METHOD AND APPARATUS FOR ALD PROCESSING
PARTICULATE MATERIAL
FIELD OF THE INVENTION
The present invention generally relates to deposition reactors. More particularly,
the invention relates to atomic layer deposition reactors in which material is
deposited on surfaces by sequential self-saturating surface reactions.
BACKGROUND OF THE INVENTION
Atomic Layer Epitaxy (ALE) method was invented by Dr. Tuomo Suntola in the
early 1970's. Another generic name for the method is Atomic Layer Deposition
(ALD) and it is nowadays used instead of ALE. ALD is a special chemical
deposition method based on the sequential introduction of at least two reactive
precursor species to at least one substrate.
Thin films grown by ALD are dense, pinhole free and have uniform thickness. For
example, in an experiment aluminum oxide has been grown by thermal ALD from
trimethylaluminum (CH3)3AI, also referred to as TMA, and water at 250 - 300 °C
resulting in only about 1% non-uniformity over a substrate wafer.
One interesting application of ALD technique is coating of small particles. It may
be desirable, for example, to deposit a thin coating on particles to alter the surface
properties of these particles while maintaining their bulk properties.
SUMMARY
According to a first example aspect of the invention there is provided a method
comprising:
arranging a precursor vapor flow through a vertical atomic layer deposition (ALD)
cartridge along a top-to-bottom vertical channel in a central area of the cartridge;
and
moving particulate material to be ALD processed in the cartridge upwards, upon
rotation, by a threaded area substantially extending from the vertical channel to a
side wall of the cartridge, and downwards along the vertical channel to cause the
particulate material to cycle during ALD processing.
The particulate material may be powder or more coarse material, such as for
example diamonds or similar. The cartridge may have a circular cross section. In
certain example embodiments, the cartridge is of a cylindrical form, or for example,
a conical frustum placed upside down.
In certain example embodiments, the vertical channel has an edge wall. In other
embodiments, the vertical channel is without an edge wall. In the latter
embodiments, the vertical channel extends in the side direction to the point at
which the threaded area begins (that is, to an imaginary edge wall or outline). In
certain example embodiments, the threaded area extends from the edge wall or
virtual edge wall of the vertical channel to the cartridge side wall.
In certain example embodiments, the threaded area comprises one or more
threads. In certain example embodiments, a thread is a structure that is wrapped
inside the (hollow) cartridge so that it travels around the vertical channel (outside
of it) obliquely towards the top of the cartridge. In certain example embodiments, a
thread may be in the form of a ridge or a shelf. In certain example embodiments, a
thread is in the form of a curved shelf or protrusion. The protrusion may protrude
from the side wall of the cartridge towards the vertical channel. Alternatively, the
protrusion may protrude from the edge wall of the vertical channel (if present)
towards the side wall of the cartridge. In further embodiments, the thread may be a
curved shelf between the vertical channel and cartridge side wall attached to both
the vertical channel edge wall (if present) and the cartridge side wall.
A thread may have a thread start at the bottom of the cartridge and an end at the
top of the cartridge. It may travel from the bottom to the top as an internal thread
on the side wall. A thread may be a helical structure. A thread may be attached to
one or more thread supports. The inner side of the cartridge side wall and/or the
outer side of the vertical channel edge wall (if present) may act as a thread
support.
The threaded area may have more than one thread. Accordingly, the threaded
area may be with one start or two starts, or more starts. A thread may slope
towards the side wall or towards the vertical channel, or it may be even
(independently of the wall or support into which it is attached).
In certain example embodiments, the method comprises rotating the whole
cartridge. In certain other example embodiments, the method comprises rotating
only a part of the cartridge. In certain example embodiments, only the threaded
area inside the cartridge together with a thread support is rotated. Accordingly, in
certain example embodiments, a thread or threads (in case there are more)
together with the vertical channel edge wall are rotated, whereas the side wall of
the cartridge is stationary. In other example embodiments, a thread or threads (in
case there are more) together with the side wall of the cartridge are rotated,
whereas the vertical channel edge wall is stationary. In other example
embodiments, a thread or threads (in case there are more) may be supported by
supports other than the cartridge side wall and the vertical channel edge wall (if
any). Accordingly, in these embodiments, the thread or threads (in case there are
more) together with the (separate) thread supports are rotated, whereas the
cartridge side wall is statutory and the vertical channel edge wall (if any) is
statutory.
In certain example embodiments, the method comprises:
moving the particulate material upwards by a combined movement of rotation and
shaking. Similarly scenarios as with the preceding rotation-only embodiments can
be implemented. Accordingly, the whole cartridge or only a part of the cartridge
may be rotated and shaken.
In certain example embodiments, the combined movement of rotation and shaking
comprises consecutive movements consisting of lifting, rotating, and lowering. This
movement may be applied to the whole cartridge or only to a part of the cartridge.
Similar scenarios as with the preceding rotation-only embodiments can be
implemented.
In certain example embodiments, the cartridge comprises a first particle filter on
the top of the cartridge and a second particle filter on the bottom of the cartridge.
The first particle filter allows precursor vapor and inactive gas to enter the vertical
channel but prevents the particulate material from travelling out of the cartridge.
The second particle filter allows reaction and inactive gases to exit the vertical
channel (and the cartridge) to an exhaust line but prevents the particulate material
from travelling out of the cartridge.
In certain example embodiments, the rotating movement, or rotating and shaking
movement, is transmitted to the cartridge along a gas exhaust line.
In certain example embodiments, the method comprises:
exposing the particulate material to temporally separated precursor pulses in the
cartridge to deposit material on the surface of the particulate material by
sequential self-saturating surface reactions.
According to a second example aspect of the invention there is provided an
apparatus, comprising:
a rotatable vertical atomic layer deposition (ALD) cartridge comprising a hollow
space defined by a side wall;
a vertical channel in a central area of the cartridge vertically extending
substantially throughout the cartridge configured to allow top-to-bottom flow of
precursor vapor through the cartridge; and
a threaded area within the hollow space substantially extending from the vertical
channel to the side wall, wherein
the apparatus is configured to move particulate material to be ALD processed
upwards by the threaded area, upon rotation, and downwards along the vertical
channel to cause the particulate material to cycle during ALD processing.
In certain example embodiments, the threaded area comprises a screw thread.
In certain example embodiments, the apparatus is configured to move the
particulate material upwards by a combined movement of rotation and shaking.
In certain example embodiments, the combined movement of rotation and shaking
comprises consecutive movements consisting of lifting, rotating, and lowering.
In certain example embodiments, the apparatus comprises a reaction chamber
housing the cartridge and providing the cartridge with precursor vapor in-feed. In
certain example embodiments, the apparatus comprises a vacuum chamber
surrounding the reaction chamber.
In certain example embodiments, the apparatus comprises a rotator connected to
the cartridge but located outside of a reaction chamber housing the cartridge. In
certain example embodiments, the apparatus comprises a rotator and a shaker
connected to the cartridge but located outside of a reaction chamber housing the
cartridge.
In certain example embodiments, the rotator is attached into an exhaust line. In
certain example embodiments, the shaker is attached into an exhaust line. In
certain example embodiments, the rotator and shaker is a combined module
attached into an exhaust line. In certain example embodiments, both the rotation
and shaking is transmitted via a single vertical transmission rod. In certain
example embodiments, the rotating movement (or the rotating and shaking
movement) is transmitted from the bottom side of the ALD cartridge. In certain
example embodiments, the rotating movement (or the rotating and shaking
movement) is transmitted via an exhaust line feedthrough. In certain example
embodiments, the vertical transmission rod is located within an exhaust line.
Different non-binding example aspects and embodiments of the present invention
have been illustrated in the foregoing. The above embodiments are used merely to
explain selected aspects or steps that may be utilized in implementations of the
present invention. Some embodiments may be presented only with reference to
certain example aspects of the invention. It should be appreciated that
corresponding embodiments may apply to other example aspects as well. Any
appropriate combinations of the embodiments may be formed.
BRIEF DESCRIPTION OF THE DRAWINGS
The invention will now be described, by way of example only, with reference to the
accompanying drawings, in which:
shows a side view of an ALD cartridge in accordance with an
example embodiment;
shows a top view of the ALD cartridge of Fig. 1 in accordance
with an example embodiment;
shows particulate material propagation directions within the
deposition cartridge of Fig. 1 in accordance with an example
embodiment;
shows another illustration of the embodiment shown in Fig. 3;
shows a top view of an ALD cartridge in accordance with another
example embodiment;
shows particulate material propagation directions within an ALD
cartridge in accordance with another example embodiment;
shows a side view of an ALD reactor in accordance with an
example embodiment;
shows a side view of an ALD cartridge in accordance with
another example embodiment; and
show threads within ALD cartridges in accordance with various
example embodiments.
DETAILED DESCRIPTION
In the following description, Atomic Layer Deposition (ALD) technology is used as
an example. The basics of an ALD growth mechanism are known to a skilled
person. As mentioned in the introductory portion of this patent application, ALD is
a special chemical deposition method based on the sequential introduction of at
least two reactive precursor species to at least one substrate. The at least one
substrate is exposed to temporally separated precursor pulses in the reaction
chamber to deposit material on the substrate surfaces by sequential self-saturating
surface reactions.
A basic ALD deposition cycle consists of four sequential steps: pulse A, purge A,
pulse B and purge B. Pulse A consists of a first precursor vapor and pulse B of
another precursor vapor. Inactive gas and a vacuum pump are used for purging
gaseous reaction by-products and the residual reactant molecules from the
reaction space during purge A and purge B. A deposition sequence comprises at
least one deposition cycle. Deposition cycles are repeated until the deposition
sequence has produced a thin film or coating of desired thickness. Deposition
cycles can also be more complex. For example, the cycles can include three or
more reactant vapor pulses separated by purging steps. All these deposition
cycles form a timed deposition sequence that is controlled by a logic unit or a
microprocessor.
In certain example embodiments as described in the following, thin conformal
coatings are provided onto the surfaces of various particulate materials. The size
of the particles depends on the particular material and the particular application.
Suitable particle sizes typically range from the nanometer range up to the
micrometer range, or even up to larger particles depending on the application. A
wide variety of particulate materials can be used. The composition of a base
particle and that of the coating is typically selected together so that the surface
characteristics of the particle are modified in a way that is desirable for a particular
application. The base particles preferably have some functional group on the
surface that participates in an ALD reaction sequence that creates the coating.
Fig. 1 shows a side view and Fig. 2 a top view of an ALD cartridge in accordance
with an example embodiment. In this embodiment, the ALD cartridge 100
(hereinafter cartridge 100) has a circular cross section. The cartridge 100 is of a
cylindrical form, although in other embodiments, it may be of another form, for
example, a conical frustum placed upside down.
The cartridge 100 comprises a side wall 10 1 defining a hollow space. In the hollow
space the cartridge 100 comprises a vertical channel 102. The vertical channel
102 resides in a central area of the cartridge 100, and it extends vertically
substantially throughout the cartridge 100.
The vertical channel 102 is defined on its top side by a first particle filter 106. The
first particle filter 106 may cover only the area of the vertical channel 102 (as
drawn in Fig. 1) or it may cover a larger area of the cartridge top. On the bottom
side the vertical channel 102 is defined by a second particle filter (not shown in
Figs. 1 and 2).
In the hollow space, the cartridge 100 comprises a threaded area around the
vertical channel 102 sideways. The threaded area extends from the edge of the
vertical channel 102 to the cartridge side wall 0 1. The threaded area comprises
one on more threads 103. In the drawing of Fig. 1, one thread 103 is visible. The
thread 103 is a structure that is wrapped inside the (hollow) cartridge 100 so that it
travels around the vertical channel 102 (outside of it) obliquely towards the top of
the cartridge 100. In this embodiment, the thread 103 is a curved shelf. The thread
103 starts at thread start 104 on the bottom of the cartridge 100, and it ends at
thread end 105 at the top of the cartridge 100.
The cartridge 100 comprises particulate material to be ALD processed. When the
cartridge 100 is rotated, the particulate material moves upwards along the thread
103. The route of the particulate material is shown by the arrows in Fig. 3.
Accordingly, when the cartridge 100 is rotated as illustrated by the arrow 3 10, the
particulate material moves from the thread start 104 at the bottom of the cartridge
100 along the thread 103 by the curved track formed by the thread 103 to the
thread end 105. At the thread end 105, the particulate material moves into the
vertical channel 102 and downwards along the vertical channel 102 back to the
bottom. This way the particulate material is caused to cycle during ALD
processing. The particulate filters are not shown in Figs. 3-6.
The vertical channel 102 is configured to allow top-to-bottom flow of precursor
vapor through the cartridge 100. The first particle filter 106 allows precursor vapor
and inactive gas to enter the vertical channel 102 but prevents the particulate
material from travelling out of the cartridge 100. Similarly, the second particle filter
allows reaction and inactive gases to exit the vertical channel 102 (and the
cartridge 100) to an exhaust line (not shown in Figs. 1-3) but prevents the
particulate material from travelling to the outside of the cartridge 100.
Additionally, the cartridge 100 may be shaken as illustrated by the arrow 3 11. In
an example embodiment, the cartridge 100 is rapidly lifted and then rotated. This
causes the particulate material to travel uphill along the thread 103. Subsequently,
the cartridge 100 is lowered to its original position. The sequence of lifting, rotating
and lowering is repeated for continuous uphill movement of the particulate
material.
Fig. 4 shows another illustration of the embodiment shown in Fig. 3 . What is
shown in Fig. 4 corresponds to that shown in Fig. 3, but in addition Fig. 4 also
illustrates by small dots the particulate material particles traveling around the
cartridge 100.
Fig. 5 shows a top view of an ALD cartridge in accordance with another example
embodiment. In order to prevent the particulate material from being trapped at the
thread end, the thread end 505 (in Fig. 5) may be formed so that it drives the
particulate material into the vertical channel 102. In Fig. 5, the thread end is
formed as a spiral in the top view. However, other shapes are possible in other
embodiments.
As shown in the preceding, a thread 103 may be in the form of a shelf. In
alternative embodiments, the thread may be of another form, for example, in the
form of a ridge. In certain example embodiments, such as in the example
embodiment shown in Fig. 6, the vertical channel 102 is without edge walls. In
these embodiments, the particulate material may drop into the vertical channel 102
also during the journey to the thread end 105 as illustrated by the arrows shown in
Fig. 6 .
Depending on whether the vertical channel 102 has an edge wall, the following
alternatives can be identified: the thread 103 may be a curved protrusion
protruding from the edge wall; the thread 103 may be a curved protrusion
protruding from the side wall 10 1; and the thread 103 may be a curved shelf
between the vertical channel 102 and cartridge side wall 10 1 attached to both the
edge wall and the cartridge side wall 10 1 . In the first and second alternative, in
some embodiments, there can be a small interval between the curved protrusion
and the side wall 10 1 or the edge wall (if any), respectively. The first and second
alternative then make it possible to rotate (or rotate and shake) only part of the
cartridge 100, instead of rotating (or rotating and shaking) the whole cartridge 100.
Namely, in the first alternative, the cartridge side wall 10 1 can be stationary, while
the interior of the cartridge rotates (or rotates and shakes). In the second
alternative, the vertical channel edge wall can be stationary, while the threaded
area and the cartridge side wall rotate.
The thread 103 as shown in Figs. 1-6 (as well as possible other threads not show)
may travel from the cartridge bottom to the top as an internal thread on the side
wall 101 . The thread 103 may be a helical structure. The thread 103 may be
attached to one or more thread supports. The inner side of the cartridge side wall
10 1 and/or the outer side of the vertical channel edge wall (if present) may act as
a thread support. Alternatively, there may be separate supports instead.
The lead of the thread 103 depends on the implementation. The threaded area
may have more than one thread. Accordingly, the threaded area may be with one
start or two starts, or more starts. A thread may slope towards the side wall 10 1 or
towards the vertical channel 102, or it may be even (independently of the wall or
support into which it is attached).
Fig. 9A shows an even thread 903 between the vertical channel edge or edge wall
902 and cartridge side wall 901 . Fig. 9B shows a thread 903 sloping towards the
side wall 901 , whereas Fig. 9C shows a thread 903 sloping towards the vertical
channel edge or edge wall 902.
Figs. 10A-1 0C show curved protrusion threads 1003 where there is a small
interval between the curved protrusion thread 1003 and the cartridge sidewall
1001 . Fig. 10A shows an even thread 1003 between the vertical channel edge wall
1002 and cartridge side wall 1001 . Fig. 10B shows a thread 1003 sloping towards
the side wall 1001 , whereas Fig. 10C shows a thread 1003 sloping towards the
vertical channel edge wall 1002.
Figs. 11A-1 1C show curved protrusion threads 1103 where there is a small
interval between the curved protrusion thread 1103 and the vertical channel edge
wall 1102. Fig. 11A shows an even thread 1103 between the vertical channel edge
wall 1102 and cartridge side wall 1101 . Fig. B shows a thread 1103 sloping
towards the side wall 1101 , whereas Fig. C shows a thread 1103 sloping
towards the vertical channel edge wall 1102.
Fig. 7 shows a side view of an ALD reactor in accordance with an example
embodiment. The ALD reactor comprises a particulate material atomic layer
deposition cartridge 700 (hereinafter cartridge 700).
The cartridge 700 comprises a side wall 701 defining a hollow space. In the hollow
space the cartridge 700 comprises a vertical channel 702. The vertical channel
702 resides in a central area of the cartridge 700, and it extends vertically
substantially throughout the cartridge 700.
The vertical channel 702 is defined on its top side by a first particle filter 706. On
the bottom side the vertical channel 702 is defined by a second particle filter 707.
In the hollow space, the cartridge 700 comprises a threaded area around the
vertical channel 702 sideways. The threaded area extends from the edge of the
vertical channel 702 to the cartridge side wall 701 . The threaded area comprises
one on more threads 703.
The ALD reactor comprises a reaction chamber 720. The reaction chamber 720 is
limited on its sides by a reaction chamber wall(s) 721 . On its top side, the reaction
chamber is closed by a reaction chamber lid 722. The reaction chamber is housed
by a vacuum chamber 730. The vacuum chamber 730 is limited on its sides by a
vacuum chamber wall(s) 731 . On its top side, the vacuum chamber is closed by a
vacuum chamber lid 732. The vacuum chamber lid 732 and the reaction chamber
lid 722 may be integrated to form a dual-lid system. Furthermore, a heat reflector
737 may also be integrated to the lid system. The cartridge 700 can be loaded
from the reactor top by opening the lid system.
The vacuum chamber comprises, in addition to the heat reflector 737, other heat
reflectors, such as the heat reflectors 736 on the sides of the reaction chamber
720. The heat reflectors form a thermos bottle structure. Within said structure in
the vacuum chamber 730 is placed reaction chamber heaters 735. The reaction
chamber heaters 735 heat the reaction chamber 720 and the cartridge 700 inside
it as desired.
The reaction chamber 730 is delimited on its bottom side by a reaction chamber
flange 734. Electrical power to the reaction chamber heaters 735 is provided with
conductors via feedthroughs through the flange 734. Precursor vapor and inactive
gas in-feed lines 738 similarly travel through feedthroughs through the flange 734
into the vacuum chamber 730. Therefrom, the in-feed lines 738 travel via the
reaction chamber lid 722 into the reaction chamber 720 providing the cartridge 700
with precursor vapor and inactive gas in-feed from the top side of the cartridge
700.
Below the reaction chamber 720, the ALD reactor comprises an exhaust line 740
which conducts reaction and inactive gases towards a vacuum pump (not shown).
For that purpose, the reaction chamber (bottom) flange 734 has an exhaust line
feedthrough. The exhaust line 740 branches below the reaction chamber 720 (the
exhaust line 740 may form a T-junction, or similar). One branch (to the side in Fig.
7) leads to the vacuum pump. The other branch (down in Fig. 7) leads to a module
741 . The module 741 may be a rotator module. Alternatively, the module 741 may
be a rotator and shaker module. A vertical rod 742 attached to the module 741 at
its lower end and to the cartridge 700 at its upper end is used as a transmission
rod to rotate (or rotate and shake) the cartridge 700. The vertical rod 741 travels
within the exhaust line 740. It goes through the vacuum chamber flange 734 via
the exhaust line feedthrough. The vertical rod 741 may be supported to the
exhaust line 740 by supports 743 between the module 741 and the vacuum
chamber flange 734.
The cartridge 700 comprises particulate material to be ALD processed. During
ALD processing, when the cartridge 700 is rotated as illustrated by the round
arrow 7 10, a particulate material cycle similar to that shown in Figs. 1-6 is
established. The particulate material moves upwards along the thread 703 and
downwards along the vertical channel 702. Additionally, the cartridge 700 may be
shaken as illustrated by the up-and-down arrow 7 10 . The particulate material is
then moved by a combined movement of rotation and shaking as described in the
foregoing.
The vertical channel 702 allows top-to-bottom flow of precursor vapor through the
cartridge 700. The first particle filter 706 allows precursor vapor and inactive gas to
enter the vertical channel 702 from a top part of the reaction chamber 720 but
prevents the particulate material from travelling out of the cartridge 700. Similarly,
the second particle filter allows reaction and inactive gases to exit the vertical
channel 702 (and the cartridge 700) to the bottom part of the reaction chamber
720 and therefrom to the exhaust line 740 but prevents the particulate material
from travelling to the outside of the cartridge 700.
Fig. 8 shows a side view of an ALD cartridge in accordance with another example
embodiment. The ALD cartridge 800 otherwise corresponds to the structure and
operation to the ALD cartridge 700 except that, instead of the whole cartridge 700
being rotated (or rotated and shaken), in the embodiment of Fig. 8 only a part of
the cartridge 800 is rotated (or rotated and shaken). As mentioned in the
preceding, in alternative embodiments, the cartridge may have stationary parts
that remain still while the other parts of the cartridge are rotated (or rotated and
shaken). In the example embodiment of Fig. 8, the transmission rod 842 is
connected to the vertical channel 802 to which the thread(s) 803 are attached. The
transmission rod 842 therefore rotates (or rotates and shakes) only the edge wall
of the vertical channel 802 and the thread(s) 803, while the cartridge side wall 801
and the first and second particle filters 806 and 807 remain still.
Without limiting the scope and interpretation of the patent claims, certain technical
effects of one or more of the example embodiments disclosed herein are listed in
the following: A technical effect is hindering the formation of agglomerates.
Another technical effect is transmitting rotating movement, or rotating and shaking
movement, to an ALD cartridge along a gas exhaust line.
The foregoing description has provided by way of non-limiting examples of
particular implementations and embodiments of the invention a full and informative
description of the best mode presently contemplated by the inventors for carrying
out the invention. It is however clear to a person skilled in the art that the invention
is not restricted to details of the embodiments presented above, but that it can be
implemented in other embodiments using equivalent means without deviating from
the characteristics of the invention.
Furthermore, some of the features of the above-disclosed embodiments of this
invention may be used to advantage without the corresponding use of other
features. As such, the foregoing description should be considered as merely
illustrative of the principles of the present invention, and not in limitation thereof.
Hence, the scope of the invention is only restricted by the appended patent claims.

Claims
1. A method comprising:
arranging a precursor vapor flow through a vertical atomic layer deposition
(ALD) cartridge along a top-to-bottom vertical channel in a central area of the
cartridge; and
moving particulate material to be ALD processed in the cartridge upwards,
upon rotation, by a threaded area substantially extending from the vertical
channel to a side wall of the cartridge, and downwards along the vertical
channel to cause the particulate material to cycle during ALD processing.
2 . The method of claim 1, comprising:
moving the particulate material upwards by a combined movement of
rotation and shaking.
3 . The method of claim 2, wherein the combined movement of rotation and
shaking comprises consecutive movements consisting of lifting, rotating, and
lowering.
4 . The method of any preceding claim, wherein the rotating movement, or
rotating and shaking movement, is transmitted to the cartridge along a gas
exhaust line.
5 . The method of any preceding claim, comprising:
exposing the particulate material to temporally separated precursor pulses
in the cartridge to deposit material on the surface of the particulate material by
sequential self-saturating surface reactions.
6 . An apparatus, comprising:
a rotatable vertical atomic layer deposition (ALD) cartridge comprising a
hollow space defined by a side wall;
a vertical channel in a central area of the cartridge vertically extending
substantially throughout the cartridge configured to allow top-to-bottom flow of
precursor vapor through the cartridge; and
a threaded area within the hollow space substantially extending from the
vertical channel to the side wall, wherein
the apparatus is configured to move particulate material to be ALD
processed upwards by the threaded area, upon rotation, and downwards
along the vertical channel to cause the particulate material to cycle during ALD
processing.
7 . The apparatus of claim 5, wherein the apparatus is configured to move the
particulate material upwards by a combined movement of rotation and
shaking.
8 . The apparatus of claim 6, wherein the combined movement of rotation and
shaking comprises consecutive movements consisting of lifting, rotating, and
lowering.
9 . The apparatus of any preceding claim 5-7, wherein the apparatus comprises a
reaction chamber housing the cartridge and providing the cartridge with
precursor vapor in-feed.
10 . The apparatus of any preceding claim 5-8, wherein the apparatus comprises a
rotator and a shaker connected to the cartridge but located outside of a
reaction chamber housing the cartridge.
11. The apparatus of claim 9, comprising the rotator and/or the shaker attached
into an exhaust line.