PROTECTING AN INTERIOR OF A HOLLOW BODY WITH AN ALD COATING
FIELD OF THE INVENTION
The present invention generally relates to atomic layer deposition (ALD). More
particularly, the invention relates to providing protective coating by means of ALD.
BACKGROUND OF THE INVENTION
This section illustrates useful background information without admission of any
technique described herein representative of the state of the art.
Atomic Layer Epitaxy (ALE) method was invented by Dr. Tuomo Suntola in the
early 970's. Another generic name for the method is Atomic Layer Deposition
(ALD) and it is nowadays used instead of ALE. ALD is a special chemical
deposition method based on the sequential introduction of at least two reactive
precursor species to at least one substrate.
Thin films grown by ALD are dense, pinhole free and have uniform thickness. For
example, in an experiment aluminum oxide has been grown by thermal ALD from
trimethylaluminum (CH3)3AI, also referred to as TMA, and water resulting in only
about 1% non-uniformity over a substrate wafer.
One interesting application of ALD technique is providing protective coatings on
surfaces.
SUMMARY
According to a first example aspect of the invention there is provided a method of
protecting an interior of a hollow body, the method comprising:
providing an inlet and exhaust manifold comprising a port assembly attachable to
an opening of the hollow body;
exposing the interior of the hollow body to sequential self-saturating surface
reactions by sequential inlet of reactive gases via said port assembly and said
opening into the interior of the hollow body; and
removing excess gases via said opening and said port assembly out from the
hollow body.
The hollow body in this patent application may be any hollow body whose inner
walls require a protective coating other than a gas container. Examples of
applicable hollow bodies comprise ovens, crushers, vibrators, valves, heat
exchangers, fuel cells, liquid and mixing containers. Further examples include
various closed processing equipment in which both inlet and outlet occurs via a
same port.
The sequential self-saturating surface reactions (according to ALD) produce the
desired protective coating within the interior (on the inner surfaces) of the hollow
body. Accordingly, the interior of the hollow body may be coated by using ALD so
that all surfaces within the hollow body which see the reactive gases end up
coated.
In the event the hollow body (or equipment) comprises another opening than the
one mentioned leading to the interior of the hollow body, certain example
embodiments comprise covering this another opening by a suitable cover or
otherwise closing it.
In certain example embodiments, the method comprises attaching said port
assembly to said opening of the hollow body. Said opening of the hollow body may
be a hollow body mouth. The hollow body opening may be threaded.
In certain example embodiments, when both the inlet side and the exhaust side of
the manifold operate via the same port assembly (which in turn operates via the
one and the same opening of the hollow body), the port assembly can be defined
as an integrated port assembly.
In certain example embodiments, the method comprises pumping excess gases,
such as reaction residue and purge gas, from the interior of the hollow body by a
vacuum pump attached to an exhaust side of the inlet and exhaust manifold. The
vacuum pump may provide one or more of the following effects: It may be used to
pump the interior of the hollow body into vacuum. It may be configured to pump
excess gases from the hollow body via the port assembly.
The hollow body may be used as the reaction chamber for ALD reactions.
Accordingly, in certain example embodiments, the hollow body is used as a
reaction vessel sealed by the port assembly. The sequential self-saturating
surface reactions are thereby limited to occur within the interior of the hollow body.
In certain example embodiments, the hollow body whose inner walls are coated
forms a hot wall reaction chamber heated by an external heater.
In certain example embodiments, both gas inlet and gas exhaust occurs via a
same opening (or port) of the hollow body. In certain example embodiments, the
inlet and exhaust manifold hermetically connected to the hollow body opens
directly into the hollow body and allows alternate supply of the precursors needed
for performing an ALD process, purging the inner volume of the hollow body with
an inert gas and evacuation of the precursors, gaseous reaction products and
purge gas from the hollow body.
In certain example embodiments, the hollow body is closable (or closed) by the
inlet and exhaust manifold.
In certain example embodiments, said port assembly comprises a sealing part. In
certain example embodiments, the sealing part is detachably attachable to the
hollow body opening in the place of a hollow body stop valve (if any). The sealing
part, in certain example embodiments, comprises a tapered thread. In certain
example embodiments, the tapered thread is configured to fit to a counter thread
in the hollow body opening. The sealing part may be twisted into the hollow body
opening to seal the hollow body opening. In certain example embodiments, there
is a sealing tape, such as Teflon tape between the tapered thread and the
threaded hollow body opening to improve sealing. In certain example
embodiments, at least one in-feed line and an exhaust line pass through the
sealing part. In certain example embodiments, said port assembly comprises a
fitting part detachably attachable to the sealing part. The fitting part may form a
(cylindrical) continuation of the sealing part. In certain example embodiments,
when the fitting part is detached from the sealing part, the sealing part is twistable
to tighten against the hollow body opening. Depending on the implementation, the
fitting part may allow the sealing part to twist also when attached to the fitting part.
In certain example embodiments, at least one in-feed line and an exhaust line
pass both through the sealing part and the fitting part. In certain example
embodiments, an interface between the sealing part and the fitting part is airtight
when the fitting part has been attached to the sealing part. In certain example
embodiments, there is an airtight feedthrough at an opposite end of the fitting part
for at least one of an in-feed and an exhaust line to pass through.
In embodiments, in which the hollow body is placed into a chamber of a reactor for
deposition, such as a reaction or vacuum chamber, the sealing by the port
assembly prevents a coating from being deposited onto the chamber walls. This
reduces the need to clean the chamber walls.
In certain example embodiments, the hollow body is used as a reaction vessel
sealed by a sealing part comprised by the port assembly.
In certain example embodiments, said sealing part comprises a tapered thread
detachably attachable to said opening of the hollow body in the place of a stop
valve.
In certain example embodiments, said port assembly comprises a fitting part
attachable to the sealing part allowing the sealing part to twist to tighten against
said opening of the hollow body.
In certain example embodiments, the method comprises:
guiding inactive purge gas into an intermediate space between the hollow body
and a surrounding chamber wall, and
pumping said inactive purge gas out from the intermediate space.
An over pressure generated by guiding the inactive purge gas into the
intermediate space further improves the sealing effect of the port assembly. The
intermediate space in an embodiment is kept in a vacuum pressure by a vacuum
pump which is in fluid communication with the intermediate space. By arranging a
material flow from the intermediate space through an exhaust conduit to a pump,
such as the vacuum pump, any precursor material ended up into the intermediate
space can be removed.
The inlet and exhaust manifold provides at least one in-feed line and an exhaust
line. Precursor vapor is discharged from said at least one in-feed line at a
discharge point within the hollow body. The exhaust line begins at an exhaust
point within the hollow body. In certain example embodiments, the discharge point
(i.e., a gas discharge point) within the hollow body is arranged at a different level
than the exhaust point (i.e., a gas exhaust point). In certain example
embodiments, the discharge point is arranged, within the interior of the hollow
body, at an end of the hollow body opposite to an end of the hollow body in which
the exhaust point resides. In certain example embodiments, a gas line (exhaust or
in-feed line) which extends to the farthest end travels all the way from the opening
to the farthest end within the hollow body.
The discharge point in certain example embodiments resides at an end of the
hollow body opposite to the end in which the opening resides and the exhaust
point resides at the opposite end (i.e., at the end in which the opening resides).
The discharge point in certain example embodiments resides at an end of the
hollow body in which the opening resides and the exhaust point resides at the
opposite end (i.e., at the end opposite to the end in which the opening resides). In
certain example embodiments in which the hollow body has a top and a bottom,
the discharge point resides at the bottom (or bottom section) of the hollow body
the exhaust point being in the top (or top section). In certain example
embodiments in which the hollow body has a top and a bottom, the discharge
point resides in the top (or top section) of the interior of the hollow body the
exhaust point being at the bottom (or bottom section).
In certain example embodiments, the inlet and exhaust manifold comprises one or
more in-feed lines with their controlling elements controlled by a computerimplemented
control system.
In certain example embodiments, the inlet and exhaust manifold comprises ALD
reactor in-feed equipment. In certain example embodiments, the in-feed
equipment comprises in-feed line(s) and at least the desired precursor and
inactive gas flow controlling elements, such as valve(s), mass flow controller(s) or
similar, and their control system.
The control system may be implemented for example by software in a laptop
computer or similar. Accordingly, in certain example embodiments, the inlet and
exhaust manifold comprises one or more in-feed lines with their controlling
elements controlled by a computer-implemented control system. Suitable
replaceable precursor and inactive gas sources may be attached to the in-feed
equipment.
According to a second example aspect of the invention there is provided an
apparatus for protecting an interior of a hollow body, comprising:
an inlet and exhaust manifold comprising a port assembly attachable to an
opening of the hollow body, the apparatus being configured to expose the interior
of the hollow body to sequential self-saturating surface reactions by sequential
inlet of reactive gases via said port assembly and said opening into the interior of
the hollow body; and
a pump configured to remove excess gases via said opening and said port
assembly out from the hollow body.
In certain example embodiments, a gas discharge point provided by the inlet and
exhaust manifold is arranged at a different level than a gas exhaust point provided
by the inlet and exhaust manifold. The different levels here typically mean different
heights.
In certain example embodiments, the inlet and exhaust manifold comprises
precursor vapor and purge gas in-feed lines and their controlling elements. The
pump may attached to the exhaust side of the inlet and exhaust manifold. The
pump may be a vacuum pump.
In certain example embodiments, the inlet and exhaust manifold comprises a
hollow body-specific port assembly configured to attach the inlet and exhaust
manifold into said opening of the hollow body thereby forming a fluid
communication path between the inlet and exhaust manifold and the interior of the
hollow body. Similarly, a fluid communication path between the interior of the
hollow body and the pump is formed.
In certain example embodiments, the port assembly comprises a sealing part
attachable to the opening of the hollow body.
In certain example embodiments, the sealing part comprises a tapered thread.
In certain example embodiments, the apparatus comprises:
a chamber surrounding the hollow body and an inactive gas in-feed line configured
to guide inactive purge gas into an intermediate space between the hollow body
and a surrounding chamber wall.
The apparatus comprising the inlet and exhaust manifold may be mobile so that it
can be moved to meet the user's needs. In certain example embodiments, the inlet
and exhaust manifold comprises a separate inlet manifold and a separate exhaust
manifold both being able to simultaneously couple to the opening of the hollow
body and designed to work together in a hollow body interior protecting method.
In a further aspect, instead of arranging the inlet and exhaust of gases via the
same opening, the inlet of gases can be arranged via a first opening of a follow
body and exhaust of gases via another opening of the hollow body, if applicable.
Different non-binding example aspects and embodiments of the present invention
have been illustrated in the foregoing. The above embodiments are used merely to
explain selected aspects or steps that may be utilized in implementations of the
present invention. Some embodiments may be presented only with reference to
certain example aspects of the invention. It should be appreciated that
corresponding embodiments may apply to other example aspects as well. Any
appropriate combinations of the embodiments may be formed.
BRIEF DESCRIPTION OF THE DRAWINGS
The invention will now be described, by way of example only, with reference to the
accompanying drawings, in which:
Fig. 1 shows a schematic view of an apparatus and its use for
protecting an interior of a hollow body in accordance with an
example embodiment;
Figs. 2A-2B show alternative in-feed arrangements in accordance with certain
example embodiments;
Fig. 3 shows another example embodiment;
Figs. 4A-4B show a sealing arrangement in accordance with certain example
embodiments; and
Fig. 5 shows a method in accordance with an example embodiment.
DETAILED DESCRIPTION
In the following description, Atomic Layer Deposition (ALD) technology is used as
an example. The basics of an ALD growth mechanism are known to a skilled
person. As mentioned in the introductory portion of this patent application, ALD is
a special chemical deposition method based on the sequential introduction of at
least two reactive precursor species to at least one substrate. The at least one
substrate is exposed to temporally separated precursor pulses in a reaction vessel
to deposit material on the substrate surfaces by sequential self-saturating surface
reactions. In the context of this application, the at least one substrate comprises
the interior (inner surfaces) of a hollow body. Further, in the context of this
application, the term ALD comprises all applicable ALD based techniques and any
equivalent or closely related technologies, such as, for example MLD (Molecular
Layer Deposition) technique.
A basic ALD deposition cycle consists of four sequential steps: pulse A, purge A,
pulse B and purge B. Pulse A consists of a first precursor vapor and pulse B of
another precursor vapor. Inactive gas and a vacuum pump are typically used for
purging gaseous reaction by-products and the residual reactant molecules from
the reaction space during purge A and purge B. A deposition sequence comprises
at least one deposition cycle. Deposition cycles are repeated until the deposition
sequence has produced a thin film or coating of desired thickness. Deposition
cycles can also be more complex. For example, the cycles can include three or
more reactant vapor pulses separated by purging steps. All these deposition
cycles form a timed deposition sequence that is controlled by a logic unit or a
microprocessor.
In certain example embodiments as described in the following, there is provided a
method and apparatus for protecting a hollow body interior with a protective
coating. The hollow body here is a pressure vessel. The hollow body itself forms a
reaction chamber (or a reaction space), and there is typically no separate
substrate, but the surfaces of the interior of the hollow body form a substrate
(substrate here meaning the material on which a process is conducted). All these
surfaces can be coated by an ALD process in which precursor vapors are
sequentially inlet via an inlet and exhaust manifold into the interior of the hollow
body. Excess gases, such as reaction residue (if any) and purge gas, is pumped
out from the interior of the hollow body via an exhaust side of the inlet and exhaust
manifold. The hollow body can be optionally heated before and/or during ALD
processing by a heater placed around the hollow body.
Fig. 1 shows the method and related apparatus in certain example embodiments.
The apparatus used to protect the interior of a hollow body 10 comprises an inlet
and exhaust manifold 20. The apparatus may be a mobile apparatus. A mobile
apparatus may be conveniently moved into the proximity of hollow bodies to be
protected, if needed.
The inlet and exhaust manifold 20 is configured to be detachably attached to an
opening 11 of the hollow body. Fig. 1 shows the inlet and exhaust manifold 20
attached by a port assembly 24 to the hollow body opening 11. The port assembly
24 may be a hollow body-specific part. The port assembly comprises a sealing
arrangement (not shown) to seal the interface between the hollow body opening
11 and the port assembly 24. In an example implementation, the port assembly
comprises a seal (not shown) which tightens against its counter surface in the
hollow body opening 11.
The inlet and exhaust manifold 20 comprises ALD reactor in-feed equipment 70.
The in-feed equipment 70 comprises the required in-feed lines and their controlling
elements. Attached to the port assembly 24 in Fig. 1 is a first precursor vapor infeed
line 4 1, a second precursor in-feed line 42 and a purge gas in-feed line 43.
The first precursor in-feed line 4 1 originates from a first precursor source 2 1, the
second precursor in-feed line 42 from a second precursor source 22, and the
purge gas in-feed line 43 from a purge/inactive gas source 23. The in-feed lines
4 1-43 extend, travelling through the port assembly 24 and hollow body opening
11, from the sources 21-23 to the interior of the hollow body 10. The in-feed lines
4 1-43 end at respective discharge points. An exhaust line 32 begins at an exhaust
point within the interior of the hollow body. The discharge points should reside in a
different level than the exhaust point to effectively obtain uniform deposition. In the
embodiment shown in Fig. 1 the discharge points of the in-feed lines 4 1-43 are at
the bottom section of the hollow body 10 the exhaust point being in the top
section.
The in-feed line controlling elements comprise flow and timing controlling
elements. A first precursor in-feed valve 6 1 and mass (or volume) flow controller
5 1 in the first precursor in-feed line 4 1 control the timing and flow of first precursor
pulses. Correspondingly, a second precursor in-feed valve 62 and mass (or
volume) flow controller 52 in the second precursor in-feed line 42 control the timing
and flow of second precursor pulses. Finally, a purge gas in-feed valve 63 and
mass (or volume) flow controller 53 control the timing and flow of purge gas.
In the embodiment shown in Fig. 1, the operation of the in-feed equipment 70 is
controlled by a control system. Fig. 1 shows a control connection 72 between the
in-feed equipment 70 and a control system 7 1. The control system 7 1 may be
implemented for example by software in a laptop computer or similar.
In certain example embodiments, the ALD process within the interior of the hollow
body is performed in a vacuum pressure. The inlet and exhaust manifold 20
comprises a vacuum pump 33. In certain example embodiments, the vacuum
pump 33 is located in the end of the exhaust line 32 provided by the inlet and
exhaust manifold 20. The vacuum pump 33 can be optionally controlled by the
control system 7 1 via an optional electrical connection 73 (which is between the
control system 7 1 and the vacuum pump 33). In certain example embodiments,
the hollow body is heated by an external heater (not shown).
In operation, the vacuum pump 33 pumps the interior of the hollow body 10 into
vacuum. Precursor vapor of the first precursor and second precursor are
sequentially discharged into the interior of the hollow body from the discharge
points of the first and second precursor in-feed lines 4 1 and 42, respectively. In the
purge steps, inactive purging gas is discharged into the interior of the hollow body
from the discharge point of the purge gas in-feed line 43. The arrows 15 depict the
flow direction of precursor vapor and purge gas within the hollow body from the
respective discharge points towards the exhaust point (via which they are pumped
into the exhaust line 32). The desired thickness of protective coating onto the
hollow body inner surface is obtained by repeating deposition cycles as needed.
Further referring to Fig. 1, it should be noted that in other embodiments, the inlet
and exhaust manifold 20 may be arranged differently. Instead of separate in-feed
lines at least part of the in-feed lines may be in common. The valve types may
vary. The flow controlling element locations may vary, etc. For example, three-way
valves may be used instead of two-way valves, immediately reflecting changes in
in-feed line routing. Concerning the precursor sources and purge gas, their
selection depends on the implementation and desired coating. The hollow body 10
can be heated by an optional heater 16 from the outside of the hollow body 10 .
The heater may be a helical coil heater arranged around the hollow body 10 . The
operation of the heater can be optionally controlled be the control system 7 1 over
a connection.
Applicable coatings depending on the application are, for example, metal oxides,
such as aluminum oxide, titanium oxide, tantalum oxide, and tungsten carbide,
and their combinations, but the coatings are not limited to these materials.
In the event the hollow body comprises another opening than the one mentioned
leading to the interior of the hollow body, said another opening in certain example
embodiments is covered by a cover or is otherwise closed.
Figs. 2A and 2B show two alternative embodiments for the placement of in-feed
and exhaust lines within the hollow body 10 . The hollow body 10 has an inner wall
shape allowing free movement of low-pressure gases.
Fig. 2A corresponds to the arrangement shown in Fig. 1. Accordingly, the in-feed
lines 4 1-43 and exhaust line 32 travel through the hollow body opening 11. The infeed
lines 41-43 end at respective discharge points. The exhaust line 32 begins at
an exhaust point. The discharge points of the in-feed lines 4 1-43 are at the bottom
section of the hollow body 10 the exhaust point being in the top section. The
direction of gas flow is shown by the arrows 15 .
In the preferred embodiment shown in Fig. 2B, the exhaust line to the contrary
begins at the bottom section of the hollow body 10 whereas the discharge points
of the in-feed lines 4 1-43 are in the top section. The in-feed lines 41-43 and
exhaust line 32 travel through the hollow body opening 11. The in-feed lines 4 1-43
end at respective discharge points. The exhaust line 32 begins at an exhaust
point. The direction of gas flow is shown by the arrows 5 .
Fig. 3 shows a method and apparatus for protecting an interior of a hollow body in
accordance with another example embodiment. This embodiment basically
corresponds to the embodiment shown in Fig. 1, however, disclosing certain
further features.
Fig. 3 shows pressure vessel, such as a chamber 30 surrounding the hollow body
10 . The chamber 30 may be, for example, a vacuum chamber or ALD reaction
chamber generally used in the field of ALD. The hollow body 10 is loaded into the
chamber 30 via a loading hatch 3 1, or similar, and is attached by its opening 11 to
the port assembly 24. The in-feed lines 4 1-43 are passed into the chamber 30
through a feedthrough 36 arranged into the chamber 30 wall. The exhaust line 32
is passed out from the chamber 30 through a feedthrough 46 arranged into the
chamber 30 wall. The location of the feedthroughs 36 and 46 depend on the
implementation. The feedthroughs 36 and 46 may even be implemented by a
single feedthrough. The feedthroughs 36 and 46 are sealed.
The basic operation concerning the deposition of a protective coating within the
hollow body 10 is similar to that described in connection with Fig. 1.
The embodiment shown in Fig. 3 optionally comprises a purge gas in-feed conduit
44 through which inactive purge gas is guided (discharged) into an intermediate
space 40 between the hollow body 10 and a surrounding chamber 30 wall. The
purge gas flows to the conduit 44, for example, along a branch 43a divided from
the purge gas in-feed line 43.
The intermediate space 40 is pumped by the vacuum pump 33 via an exhaust
conduit 45 arranged on the opposite side of the intermediate space 40. The
exhaust pump 33 is in fluid communication with the intermediate space 40 through
an exhaust line 47 extending from the exhaust conduit 45 to the exhaust pump 33.
The exhaust lines 32 and 47 may join at some point on the way to the exhaust
pump 33.
The pumping causes a flow within the intermediate space 40 that conducts any
precursor material ended up into the intermediate space 40 into the exhaust line
47. An over pressure generated by guiding the inactive purge gas into the
intermediate space 40 further improves the sealing effect of the port assembly 24.
The arrows 35 depict the flow direction within the intermediate space 40.
Fig. 4A shows a sealing arrangement in accordance with an example embodiment.
The hollow body 4 10 comprises an opening 4 11 which can be, for example, a
mouth of the hollow body. An inlet and exhaust manifold comprises a port
assembly comprising a sealing part 424. The sealing part is detachably attachable,
by for example twisting, to the opening 4 11 of the hollow body. If applicable, the
sealing part is detachably attachable in the place of a hollow body stop valve or
similar. For attaching and detaching, the sealing part 424 in this embodiment is a
tapered thread part. The tapered thread of the sealing part is configured to fit to a
counter thread (if any, not shown) in the hollow body opening 4 11 to tighten and
seal the hollow body opening 4 11. As mentioned, the sealing part 424 can be, for
example, twisted into the hollow body opening 4 11 to seal the hollow body
opening.
In certain example embodiments, there is sealing tape 425, such as Teflon tape
around the tapered thread between the tapered thread and the threaded hollow
body opening 4 11 to improve sealing as illustrated in Fig. 4B which is an
enlargement of certain parts of Fig. 4A.
Depending on the implementation, the sealing part may be of a tapered form or
not, and it may be threaded or not. Accordingly, in other embodiments, the sealing
part may be, for example, a tapered part without a thread or a threaded part
without tapering.
Figs. 4A and 4B show two in-feed lines 441 and 443 as well as an exhaust line
432 arranged similarly as in the preferred Fig. 2B. Accordingly, the gas discharge
point is in the very proximity of the hollow body opening and the exhaust point at
the opposite end of the hollow body. The in-feed lines and exhaust line pass
through the sealing part 424 extending through the sealing part into an interior of
the hollow body 4 10. In certain example embodiments, the port assembly further
comprises a fitting part 426 detachably attachable to the sealing part. The fitting
part 426 forms a (cylindrical) continuation of the sealing part 424. In certain
example embodiments, when the fitting part 426 is detached from the sealing part
424, the sealing part 424 is twistable to tighten against the hollow body opening
4 11. Depending on the implementation, the fitting part 426 may allow the sealing
part 424 to twist also when attached to the fitting part 426. The in-feed lines 441
and 443 as well as the exhaust line 432 pass both through the sealing part 424
and the fitting part 426. The interface between the sealing part 424 and the fitting
part 426 is airtight when the fitting part 426 has been attached to the sealing part
424. In certain example embodiments, there is an airtight feedthrough at an end
opposite to the sealing part end of the fitting part 426 (as depicted in the upper
section of Fig. 4A) for at least one of an in-feed line 441 ,443 and an exhaust line
432 to pass through. An airtight feedthrough here means basically a feedthrough
at which gas can flow between the inside of a part and the outside of a part 426
only through a pipeline. An airtight interface, similarly, means an interface at which
gas can flow from the part (for example, fitting part 426) on a first side of the
interface to the part (for example, sealing part 424) on the other side only through
the interface.
In embodiments, in which the fitting part is omitted, the feedthrough(s) are
preferably arranged in the (upper) end of the sealing part 424.
As to the general operation of the embodiments shown in Figs. 4A and 4B, a
reference is made also to the embodiments shown in Figs. 1 to 3.
Fig. 5 shows a method in accordance with an example embodiment. In step 8 1, an
inlet and exhaust manifold is attached to a hollow body. ALD processing is
performed in step 82. The ALD processing comprises exposing the interior of the
hollow body to sequential self-saturating surface reactions and removing excess
gases out from the hollow body. Finally, in step 83, the inlet and exhaust manifold
is detached from the hollow body.
Without limiting the scope and interpretation of the patent claims, certain technical
effects of one or more of the example embodiments disclosed herein are listed in
the following: A technical effect is protecting a hollow body interior by a conformal
protective coating. Another technical effect is coating only the inside of the hollow
body the outside being not coated. Another technical effect is reduced cleaning
need of a surrounding chamber.
It should be noted the some of the functions or method steps discussed in the
preceding may be performed in a different order and/or concurrently with each
other. Furthermore, one or more of the above-described functions or method steps
may be optional or may be combined.
The foregoing description has provided by way of non-limiting examples of
particular implementations and embodiments of the invention a full and informative
description of the best mode presently contemplated by the inventors for carrying
out the invention. It is however clear to a person skilled in the art that the invention
is not restricted to details of the embodiments presented above, but that it can be
implemented in other embodiments using equivalent means without deviating from
the characteristics of the invention.
Furthermore, some of the features of the above-disclosed embodiments of this
invention may be used to advantage without the corresponding use of other
features. As such, the foregoing description should be considered as merely
illustrative of the principles of the present invention, and not in limitation thereof.
Hence, the scope of the invention is only restricted by the appended patent claims.
Claims
. A method of protecting an interior of a hollow body, the method comprising:
providing an inlet and exhaust manifold comprising a port assembly
attachable to an opening of the hollow body;
exposing the interior of the hollow body to sequential self-saturating surface
reactions by sequential inlet of reactive gases via said port assembly and said
opening into the interior of the hollow body; and
removing excess gases via said opening and said port assembly out from
the hollow body.
2 . The method of claim 1, comprising attaching said port assembly to said
opening of the hollow body.
3 . The method of claim 1 or 2, comprising pumping reaction residue and purge
gas from the interior of the hollow body by a vacuum pump attached to an
exhaust side of the inlet and exhaust manifold.
4 . The method of any preceding claim, wherein a gas discharge point within the
hollow body is arranged at a different level than a gas exhaust point.
5 . The method of any preceding claim, wherein the hollow body is used as a
reaction vessel sealed by a sealing part comprised by the port assembly.
6 . The method of claim 5, wherein said sealing part comprises a tapered thread
detachably attachable to said opening of the hollow body.
7 . The method of claim 5 or 6, wherein said port assembly comprises a fitting
part attachable to the sealing part allowing the sealing part to twist to tighten
against said opening of the hollow body.
8 . The method of any preceding claim, comprising:
guiding inactive purge gas into an intermediate space between the hollow
body and a surrounding chamber wall, and
pumping said inactive purge gas out from the intermediate space.
9 . The method of any preceding claim, wherein the inlet and exhaust manifold
comprises one or more in-feed lines with their controlling elements controlled
by a computer-implemented control system.
10 . An apparatus for protecting an interior of a hollow body, comprising:
an inlet and exhaust manifold comprising a port assembly attachable to an
opening of the hollow body, the apparatus being configured to expose the
interior of the hollow body to sequential self-saturating surface reactions by
sequential inlet of reactive gases via said port assembly and said opening into
the interior of the hollow body; and
a pump configured to remove excess gases via said opening and said port
assembly out from the hollow body.
11. The apparatus of claim 10, wherein a gas discharge point provided by the inlet
and exhaust manifold is arranged at a different level than a gas exhaust point
provided by the inlet and exhaust manifold.
12 . The apparatus of claim 10 or 11, wherein the inlet and exhaust manifold
comprises precursor vapor and purge gas in-feed lines and their controlling
elements.
13 . The apparatus of any of claims 10-1 2, wherein the inlet and exhaust manifold
comprises a hollow body-specific port assembly configured to attach the inlet
and exhaust manifold into said opening of the hollow body thereby forming a
fluid communication path between the inlet and exhaust manifold and the
interior of the hollow body.
14. The apparatus of any of claims 10-1 3, comprising:
a chamber surrounding the hollow body and an inactive gas in-feed line
configured to guide inactive purge gas into an intermediate space between the
hollow body and a surrounding chamber wall.
15 . The apparatus of any of claims 10-14, wherein the port assembly comprises a
sealing part attachable to the opening of the hollow body.
16 . The apparatus of claim 15, wherein the sealing part comprises a tapered
thread.
17 . The apparatus of claims 10-1 6, wherein the apparatus is mobile.