Development Method And Substrate Processing System

Abstract: Provided is a development method for subjecting a substrate to a development treatment, the development method including: a step for supplying a developing liquid comprising an organic solvent to the substrate which has a metal-containing coating film that has undergone exposure to light in accordance with a predetermined pattern; and a step for supplying a first cleaning liquid comprising an organic solvent to the substrate to which the developing liquid has been supplied. The metal-containing coating film is less soluble in the first cleaning liquid than in the developing liquid, and the first cleaning liquid contains pure water in an amount of 0.25-50 vol%.

Patent Information

Application #

Filing Date

15 December 2025

Publication Number

52/2025

Publication Type

INA

Invention Field

ELECTRONICS

Status

Email

Parent Application

Applicants

TOKYO ELECTRON LIMITED

3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325

Inventors

1. KAMEI, Yuya

c/o TOKYO ELECTRON KYUSHU LIMITED, 1-1, Fukuhara, Koshi City, Kumamoto 8611116

Specification

Documents

Application Documents

#	Name	Date
1	202517126889-TRANSLATIOIN OF PRIOIRTY DOCUMENTS ETC. [15-12-2025(online)].pdf	2025-12-15
2	202517126889-STATEMENT OF UNDERTAKING (FORM 3) [15-12-2025(online)].pdf	2025-12-15
3	202517126889-REQUEST FOR EXAMINATION (FORM-18) [15-12-2025(online)].pdf	2025-12-15
4	202517126889-PROOF OF RIGHT [15-12-2025(online)].pdf	2025-12-15
5	202517126889-PRIORITY DOCUMENTS [15-12-2025(online)].pdf	2025-12-15
6	202517126889-POWER OF AUTHORITY [15-12-2025(online)].pdf	2025-12-15
7	202517126889-FORM 18 [15-12-2025(online)].pdf	2025-12-15
8	202517126889-FORM 1 [15-12-2025(online)].pdf	2025-12-15
9	202517126889-DRAWINGS [15-12-2025(online)].pdf	2025-12-15
10	202517126889-DECLARATION OF INVENTORSHIP (FORM 5) [15-12-2025(online)].pdf	2025-12-15
11	202517126889-COMPLETE SPECIFICATION [15-12-2025(online)].pdf	2025-12-15