets locked through screw according to the substrate sizes. This locks the substrate firmly.

Although, the invention has been described and illustrated with respect to the exemplary embodiments thereof, it should be understood by those skilled in the art that the foregoing and various other changes, omissions and additions may be made therein and thereto, without parting from the spirit and scope of the present invention. ,CLAIMS:WE CLAIM:
1. A substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater, comprising:
a holder body [1] having a holding surface to hold a substrate;
one or more physical constraints;
one or more mechanical constraints [2]; and
a protrusion on the counterface of the holder body with atleast one guided groove,
characterized in that, the physical constraints or mechanical constraints [2] acts as barriers in X-Y axis or plane to secure/ hold the substrate at higher rpm,
wherein the holder body [1] confines the substrate in X-Y axis during a rotational motion,
wherein the physical constraint comprises one or more slots on the holding surface slots [3] configured to house the substrate, and
wherein the mechanical constraints [2] comprise of one or more detachable screws [5] and sliders [4] configured to confine the substrate on the holder body [1].

2. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein the chuck [100] is circular in shape and is configured to rotate around the axis of the holder body [1].
3. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein the shape of the slots [3] is selected from one or more of rectangular, square, circular and triangular.

4. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein the slots [3] are of varying dimensions corresponding to the substrate to be engaged.

5. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein a largest slot is at the periphery of the holder body [1] and a smallest slot is at the centre of the holder body [1].

6. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein the slots [3] of the physical constraints starts from a perimeter of the holder body [1], and intersects at a centre of the holder body [1].

7. The substrate holding chuck [100] to hold substrates on a rotating chuck of a spin coater as claimed in claim 1, wherein the screws [5] and sliders [4] are detachably secured to confine the substrate at a distance from the centre of the holder body [1], and the distance corresponds to the dimensions of the substrate.

8. A method for holding substrates on the substrate holding chuck [100], comprising:
placing the substrate on the holding surface of the holder body [1]; and
confining the substrate on the holding body by the physical constraints or the mechanical constraints [2],
characterized in that, the physical constraints or mechanical constraints [2] acts as barriers in X-Y axis which makes the substrate stationary and ensures uniform coating of the substrate at higher rpm.