Abstract: A power semiconductor device (1) is specified, comprising - a drift layer (2) of a first conductivity type, - a well region (3) of a second conductivity type being different from the first conductivity type, and - a first doped region (4) of the first conductivity type and a second doped region (5) of the second conductivity type, wherein - the well region (3), the first doped region (4) and the second doped region (5) are provided at a first side of the power semiconductor device (1), - the first doped region (4) and the second doped region (5) are spaced apart (6) from the drift layer (2) by the well region (3), and - the second doped region (5) is completely surrounded by the first doped region (4) in lateral directions, and - the second doped region (5) comprises at least two parts (6), which are spaced apart (6) from one another in lateral directions by the first doped region (4). Furthermore, a method for producing a power semiconductor device (1) is specified.
| # | Name | Date |
|---|---|---|
| 1 | 202547072018-STATEMENT OF UNDERTAKING (FORM 3) [29-07-2025(online)].pdf | 2025-07-29 |
| 2 | 202547072018-REQUEST FOR EXAMINATION (FORM-18) [29-07-2025(online)].pdf | 2025-07-29 |
| 3 | 202547072018-PROOF OF RIGHT [29-07-2025(online)].pdf | 2025-07-29 |
| 4 | 202547072018-Proof of Right [29-07-2025(online)]-1.pdf | 2025-07-29 |
| 5 | 202547072018-PRIORITY DOCUMENTS [29-07-2025(online)].pdf | 2025-07-29 |
| 6 | 202547072018-NOTIFICATION OF INT. APPLN. NO. & FILING DATE (PCT-RO-105-PCT Pamphlet) [29-07-2025(online)].pdf | 2025-07-29 |
| 7 | 202547072018-FORM 18 [29-07-2025(online)].pdf | 2025-07-29 |
| 8 | 202547072018-FORM 1 [29-07-2025(online)].pdf | 2025-07-29 |
| 9 | 202547072018-DRAWINGS [29-07-2025(online)].pdf | 2025-07-29 |
| 10 | 202547072018-DECLARATION OF INVENTORSHIP (FORM 5) [29-07-2025(online)].pdf | 2025-07-29 |
| 11 | 202547072018-COMPLETE SPECIFICATION [29-07-2025(online)].pdf | 2025-07-29 |
| 12 | 202547072018-FORM-26 [30-07-2025(online)].pdf | 2025-07-30 |