DESC:ION MIGRATION SYSTEM

FIELD OF INVENTION
[0001] The embodiment herein generally relates to purification of a process solution. More specifically, the invention relates to a system and method for removing impurities and reusing a waste solution from chrome plating process.
BACKGROUND AND PRIOR ART
[0002] A chrome plating process generates waste solutions from washing of components after chrome plating and scrubbing of components. These waste solutions cannot be reused as a process solution. Also, a process solution having excessive impurities affects the quality of chrome plating by reducing the salt spray life of the component. Conventionally, such solutions are treated by adding ferrous sulphate, sulphuric acid. The treated solution is mixed with hydrated lime for increasing pH and then is converted into sludge. The sludge is checked for absence of chromium and disposed to an Effluent Treatment Plant. Thus, the waste solutions from chrome plating process are not fit for reuse and get wasted as sludge.
[0003] Therefore, there is a need for reusing the waste solution from chrome plating process. In particular, there is a need for a system and method for removing the impurities from a waste solution of chrome plating process for reusing and reducing wastage.
OBJECTS OF THE INVENTION
[0004] Some of the objects of the present disclosure are described herein below:
[0005] A main object of the present invention is to reuse a waste solution obtained from chrome plating process.
[0006] Another object of the present invention is to remove impurities from a waste solution of chrome plating process.
[0007] Yet another object of the present invention is to remove impurities of chloride, trivalent chromium, iron, copper from a waste solution of chrome plating process.
[0008] Still another object of the present invention is to purify a waste solution such that the purified process solution for chrome plating can increase a salt spray life of a component.
[0009] The other objects and advantages of the present invention will be apparent from the following description when read in conjunction with the accompanying drawings, which are incorporated for illustration of preferred embodiments of the present invention and are not intended to limit the scope thereof.
SUMMARY OF THE INVENTION
[00010] In view of the foregoing, an embodiment herein provides a system and method for purifying a waste solution from a chrome plating process. In accordance with an embodiment, a system and method is provided for removing impurities and reusing a waste solution from chrome plating process. The system comprises an anodic compartment having a plurality of anodes, a cathodic compartment having a cathode, wherein the cathodic compartment is placed inside the anodic compartment. An anolyte is provided in the anodic compartment for purification, wherein the anolyte is the waste solution from chrome plating process. A catholyte is provided in the cathodic compartment for purifying the anolyte. Direct current is supplied to the anode and the cathode at a predetermined temperature, and the catholyte is a pure chromic acid solution without a catalyst.
[00011] In accordance with an embodiment, the predetermined temperature is in the range of 40-50 degrees Celsius, preferably 45 degrees Celsius.
[00012] In accordance with an embodiment, the anolyte, which is the waste solution of chrome plating process, includes impurities of chloride, trivalent chromium, iron, copper.
[00013] In accordance with an embodiment, pH of the catholyte is less than 1.5.
[00014] In accordance with an embodiment, the plurality of anodes and the cathode are flat and material of the plurality of anodes and the cathode is selected from a group containing tin, lead and stainless steel. In an embodiment, ratio of surface area of anode to surface area of cathode is in the range of 3 to 8.
[00015] In accordance with an embodiment, material for the anodic compartment is selected from a group containing PVC, stainless steel.
[00016] In accordance with an embodiment, material of the cathodic compartment is ceramic, shape of the cathodic compartment is cylindrical and a pore size of the ceramic is 1 micron.
[00017] These and other aspects of the embodiments will be better appreciated and understood when considered in conjunction with the following description and the accompanying drawings. It should be understood, however, that the following descriptions, while indicating preferred embodiments and numerous specific details thereof, are given by way of illustration and not of limitation. Many changes and modifications may be made within the scope of the embodiments without departing from the spirit thereof, and the embodiments include all such modifications.

BRIEF DESCRIPTION OF DRAWINGS
[00018] The detailed description is set forth with reference to the accompanying figures. In the figures, the left-most digit(s) of a reference number identifies the figure in which the reference number first appears. The use of the same reference numbers in different figures indicates similar or identical items.
[00019] Fig.1 illustrates a schematic diagram of ion migration system 100, according to an embodiment herein; and
[00020] Fig.2 illustrates a method of ion migration system 200, according to an embodiment herein.
LIST OF NUMERALS
100 - Ion migration system
101 - Anodic compartment
102 - Anode
103 - Cathodic compartment
104 - Cathode
105 - Anolyte
106 - Catholyte
107 - DC source
108 - Filter
200 - Method of ion migration system

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[00021] The embodiments and the various features and advantageous details thereof are explained more fully with reference to the non-limiting embodiments and detailed in the following description. Descriptions of well-known components and processing techniques are omitted so as to not unnecessarily obscure the embodiments. The examples used are intended merely to facilitate an understanding of ways in which the embodiments may be practiced and to further enable those of skill in the art to practice the embodiments. Accordingly, the examples should not be construed as limiting the scope of the embodiments.
[00022] As mentioned above, there is a need for reusing a waste solution from chrome plating process. In particular, there is a need for a system and method for removing impurities from the waste solution of chrome plating process for reducing wastage. The embodiments achieve this by providing an ion migration system. Referring now to the drawings, and more particularly to Figs. 1 through 2, where similar reference characters denote corresponding features consistently throughout the figures, there are shown preferred embodiments.
[00023] Fig.1 illustrates a schematic diagram of ion migration system for reusing and removing impurities from a waste solution of chrome plating process, according to an embodiment. The system 100 comprises of an anodic compartment 101, a cathodic compartment 103, a cathode 104, a plurality of anodes 102, an anolyte 105, a catholyte 106, a DC source 107. The anodic compartment 101 includes the anolyte 105, wherein the anolyte 105 is the waste solution of chrome plating process. The plurality of anodes 102 is placed in the anodic compartment 101. The cathodic compartment 103 is placed in the anodic compartment 101. The cathodic compartment 103 includes the catholyte 106, wherein the catholyte 106 is provided for purifying the anolyte 105. The catholyte 106 is a pure chromic acid solution without a catalyst. Direct current is supplied to the anode and the cathode at a predetermined temperature through a DC source 107. A filter 108 is provided for filtering and transferring the purified anolyte from the anodic compartment 101.
[00024] In an embodiment, the waste solution of chrome plating process is obtained from washing of components after chrome plating, scrubbing of components after chrome plating. Also, a process solution having excessive impurities is a waste solution. In an embodiment, the impurities in the anolyte 105 are present in the form of chloride, trivalent chromium, iron, and copper.
[00025] In an embodiment, the cathodic compartment 103 is made of ceramic for enabling migration of the cations and the anions. A pore size of the ceramic is in the range of 0.5 to 2 microns, preferably 1 micron.
[00026] In an embodiment, a rectifier 107 is the DC source 107 for supplying direct current to the cathode 104 and the plurality of anodes 102 at a predetermined temperature. In an embodiment, the predetermined temperature is in the range of 40-50 degrees Celsius, preferably the predetermined temperature is 45 degrees Celsius for effective removal of impurities. Supplying direct current at a predetermined temperature enables the metal cations and impurities present in the anolyte 105 in the anodic compartment 101 to migrate to the cathode 104 through the cathodic compartment 103. The metal cations are electrodeposited on the cathode 104, thereby removing the impurities present in the anolyte 105. The chromate anions present in the catholyte 106 in the cathodic compartment 103 migrate to the anodic compartment 101 and get electrodeposited on the anode 102. Thereby, the concentration of chromium increases in the anolyte 105 for reusing as a process solution in chrome plating process.
[00027] In accordance with an embodiment, pH of the catholyte 106 is less than 1.5. The pH of the catholyte 106 gradually increases during the removal of impurities from the anolyte 105.
[00028] In accordance with an embodiment, the anode 102 and the cathode 104 are flat and material of the anode 102 and the cathode 104 is selected from a group containing tin, lead and stainless steel. In an embodiment, ratio of surface area of anode 102 to surface area of cathode 104 is in the range of 3 to 8 for increased removal of impurities.
[00029] In accordance with an embodiment, material for the anodic compartment 101 is selected from a group containing PVC, stainless steel. In an embodiment, shape of the anodic compartment 101 is cuboidal. In an embodiment, material of the cathodic compartment 103 is ceramic. In an embodiment, a pore size of the ceramic is in the range of 0.5 microns to 2 microns. Preferably, pore size of ceramic is 1 micron. In an embodiment, shape of the cathodic compartment is cylindrical.
[00030] In an embodiment, using chromic acid without a catalyst as the catholyte 106 can reduce impurity level of iron by 30- 50%, of copper by 25 - 30%, of chloride by 50 – 60%.
[00031] Fig.2 illustrates a method of ion migration system, according to an embodiment. The method 200 for removing impurities and reusing a waste solution from chrome plating process, comprises of providing an anodic compartment 101 having a plurality of anodes 102 and providing a cathodic compartment 103 having a cathode 104 wherein the cathodic compartment 103 is placed inside the anodic compartment 101. A DC source 107 is used for supplying direct current to the plurality of anodes 102 and the cathode 104. A catholyte 106 is provided in the cathodic compartment 103 for purifying an anolyte 105 in the anodic compartment 101, wherein the anolyte 105 is the waste solution from chrome plating process. A DC source 107 supplies direct current to the plurality of anodes 102 and the cathode 104 at a predetermined temperature. The catholyte 106 provided is a pure chromic acid solution without a catalyst.
[00032] A main advantage of the present invention is that the system enables the waste solution from chrome plating process to be reused.
[00033] Another advantage of the present invention is that the system removes impurities of chloride ion, trivalent chromium, copper, iron from a waste solution of chrome plating process.
[00034] Still another advantage of the present invention is that the use of chromic acid as a catholyte increases conductivity due to lower pH and reduced metal precipitation.
[00035] Yet another advantage of the present invention is that the use of chromic acid as a catholyte increases the concentration of chromium in the anolyte for reuse after the purification process.
[00036] Another advantage of the present invention is that the purified process solution for chrome plating can increase a salt spray life of a component.
[00037] Still another advantage of the present invention is that there is no limitation to the chromic acid concentration in the waste solution. The system can purify a waste solution having a concentration of more than 200 gm/lt of chromic acid and more than 20 gm/lt trivalent chrome content.
[00038] Yet another advantage of the present invention is easier identification of removal of impurities due to change in the colour of the catholyte solution from red to blackish.
[00039] Another advantage of the present invention is the reduced cleaning of the cathode due to less precipation.
[00040] The foregoing description of the specific embodiments will so fully reveal the general nature of the embodiments that others can, by applying current knowledge, readily modify and/or adapt for various applications such specific embodiments without departing from the generic concept, and, therefore, such adaptations and modifications should and are intended to be comprehended within the meaning and range of equivalents of the disclosed embodiments. It is to be understood that the phraseology or terminology employed is for the purpose of description and not of limitation. Therefore, while the embodiments have been described in terms of preferred embodiments, those skilled in the art will recognize that the embodiments can be practiced with modification within the spirit and scope of the embodiments as described.
,CLAIMS:We claim:

1. A system 100 for removing impurities and reusing a waste solution from chrome plating process, comprising:
an anodic compartment 101 having a plurality of anodes 102;
a cathodic compartment 103 having a cathode 104, wherein the cathodic compartment 103 is placed inside the anodic compartment 101;
an anolyte 105 provided in the anodic compartment 101 for purification, wherein the anolyte 105 is the waste solution from chrome plating process;
a catholyte 106 provided in the cathodic compartment 103 for purifying the anolyte 105;
characterized in that
direct current is supplied to the anode and the cathode 104 at a predetermined temperature; and
the catholyte 106 is a pure chromic acid solution without a catalyst.
2. The system 100 as claimed in claim 1, wherein the predetermined temperature is in the range of 40-50 degrees Celsius, preferably 45 degrees celsius.
3. The system 100 as claimed in claim 1, wherein impurities of chloride, trivalent chromium, iron, copper are removed from the waste solution of chrome plating process.
4. The system 100 as claimed in claim 1, wherein pH of the catholyte 106 is less than 1.5.
5. The system 100 as claimed in claim 1, wherein material of the plurality of anodes 102 and the cathode 104 is selected from a group containing tin, lead and stainless steel.
6. The system 100 as claimed in claim 1, wherein the cathode 104 and the plurality of anodes 102 are flat.
7. The system as claimed in claim 1, wherein ratio of surface area of anode 102 to surface area of cathode 104 is in the range of 3 to 8.
8. The system as claimed in claim 1, wherein material for the anodic compartment 101 is selected from a group containing PVC, stainless steel.
9. The system as claimed in claim 1, wherein material of the cathodic compartment 103 is ceramic for enabling migration of cations and anions.
10. The system as claimed in claim 9, wherein a pore size of the ceramic is 1 micron.
11. A method 200 for removing impurities and reusing a waste solution from chrome plating process, comprising the steps of:
providing an anodic compartment 101 having a plurality of anodes 102;
providing a cathodic compartment 103 having a cathode 104, wherein the cathodic compartment 103 is placed inside the anodic compartment 101;
supplying direct current to the plurality of anodes 102 and the cathode 104;
providing a catholyte 106 in the cathodic compartment 103;
purifying an anolyte 105 in the anodic compartment 101, wherein the anolyte 105 is the waste solution from chrome plating process;
characterized in that
the direct current is supplied to the anode and the cathode 104 at a predetermined temperature; and
the catholyte 106 is a pure chromic acid solution without a catalyst.
12. The method 200 as claimed in claim 12, wherein the predetermined temperature is in the range of 40 to 50 degrees Celsius, preferably 45 degrees Celsius.
13. The method 200 as claimed in claim 12, wherein impurities of chloride, trivalent chromium, iron, copper are removed from the waste solution of chrome plating process.
14. The method 200 as claimed in claim 12, wherein pH of the catholyte 106 is less than 1.5.
15. The method 200 as claimed in claim 12, wherein material for the cathode 104 and the plurality of anodes 102 is selected from a group containing tin, lead and stainless steel.
16. The method 200 as claimed in claim 12, wherein the cathode 104 and the plurality of anodes 102 are flat.
17. The method 200 as claimed in claim 12, wherein ratio of surface area of anode to surface area of cathode 104 is in the range of 3 to 8.
18. The method 200 as claimed in claim 12, wherein material for the anodic compartment 101 is selected from a group containing PVC, stainless steel.
19. The method 20 as claimed in claim 12, wherein material of the cathodic compartment 103 is ceramic for enabling migration of anions and cations.
20. The method 200 as claimed in claim 21, wherein pore size of the cathodic compartment 103 is 1 micron.