SULFUR CONTAINING SILICA PARTICLE
FIELD OF THE INVENTION
This disclosure pertains to a silica containing composition, specifically a silica containing
composition that includes a sulfur moiety
BACKGROUND OF THE INVENTION
Silica containing materials have ubiquitous applications. More specifically, a variety of
manufacturing processes that produce either consumer or industrial products utilize silicacontaining
materials for various purposes. For example, silica-containing products can be
utilized as fillers in coatings (e.g. paints) and polymer composites, catalysts supports,
beer/wine/juice clarifiers. New and improved silica containing products with increased
performance and ease of use are desired by various industries.
SUMMARY OF THE INVENTION
A. COMPOSITIONS
The present invention provides for a composition comprising a compound having the
following formula (Si02)x(OH) M SaF: wherein M is at least one of the following metal or
metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron,
cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum,
gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following:
sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F
optionally exists and said F is at least one of the following: a functionalized organosilane, a
sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing
organosilane at a surface area coverage of 0.01-100 %; and wherein the molar ratio of y/x is
equal to 0.01-0.5, the molar ratio of x/z is equal to 3-300, and the molar ratio of a z is 1-5.
The present invention also provides for a composition comprising a compound having a
formula of: (Si02) 5 Cu S .
B. PRODUCT BY PROCESS
The present invention further provides for a product produced by filtering an aqueousbased
material from a composition comprising a compound having the following formula
(Si02) (OH) M SaF wherein M is selected from at least one of the following metal or metalloid
cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt,
nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold,
and bismuth; wherein S is a sulfur-based species selected from at least one of the following:
sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F
optionally exists and said F is at least one of the following: a functionalized organosilane, a
sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing
organosilane at a surface area coverage of 0.01-100 %; wherein the molar ratio of y/x is equal to
0.01-0.5, the molar ratio of x z is equal to 3-300, and the molar ratio of a z is 1-5; and wherein
the compound comprises 3 % to 15 % by weight in an aqueous-based slurry.
The present invention also provides for a product produced from drying a composition at
a temperature of 100 °C to 350 C, wherein said composition comprises a compound containing
the following formula (Si02) (OH) M SaF: wherein M is selected from at least one of the
following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium,
vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium,
silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected
from at least one of the following: sulfide salts, dithiocarbamates, polymer-based
dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of
the following: a functionalized organosilane, a sulfur-containing organosilane, an aminecontaining
organosilane, and an alkyl-containing organosilane at a surface area coverage of
0.01-100 %; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x z is equal
to 3-300, and the molar ratio of a z is 1-5.
C. METHODS OF MANUFACTURE
The present invention provides for a method of forming a silica-based product/
composition comprising: a. providing a silica containing precursor (SCP) contained in solution
that has a pH less than or equal to a pH of 7; b. optionally doping the SCP with one or more
metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH
of 7; c. adjusting the pH of the solution to greater than 7; d. adding an effective amount of salt to
the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said
addition occurs prior to, simultaneous with, or after the pH adjustment in step lc; e. optionally
filtering and drying the SCP; and f. optionally reacting the dried product from step e with a
functional group and optionally wherein the resultant functionalized dried product is at least one
of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
The present invention also provides for a method of forming a silica-based
product/composition comprising: a. providing a silica containing precursor (SCP) contained in
solution that has a pH greater than 7; b. adjusting the pH of the solution to less than or equal to 7;
c. optionally doping the SCP with one or more metal species, wherein said doping occurs when
the solution has a pH less than or equal to a pH of 7; d. adjusting the pH of the solution to greater
than 7; e. adding an effective amount of salt to the solution so that the conductivity of the
solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous
with, or after the pH adjustment in step 2d; f. optionally filtering and drying the SCP; and g.
optionally reacting the dried product from step f with a functional group and optionally wherein
the resultant functionalized dried product is at least one of the following: a functionalized metal
oxide-doped or metal sulfide-doped silica product.
DETAILED DESCRIPTION OF THE INVENTION
Any patents and published applications mentioned in this application are herein
incorporated by reference.
As specified above, the present invention provides a composition that contains a
compound with a sulfur component, specifically a compound having a formula of
(Si0 2)x(OH) M SaF: wherein is selected from at least one of the following metal or metalloid
cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt,
nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold,
and bismuth; wherein S is a sulfur-based species selected from at least one of the following:
sulfide salts, dithiocarbamates, and polymer-based dithiocarbamates, polysulfide salts; wherein F
optionally exists and said F is at least one of the following: a functionalized organosilane, a
sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing
organosilane at a surface area coverage of 0.01-100 %; and wherein the molar ratio of y/x is
equal to 0,01-0.5, the molar ratio of x z is equal to 3-300, and the molar ratio of a/z is 1-5.
The compound can be in various forms and proportions relative to the components of the
compositions. In addition, various products can contain the compounds encompassed by this
invention. For example, the following compound embodiments can stand alone, be further
modified by chemical and/or physical means, or integrated into other products, e.g. consumer or
industrial products.
In another embodiment, the invention also provides for a composition comprising a
compound having a formula of: (Si0 5-CuiS ,
In another embodiment, the compound comprises 3 % to 15 % by weight in an aqueousbased
slurry.
In another embodiment, the compound comprises 15% to 40% by weight in a wet cake
form.
In another embodiment, the compound comprises 40% to 99% by weight in a powder
form.
In another embodiment, the compound has a particle size of 5 to 200 m containing
aggregated nanoparticles ranging from 3 to 500nm.
In another embodiment, the compound has a surface area of 30 2/g to 800 m2/g.
In another embodiment, the compound has a pore volume of 0.3 cc/g to 2.0 cc/g.
In another embodiment, a product is produced by filtering an aqueous-based material
from a composition comprising a compound having the following formula (Si0 2) (OH) M SaF
wherein M is selected from at least one of the following: boron, magnesium, aluminum, calcium,
titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum,
palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species
selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based
dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of
the following: a functional ized organosilane, a sulfur-containing organosilane, an aminecontaining
organosilane, and an alkyl-containing organosilane at a surface area coverage of
0.01-100 %; wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x z is equal to
3-300, and the molar ratio of a/z is 1-5; and wherein the compound comprises 3 % to 15 % by
weight in an aqueous-based slurry.
In another embodiment, the product is produced from drying a composition at a
temperature of 100 °C to 350 °C, wherein said composition comprises a compound having the
following formula (Si0 2) (OH)yM SaF: wherein M is at least one of the following metal or
metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron,
cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum,
gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following:
sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F
optionally exists and said F is at least one of the following: a functional ized organosilane, a
sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing
organosilane at a surface area coverage of 0.01-100 %; and wherein the molar ratio of y/x is
equal to 0.01-0.5, the molar ratio of x z is equal to 3-300, and the molar ratio of a/z is 1-5.
The compounds can be made in various ways, such as US Patent Publication No.
2007023 1247, which is herein incorporated by reference.
As stated above, the silica containing products encompassed by this invention can be
made by the following methods.
One methodology involves starting from an acidic starting point.
In one embodiment, the method comprises forming a silica-based product comprising the
steps of: a. providing a silica containing precursor (SCP) contained in solution that has a pH less
than or equal to a pH of 7; b. optionally doping the SCP with one or more metal species, wherein
said doping occurs when the solution has a pH less than or equal to a pH of 7; c. adjusting the pH
of the solution to greater than 7; d. adding an effective amount of salt to the solution so that the
conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior
to, simultaneous with, or after the pH adjustment in step lc; e. optionally filtering and drying the
SCP; and f. optionally reacting the dried product from step e with a functional group and
optionally wherein the resultant fiinctionalized dried product is at least one of the following: a
functionalized metal oxide-doped or metal sulfide-doped silica product.
In another embodiment, the functional group in step f is an organosilane.
In another embodiment, the silicon-containing precursor is selected from at least one of
the following: silicic acid, colloidal silica, tetraethylorthosilicate, and dispersed fumed silica.
In another embodiment, the pH range of the SCP in step 1(a) is from 3 to 4.
In another embodiment, the pH of the SCP is adjusted to greater than 7 by
mixing/interacting the molecules of said SCP with an alkaline solution at a shear rate of 6 to 23
m/s based on tip speed.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by mixing said SCP with an alkaline solution via a mixing chamber. An example
of a mixing chamber is described in U.S. Patent No. 7,550,060, "Method and Arrangement for
Feeding Chemicals into a Process Stream". This patent is herein incorporated by reference. In
one embodiment, the mixing chamber comprises a first conduit having one or more inlets and
outlets; a second conduit having one or more inlets and outlets, wherein said first conduit secures
to said second conduit and traverses said second conduit; a mixing chamber that has one or more
inlets and outlets, wherein said second conduit secures to said mixing chamber and wherein said
outlets of said first conduit and said outlets of said second conduit are in communication with
said mixing chamber; and an adaptor that is in communication with said outlet of said mixing
chamber and is secured to said mixing chamber. The mixing chamber can then be attached or in
communication with a receptacle that holds/processes through (e.g. a conduit) a mixed product.
In one embodiment, said mixing chamber can then be attached or in communication with a
receptacle that holds/processes a mixed product resulting from said pH adjustment of said SCP.
Additionally, Ultra Turax, Model Number UTI-25 (available from IKA® Works, Inc. in
Wilmington, NC), a mixing device, can be utilized.
It is envisioned that any suitable reactor or mixing device/chamber may be utilized in the
method of the invention.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution with mixing yielding a Reynolds
Number greater than or equal to 2000, to form the silica based product.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution under transitional flow
conditions, i.e. Reynolds Numbers between 2000 and 4000, to form the silica based product.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution under turbulent flow conditions,
i.e. Reynolds Numbers greater than or equal to 4000, to form the silica based product.
In another embodiment, the pH of the SCP is adjusted to a pH range of 7 to 11 with the
use of a chemistry selected from at least one of the following: ammonium hydroxide, ammonium
carbonate, mineral bases such as but not limited to sodium hydroxide and/or potassium
hydroxide, organic bases such as but not limited to trimethylammonium hydroxide, alkaline
silicates, sulfide salts such as but not limited to sodium sulfide, and polysulfide containing salts
such as but not limited to calcium polysulfide and/or sodium polysulfide.
In another embodiment, the resulting slurry from step d is filtered and dried such that the
solid concentration of said dried and filtered product is increased from about 5 wt% to about 99
wt%.
In another embodiment, the dried product from step e is surface treated with an
organosilane via controlled hydrolysis and condensation of the silane to the silica surface in at
least one of the processes: an organic solvent, supercritical solvent, or solvent-free process.
Another methodology involves starting from an alkaline starting point.
In one embodiment, the method comprises forming a silica-based product comprising the
steps of: a. providing a silica containing precursor (SCP) contained in solution that has a pH
greater than 7; b. adjusting the pH of the solution to less than or equal to 7; c. optionally doping
the SCP with one or more metal species, wherein said doping occurs when the solution has a pH
less than or equal to a pH of 7; d . adjusting the pH of the solution to greater than 7; e. adding an
effective amount of salt to the solution so that the conductivity of the solution is greater than or
equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH
adjustment in step 2d; f. optionally filtering and drying the SCP; and g. optionally reacting the
dried product from step f with a functional group and optionally wherein the resultant
functionalized dried product is at least one of the following: functionalized metal oxide-doped or
metal sulfide-doped silica product.
In another embodiment, the functional group in step g is an organosilane.
In another embodiment, the silicon-containing precursor is selected from at least one of
the following: silicic acid, colloidal silica, alkaline silicates, tetraethylorthosilicate, and
dispersed fumed silica.
In another embodiment, the pH of the silicon-containing precursor is adjusted through the
use of at least one of the following: carbonic acid, an organic acid(s) such as but not limited to
acetic acid, a mineral acid(s) such as but not limited to sulfuric acid and/or hydrochloric acid
such that the pH is decreased to a range of from to 2 to 7.
In another embodiment, the pH range of the SCP is adjusted to a range of 3 to 4 with
acetic acid.
In another embodiment, the pH of the SCP is adjusted to a pH range of 7 to 11 with the
use of a chemistry selected from at least one of the following: ammonium hydroxide, ammonium
carbonate, mineral bases, organic bases, alkaline salts, sulfide salts, alkaline silicates, and
polysulfide containing salts.
In another embodiment, the resulting slurry from step e is filtered and dried such that the
solid concentration of said dried and filtered product is increased from about 5 wt% to about 99
wt%.
In another embodiment, the dried product from step f is surface treated with an
organosilane via controlled hydrolysis and condensation of the silane to the silica surface in at
least one of the following: an organic solvent, supercritical solvent, or solvent-free process.
In another embodiment, the pH of the SCP is adjusted to greater than 7 by mixing said
SCP with an alkaline solution at a shear rate of 6 to 23 m/s based on tip speed.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by mixing said SCP with an alkaline solution via a mixing chamber. An example
of a mixing chamber is described in U.S. Patent No. 7,550,060, "Method and Arrangement for
Feeding Chemicals into a Process Stream". This patent is herein incorporated by reference. In
one embodiment, the mixing chamber comprises a first conduit having one or more inlets and
outlets; a second conduit having one or more inlets and outlets, wherein said first conduit secures
to said second conduit and traverses said second conduit; a mixing chamber that has one or more
inlets and outlets, wherein said second conduit secures to said mixing chamber and wherein said
outlets of said first conduit and said outlets of said second conduit are in communication with
said mixing chamber; and an adaptor that is in communication with said outlet of said mixing
chamber and is secured to said mixing chamber. The mixing chamber can then be attached or in
communication with a receptacle that holds/processes through (e.g. a conduit) a mixed product.
In one embodiment, said mixing chamber can then be attached or in communication with a
receptacle that holds/processes a mixed product resulting from said pH adjustment of said SCP.
Additionally, Ultra Turax, Model Number UTI-25 (available from A® Works, Inc. in
Wilmington, NC), a mixing device, can be utilized.
It is envisioned that any suitable reactor or mixing device/chamber may be utilized in the
method of the invention.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution with mixing yielding a Reynolds
Number greater than or equal to 2000, to form the silica based product.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution under transitional flow
conditions, i.e. Reynolds Numbers between 2000 and 4000, to form the silica based product.
In another embodiment, the method further comprises adjusting the pH of the SCP to
greater than 7 by combining said SCP with an alkaline solution under turbulent flow conditions,
i.e. Reynolds Numbers greater than or equal to 4000, to form the silica based product.The sulfurbased
species of the present invention may be selected from a representative list but not intended
to be a limiting list of at least one of the following: sulfide salts, dithiocarbamates, polymerbased
dithiocarbamates, and polysulfide salts. Sulfide salts maybe but not limited to sodium
sulfide, potassium sulfide, and/or metal sulfides such as copper sulfide. Dithiocarbamates may
be but not limited to dimethyldithiocarbamate (DMDTC) or diethyldithiocarbamate (DEDTC).
Polymer-based dithiocarbamates contain organic polymers containing the functional group
R CS2. wherein R is an alkyl group which is linear or branched. An example of a commercially
available polymer-based dithiocarbamate is described in U.S. Patent Nos. 5164095 and U.S.
Patent Nos. 5346627, which are herein incorporated by reference. Polysulfides that can be used
in the present invention include, but are not limited to, sodium polysulfide and calcium
polysulfide.
Organosilanes that can be used in the current invention are well known in the art and may
be represented generally by R(4- )-SiXa, wherein a may be from 1to 3. The organo-functional
group, R-, may be any aliphatic or alkene containing functionalized group such as propyl, butyl,
3-chloropropyl, amine, thiol, and combinations thereof. X is representative of a hydrolysable
alkoxy group, typically methoxy or ethoxy. Some examples are 3-thiopropyl and
mercaptopropyl silanes.
During the preparation of the composition of this invention, salt is added to increase the
conductivity of the reaction solution to 4mS. Examples of the salts that can be used include, but
are not limited to, alkali and alkaline halides, sulfates, phosphates, and nitrates such as sodium
sulfite, potassium chloride, sodium chloride, sodium nitrate, calcium sulfate, and potassium
phosphate. One skilled in the art would recognize that the effective amount of salt added to reach
the desired conductivity will vary dependent on the salt of choice.
Thiols and amines are represented generally by the class of organic and inorganic
compounds containing the amine or thiol group having the general formula -B-(SH) or -B-
(NH ), wherein B is a linear or branched group consisting of carbon atoms such as -(CH ) -,
wherein n is from 1 to 15, in particular where n is 1 to 6, and most preferred where n is 3.
EXAMPLES
Example 1:
In this example, 180 g of 7 wt% silicic acid was added to a heel containing 450 g deionized (DI)
water and 150 g of silicic acid heated to 90 °C. The silicic acid was fed at 10 ml/min for 3 h via a
peristaltic pump into a 5 L reaction flask.
A solution containing 16.4 g of a 25 wt ammonia solution and 5.84 g ammonium carbonate
was prepared in 24.6 g DI water. The solution was added to the reaction flask quickly whereupon
the viscosity of the solution increased significantly. The mixture was stirred for 30 minutes, then
any remaining silicic acid was fed at 20 ml/min. Upon completion of the silicic acid feed, the
heating was turned off and the solution was allowed to cool.
The silica slurry was filtered and freeze-dried at 1 0 °C to produce a dry powder. Nitrogen
sorption analysis of the powder was performed on an Autosorb-lC unit from Quantachrome. The
sample was degassed at 300 °C for 2 h, then characterized by a multi-point BET (Brunauer,
Emmett, and Teller - a surface area test) surface area, total pore volume, and BJH (Barrett-
Joyner-Halenda) adsorption pore size distribution. Physical data indicated a surface area of 354
square meters per gram, a pore volume of 1.19 cc/g, and a pore diameter of 13.5 nm.
Example 2:
In this example, 1414 g of 8.3 wt% silicic acid was added to a heel containing 16.3 g copper
sulfate, 400 g DI water, and 200 g silicic acid heated to 90 °C. The silicic acid was fed at 8
ml/min for 3 h via a peristaltic pump into a 5 L reaction flask.
A solution containing 17.3 g sodium sulfide and 11.8 g of a 25 wt% ammonia was prepared in
200 g DI water. The solution was quickly added to the reaction flask after 3 h of silicic acid feed
where the viscosity of the solution increased significantly. The mixture was stirred for 30
minutes, then any remaining silicic acid was fed at 16 ml/min. Upon completion of the silicic
acid feed, the heating was turned off and the solution was allowed to cool.
The CuS-doped silica slurry was filtered and dried at 105 °C to produce a dry powder. Nitrogen
sorption analysis of the powder was performed on an Autosorb-lC unit from Quantachrome. The
sample was degassed at 105 °C for 4 h, then characterized by a multi-point BET surface area,
total pore volume, and BJH adsorption pore size distribution. Nitrogen sorption analysis
indicated a surface area of 321 square meters per gram, a pore volume of 1.46 cc/g, and a pore
diameter of 8.2 n .
Example 3:
In this example, three solutions were prepared: A) 12 kg Nalco N8691 silica sol, B) 396 g copper
sulfate and 360 g glacial acetic acid dissolved in 5.24 kg DI water, and C) 1.1 kg calcium
polysulfide solution and 900 g 25 wt% ammonia dissolved in 6 kg DI water. Solution B was
added to solution A, followed by subsequent addition of solution C at a high shear rate. The
mixture was stirred for 1-2 minutes before filtration. Nalco N8691 can be obtained from Nalco
Company, 1601 West Diehl Road, Naperville, IL. 60563.
The CuS-doped silica slurry was filtered and flash-dried at 565 °F to produce a dry powder.
Nitrogen sorption analysis of the powder was performed on an Autosorb-lC unit from
Quantachrome. The sample was degassed at 105 °C for 4 h, then characterized by a multi-point
BET surface area, total pore volume, and BJH adsorption pore size distribution. Nitrogen
sorption analysis indicated a surface area of 227 square meters per gram, a pore volume of 0.45
cc/g, and a pore diameter of 7.9 nm.
Example 4:
In this example, three solutions are prepared: A) 2 kg Nalco N8691 silica sol, B) 53.2 g ferric
sulfate and 60 g glacial acetic acid dissolved in 887 g DI water, and C) 184 g calcium polysulfide
solution and 150 g 25 wt ammonia dissolved in 2667 g DI water. Solution B is added to
solution A, followed by subsequent addition of solution C at a high shear rate. The mixture is
stirred for 1-2 minutes before filtration. The iron sulfide-doped silica slurry is then filtered and
flash-dried at 565 °F to produce a dry powder.
COMBINATIONS OF COMPONENTS DESCRIBED IN PATENT APPLICATION
In one embodiment, the composition of matter claims include various combinations of
sorbent components and associated compositions, such molar ratios of constituent particles. In a
further embodiment, the claimed compositions include combinations of the dependent claims. In
a further embodiment, a range or equivalent thereof of a particular component shall include the
individual component(s) within the range or ranges within the range.
In another embodiment, the method of use claims include various combinations of the
sorbent components and associated compositions, such molar ratios of constituent particles. In a
further embodiment, the claimed methods of use include combinations of the dependent claims.
In a further embodiment, a range or equivalent thereof of a particular component shall include the
individual component(s) within the range or ranges within the range.
In another embodiment, the method of manufacture claims include various combinations
of the sorbent components and associated compositions, such pH control. In a further
embodiment, the claimed methods of use include combinations of the dependent claims. In a
further embodiment, a range or equivalent thereof of a particular component shall include the
individual component(s) within the range or ranges within the range.

CLAIMS
What is claimed is:
. A composition comprising a compound having the following formula:
(Si0 )x(OH) M SaF:
wherein M is at least one of the following metal or metalloid cations: boron,
magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel,
copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum,
gold, and bismuth;
wherein S is a sulfur-based species selected from at least one of the following: sulfide
salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;
wherein Foptionally exists and said F is at least one of the following: a functionalized
organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and
an alkyl-containing organosilane at a surface area coverage of 0.01-100 %;
and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x z is equal
to 3-300, and the molar ratio of a/z is 1-5.
2. A composition comprising a compound having the following formula: S 0 )i5'CuiS5.
3. The composition of claim 1, wherein the compound comprises 3 % to 15 % by weight
in an aqueous-based slurry.
4. The composition of claim 1, wherein the compound comprises % to 40% by weight
in a wet cake form.
5. The composition of claim 1, wherein the compound comprises 40% to 99% by weight
in a powder form.
6. The composition of claim 4, wherein the compound has a particle size of 5 to 200
containing aggregated nanoparticles ranging from 3 to 00nm.
7. The composition of claim 4, wherein the compound has a surface area of 30 m /g to
800 m /g.
8. The composition of claim 4, wherein the compound has a pore volume of 0.3 cc/g to
2.0 cc/g.
9. A product produced by filtering an aqueous-based material from a composition
comprising a compound containing the following formula
(Si0 2)x(O M S F:
wherein M is at least one of the following metal cations: boron, magnesium,
aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc,
zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and
bismuth;
wherein S is a sulfur-based species selected from at least one of the following: sulfide
salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;
wherein F optionally exists and said F is at least one of the following: a functionalized
organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and
an alkyl-containing organosilane at a surface area coverage of 0.01-100 ; wherein
the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x z is equal to 3-300, and
the molar ratio of a/z is 1-5; and wherein the compound comprises 3 % to 15 % by
weight in an aqueous-based slurry.
A product produced from drying an composition at a temperature of 100 °C to 350
C, wherein said composition comprises a compound containing the following
formula (Si0 )x(OH) M SaF:
wherein M is at least one of the following metal or metalloid cations: boron,
magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel,
copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum,
gold, and bismuth;
wherein S is a sulfur-based species selected from at least one of the following: sulfide
salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;
wherein F optionally exists and said F is at least one of the following: a functionalized
organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and
an alkyl-containing organosilane at a surface area coverage of 0.01-100 %; and
wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x z is equal to
3-300, and the molar ratio of a/z is 1-5.